• Title/Summary/Keyword: 불소영향

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Effects of Krill Euphausia superba Fluoride Extract on Toxicity and Oxidative Stress in Liver cell (크릴(Euphausia superba) 불소 추출물의 간세포 독성 및 산화적 스트레스에 미치는 영향)

  • Kim, Jeong Gyun;Yoon, Ho Dong;Park, Sihyang;Kim, Poong Ho;Mok, Jong Soo;Hong, Yumi
    • Korean Journal of Fisheries and Aquatic Sciences
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    • v.46 no.6
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    • pp.682-688
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    • 2013
  • In this study, we investigated about cell toxicity and oxidative stress of HepG2 cell by treatment of sodium fluoride (NaF) and fluoride extracts from krill Euphausia superba meat, shell, whole body and krill meal. The cell toxicity showed significant at 300 and $500{\mu}g/mL$ NaF treatment group. But krill (Euphausia superba) fluoride extract (KFE) treatment in all groups were not toxic. The superoxide radical production increased significantly in NaF treated group, but there was no significant change in KFE treated group. The superoxide dismutase activity was a significant increase 21.5% at $100{\mu}g/mL$ and 24.7% at $300{\mu}g/mL$ treatment group of fluoride extracts from krill meat, and 8.7% at $300{\mu}g/mL$ in krill meals, compared to the control group. However, hydroxy radical flux and catalase and glutathione peroxidase activity of fluoride extracts from krill meat did not change. As a result, for a short period of time, NaF treatment in HepG2 cells affect the cell toxicity and oxidative stress, but in the case of KFE, these were not recognized. Thus, depending on the type of food ingested with fluoride, cell toxicity and oxidative stress was found to be different.

Performance Study of Membrane Capacitive Deionization Process Applied by Perfluoropolymer and Aminated Poly(ether imide) Ion Exchange Membranes (불소화고분자와 아민화된 폴리이서이미드 이온교환막을 적용한 축전식 탈염공정의 성능 연구)

  • Kim, Ji Seon;Jeong, Joo Hwan;Rhim, Ji Won
    • Membrane Journal
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    • v.25 no.1
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    • pp.60-66
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    • 2015
  • To investigate the performance of the composite carbon electrodes which the ion exchange polymers were directly casted onto porous carbon electrode surfaces, the adsorption/desorption experiments were carried out by varying the feed concentration, feed flow rate, and desorption voltages for the NaCl solution. When the feed concentration was 100 mg/L, the increase of the adsorption time led to the increase of the salt removal due to the increase of the residence time inside the cell while the increase of the feed flow rate from 15 mL/min to 23 mL/min gave the decrease of the salt removal efficiency, 12% because of the short residence time. When the feed concentration was 200 mg/L, the salt removal was shown 10~15% low because of the incomplete desorption within the desorption intervals.

Separation and Recovery of F-gases (불화 온실 가스 저감 및 분리회수 기술의 연구개발 동향)

  • Nam, Seung-Eun;Park, Ahrumi;Park, You-In
    • Membrane Journal
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    • v.23 no.3
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    • pp.189-203
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    • 2013
  • F-gases, gases containing fluorine such as perfluorocarbons (PFCs), sulfurhexafluoride ($SF_6$), nitrogen trifluoride ($NF_3$) are known to have green house effects. Although the net emission rates of gases containing fluorine are much lower than those of $CO_2$, their contribution to global warming cannot be ignored because of their extremely high global warming potential (GWP). F-gases mainly have been used for a variaty of applications in the semiconductor/LCD processes and in the electric power distribution industry of the national key industry. One of practical solutions of controlling the emission rates of F-gases is to reuse by separation and recovery of F-gases of low concentration from the gases mixtures with nitrogen or air. This work investigates some methods for F-gases recovery and separation around the membrane-based process.

Etch Rate Dependence of Differently Doped Poly-Si Films on the Plasma Parameters (플라즈마 변수에 의한 불순물주입 다결정실리콘 박막의 식각율 변화)

  • Park, Sung-Ho;Kim, Youn-Tae;Kim, Jin-Sup;Kim, Bo-Woo;Ma, Dong-Sung
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.11
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    • pp.1342-1349
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    • 1988
  • The dependence of the etch rates of differently doped poly-Si films on the gas composition, the chamber pressure and the RF power was investigated in detail. The highest anisotropy and the lowest CD loss were achieved at the $SF_6$-rich compositions, i.e., $Cl_2:SF_6$=17:33 (SCCM), in the $POCl_3$-doped poly-Si. The etch rates increased for n-type dopant (phosphorus), while decreased for p-type (boron) with increasing the doping levels irrespective of plasma parameters. And from the results of the activation of doped poly-Si films the active carrier concentrations as well as the doping concentrations were found to be responsible for the increase of the etch rate of the phosphorus-doped poly-Si.

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Preparation of Water-Repellent Coating Solutions from Tetraethoxysilane and Methyltriethoxysilane by Sol-Gel Method (졸-겔법에 의해 Tetraethoxysilane과 Methyltrimethoxysilane으로부터 발수코팅제 제조)

  • Kim, Dong Gu;Lee, Byung Wha;Song, Ki Chang
    • Korean Chemical Engineering Research
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    • v.56 no.3
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    • pp.327-334
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    • 2018
  • Water-repellent coating solutions were prepared by sol-gel method using tetraethoxysilane (TEOS) and methyltrimethoxysilane (MTMS) as precursors. The solutions were spin-coated on a cold-rolled steel sheet and thermally cured to prepare a non-fluorine water-repellent coating films. The effects of molar ratios of MTMS/TEOS, water concentration and ammonia concentration on the hydrophobic properties of the coating films were studied. The contact angle of water on coating films prepared by varying the molar ratio of MTMS/TEOS to 1~20 showed a maximum value of $108^{\circ}$ when the MTMS/TEOS molar ratio was 10. With increasing water content, the coating films showed the larger contact angles and the better the water repellency. As the amount of ammonia added was increased, the contact angles of coating films were increased, showing the better the water repellency. It is considered that the larger the amount of ammonia added, the larger the size of the silica particles generated, which increases the surface roughness of the silica particles, thereby increasing the water repellency.

반도체 및 Optic Industries 클린룸 배기가스의 오염제어 및 청정화기술

  • 황유성
    • Air Cleaning Technology
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    • v.17 no.4 s.67
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    • pp.39-57
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    • 2004
  • 첨단산업으로 불리는 반도체, LCD, PDP, 유기EL(OLED) 등의 생산 공정은 고도의 청정상태를 요구하며, 때문에 이들의 생산공정 중 대부분이 클린룸 내에서 이루어진다. 클린룸 내에서의 주요공정은 크게 박막형성(Layering), 노광(Photo Lithography), 식각(Etching) 등 3가지 공정으로 나눌 수 있으며, 반도체 제조공정의 경우 특별히 도핑(Doping) 공정이 추가된다. 오염물질을 함유하는 클린룸 배기는 일반적으로 산, 알칼리, Toxic(PFCs, Flammable), VOC 등으로 분류하며, 각각의 배기는 각 배기특성에 맞는 오염제어 장치를 통해, 정화된 후, 대기로 방출된다. 산, 알칼리 배기는 일반적으로 최종 단계에서 중앙집중식 습식스크러버에 의해 흡수, 중화 처리되며, VOC의 경우 농축기(Concentrator) & 축열식 열 산화장치(RTO) 설비에 의해 연소 처리된다. 하지만 CVD공정으로부터의 배기가 주를 이루는 Toxic배기의 경우, 다량의 PFCs(과불소화합물) 가스를 함유하고 있는 이유로, 대부분 클린룸 내부에 P.O.U(Point of use) 처리장치가 설치되며, P.O.U에 의해 1차 처리된 후 최종적으로 중앙집중식 습식스크러버를 거쳐 대기로 방출된다. 알칼리배기의 주성분으로는 암모니아($NH_3$), HMDS (Hexa Methyl DiSilazane), TMAH (Tetra Methyl Ammonium Hydroxide), LGL, CD 등이며 흡수액에 황산(Sulfuric Acid)용액을 공급, 중화처리하고 있다. 탄소성분을 먹이로 하는 미생물의 번식에 의한 막힘 문제를 제외하고는 큰 문제가 없다. 하지만 Toxic배기 및 산배기의 경우 처리효율이, 가스흡수 이론에 의한 계산결과와 비교할 때, 매우 저조하게 나타나는 효율부족 현상을 겪고 있으며, 이는 잔여 PFCs 가스성분 및 반응에어로졸, 응축에어로졸 등의 영향으로 추정하고 있다. 최근 Toxic 배기의 경우, P.O.U 설비를 Burn & Wet type으로 변경하여, 배기 중 PFCs 및 반응에 에어로졸($SiO_2$)의 농도를 원천적으로 감소시키는 노력이 진행 중이다. 산배기의 경우, 산결로 현상에 의한, 응축에어로졸이 문제가 되고 있으나 내식열교환기(Anti-Corrosive Heat Exchanger), 하전액적스크러버 시스템(Charged Droplets Scrubber System), Wet ESP(Wet Electrostatic Procipitator) 등의 도입을 통해 문제해결을 위한 노력을 경주하고 있다.

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EFFECT OF FLUORIDE APPLICATION ON DENTIN BONDING (불소도포가 상아질 접착에 미치는 영향)

  • Kwon, Hyoung-Jo;Park, Jin-Hoon;Cho, Kyeu-Zeung
    • Restorative Dentistry and Endodontics
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    • v.20 no.1
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    • pp.113-128
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    • 1995
  • The purpose of this study was to investigate the effect of stannous fluoride on the dentin bonding with three kinds of commercially available dentin bonding systems containing different adhesive monomers. Dentin specimens with exposed labial dentin prepared from freshly extracted bovine mandibular anterior teeth were divided into experimental and control groups. The specimens of experimental groups were bonded with dentin bonding systems and composite resins including All bond 2 ㅡ& Bisfil, Scotchbond Multi-Purpose & Z100, and Denthesive II Charisma after 2 % stannous& fluorided application for S minutes and washing for 1 minute. The specimens of control groups were bonded with the same dentin bonding systems and composite resins as used in the experimental groups. After bonded specimens were stored in $37^{\circ}C$ distilled water for 24 hours, the tensile bond strength and cohesive failure rate were measured, and then the pretreated dentin surfaces and the fractured dentin surfaces were examined under scanning electron microscope. The results were as follows : Mean bond strength of stannous fluoride applied groups of All bond 2, Scotchbond MP, and Denthesive II were 2.5MPa, 1.1MPa, and 1.1MPa respectively, and those of control groups were 7.5MPa, 8.1MPa, and 4.6MPa. Bond strength values of stannous fluoride applied groups were significantly lower than those of the control groups(p<0.05). SEM findings of dentin surfaces after stannous fluoride application demonstrated an appearance of partially remained smear layer and smear plugs inspite of pretreatment with 10 % phosphoric aicd or maleic acid solution, and an appearance of smear layer covered surface under Denthesive II priming. But those of control groups commonly showed clean dentin surfaces without smear layer and smear plugs. On SEM observation of the fractured dentin-resin interface, while most of the specimens of stannous fluoride applied groups showed adhesive failure mode, those of All bond 2 and Scotchbond MP control groups showed mainly adhesive-cohesive mixed failure mode, and mainly adhesive failure mode in Denthesive II control group.

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Glass Thinning by Fluoride Based Compounds Solution with Low Hydrofluoric acid Concentration (저불산 불소계 화합물 수용액을 이용한 글라스 박판화)

  • Kim, Ho-Tae;Gang, Dong-goo;Kim, Jin-Bae
    • Applied Chemistry for Engineering
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    • v.20 no.5
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    • pp.557-560
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    • 2009
  • In this study, a new wet etching method and the solution for thinning the glass with the thickness below $100{\mu}m$ were investigated. For the preparation of etching solution with low hydrofluoric acid, it was effective to use $NH_4F$ or $NH_4HF_2$ as a main ingredient with the addition of sulfuric acid or nitric acid. Influence of the composition of mixed acid solution and the temperature on the etching rate was investigated. The addition of anionic surfactant provides the function to prevent the adhesion of sludge generated by the etching reaction. A new wet etching pilot device equipped with streaming generation parts was used to test etching of commercial non-alkali glass and soda lime glass. The non-alkali glass with the thickness of 640 ${\mu}m$ and soda lime glass with the thickness of $500{\mu}m$ were etched to $45{\mu}m$ and $100{\mu}m$, respectively, by using the pilot device. After the etching by pilot device, the roughness degree of the glass surface was maintained at $0.01{\sim}0.02{\mu}m$.

Gas Permeation Properties of Brominated Polysulfone Membranes (브롬화된 Polysulfone막에 의한 기체 투과 특성에 관한 연구)

  • Rhim, Ji-Won;Lee, Bo-Sung;Kim, Tae-Young;Kim, Dae-Hoon;Lee, Byung-Sung;Yoon, Seok-Won;Im, Hyeon-Soo
    • Membrane Journal
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    • v.19 no.2
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    • pp.150-156
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    • 2009
  • To improve the permselective efficiency of polysulfone membranes, the bromination was performed and then the resulting membranes were investigated in terms of membrane structures and gas transport characteristics. The brominated Polysulfone membranes were characterized by FT-IR, 1H-NMR, TGA, contact angle measurements, and gas permeation measurements were accomplished with He, $N_2,\;CO_2\;and\;O_2$. In general, the permeation rates were reduced while the selectivities increased as the bromination progressed.

Influence of Fluorine-Doped Tin Oxide Coated on NiCrAl Alloy Foam Using Ultrasonic Spray Pyrolysis Deposition (초음파 분무 열분해법을 이용한 NiCrAl 합금 폼에 코팅된 불소 도핑된 주석 산화물의 영향)

  • Shin, Dong-Yo;Bae, Ju-Won;Koo, Bon-Ryul;Ahn, Hyo-Jin
    • Korean Journal of Materials Research
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    • v.27 no.7
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    • pp.392-397
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    • 2017
  • Fluorine-doped tin oxide (FTO) coated NiCrAl alloy foam is fabricated using ultrasonic spray pyrolysis deposition (USPD). To confirm the influence of the FTO layer on the NiCrAl alloy foam, we investigated the structural, chemical, and morphological properties and chemical resistance by using USPD to adjust the FTO coating time (12, 18, and 24 min). As a result, when an FTO layer was coated for 24 min on NiCrAl alloy foam, it was found to have an enhanced chemical resistance compared to those of the other samples. This improvement in the chemical resistance of using USPD NiAlCr alloy foam can be the result of the existence of an FTO layer, which can act as a protection layer between the NiAlCr alloy foam and the electrolyte and also the result of the increased thickness of the FTO layer, which enhances the diffusion length of the metal ion.