• 제목/요약/키워드: 도금산업

검색결과 177건 처리시간 0.021초

푸시풀 후드시스템의 방해기류 방향 및 세기의 영향에 관한 수치적 연구 (Numerical Study for Influence of Crossdraft Directions and Magnitudes on Push-Pull Ventilation Systems)

  • 이효우;김태형;박승욱;하현철
    • 한국산업보건학회지
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    • 제18권2호
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    • pp.161-170
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    • 2008
  • 푸쉬-풀 환기시스템은 도금조와 같이 흡인해야 할 거리가 상대적으로 긴 경우에 많이 사용되고 있다. 그러나, 창문이나 출입문을 통한 방해기류가 푸쉬-풀 환기시스템의 오염물질 제어효율을 심각하게 훼손시키고 있다고 추측하고 있으나 이에 대한 세부적인 연구가 부족한 상태에 있다. 따라서, 본 연구에서는 전산유체역학(Computational fluid dynamics)을 이용하여 푸쉬-풀 환기시스템에서의 방해기류의 방향과 세기가 흡인효율에 어떠한 영향을 미치는지에 대해 평가해 보았다. 선형흡인효율(Linear capture efficiency) 방법을 이용하여 푸쉬-풀 환기시스템에서 가상의 개방조에서 발생한 오염물질이 푸쉬-풀 시스템에 의하여 포집되지 못하고 누출되는 구역이 어딘지를 찾아낼 수 있었다. 전산유체역학 컴퓨터시뮬레이션은 AIRPAK2.1 (FLUENT CODE) 소프트웨어를 사용하였다. 푸쉬-풀 후드시스템에 방해기류가 강하게 작용하면 상대적으로 강한 와류가 발생하는데, 일반적인 난류모델인 ${\kappa}-{\varepsilon}$모델은 와류현상을 충분히 보여주지 못한 반면에 RNG 모델을 사용했을 때 실험결과를 적절히 모사해낼 수 있었다. RNG 모델을 이용하여 세가지 방향, 즉 푸쉬에서 풀 방향으로, 풀에서 푸쉬 방향으로 그리고 그에 수직되는 방향으로 방해기류가 있을 때의 푸쉬-풀 환기시스템의 흡인효율을 분석하였다. 방해기류가 0.25m/s이하일 때에는 흡인효율이 거의 떨어지지 않았으나, 방해기류가 0.6m/s에서 흡인효율이 40-70%로 떨어짐을 알 수 있었다. 따라서, 방해기류를 감소시킬 수 있는 방안에 대해서도 연구를 해야 되겠지만, 방해기류 존재 하에서 충분한 흡인 효율을 유지할 수 있는 푸쉬-풀 후드 설계기준에 대한 연구도 필요할 것으로 판단된다.

도금공정 크롬시료 분석을 위한 Microwave Oven Digestion/Atomic Absorption Spectrophotometry 방법의 정확도 및 정밀도 평가 (Accuracy and Precision of Microwave Oven Digestion/Atomic Absorption Spectrophotometry for Analyzing Airborne Chromium Collected on MCE Filter in Plating Operation)

  • 이병규;이지태;신용철
    • 한국산업보건학회지
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    • 제11권1호
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    • pp.48-55
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    • 2001
  • The purpose of this study was to evaluate the analytical accuracy and precision of microwave oven digestion/atomi absorption spectrophotometry (AAS) for analyzing airborne chromium collected on mixed cellulose ester membrane (M filter from the work environment, and to compare the accuracy and the precision with those of the National Institute for Occupational Safety and Health (NIOSH) Method #7024 hot plate digestion/AAS method. For this study, field air sample pairs were collected from a electroplating process, and spiked samples in a laboratory were prepared and using these samples. Two digestion methods were comp; and evaluated in terms of recovery rate and bias as indices of accuracy and coefficient of variation as a index of precision. The results and conclusions are as follows. In spiked samples, the accuracies (% mean recoveries) of hot plate/AAS and microwave oven/AAS method were 97.19%, 97.1%, respectively, and the precisions (pooled respectively, and the precisions (pooled coefficient of variance, $CV_{pooled}$) 6.93% and 3.88%, respectively. The biases of hot plate ani microwave oven methods were 4.56 - 14.7% and 2.22 - 7.42% respectively. There was no statistically significant difference between hot plate and microwave oven methods recovery rates of spiked samples (p>0,05). Also, no statistically significant difference was shown among the concentrations of air samples determined by two method (p>0.05). In conclusion, microwave oven/AAS method h excellent accuracy and precision, and advantages such as time-saving and simple procedure in comparison with the classical NIOSH method. Therefore, this method can be use widely to analyze airborne chromium collected on MCE filter from the work environments.

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중소기업 도금공정에서의 트리클로로에틸렌 폭로와 발산량에 관한 연구 (A Study on Worker Exposure to Trichlorethylene and Emission Factor for Degreasers in Plating Plants)

  • 이경희;백남원
    • 한국산업보건학회지
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    • 제3권1호
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    • pp.3-13
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    • 1993
  • This study was conducted at seven degreasing processes in plating plants located in Seoul, Incheon, Ansan, and Taejeon areas from July 21 to august 27, 1992. This study was performed to assess the TWA exposures to trichloroethylene (TCE) and evaluate factors affecting TCE concentrations in degreasing process. Two-Point Eddy Diffusional Model suggested by Wadden et al. was employed to calculalte emission factors according to degreaser type. Results are summarized as follows. 1. The TWA exposures of the degreasing operators ranged from 1.4 ppm to 123 ppm, and those of three plants out of seven were exceeding 50 ppm of both the Korean and U.S. OSHA standards. Degreasing assistant of Plant B, was exposed to 59 ppm. 2. The average concentrations at the distance 0, 1.5, 3.0 m from the degreasers were 1.014, 24, and 18 ppm, respectively, and showed a signifficant difference by distance (p<0.01). 3. The emission of TCE was reduced by installing local exhaust systems, condensers, and refrigeration lines at the degreasers (p<0.01). 4. The major factors related to exposure of operators were workload (r=.9621. p<0.01) and dimensions of degreansing room(r=-.8667, p<0.05). 5. If the air in degreasing room is mixed violently by other factors in addition to diffusion, the emission factors can not be evaluated because the important hypothesis of the Two-Point Eddy Diffusional Model can not be accepted. 6. The ultrasonic degreaser without the local exhaust ststem, condenser, and refrigeration lines emitted TCE three times greater than the ultrasonic degreaser with condenser and refrigeration 1ines only.

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도금업 근로자의 혈청과 공기중 크롬 및 니켈 농도 (Chromium and nickel concentrations in air and in serum of workers in chromium and nickel electroplating plants)

  • 최호춘;김해정;정호근
    • 한국산업보건학회지
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    • 제1권2호
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    • pp.117-127
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    • 1991
  • The exposure level of chromium and nickel for chrome and nickel plating workers were evaluated. Chromium and nickel concentrations in serum from 82 exposed workers and 66 controls, who were not exposed occupationally to metals, were analyzed by flameless atomic absorption spectrophotometry. The results were as follows : 1. The recovery percent of chromium and nickel concentrations in personal air samples were 95-108.2%, 88.0-107.7%, precisions (C.V., %) were 2.7-3.1%, 2.1-4.4%. respectively. 2. The recovery percent of chromium and nickel concentrations in serum were 93.6-106.4%, 91.3-107.9% and precisions (C.V. %) were 1.1-7.6%, 2.4-5.4% respectively. 3. The exposure level of chromium and nickel concentrations in the place of preparation process were $2.0{\pm}2.00{\mu}g/m^3$, chromplating were $35.7{\pm}53.07{\mu}g/m^3$, $2.8{\pm}3.42{\mu}g/m^3$, nickelplating were $4.6.0{\pm}5.8{\mu}g/m^3$, $18.62{\pm}4.41{\mu}g/m^3$, and covering were $2.9{\pm}2.02{\mu}g/m^3$, $1.1{\pm}0.47{\mu}g/m^3$ respectively. There were significant difference of concentrations for chromium and nickel in workplaces by groups statistically. 4. Chromium concentrations in serum of exposed group and control were $0.68{\pm}0.399{\mu}g/l$, $1.41{\pm}0.748{\mu}g/l$, respectively. There were significant difference of concentrations for chromium and nickel in serum by groups statistically. 5. Chromium and nickel concentrations in serum of exposed group were not significant by workplaces.

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중소기업 도금공정에서의 6가 크롬 폭로에 관한 연구 (A Study on Worker Exposure to Hexavalent Chromium in Plating 0peration)

  • 정희경;백남원
    • 한국산업보건학회지
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    • 제3권2호
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    • pp.152-165
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    • 1993
  • This study was performed at eleven small-sized plating factories located in Seoul, Incheon, Ansan, and Taejeon from July 21 to October 6, 1992. The major objectives of this study were to evaluate worker exposure to hexavalent chromium and local exhaust ventilation (L.E.V.) systems at the chromium plating operations. The most suitable L.E.V. systems for chromium plating tanks were designed as examples for recommendation to the industry. The results are summarized as follows. The range of chromium plating operations investigated included decorative, hard, and black chromium plating on several kinds of parts. Most of plating tanks were not equipped with proper control methods against emission of hexavalent chromium mists and workers were not wearing appropriate personal protectives. The ariborne hexavalent chromium concentrations showed an approximate lognormal distribution. The geometric means of both personal and area samples were within the Korean and ACGIH standards, $50{\mu}g/m^3$. However, in comparison with the NIOSH criterion, $1{\mu}g/m^3$, the geometric means of personal samples at two factories and the geometric means of area samples at two factories exceeded it. The geometric means of personal and area samples of high exposure groups (above the NIOSH criterion) were 7 and 27 times higher than those of low exposure groups (below the NIOSH criterion), respectively. The L.E.V. systems of high exposure groups were improperly designed, and the factory with the highest exposure level had no L.E.V. systems at all on chemical etching process. Whereas at factories of low exposure groups, mist control methods such as mist suppressants, tank cover, and/or auxillary L.E.V. systems were added to L.E.V systems. The evaluation of L.E.V. systems showed that there was no chromium plating operation satisfying the ACGIH criteria for capture velocity, slot velocity, and exhaust rate simultaneously. To increase performance of L.E.V. systems, it must be designed to minimize the impact of boundary layer separation. Push-pull ventilation hood and downward plenum ventilation hood were suggested for the Korean industry.

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저항 점 용접에서 날림발생 저감을 위한 DC 펄스전류 파형설계에 관한연구 (Design of DC current waveform for expulsion reduction in resistance spot welding)

  • 황인성;윤현준;김동철;강문진
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2010년도 춘계학술발표대회 초록집
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    • pp.39-39
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    • 2010
  • 최근 자동차 산업에서는 차체의 무게를 감소시켜 연비향상과 배기가스의 양을 줄이려는 목적으로 고강도 강재의 차체 적용이 증가하고 있다. 또한 다른 여러 산업에서도 두께 감소를 통한 경량화를 위해 고강도 강재가 사용되고 있다. 고강도 강재를 자동차 차체에 적용하면서 용접성에 대한 새로운 문제가 제기 되고 있으며 그 중 자동차 생산라인에서 차체의 조립공정의 대부분을 차지하는 저항 점 용접에 대한 연구가 중요한 이슈가 되고 있다. 이러한 고강도 강재의 저항 점 용접의 문제점으로는 잦은 날림발생을 들 수 있다. 이는 강도의 증가에 따른 비저항 증가와 필요 가압력의 증가로 인해 입열에 의한 가압부의 소성변형이 쉽게 발생하기 때문이다. 이를 방지하기 위해 현재 다단가압, 다단전류제어 등의 기법들이 시도되고 있다. 본 연구에서는 저항 점 용접의 펄스전류 파형설계를 통해 고강도강 용접의 날림발생을 저감하고자 하였다. 실험소재로는 Al-Si 도금의 1.5GPa 급 강재를 사용하였고 실험조건으로는 기존 로브곡선에서 날림이 발생하는 용접조건을 사용하였다. On/Off 방식의 펄스전류를 이용하여 On/Off 시간에 따른 용접성을 평가하여 이를 기존 용접성과 비교하였다. 또한 펄스전류 파형에 따른 입열과 냉각의 변화와 날림발생에 미치는 영향을 분석하였다.

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베타전지용 PN 접합 반도체 표면에 도금된 Ni 후막의 특성 (Characteristics of Electroplated Ni Thick Film on the PN Junction Semiconductor for Beta-voltaic Battery)

  • 김진주;엄영랑;박근용;손광재
    • 방사선산업학회지
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    • 제8권3호
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    • pp.141-146
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    • 2014
  • Nickel (Ni) electroplating was implemented by using a metal Ni powder in order to establish a $^{63}Ni$ plating condition on the PN junction semiconductor needed for production of beta-voltaic battery. PN junction semiconductors with a Ni seed layer of 500 and $1000{\AA}$ were coated with Ni at current density from 10 to $50mA\;cm^{-2}$. The surface roughness and average grain size of Ni deposits were investigated by XRD and SEM techniques. The roughness of Ni deposit was increased as the current density was increased, and decreased as the thickness of Ni seed layer was increased. The results showed that the optimum surface shape was obtained at a current density of $10mA\;cm^{-2}$ in seed layer with thickness of $500{\AA}$, $20mA\;cm^{-2}$ of $1000{\AA}$. Also, pure Ni deposit was well coated on a PN junction semiconductor without any oxide forms. Using the line width of (111) in XRD peak, the average grain size of the Ni thick firm was measured. The results showed that the average grain size was increased as the thickness of seed layer was increased.

도금 사업장 근로자에게 발생한 시안화수소 급성중독과 작업환경평가 (Acute Hydrogen Cyanide Poisoning in a Plating Worker and Workplace Measurement)

  • 함승헌;최원준;이준형;임용수;강지현;강성규
    • 한국산업보건학회지
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    • 제29권3호
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    • pp.336-342
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    • 2019
  • Introduction: An unexpected death was reported in a beginner immediately after starting the work at a plating factory. After the incident, air sampling was performed using a simulation of the situation as it had been at the time. Methods: To evaluate the airborne concentration of hydrogen cyanide, a total of six samples were collected: one personal sample, three area samples, and two background samples (office and outdoors). Hydrogen cyanide measurement was performed according to the standard sampling protocol recommended by the U.S. NIOSH (National Institute of Occupational Safety and Health). Results: The highest concentration of hydrogen cyanide was 0.938 ppm measured in a sample collected from the plating bath area with local exhaust ventilation. This value was approximately 20% of the ceiling occupational exposure limit. The personal sample showed a concentration of 0.135 ppm. Samples collected near the bath in which the incident occurred and a dehydrator showed hydrogen cyanide concentrations of 0.236 ppm and 0.101 ppm, respectively. Hydrogen cyanide was not detected in the background samples (office and outdoors). Conclusions: It is necessary to use proper ventilation systems and respirators in plating factories to prevent acute poisoning. Furthermore, it is important to educate and train new workers dealing with toxic substances.

도금공정 실시간 원격 온도 모니터링 시스템 (A Real Time Temperature Monitoring System for Plating Process)

  • 정선웅;최태린;유우식;김병수
    • 산업경영시스템학회지
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    • 제38권4호
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    • pp.72-79
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    • 2015
  • A number of plating companies have been exposed to the risk of fire due to unexpected temperature increasing of water in a plating bath. Since the companies are not able to forecast the unexpected temperature increasing of water and most of raw materials in the plating process have low ignition temperature, it is easy to be exposed to the risk of fire. Thus, the companies have to notice the changes immediately to prevent the risk of fire from plating process. Due to this reason, an agile and systematic temperature monitoring system is required for the plating companies. Unfortunately, in case of small size companies, it is hard to purchase a systematic solution and be offered consulting from one of the risk management consulting companies due to an expensive cost. In addition, most of the companies have insufficient research and development (R&D) experts to autonomously develop the risk management solution. In this article, we developed a real time remote temperature monitoring system which is easy to operate with a lower cost. The system is constructed by using Raspberry Pi single board computer and Android application to release an economic issue for the small sized plating manufacturing companies. The derived system is able to monitor the temperature continuously with tracking the temperature in the batch in a short time and transmit a push-alarm to a target-device located in a remoted area when the temperature exceeds a certain hazardous-temperature level. Therefore, the target small plating company achieves a risk management system with a small cost.

영상처리를 이용한 사이징 제거 상태 측정 알고리즘과 전자파 차폐 성능을 갖는 탄소 섬유 개발 (Measurement Algorithms of Sizing removed state using Image Process And Development of Carbon fibers with Electromagnetic shielding Performance)

  • 조준호;전관구
    • 한국산학기술학회논문지
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    • 제18권2호
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    • pp.95-101
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    • 2017
  • 본 논문에서는 복합재료로 만들기 위한 전처리 단계에서 수행한 사이징 제거 상태를 영상처리 알고리즘을 적용하여 수치적으로 나타내었고, 전자파 차폐 성능을 높이기 위해서 건식 공정 방식으로 니켈도금 탄소섬유를 제작하였다. 탄소섬유 제조에서 폴리머 종류로 감싸져 나온 사이징은 건식 코팅을 위해서는 제거해야 한다. 사이징이 제거된 상태를 주사 전자현미경(scanning electron microscope, SEM)으로 촬영한 이미지에서 탄소 섬유의 규칙적인 패턴, 즉 상관성을 구함으로써 수치적인 값으로 나타낼 수 있다. 사이징의 제거 방식은 용액, 압축 공기와 용액과 압축공기(하이브리드)로 제거한 SEM 영상에 대하여 제안된 방법을 적용한 결과 하이브리드 방식이 우수함을 확인 할 수 있었다. 그리고 사이징이 제거된 스프레딩 탄소 섬유 롤을 롤투롤 스퍼터 방식으로 니켈도금 탄소 섬유를 제작할 수 있었다. 제작된 30um, 40um과 100um 니켈코팅 탄소섬유에 대해서 전자파 차폐 성능을 측정하였다. 한국산업기술시험원에서 100um 니켈코팅 탄소섬유의 전자파 차폐 성능을 평가한 결과 최저 66.7(dB)에서 최고 73.2(dB)의 전자파 차폐 성능을 보였다. 이것은 구리의 전자파 차폐율과 유사하여 EV/HEV자동차의 케이블로 사용될 수 있다.