• Title/Summary/Keyword: 마이크로소자

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Preparation and Characterization of White Polymer Light Emitting Diodes using PFO:MEH-PPV (PFO:MEH-PPV를 이용한 White PLED의 제작과 특성평가)

  • Shin, Sang-Baie;Gong, Su-Choel;Park, Hyung-Ho;Jeon, Hyeong-Tag;Chang, Ho-Jung
    • Journal of the Microelectronics and Packaging Society
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    • v.15 no.4
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    • pp.59-64
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    • 2008
  • In this paper, white polymer light emitting diodes(WPLEDs) were fabricated and investigated the electrical and optical properties for the prepared devices. ITO(indium tin oxide) and PEDOT:PSS [poly(3,4-ethylenedioxythiophene):poly(styrene sulfolnate)] as anode and hole injection materials, PFO [poly(9,9-dioctylfluorene)] and MEH-PPV [poly(2-methoxy-5(2-ethylhe xoxy)-1,4-phenylenevinyle)] were used as the light emitting host and guest materials, respectively. The LiF(lithium flouride) and Al(aluminum) were used electron injection materials and cathode materials. Finally, the WPLED with structure of ITO/PEDOT:PSS/PFO:MEH-PPV/LiF/Al was fabricated. The prepared WPLED showed white emission with CIE coordinates of (x=0.36, y=0.35) at the applied voltage of 9V. The maximum current density and luminance were about $740mA/cm^2\;and\;900cd/m^2$ at 13V, respectively. And the maximum current efficiency was 0.37 cd/A at $200cd/m^2$ in luminance.

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X-band Microstrip 4×4 Broadband Circularly Polarized Array Antenna Using Sequential Rotation Divider Structure (시퀀셜 로테이션 분배기 구조를 이용한 X-band 마이크로스트립 4×4 광대역 원형 편파 배열 안테나)

  • Kim, Jung-Han;Kim, Joong-Kwan;Kim, Yong-Jin;Lee, Hong-Min
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.18 no.2 s.117
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    • pp.158-165
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    • 2007
  • In this paper, the circularly polarized $4{\times}4$ array antenna is proposed for the X-band. A single antenna consists of square patch and unequal cross-aperture coupled feeding. The RHCP(Right Handed Circularly Polarization) is generated by unequal cross-aperture coupled feeding. By reducing space among elements of way antenna from 0.8 ${\lambda}_0$ to 0.45 ${\lambda}_0$, the mounting area of array antenna is miniaturized. The $2{\times}2$ array antenna is designed using sequential rotation feeding network. The good level of gain, axial ratio, and impedance bandwidth are achieved. The $4{\times}4$ array antenna is extended by ${\lambda}/4$ transformer and T-junction power divider. The simulated maximum radiation gain is 15.09 dBi at 10 GHz. The simulated 3 dB Axial Ratio bandwidth is from 9.05 to 10.4 GHz(13.5%). Also the measured impedance bandwidth($VSWR{\leq}2$) of manufactured $4{\times}4$ array antenna is from 8.45 to 11.84 GHz(33.9%). The measured maximum radiation gain is 11.10 dBi at 10 GHz. The measured 3 dB Axial Ratio bandwidth is from 9.42 to 10.47 GHz(10.5%).

Vortical Etching Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Depending on Ar/Cl$_2$ Ratios and RF/DC Power Densities (SrBi$_2$Ta$_2$O$_9$ 박막에 있어서 Ar/C1$_2$가스의 비율 및 RF/DC Power Density의 변화에 따른 수직 식각의 특성연구)

  • 황광명;이창우;김성일;김용태;권영석;심선일
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.49-53
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    • 2001
  • Vortical etching experiments of ($SrBi_2Ta_2O_9$)/Si thin films have been performed by using the inductively coupled plasma reactive ion etching (ICP-ME) apparatus. The purposes of these experiments are to get the effective area of vertical surface. Because this technology is very important to get good qualities of ferroelectric gate structure, capacitor and the minimum parasitic effects related to the excellent performances of the FRAM (Ferroelectric Random Access Memory) device. The reacting gases were Ar and $Cl_2$gases, and various $Ar/C1_2$flow ratios were used. The etching experiments were carried out at various RF powers such as 700, 700, 500W and at various DC powers such as 200, 150, 100, 50W, respectively. The maximum etch rate of $SrBi_2Ta_2O_9$/Si thin films was 1050 A/min at the $Ar/C1_2$ gas ratio of 20/16, RF power of 700 W and DC power of 200 W. From the SEM (scanning electron microscopy) image of the SBT thin films, the wall angle was as good as about $82^{\circ}$.

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Mechanical Fatigue Lifetime of Metal Electrode for Flexible Electronics under High Temperature and High Humidity Condition (유연 전자 소자용 금속 전극의 고온/고습 조건에서 기계적 피로 수명 연구)

  • Kown, Yong-Wook;Kim, Byoung-Joon
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.2
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    • pp.45-51
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    • 2020
  • As flexible electronics will be used under high temperature and high humidity with repeated bending deformations, the effects of environmental condition and repeated mechanical deformations are considered simultaneously to achieve long-term reliability. In this study, the mechanical reliability of metal electrodes (Al, Ag, Cu) deposited on flexible polymer substrate is investigated under 4 different conditions: with and without repeated mechanical deformations and normal environmental or high temperature and high humidity conditions (85℃/85%). The mechanical failure does not occur in all the metal electrodes without mechanical deformation even under high temperature and high humidity conditions. The electrical resistance of metal electrode increased about 400% to 600% after 100,000 bending cycles under normal condition. For high temperature and high humidity condition, the electrical resistance of Al and Ag increased similarly. However, the resistance of Cu during bending fatigue test under high temperature and high humidity condition increased over 90000% because of the combined effect of corrosion and mechanical fatigue. This study can give a helpful information for designing electrode materials with high mechanical reliability under high temperature and high humidity.

Physical and Electrical Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Etched with Inductively Coupled Plasma Reactive Ion Etching System (유도결합형 플라즈마 반응성 이온식각 장치를 이용한 SrBi$_2$Ta$_2$O$_9$ 박막의 물리적, 전기적 특성)

  • 권영석;심선일;김익수;김성일;김용태;김병호;최인훈
    • Journal of the Microelectronics and Packaging Society
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    • v.9 no.4
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    • pp.11-16
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    • 2002
  • In this study, the dry etching characteristics of $SrBi_2Ta_2O_9$ (SBT) thin films were investigated by using ICP-RIE (inductively coupled plasma-reactive ion etching). The etching damage and degradation were analyzed with XPS (X-ray photoelectron spectroscopy) and C-V (Capacitance-Voltage) measurement. The etching rate increased with increasing the ICP power and the capacitively coupled plasma (CCP) power. The etch rate of 900$\AA$/min was obtained with 700 W of ICP power and 200 W of CCP power. The main problem of dry etching is the degradation of the ferroelectric material. The damage-free etching characteristics were obtained with the $Ar/C1_2/CHF_3$ gas mixture of 20/14/2 when the ICP power and CCP power were biased at 700 W and 200 W, respectively. The experimental results show that the dry etching process with ICP-RIE is applicable to the fabrication of the single transistor type ferroelectric memory device.

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Effect of $N_2+H_2$ Forming Gas Annealing on the Interfacial Bonding Strength of Cu-Cu thermo-compression Bonded Interfaces (Cu-Cu 열압착 웨이퍼 접합부의 계면접합강도에 미치는 $N_2+H_2$ 분위기 열처리의 영향)

  • Jang, Eun-Jung;Kim, Jae-Won;Kim, Bioh;Matthias, Thorsten;Hyun, Seung-Min;Lee, Hak-Joo;Park, Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.16 no.3
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    • pp.31-37
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    • 2009
  • Cu-Cu thermo-compression bonding process was successfully developed as functions of the $N_2+H_2$ forming gas annealing conditions before and after bonding step in order to find the low temperature bonding conditions of 3-D integrated technology where the quantitative interfacial adhesion energy was measured by 4-point bending test. While the pre-annealing with $N_2+H_2$ gas below $200^{\circ}C$ is not effective to improve the interfacial adhesion energy at bonding temperature of $300^{\circ}C$, the interfacial adhesion energy increased over 3 times due to post-annealing over $250^{\circ}C$ after bonding at $300^{\circ}C$, which is ascribed to the effective removal of native surface oxide after post-annealing treatment.

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Development of Polymer Elastic Bump Formation Process and Bump Deformation Behavior Analysis for Flexible Semiconductor Package Assembly (유연 반도체 패키지 접속을 위한 폴리머 탄성범프 범핑 공정 개발 및 범프 변형 거동 분석)

  • Lee, Jae Hak;Song, Jun-Yeob;Kim, Seung Man;Kim, Yong Jin;Park, Ah-Young
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.2
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    • pp.31-43
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    • 2019
  • In this study, polymer elastic bumps were fabricated for the flexible electronic package flip chip bonding and the viscoelastic and viscoplastic behavior of the polymer elastic bumps according to the temperature and load were analyzed using FEM and experiments. The polymer elastic bump is easy to deform by the bonding load, and it is confirmed that the bump height flatness problem is easily compensated and the stress concentration on thin chip is reduced remarkably. We also develop a spiral cap type and spoke cap type polymer elastic bump of $200{\mu}m$ diameter to complement Au metal cap crack phenomenon caused by excessive deformation of polymer elastic bump. The proposed polymer elastic bumps could reduce stress of metal wiring during bump deformation compared to metal cap bump, which is completely covered with metal wiring because the metal wiring on these bumps is partially patterned and easily deformable pattern. The spoke cap bump shows the lowest stress concentration in the metal wiring while maintaining the low contact resistance because the contact area between bump and pad was wider than that of the spiral cap bump.

Study of Organic-inorganic Hybrid Dielectric for the use of Redistribution Layers in Fan-out Wafer Level Packaging (팬 아웃 웨이퍼 레벨 패키징 재배선 적용을 위한 유무기 하이브리드 유전체 연구)

  • Song, Changmin;Kim, Sarah Eunkyung
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.53-58
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    • 2018
  • Since the scaling-down of IC devices has been reached to their physical limitations, several innovative packaging technologies such as 3D packaging, embedded packaging, and fan-out wafer level packaging (FOWLP) are actively studied. In this study the fabrication of organic-inorganic dielectric material was evaluated for the use of multi-structured redistribution layers (RDL) in FOWLP. Compared to current organic dielectrics such as PI or PBO an organic-inorganic hybrid dielectric called polysilsesquioxane (PSSQ) can improve mechanical, thermal, and electrical stabilities. polysilsesquioxane has also an excellent advantage of simultaneous curing and patterning through UV exposure. The polysilsesquioxane samples were fabricated by spin-coating on 6-inch Si wafer followed by pre-baking and UV exposure. With the 10 minutes of UV exposure polysilsesquioxane was fully cured and showed $2{\mu}m$ line-pattern formation. And the dielectric constant of cured polysilsesquioxane dielectrics was ranged from 2.0 to 2.4. It has been demonstrated that polysilsesquioxane dielectric can be patterned and cured by UV exposure alone without a high temperature curing process.

Design of EMI Reduction of SMPS Using MLCC Filters (MLCC를 이용한 SMPS의 EMI 저감 설계)

  • Choi, Byeong-In;Choa, Sung-Hoon
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.4
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    • pp.97-105
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    • 2020
  • Recently, as the data speed and operating frequencies of Ethernet keeps increasing, electro magnetic interference (EMI) also becomes increasing. The generation of such EMI will cause malfunction of near electronic devices. In this study, EMI filters were applied to reduce the EMI generated by DC-DC SMPS (switching mode power supply), which is the main cause of EMI generation of Ethernet switch. As the EMI filter, MLCCs with excellent withstanding voltage characteristics were used, which had advantages in miniaturization and mass production. Two types of EMI MLCC filters were used, which are X-capacitor and X, Y-capacitor. X-capacitor was composed of 2 MLCCs with 10 nF and 100 nF capacity and 1 Mylar capacitor. Y-capacitor was consisted of 6 MLCCs with a capacity of 27 nF. When only X-capacitor was applied as EMI filter, the conductive EMI field strength exceeded the allowable limit in frequency range of 150 kHz ~ 30 MHz. The radiative EMI also showed high EMI strength and very small allowable margin at the specific frequencies. When the X and Y-capacitors were applied, the conductive EMI was greatly reduced, and the radiation EMI was also found to have sufficient margin. In addition, X, Y-capacitors showed very high insulation resistance and withstanding resistance performances. In conclusion, EMI X, Y-capacitors using MLCCs reduced the EMI noise effectively and showed excellent electrical reliability.

The 33-mode Dielectric and Piezoelectric Properties of PIN-PMN-PT Single Crystal under Stress and Electric Field (압축하중 및 전계 인가에 따른 PIN-PMN-PT 단결정의 33-모드 유전 및 압전특성)

  • Lim, Jae Gwang;Park, Jae Hwan;Lee, Jeongho;Lee, Sang Goo
    • Journal of the Microelectronics and Packaging Society
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    • v.27 no.4
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    • pp.91-96
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    • 2020
  • The 33-mode dielectric and piezoelectric properties of Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 piezoelectric single crystals were measured under large electric field and compressive stress. The phase transition from the low temperature rhombohedral to the high temperature tetragonal structure was observed in the range of 110~140℃, and the Curie temperature changing to the cubic structure was about 165℃. The polarization change according to the compressive stress and electric field was measured. Relative dielectric constant was calculated from the slope of the polarization curve applied to the electric field, and the calculated relative dielectric constant increased as the applied stress increased, and the relative dielectric constant decreased as the applied electric field increased. The strain according to the compressive stress and electric field change was measured, the piezoelectric constant was calculated from the slope of the curve, and the phase transition according to the application of pressure was confirmed. In the case of practical application as an underwater or medical ultrasonic actuator, it is necessary to properly design the magnitude of the compressive stress applied to the device and the DC bias in order to maintain linear driving.