• Title/Summary/Keyword: 서브미크론

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Development of a Submicron Order Straightness Measuring Device (서브미크론 진직도 측정장치 개발)

  • 박천홍;정재훈;김수태;이후상
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.5
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    • pp.124-130
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    • 2000
  • For measuring out the submicron order straightness, a precision measuring device is developed in this paper. The device is constructed with a hydrostatic feed table and a capacitive type sensor which is mounted to the feed table. Straightness is acquired as substracting the motion error of feed table from the measured profile with probe. Motion error of feed table is simultaneously compensated upto 0.120${\mu}{\textrm}{m}$ of linear motion error and 0.20arcsec of angular motion error using the active controlled capillary. Reversal method and strai호t-edge is used fur estimating the measuring accuracy and from the experimental result, it is verified that the device has the measuring accuracy 0.030m. Also, through the practical application on the measurement of ground surface, it is confirmed that the device is very effective to measure the submicron order straightness.

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Four-mirror optical system for UV submicron lithography (서브미크론 리소그라피를 이한 4 반사광학계의 설계)

  • 박성찬
    • Proceedings of the Optical Society of Korea Conference
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    • 1991.06a
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    • pp.81-87
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    • 1991
  • A design of a four-mirror optical system for submicron lithography using KrF excimer laser beam(λ=248nm) is presented. By using the third order aberration theory, analytic solutions for a telecentric, flat-field, and anastigmatic four-spherical-mirror system (reduction magnification 5$\times$) are found. Aspherization is carried out to the spherical mirror surfaces in order to reduce the residual higher order aberrations and vignetting effect. Finally we obtain a reflection system useful in submicron lithographic application.

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초정밀 스테이지의 반복정밀도 분석

  • 박종하;황주호;박천홍;홍준희
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.05a
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    • pp.320-320
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    • 2004
  • 반도체용 노광장비나 검사장비, 초정밀 광학렌즈, 비구면 렌즈 가공 등의 핵심이 되는 것은 초정밀결정기술이다. 서브미크론의 정밀도를 갖는 장비는 한치의 오차도 허용치 야고 계획된 경로대로 정확하게 목표지점에 도달해야 초정밀 가공을 기대 할 수 있다 초정밀 공기정압 스테이지는 저마찰 특성과 높은 운동정밀도, 청정환경유지가 가능하여 반도체 노광장비에서 PDP 나 LCD검사장비, 초정밀가공 가공기 등 다양한 정밀장비에서 활용된다.(중략)

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Formation of Submicron Top Pattern by using Tri-Layer Resist Structure (심층 레지스터 구조를 이용한 서브미크론 상층패턴 형성)

  • 심규환;양전욱;이진희;강진영;마동성
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.5
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    • pp.495-500
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    • 1988
  • The effectiveness of tri layer resist (TLR) technique is compared with that of single layer resist (SLR) technique in order to make a 0.8um pattern with the linewidth deviation of 10 percents. SLR technique is not appropriate to shape the micro-pattern on oxide and aluminum steps because of the standing wave effect and the light scattering effect in shaping the resist pattern. On the contrary, the uniform line with a width of 0.8um on oxide and aluminum steps can be formed by TLR technique, reducting such effects. The planarization and the light absorption coefficient of the bottom layer resist in TLR are optimized by exposing it to ultra violet light after baking it for 30min at 230\ulcorner. An uniform line with a width of 0.8um on oxide step is defined with the light absorption coefficient of 0.85 whereas that on aluminum step is defined with 0.95.

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A Study on the Collection Characteristics of Submicron Particles in an Electrostatic Precipitator - II. Collection Efficiency Characteristics (전기 집진기에서의 Submicron 입자의 집진 특성에 관한 연구-II. 집진 효율 특성)

  • 김용진;여석준;유주식
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.13 no.7
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    • pp.579-587
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    • 2001
  • This study investigates particle collection characteristics of a cylindrical electrostatic precipitator. Experimental work has been made for the submicron particles. The effects of polarity of discharge electrode wire, particle diameter, gas velocity, gas temperature, and specific corona power on the particle collection efficiency are investigated. The efficiency of negative corona is higher than that of positive corona. as the particle diameter increases, the efficiency is decreased when the diameter is in the range of 0.02-0.6 micron, but is increased for the nanometer particles with diameter smaller than 0.02 micron. The efficiency is increased with increase of specific corona power. As the gas temperature increases, overall collection efficiency is increased for a negative corona, but is deceased for a positive corona.

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A Study on the Collection Characteristics of Submicron Particles in an Electrostatic Precipitator - I. Electrical Characteristics (전기 집진기에서의 Submicron 입자의 집진 특성에 관한 연구-I. 전기적 특성)

  • 김용진;황태근;유주식
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.13 no.7
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    • pp.572-578
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    • 2001
  • This study conducts a laboratory measurement on a cylindrical electrostatic precipitator(ESP) with a 30mm-diameter cylinder. Several kinds of test aerosols are generated with an atomizer and a diffusion dryer. The effects of applied voltage, flow state, gas velocity, and gas temperature on the electrical characteristics of the precipitator and onset of corona are experimentally investigated. The corona onset voltage is decreased, as diameter of discharge electrode wire becomes small or temperature of the precipitator increases. As the fluid velocity or particle load in the precipitator increases, the corona current is decreased.

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Research for Patent Application Tendency in the High Reliable Machining Center for Making of Ultra Precisional Component (고정밀 부품 가공을 위한 고유연성 머시닝센터의 특허동향 분석에 관한 연구)

  • Kim, Seung-Min;Ko, Jun-Bin;Park, Hee-Sang
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.17 no.6
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    • pp.1-7
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    • 2008
  • This paper research the trend of technology of the high efficient and reliability machining center and high flexibility parallel manipulator machining center including linear motor machining center, submicron machining center and direct drive 5 axis machining center using patent information of Korea, U.S.A, Japan and Europe. By using this, the technique level of Korea, the International trend of technology and condition of cooperation research was estimated and the necessity of research and development performance about the machining center for the IT part processing were inquired.

The DC Characteristics of Submicron MESFEFs (서브미크론 MESFET의 DC 특성)

  • 임행상;손일두;홍순석
    • Electrical & Electronic Materials
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    • v.10 no.10
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    • pp.1000-1004
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    • 1997
  • In this paper the current-voltage characteristics of a submicron GaAs MESFET is simulated by using the self-consistent ensemble Monte Carlo method. The numerical algorithm employed in solving the two-dimensional Poisson equation is the successive over-relaxation(SOR) method. The total number of employed superparticles is about 1000 and the field adjusting time is 10fs. To obtain the steady-state results the simulation is performed for 10ps at each bias condition. The simulation results show the average electron velocity is modified by the gate voltage.

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Synthesis and Application of Hybrid Nanostructure Containing Quantum Dots

  • U, Gyeong-Ja;Yu, Hye-In;Jang, Ho-Seong;Kim, Sang-Gyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.131-131
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    • 2014
  • 양자점은 전통적인 유기 염료에 비해 흡광영역이 넓고 발광 피크의 폭이 좁으며, 흡광과 발광 사이의 에너지 차가 커서 검출이 용이하고, 광안정성이 우수할 뿐만 아니라, 단순히 크기를 조절함으로써 발광 피크의 에너지를 제어할 수 있는 특장 때문에 많은 연구가 진행되었다. 그러나 많은 나노입자들과 마찬가지로 실질적인 응용을 위해서는 양자점 나노입자들도 대부분 표면개질을 거쳐야 하는데, 이 과정이 까다롭고 또 표면개질 중에 나노입자들의 응집이 일어나거나 광특성이 나빠지는 등의 문제가 흔히 발생한다. 한편, 서브미크론 크기의 입자들은 나노입자에 비해 응집현상이 미미해서 상대적으로 취급이 용이하다. 그 중에서도 실리카 입자들은 합성방법도 쉽게 확립되어 있고 생체친화성이 우수하며 그 표면화학 반응이 이미 잘 알려져 있어서 활용하기가 매우 용이하다. 따라서 양자점 층을 실리카 표면 가까이에 자기조립을 통해 배열한 하이브리드 구조는 양자점의 장점을 편리하게 이용할 뿐만 아니라 실리카의 표면개질 특성도 그대로 이용할 수 있다는 이중의 장점이 있다. 본 논문에서는 코어/쉘 구조로 안정화된 II-VI 반도체 양자점 층을 아래 그림 1과 같이 실리카 콜로이드 내에 배열한 하이브리드 구조를 소개하고, 이 하이브리드 구조를 표면개질 하여 LED 칩 위에 패키징 함으로써 백색광을 제조한 연구 및 더 나아가 중심에 초상자성 클러스터 핵을 배치하고 이를 둘러싼 실리카 콜로이드 표면 가까이에 양자점 층을 배열한 초상자성 하이브리드 구조를 합성하여 이를 on-site sensor에 적용한 연구 결과를 소개한다.

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