• Title/Summary/Keyword: 나노패터닝

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Superhydrophobic Nano Patterning Techniques for Enhanced Performance of Naval Underwater Vessels (군용 수중 운동물체의 성능강화를 위한 초소수성 나노 패터닝 기술)

  • Hong, Soon-Kook;Lee, Ki-Young
    • Journal of Ocean Engineering and Technology
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    • v.27 no.2
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    • pp.114-120
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    • 2013
  • A superhydrophobic surface means that the contact angle between the solid surface and a water droplet is more than $150^{\circ}$. Materials with a superhydrophobic surface have a self-cleaning function because of the Lotus effect, in which water is not absorbed by the material but rolls off of it. If such a Lotus effect can be applied to the surface of underwater vessels, submarines, torpedos, and so on, enhanced vessels can be made based on this lubricant effect reducing the friction coefficient for the liquid. Because polymer composites can be easily applied in various nanotechniques, they are more advantageous than conventional materials like iron in terms of a superhydrophobic surface. Furthermore, a superhydrophobic surface bring enhanced anticorrosion and ecotechnology because no paint is needed on underwater vessels.

Patterning of Single-wall Carbon Nanotube using Ink-jet Printing (잉크젯 프린팅에 의한 단일벽 탄소나노튜브의 패터닝)

  • Song, Jin-Won;Yoon, Yeo-Hwan;Han, Chang-Soo
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.236-237
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    • 2007
  • A single-wall carbon nanotube (SWNT) transparent conductive film (TCF) was fabricated using a simple inkjet printing method. The TCF could be selectively patterned by controlling the dot size to diameters as small as 34${\mu}m$. In thisrepeatable and scalable process, we achieved 71% film transmittance and a resistance of 900 ohm/sq sheet with an excellent uniformity, about $\pm$5% deviation overall. Inkjet printing of SWNT is substrate friendly and the TCF is printed on a flexible substrate. This method of fabrication using direct printing permits mass production of TCF in a large area process, reducing processing steps and yielding low-cost TCF fabrications on a designated area using simple printing.

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Selective Array of Polystyrene Beads by Using Nanometer-Scaled Hydrophilic Thin Film Patterning (나노미터 규격의 친수성 박막 패터닝을 이용한 선택적 폴리스티렌 입자 배열)

  • Kang, Jung-Hwa;Kim, Kyoung-Soeb;Kim, Nam-Hoon;Roh, Yong-Han
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.103-104
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    • 2007
  • Nanometer-scaled polymer beads, such as polystyrene beads, were used as nanometer fabrication materials due to their some advantages such as self-assembled monolayer, nanometer scaled size and excellent compatibility with silicon based devices. Thus, the investigation on these properties of polymer beads was required. It is difficult to control the array of polystyrene beads on silicon substrate. In this study, we investigated the condition of selective array of polystyrene beads on nanometer-scaled hydrophilic surface which was obtained by APS coating. A tilting method was used to array the polystyrene beads selectively on the substrate. The polystyrene beads could be arrayed selectively by this method. From these results, we verified that there are possibilities to fabricate unique tools for the nanometer-scaled electrical devices.

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Analysis of Ion Beam-Solid Interactions for Nano Fabrication (나노 패터닝을 위한 이온빔-고체 상호작용 분석)

  • Kim H.B.;Hobler G.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.581-584
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    • 2005
  • Ion beam processing is one of the key technologies to realize mastless and resistless sub 50nm nano fabrication. Unwanted effects, however, may occur since an energetic ion can interact with a target surface in various ways. Depending on the ion energy, the interaction can be swelling, deposition, sputtering, re-deposition, implantation, damage, backscattering and nuclear reaction. Sputtering is the fundamental mechanisms in ion beam induced direct patterning. Re-deposition and backscattering are unwanted mechanisms to avoid. Therefore understanding of ion beam-solid interaction should be advanced for further ion beam related research. In this paper we simulate some important interaction mechanisms between energetic incident ions and solid surfaces and the results are compared with experimental data. The simulation results are agreed well with experimental data.

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Laser-Direct Patterning of Nanostructured Metal Thin Films (나노구조 금속 박막의 레이저 직접 패터닝에 관한 연구)

  • Shin, Hyunkwon;Lee, Hyeongjae;Yoo, Hyeonggeun;Lim, Ki-Soo;Lee, Myeongkyu
    • Korean Journal of Metals and Materials
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    • v.48 no.2
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    • pp.163-168
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    • 2010
  • We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermoelastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatiallymodulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.

One-Step Nanoscale Patterning of Silver Ionic Ink via Elastic Mold Deformation (탄성 몰드 변형을 이용한 은 이온 잉크의 원-스텝 나노스케일 패터닝)

  • Yong Suk Oh
    • Journal of Sensor Science and Technology
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    • v.32 no.4
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    • pp.252-256
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    • 2023
  • A one-step method for nanoscale patterning of silver ionic ink on a substrate is developed using a microscale, elastic mold deformation. This method yields unique micro/nanoscale metallic structures that differ from those produced using the original molds. The linewidth of these metallic structures is significantly reduced (approximately 10 times) through the sidewall deformation of the original mold cavity on a thin liquid film, as verified by finite element analysis. The process facilitates the fabrication of various, isolated and complex micro/nanoscale metallic structures with negligible residual layers at low cost and high throughput. These structures can be utilized for various applications, including optoelectronics, wearable sensors, and metaverse-related devices. Our approach offers a promising tool for manipulation and fabrication of micro/nanoscale structures of various functional materials.

Viscoelastic Finite Element Analysis of Filling Process on the Moth-Eye Pattern (모스아이 패턴의 충전공정에 대한 점탄성 유한요소해석)

  • Kim, Kug Weon;Lee, Ki Yeon;Kim, Nam Woong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.15 no.4
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    • pp.1838-1843
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    • 2014
  • Nanoimprint lithography (NIL) fabrication process is regarded as the main alternative to existing expensive photo-lithography in areas such as micro- and nano-electronics including optical components and sensors, as well as the solar cell and display device industries. Functional patterns, including anti-reflective moth-eye pattern, photonic crystal pattern, fabricated by NIL can improve the overall efficiency of such devices. To successfully imprint a nano-sized pattern, the process conditions such as temperature, pressure, and time should be appropriately selected. In this paper, a cavity-filling process of the moth-eye pattern during the thermal-NIL within the temperature range, where the polymer resist shows the viscoelastic behaviors with consideration of stress relaxation effect of the polymer, were investigated with three-dimensional finite element analysis. The effects of initial thickness of polymer resist and imprinting pressure on cavity-filling process has been discussed. From the analysis results it was found that the cavity filling can be completed within 100 s, under the pressure of more than 4 MPa.

A study on the Nano Wire Grid Polarizer Film by Magnetic Soft Mold (Magnetic soft mold를 이용한 나노 와이어 그리드 편광 필름 연구)

  • Jo, Sang-Uk;Chang, Sunghwan;Choi, Doo-Sun;Huh, Seok-Hwan;Jeong, Myung Yung
    • Journal of the Microelectronics and Packaging Society
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    • v.21 no.2
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    • pp.85-89
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    • 2014
  • We propose the new fabrication method of a 70 nm half-pitch wire grid polarizer with high performance using magnetic soft mold. The device is a form of aluminium gratings on a PET(Polyethylene phthalate) substrate whose size of $3cm{\times}3cm$ is compatible with a TFT_LCD(Tin Flat Transistor Liquid Crystal Display) panel. A magnetic soft mold with a pitch of 70 nm is fabricated using two-step replication method. As a result, we get a NWGP pattern which has 70.39 nm line width, 64.76 nm depth, 140.78 nm pitch, on substrate. The maximum and minimum transmittances of the NWGP at 800 nm are 75% and 10%, respectively. This work demonstrates a unique cost-effective solution for nanopatterning requirements in consumer electronics components.

Biodevice Technology (바이오소자 기술)

  • Choi, Jeong-Woo;Lee, Bum-Hwan
    • Korean Chemical Engineering Research
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    • v.44 no.1
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    • pp.1-9
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    • 2006
  • Biodevices composed of biomolecular layer by mimicking the natural functions of cells and the interaction mechanisms of the constituted biomolecules have been developed in various industrial fields such as medical diagnosis, drug screening, electronic device, bioprocess, and environmental pollution detection. To construct biodevices such as bioelectronic devices (biomolecular diode, bio-information storage device and bioelectroluminescence device), protein chip, DNA chip, and cell chip, biomolecules including DNA, protein, and cells have been used. Fusion technology consisting of immobilization technology of biomolecules, micro/nano-scale patterning, detection technology, and MEMs technology has been used to construct the biodevices. Recently, nanotechnology has been applied to construct nano-biodevices. In this paper, the current technology status of biodevice including its fabrication technology and applications is described and the future development direction is proposed.

수직형 발광다이오드의 표면패턴 밀도 증가에 따른 광추출 효율 향상에 관한 연구

  • Jeong, Ho-Yeong;Kim, Su-Jin;Kim, Gyeong-Heon;An, Ho-Myeong;Kim, Tae-Geun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.416-417
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    • 2013
  • 최근 질화물계 발광다이오드(light emitting diode, LED) 소자는 핸드폰, 스마트 TV 등의 디스플레이 분야와 실내외조명, 감성조명, 특수조명 등의 조명분야에 그 응용분야가 급속히 확대되고 있다. 이러한 LED 소자는 에너지 절감과 친환경에 장점을 가지고, 가까운 미래에 조명시장을 대체할 것으로 예상된다. 이를 만족하기 위해서는 현재보다 더 높은 효율을 갖는 LED 개발이 요구되어지고 있는 상황이다. 일반적으로 질화물계 LED 소자의 효율은 내부양자 효율, 광추출 효율 등으로 나타낼 수 있다. 내부 양자효율은 성장된 결정의 질의 개선 및 다층의 이종접합 또는 다중양자우물 구조와 같이 활성층의 캐리어 농도를 높이는 접합구조로 설계되어 80% 이상의 효율을 나타낸다. 그러나 광추출 효율은 이에 미치지 못하고 있다. 이는 반도체 재료의 높은 굴절률로 인하여 빛이 외부로 탈출하지 못하고 내부로 반사되거나 물질 안에서 흡수가 일어나기 때문이다. 따라서 이러한 문제를 해결하기 위해 많은 연구 그룹들은, 표면에 패턴 형성하여 빛의 전반사를 줄여 그 효율을 올리는 연구결과를 보고하고 있다. 대표적인 방법으로는 wet etching, 전자빔 리소그라피, 나노임프린트 리소그라피, 레이저 홀로 리그라피, 나노스피어 리소그라피 등이 사용되고 있다. 이 중, 나노스피어 리소그라피는 폴리스틸렌 혹은 실리카 등과 같은 나노 크기의 bead를 사용하여 반도체 기판 표면에 단일층으로 고르게 코팅한 마스크로 사용하여 패턴을 주는 방법이다. 이 방법의 장점으로는 대면적에 균일한 패턴을 형성할 수 있고, 공정비용이 저렴하여 양산하기에 적합하다는 특징이 있다. 나노스피어 리소그라피를 통해서 표면에 생성된 패턴 모양의 각도에 따라서, 식각되는 깊이에 변화에 따라 실험한 결과들은 있지만, 아직까지 크기가 다른 나노입자들의 마스크 이용하여 형성된 패턴 밀도에 따른 광 추출 효과에 대한 연구가 많이 미흡하다. 따라서 본 연구에서는 다양한 크기의 실리카로 패턴을 형성시켜 패턴 밀도에 대한 광추출 효율의 효과에 대해서 조사하였다. 실험 방법으론, DI, 에탄올, TEOS, 암모니아의 순서대로 그 혼합 비율을 조정하여 100, 250, 500 nm 크기의 나노입자를 합성하였고 이것을 질화물계 LED의 표면 위에 단일층으로 스핀코팅 방법을 통해 코팅을 하였다. 그 후 ICP-RIE 방법으로 필라 패턴을 형성하였는데, 그 결과 100 nm SiO2 입자를 이용한 경우 $4.5{\times}10^9$/$cm^2$, 250 nm의 경우 $1.4{\times}10^9$/$cm^2$, 500 nm의 경우 $0.4{\times}10^9$/$cm^2$의 패턴의 밀도를 보여주었다(Fig. 1). 패턴의 밀도에 따라 전계광학적 특성을 확인하여 보았는데, 그 결과는 평평한 표면과 비교하였을 때 100 nm에서 383%, 250 nm에서는 320%, 500 nm에서는 244% 상승하는 결과를 보여주었다(Fig. 2). 이번 실험을 통해서 LED의 광추출 효율은 표면 모양과 깊이 뿐 아니라 밀도가 커질수록 그 효율이 올라간다는 사실을 알 수 있었다.

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