• Journal of Sensor Science and Technology
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• v.12 no.5
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• pp.199-204
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• 2003

This paper describes on the fabrication and characteristics of a ceramic thin-film pressure sensor based on Ta-N strain-gauges for harsh environment applications. The Ta-N thin-film strain-gauges are sputter-deposited onto a micromachined Si diaphragms with buried cavity for overpressure protectors. The proposed device takes advantages of the good mechanical properties of single-crystalline Si as diaphragms fabricated by SDB and electrochemical etch-stop technology, and in order to extend the operating temperature range, it incorporates relatively the high resistance, stability and gauge factor of Ta-N thin-films. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is $1.097-1.21\;mV/V{\codt}kgf/cm^2$ in the temperature range of $25-200^{\circ}C$ and the maximum non-linearity is 0.43%FS.

• Electrical & Electronic Materials
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• v.10 no.10
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• pp.1022-1028
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• 1997

In this paper we present the construction details and output characteristics of a diaphragm-type pressure sensor with Cu-Ni(53:47) thin-film strain gauges. In order to improve the sensitivity and the temperature compensation two circumferential gauges are placed near the center of the diaphragm and two radial gauges are located near the edge. For all the gauges the relative change in resistance ΔR/R with pressure is of the order 10$^{-3}$ for the maximum pressure. The output is found to be linear over the entire pressure range(0-30kfg/cm$^2$)and the output sensitivity obtained is 1.6mV/V. The maximum nonlinearity observed in output characteristics is 0.35%FS for 5V excitation and the hysteresis is less than 0.1%FS.

• The Journal of the Acoustical Society of Korea
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• v.14 no.2E
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• pp.12-18
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• 1995

Capactive miro pressure sensor is simulated with finite element methods to analyze the effect of geometrical variation on its performace. Sensor material is th silicon single crystal. The sensor consists of a disk type diaphragm and several bridges connected to a rigid frame. Structural variables in consideration are the thickness of the diaphragm and the bridges, radius of the circular plate, and the number of bridges. Results of static, dynamic and sensitivity analyses reveal the best structure of the sensor among the fifteen cases under investigation.

• Proceedings of the KOSOMBE Conference
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• v.1990 no.11
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• pp.75-79
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• 1990

반도체 및 전자공업의 급속한 발달에 힘입어 압력센서가 소형, 경량, 대량 생산화됨으로써 의료용으로의 사용이 최근 급속히 늘고 있다. 따라서 본 논문은 현재 가장 활발히 개발되고 있는 압저항형 압력 센서의 원리인 압저항 효과에 대해 이론적인 분석을 상세히 소개하였다. 그리고 기존에 많이 소개된 바 있는 정사각형 모양의 박막모서리 중앙 부분에 위치한 압저항체의 설계 보다 직사각형 박막 중심에 위치한 압저항체의 설계가 우수한 특성을 보일 수 있는 이론적 근거를 설명한다.

• Korean Journal of Materials Research
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• v.6 no.9
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• pp.937-942
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• 1996

박막 공정 및 마이크로머시닝(micromachining)기술에 의해 제작되는 마이크로 가스 센서는 고온 동작이 필수불가결하며 이 때 안정된 출력을 얻기 위해서 센서 저항 변화에 영향을 줄 수 있는 응집화 현상이 발생하지 말아야 한다. 본 연구에서는 고온 동작시 응집화의 구동력으로 작용하는 여러 요소중의 하나인 응력(stress)을 줄이기 위해서 인가 전력 밀도, 기판온도, 증착 압력 등을 증착 변수로 하여 증착 조건이 (AI, SI)1-xOx박막과 Pt 박막의 제반 물성 및 응력변화에 미치는 영향에 대하여 연구하였다. (AI, SI)1-xOx박막의 증착 속도와 굴절율 값은 O2분압과 기판 온도가 증가할수록 감소하였으며 응력은 O2분압이 증가함에 따라 인장에서 압축으로 전환된 후 증가하였다. Pt 박막의 경우, 인가 전력이 증가할수록 공정 압력이 감소할수록, 기판 온도가 감소할수록 증착 속도는 증가하였으며 전기 비저항은 감소하였다. Pt 박막의 응력은 인가 전력이 증가할수록, 공정 압력이 증가할수록, 기판 온도가 증가할수록 압축에서 인장의 방향으로 전환된 후 증가하였으며 박막의 전기비저항 및 증착속도에 크게 의존하는 것으로 분석되었다.

• Journal of Sensor Science and Technology
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• v.10 no.3
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• pp.173-179
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• 2001

The currently used semiconductor pressure sensors are piezoresistive and capacitive type. Especially, semiconductor micro pressure sensors have a great deal of attention because of their small size. However, its fabrication processes are difficult, so that its yield is poor. For the purpose of resolving the drawbacks of the existing silicon pressure sensors, we demonstrate a new type of pressure sensor using PSFET(pressure sensitive field effect transistor) and investigate its operational characteristics. We used PZT(Pb(Zr,Ti)$O_3$) as a pressure sensing material. PZT thin films were deposited on a gate oxide of MOSFET by an rf-magnetron sputtering method. To abtain the stable phase, perovskite structure, furnace annealing technique have been employed in PbO ambient. The sensitivity of the PSFET was 0.38 mV/mmHg.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.40 no.2
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• pp.81-86
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• 2003

To measure the pressure using semiconductor type pressure sensor in water or chemical solution, the sensor must be protected from the solution using proper packaging materials. stainless steel isolated type pressure sensor packaged with SUS316 can be widely used to measure the pressure in water or chemical due to its high corrosion-resistance and good performance in tensility and welding. Even if the surface of SUS316 has a plenty of nickel and chromium, the SUS316 is highly corrosive in acidic or alkaline solution. We coated parylene and adhesion promoting copper layer are 5${\mu}{\textrm}{m}$ and 200nm, respectively. The parylene coated stainless steel pressure sensor showed good anti-corosive characteristics in various strong acids. The accuracy of pressure sensor wasn't varied after parylene coating with 0.5%FSO.

• Electrical & Electronic Materials
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• v.10 no.9
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• pp.938-944
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• 1997

Cu-Ni thin film strain gauges for diaphragm-type pressure sensors were developed. Thin films of Cu-Ni alloys of various compositions were deposited onto glass and stainless steel substrates by RF magnetron sputtering. The effects of composition substrate temperature Ar partial pressure and aging on the electrical properties of Cu-Ni film strain gauges in the thickness range 500~2000$\AA$ are discussed. The maximum resistivity(95.6 $\mu$$\Omega$cm) is obtained from 53wt%Cu-47wt%Ni films while the temperature coefficient of resistance(TCR) becomes minimum(25.6ppm/$^{\circ}C$). The gauge factor is about 1.9.

• Proceedings of the KIEE Conference
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• 2002.11a
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• pp.54-56
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• 2002

본 논문에서는 뇌압을 측정하기 위해 LC 공진을 이용한 압력센서를 제작하고 그 성능을 시험하였다. 원격 측정용 압력센서는 움직이는 전극역할을 하는 p+ 박막이 있는 실리콘 기판과 고정된 평면 코일이 있는 유리 기판으로 구성되어 있다. 압력에 따라 두 전극 간의 간격이 달라지고 이에 따른 캐피시턴스가 변화하여 공진주파수가 변화하게 된다. 원격 측정용 외부 안테나를 이용하여 측정회로의 공진 주파수에서 위상의 변화를 측정하여 압력을 측정한다. 상부기판은 실리콘 기판을 도핑하여 p+ 막을 형성하고 금속막을 증착하여 전극을 형성한 후 실리콘을 식각하여 완성하고. 하부기판은 유리 기판 위에 금속막을 증착한 후. 전기도금으로 평면 코일을 형성하고 다시 금속막을 증착하여 전극을 형성하여 제작한다. 압력을 변화시킬 때 전극간의 간격의 변화에 따른 공진주파수에서의 위상의 변화를 외부 안테나에 연결된 측정회로를 통해 측정한다. 측정결과 공진주파수인 160 Mhz에서 -0.08 $deg/mmH_2O$의 감도를 얻을 수 있었다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.3 no.1
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• pp.59-65
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• 1993

The boron-doped polycrystalline silicon films which can be used in pressure sensors were fabricated in a high-vacuum resistance heating evaporator. Poly-Si films were deposited on quartz substrates at various temperatures and the boron was doped to the silicon film in a diffusion furnace using BN wafer. The silicon films deposited at $500^{\circ}C$ was amorphous, began to show crystalline at $600^{\circ}C$, and became polycrystalline at $700^{\circ}C$. After doping boron at $900^{\circ}C$for 10 minutes, the resistivity of the films was in the range of $0.1{\Omega}cm~1.5{\Omega}cm$, the boron density was $9.4\times10^{15}~2.1\times{10}^{17}cm^{-3}$, and the grain size was $107{\AA}~191{\AA}$.