• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.585-589
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• 2008

This study is performed to analyze the fluid flow about 150mm shower heads of semiconductor device. Under the air pressure, the ideal gas of moving fluid is injected as 5m/s velocity into inlet of shower heads and the flow distribution in shower heads is measured according to pitch of plasma distribution device. As results, the maximum and minimum value of fluid velocity are investigated with their position. The velocity values at outlet are also studied. From two experiment using the plasma distribution device, the results of CFD are compared with the experimental results. That results shows stable flow of fluid in that case of corrected design from CFD.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2011년도 춘계학술대회 논문집
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• pp.459-460
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• 2011

• 대한기계학회논문집B
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• 제23권3호
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• pp.419-430
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• 1999

Measurements of local blowing ratio and ammonia-diazo flow visualizations have been conducted for a shower-head film cooling on a first-stage turbine stator. In this study, six rows of normal holes are drilled symmetrically on the semicircular leading edge of a simulated blunt body. The measurements show that for an average blowing ratio based on freestream velocity, M, of 0.5, local average mass flow rate through the first two rows of the holes is less than those through the second and third two rows of the holes, and the fraction of mass flow rate through the first two rows to total mass flow rate has a tendency to increase with the increment of M. The flow visualizations reveal that the injection through the first two row results in inferior film coverage even In the case of M = 0.5, meanwhile the row of holes situated at farther downstream location provides higher film-cooling performances for all tested M. This is because film-cooling effectiveness depends on local mainflow velocity at the hole location as well as the mass flow rate through each row.

• 대한기계학회논문집B
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• 제24권2호
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• pp.177-187
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• 2000

Measurements of temperature fields and film-cooling effectiveness have been conducted for a shower-head film cooling on the leading edge of a blunt body, which simulates a first-stage turbine stator. In this study, three injection cases are employed for an average blowing ratio based on freestream velocity, M, of 0.5, 1.0 and 1.5. Two (Case 1), four (Case 2) and six (Case 3) rows of normal holes are symmetrically drilled on the three tested circular-cylinder leading edges. The measurements show that regardless of M, the film-cooling effectiveness increases as the injection row is situated at farther downstream location. In Case 1, the film-cooling effectiveness is highest for M = 0.5 and lowest for M = 1.5. On the contrary, in Case 3, the film-cooling effectiveness is highest for M = 1.0 and lowest for M = 0.5. When M = 0.5, the film coverage by the first row of the injection holes deteriorates as the number of the injection row increases. In particular, the film-cooling effectiveness due to the injection through the first row of the holes in Case 3, has a nearly zero value.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 춘계학술대회
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• pp.1475-1480
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• 2004

Plasma Enhanced Chemical Vapor Deposition (PECVD) process uses unique property of plasma to modify surfaces and to achieve the high deposition rates. In this study, a vertical thermal RF-PECVD (Radio Frequency-PECVD) reactor is modeled to investigate thermal flow and the deposition rates with various shapes of the showerhead. The showerhead in the CVD reactor has the shape of a ring and gases are injected in parallel with the susceptor, which is a rotating disk. In order to achieve the high deposition rates, we have simulated the thermal flow fields in the reactor with several showerhead models. Especially the effects of the number of injection holes and the rotating speed of the susceptor are studied. Using a commercial code, CFDACE, which uses FVM (Finite Volume Method) and SIMPLE algorithm, governing equations have been solved for the pressure, mass-flow rates and temperature distributions in the CVD reactor. With the help of the Nusselt number and Sherwood number, the heat and mass transfers on the susceptor are investigated. In order to characteristics of measure the flatness of the layer, furthermore, the relative growth rate (RGR) is considered.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2010년도 제35회 추계학술대회논문집
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• pp.479-483
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• 2010

본 연구는 하이브리드 로켓 연소에서 원통형 멀티 포트 그레인과 스월 인젝터 적용 시 각각 후퇴율 증가의 장점을 취합하고자 수행하였으며, 연료 포트 수와 스월 인젝터의 배치에 따른 후퇴율 변화에 대한 실험을 수행 하였다. 실험 결과 멀티 포트 그레인에 샤워 헤드 형태의 인젝터를 적용한 것보다 스월 인젝터를 적용한 경우의 후퇴율이 증가되는 것을 확인 할 수 있었다.

• 반도체디스플레이기술학회지
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• 제19권2호
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• pp.16-21
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• 2020

How accurately reproducible energy is delivered to the wafer in the process of making thin films using PE-CVD (Plasma enhanced chemical vapor deposition) during the semiconductor process. This is the most important technique, and most of the reaction on the wafer surface is made by thermal energy. In this study, we studied the method of monitoring the change of thermal energy transferred to the wafer surface by monitoring the temperature change according to the change of the thin film formed on the showerhead facing the wafer. Through this research, we could confirm the monitoring of wafer thin-film which is changed due to abnormal operation and accumulation of equipment, and we can expect improvement of semiconductor quality and yield through process reproducibility and equipment status by real-time monitoring of problem of deposition process equipment performance.

• 한국전기전자재료학회논문지
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• 제33권5호
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• pp.344-349
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• 2020

Modern thin film deposition processes require high deposition rates, low costs, and high-quality films. Atmospheric pressure plasma-enhanced chemical vapor deposition (AP-PECVD) meets these requirements. AP-PECVD causes little damage on thin film deposition surfaces compared to conventional PECVD. Moreover, a higher deposition rate is expected due to the surface heating effect of atomic hydrogens in AP-PECVD. In this study, polycrystalline silicon thin film was deposited at a low temperature of 100℃ and then AP-PECVD experiments were performed with various plasma powers and hydrogen gas flow rates. A deposition rate of 15.2 nm/s was obtained at the VHF power of 400 W. In addition, a metal foam showerhead was employed for uniform gas supply, which provided a significant improvement in the thickness uniformity.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2009년도 춘계학술대회 논문집
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• pp.61-64
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• 2009

본 연구에서는 액체 로켓 엔진의 연소 시험을 통하여 O/F ratio가 연소 성능에 미치는 영향을 측정하였다. 사용된 분사기는 추력 200 N, 챔버 압 10 bar로 설계된 샤워헤드형 이며, 점화 방식은 촉매점화를 선택하였고. 과산화수소와 케로신을 추진제로 사용하였다. 본 실험을 통해서 로켓의 효율을 보다 증가시킬 수 있는 방법으로 O/F ratio가 연소 성능에 미치는 영향을 측정하여 O/F ratio의 운용조건을 알 수 있었다.

• 한국응용과학기술학회지
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• 제34권2호
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• pp.394-399
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• 2017

본 연구는 오존수를 이용한 인체공학적 샴푸대가 분리 가능하고 미세분사 형식의 샤워헤드와 높낮이 조절이 가능한 샴푸대를 개발할 수 있는 장치기술 및 그 방법을 제시하고자 한다. 개발결과 기존의 장치보다 피시술자 머리가 세발대 안으로 들어오는 인체공학적 디자인과 목받이 부분을 높게 제작하여 물튀김 방지를 완성하였다. 실험결과 물을 공급하는 통에 부착되어 있는 온수 유지 히터를 통해 피시술자의 기호에 맞는 온도를 설정하여 시술 시 지연 시간 없이 온수 세발 가능하도록 온도센서를 통하여 확인한 결과 수온유지($38^{\circ}C$)가 일정하게 유지되었다. 그리고 오존수 변환장치 설치로 자체 살균(1PPM) 및 정화 기능까지 가능한 장치의 효용성을 알 수 있었다. 오존수를 20분 정도 측정한 결과 오존 농도가 1PPM 이하로 측정되어 안정성을 확보하였다. 최종적으로 오존수를 20분 정도 측정한 결과 오존 농도가 1PPM 이하로 측정되어 안정성을 확보하였고, 온수장치와 오존수 변환장치와 함께 이동 샴푸대의 모든 부분이 사용자가 사용하기에 불편함이 없도록 설계 하였다.