• Title/Summary/Keyword: 마이크로 챔버

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In-situ Observation of Electromigration Behaviors of Eutectic SnPb Line (공정조성 SnPb 솔더에 대한 실시간 Electromigration 거동 관찰)

  • Kim Oh-Han;Yoon Min-Seung;Joo Young-Chang;Park Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.4 s.37
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    • pp.281-287
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    • 2005
  • in-situ electromigration test was carried out for edge drift lines of eutectic SnPb solder using Scanning Electron Microscopy (SEM). The electromigration test for the eutectic SnPb solder sample was conducted at temperature of $90^{\circ}C$ and the current density of $6{\times}10^4A/cm^2$. Edge drift at cathode and hillock growth at anode were observed in-situ in a SEM chamber during electromigration test. It was clearly revealed that eutectic SnPb solder lines has an incubation stage before void formation during electromigration test, which seemed to be related to the void nucleation stage of flip chip solder electromigration behaviors.

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Analysis of the Electrical Defect Detection Mechanism using a Low Energy Electron Beam on the TFT Substrate for TFT-LCDs (TFT-LCD용 TFT기판에서 저에너지 전자빔을 이용한 전기적 결함 검출 메카니즘 분석)

  • Oh, Tae-Sik;Kim, Ho-Seob;Kim, Dae-Wook;Ahn, Seung-Joon;Lee, Gun-Hee
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.4
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    • pp.1803-1811
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    • 2011
  • We have analyzed the electrical defect detection mechanism using low energy microcolumn on the TFT substrate for TFT-LCD. In this study, we have acquired the SEM images of the various pixel defects for 7-inch TFT substrate by scanning of low energy electron beam in the high vacuum chamber. Futhermore, we have interpreted the defect detection mechanism through the correlations between the SEM images and electrical behaviors of the defective pixels. As a result, we obtained consistent results as the follows. We can confirm that the SEM images using low energy electron beam are significantly affected by the space charge effect.

A Study on the Formation of Air Bubble by the Droplet Volume and Dispensing Method in UV NIL (UV NIL공정에서 액적의 양과 도포방법에 따른 기포형성 연구)

  • Lee, Ki Yeon;Kim, Kug Weon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.14 no.9
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    • pp.4178-4184
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    • 2013
  • Nanoimprint lithography (NIL) is an emerging technology enabling cost-effective and high-throughput nanofabrication. Recently, the major trends of NIL are high throughput and large area patterning. UV curable type NIL (UV NIL) can be performed at room temperature and low pressure. And one advantage of UV NIL is that it does not need vacuum, which greatly simplifies tool construction, so that vacuum oprated high-precision stages and a large vacuum chamber are no longer needed. However, one key issue in non-vacuum environment is air bubble formation problem. Namely, can the air bubbles be completely removed from the resist. In this paper, the air bubbles formation by the method of droplet application in UV NIL with non-vacuum environment are experimentally studied. The effects of the volume of droplet and the number of dispensing points on air bubble formation are investigated.

비정질 탄소막 (a-C:H) 내에 존재하는 수소에 관한 연구

  • 박노길;박형국;손영호;정재인
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.133-133
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    • 1999
  • 비정질 탄소막 제조에 있어서 수소가 포함된 반응성 가스를 사용할 경우 제작된 탄소막 내부에는 수소가 포함되게 되며, 이러한 수소원자들은 막의 특성에 중요한 영향을 주는 것으로 알려져 있다. 따라서, 본 연구에서는 비정질 탄소막(a-C:H) 내부에 존재하는 수소가 탄소막의 특성에 미치는 영향을 알아보고, 막 내부에 포함된 수소의 함량과 공정조건 사이의 함수계를 조사함으로써 수소의 함량을 인위적으로 통제할 수 있는 가능성을 제시하고자 한다. 수소가 포함된 비정질 탄소막은 2.45 GHz의 전자기파를 사용하는 electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) 방법과 DC magnetron sputtering 법을 사용하여 제작하였다. 기판으로는 Si(001) wafer를 사용하였으며, 아세톤과 에탄올을 사용하여 표면의 유기성분을 제거하고, 진공챔버속에서 Ar 플라즈마를 발생시켜 sputter etching 방법으로 표면을 세척하였다. ECR-PECVD 방법에서는 반응가스로 메탄(CH4)과 수소(H2)의 혼합가스를 사용하였으며, 혼합가스의 비는 5~50% 범위내에서 변화를 주었다. 수소가스의 유량은 100SCCM으로 고정하였으며, 마이크로웨이브의 power는 360~900W였고, 기판에 가해준 negative DC bias 전압은 0~-500V이었다. DC magnetron sputtering 방법에서는 반응가스로 아세틸린(C2H2) 가스를 사용하였으며, 플라즈마 발생을 용이하게 하기 위해서 Ar 가스와 혼합하여 사용하였다. Ar 가스의 유량은 10SCCM으로 고정하였으며, 아세틸렌 가스의 유량은 5~20SCCM 범위내에서 주입하였다. 이때, 기판에 가해준 negative DC bias 전압은 0~-100V이었다. 제작된 탄소막의 수소 함량을 조사하기 위하여 Fourier Transform Infrared (FTIR) 분광법과 Elastic Recoil Detection Analysis (EFDA) 법을 사용하였으며, 증착율은 SEM 단면촬영과 a-step을 이용하여 측정하였고, 막의 경도는 Micro-Hardness Testing 법을 사용하여 측정하였다.

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Implementation of Integration Control System Based on Smart for Moving Welfare Medical Device Disinfection (이동식 복지용구 소독을 위한 스마트 기반의 통합제어시스템 구현)

  • Hwang, Gi-Hyun
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.9
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    • pp.2251-2258
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    • 2014
  • In this paper, an integrated control system for removable welfare equipment disinfection is implemented. The integrated control system consisted of a hydrogen peroxide vapor supply control circuit, a sterilization chamber control circuit using low vacuum, and a washing control circuit using microbubble. A Smart-phone based remote control and monitoring system is implemented to monitor the operating status and communication status for the integrated control system. An experiment is set up to evaluate the performance of the integrated control system. The experiment result confirms that signal and operation status can transmit and receive within the control circuit. The integrated control system shows good performance in terms of sensor interface, communication state and control. In future research, the proposed control system should deploy to an actual system for trial test to prove its performance.

반도체 MEMS 공정에 적용하기 위한 micro blaster 식각 특성

  • Kim, Dong-Hyeon;Gang, Tae-Uk;Kim, Sang-Won;Gong, Dae-Yeong;Seo, Chang-Taek;Kim, Bong-Hwan;Jo, Chan-Seop;Lee, Jong-Hyeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.245-245
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    • 2010
  • 최근에 반도체 소자 및 마이크로머신, 바이오센서 등에 사용되는 미세 부품에 대한 연구 개발이 활발히 진행되고 있다. 미세 부품을 제작하기 위한 MEMS 공정은 대표적으로 화학용액을 이용한 습식식각, 플라즈마를 이용한 건식식각 등이 주를 이룬다. Micro blaster는 경도가 강하고 화학적 내성을 가지며 용융점이 높아 반도체 MEMS 공정에 어려움이 있는 기판을 다양한 형태로 식각 할 수 있는 기계적인 식각 공정 기술이라 할 수 있다. Micro blaster의 식각 공정은 고속의 날카로운 입자가 공작물을 타격할 때 입자의 아래에는 고압축응력이 발생하게 되고, 이 고압축 응력에 의하여 소성변형과 탄성변형이 발생된다. 이러한 변형이 발전되어 재료의 파괴 초기값보다 크게 되면 크랙이 발생되고, 점점 더 발전하게 되면 재료의 제거가 일어나는 단계로 이루어진다. 본 연구에서는 micro blaster 장비를 반도체 MEMS 공정에 적용하기 위한 식각 특성에 관하여 확인하였다. Micro blaster 장비와 식각에 사용한 파우더는 COMCO INC. 제품을 사용하였다. Micro blaster를 $Al_2O_3$ 파우더의 입자 크기, 분사 압력, 기판의 종류, 노즐과 기판과의 간격, 반복 횟수, 노즐 이동 속도 등의 공정 조건에 따른 식각 특성에 관하여 분석하였다. 특히 실제 반도체 MEMS 공정에 적용 가능한지 여부를 확인하기 위하여 바이오 PCR-chip을 제작하였다. 먼저 glass 기판과 Si wafer 기판에서의 식각률을 비교 분석하였고, 이 식각률을 바탕으로 바이오 PCR-chip에 사용하게 될 미세 홀과 미세 채널, 그리고 미세 챔버를 형성 하였다. 패턴을 형성하기 위하여 TOK Ordyl 사의 DFR(dry film photoresist:BF-410)을 passivation 막으로 사용하였다. Micro blaster에 사용되는 파우더의 직경이 수${\mu}m$ 이상이기 때문에 $10\;{\mu}m$ 이하의 미세 채널과 미세홀을 형성하기 어려웠지만 현재 반도체 MEMS 공정 기술로 제작 연구되어지고 있는 바이오 PCR-chip을 직접 제작하여 micro blaster를 이용한 반도체 MEMS 공정 기술에 적용 가능함을 확인하였다.

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Regional Distribution of Isotropy Magnetic Property of Dual-type Giant Magnetoresistance-Spin Valve Multilayer (이중구조 거대자기저항-스핀밸브 박막의 자기등방성 영역분포에 관한 연구)

  • Khajidmaa, Purevdorj;Lee, Sang-Suk
    • Journal of the Korean Magnetics Society
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    • v.23 no.6
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    • pp.193-199
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    • 2013
  • The regional distribution of magnetic isotropy depending on the post annealing condition for the dual-type structure GMR-SV (giant magnetoresistance-spin valve) of NiFe/Cu/NiFe/IrMn/NiFe/Cu/NiFe multilayer was investigated. The rotation of in-plane ferromagnetic layer induced by controlment of the post annealing temperature inside of the vacuum chamber. The magnetoresistive curves of a dual-type IrMn based GMR-SV depending on the direction of the magnetization easy axis of the free layer and the pinned layer are measured by between $0^{\circ}$ and $360^{\circ}$ angles for the applied fields. The optimum annealing temperature having a steady and isotropy magnetic sensitivity of 1.52 %/Oe was $107^{\circ}C$ in the rotational section of $0{\sim}90^{\circ}$. By investigating the switching process of magnetization for an arbitrary measuring direction, the in-plane orthogonal magnetization for the dual-type GMR-SV multilayer can be used by a high sensitive biosensor for detection of magnetized micro-beads.

A Study on the MDAS-DR Antenna for Shaping Flat-Topped Radiation Pattern (구형 빔 패턴 형성을 위한 MDAS-DR 안테나에 대한 연구)

  • Eom, Soon-Young;Yun, Je-Hoon;Jeon, Soon-Ick;Kim, Chang-Joo
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.18 no.3 s.118
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    • pp.323-333
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    • 2007
  • In this paper, a new MDAS-DR antenna structure designed to efficiently shape a flat-topped radiation pattern is proposed. The antenna structure is composed of a stacked micro-strip patch exciter and a multi-layered disk array structure(MDAS) surrounded by a dielectric ring. The MDAS, which was supplied by a stacked microstrip patch exciter with radiating power, can form a flat-topped radiation pattern in a far field by a mutual interaction with the surrounding dielectric ring. Therefore, the design parameters of the dielectric ring and the MDAS structure are important design parameters for shaping a flat-topped radiation pattern. The proposed antenna used twelve multi-layered disk array elements and a Teflon material with a dielectric constant of 2.05. An antenna operated at 10 GHz$(9.6\sim10.4\;GHz)$ was designed in order to verify the effectiveness of the proposed antenna structure. The commercial simulator of CST Microwave $Studio^{TM}$, which was adapted to a 3-D antenna structure analysis, was used for the simulation. The antenna breadboard was also fabricated and its electrical performance was measured in an anechoic antenna chamber. The measured results of the antenna breadboard with a flat-topped radiation pattern were found to be in good agreement with the simulated one. The MDAS-DR antenna gain measured at 10 GHz was 11.18 dBi, and the MDAS-DR antenna was capable of shaping a good flat-topped radiation pattern with a beam-width of about $40^{\circ}$, at least within a fractional bandwidth of 8.0 %.

La0.7Sr0.3MnO3 CMR thin film resistor deposited on SiO2/Si and Si substrates by rf magnetron sputtering for infrared sensor (SiO2/Si 및 Si 기판에 rf magnetron sputtering법으로 증착된 적외선 센서용 La0.7Sr0.3MnO3 CMR 박막 저항체 특성연구)

  • Choi, Sun-Gyu;Reddy, A. Sivasankar;Yu, Byoung-Gon;Ryu, Ho-Jun;Park, Hyung-Ho
    • Journal of the Korean Vacuum Society
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    • v.17 no.2
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    • pp.130-137
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    • 2008
  • $La_{0.7}Sr_{0.3}MnO_3$ films were deposited on $SiO_2$/Si and Si substrates annealed at $350^{\circ}C$ by rf magnetron sputtering. The oxygen gas flow rates were varied as 0, 40, and 80 sccm. Without post annealing process, $La_{0.7}Sr_{0.3}MnO_3$ thin films on $SiO_2$/Si and Si substrates were polycrystalline with (100), (110), and (200) growth planes. The grain size of $La_{0.7}Sr_{0.3}MnO_3$ thin films was increased with increasing oxygen gas flow rate. The sheet resistance of $La_{0.7}Sr_{0.3}MnO_3$ thin films was decreased with oxygen flow rate due to the increased grain size which induced a reduction of grain boundary. TCR (temperature coefficient of resistance) values of $La_{0.7}Sr_{0.3}MnO_3$ thin films were obtained from -2.0% to -2.2%.

Highly Sensitive Detection of Pathogenic Bacteria Using PDMS Micro Chip Containing Glass Bead (유리비드를 포함한 PDMS 마이크로칩을 이용한 고감도 감염성 병원균 측정에 관한 연구)

  • Won, Ji-Yeong;Min, Jun-Hong
    • KSBB Journal
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    • v.24 no.5
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    • pp.432-438
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    • 2009
  • Here, we demonstrated simple nucleic acid, RNA, concentration method using polymer micro chip containing glass bead ($100\;{\mu}m$). Polymer micro chip was fabricated by PDMS ($1.5\;cm\;{\times}\;1.5\;cm$, $100\;{\mu}m$ in the height) including pillar structure ($160\;{\mu}m\;(I)\;{\times}\;80\;{\mu}m\;(w)\;{\times}\;100\;{\mu}m\;(h)$, gap size $50\;{\mu}m$) for blocking micro bead. RNA could be adsorbed on micro glass bead at low pH by hydrogen bonding whereas RNA was released at high pH by electrostatic force between silica surface and RNA. Amount of glass beads and flow rate were optimized in aspects of adsorption and desorption of RNA. Adsorption and desorption rate was measured with real time PCR. This concentrated RNA was applied to amplification micro chip in which NASBA (Nucleic Acid Sequence Based Amplification) was performed. As a result, E.coli O157 : H7 in the concentration of 10 c.f.u./10 mL was successfully detected by these serial processes (concentration and amplification) with polymer micro chips. It implies this simple concentration method using polymer micro chip can be directly applied to ultra sensitive method to measure viable bacteria and virus in clinical samples as well as environmental samples.