• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.413-413
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• 2008

최근 잉크젯, 스크린, 그라비아 등 기존의 인쇄 방식과 인쇄 기술을 이용하여 저가의 전자회로 혹은 전자 소자를 제조하고자 프린팅 소재 및 공정 개발에 대한 산업계의 관심이 증가하고 있다. 특히 PCB, RFID, 디스플레이, 태양전지 분야의 전극재료의 개발에 많은 연구가 진행 중에 있으며, 다양한 인쇄 방법 중 미세회로의 구현이 가능한 잉크젯 프린팅을 통한 전극 형성방법에 주목하고 있다. 본 연구는 잉크젯 프린팅 방식을 통해 배선을 형성하고자 이에 적합한 다양한 농도의 잉크를 배합하여 평가하였으며, 첨가제 및 소결, 건조 조건의 변화를 통해 기재와의 부착력, 배선의 크랙을 조절하였다.

• Korean Chemical Engineering Research
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• v.53 no.1
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• pp.111-115
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• 2015

To produce patterns with high resolution in gravure printing, it is important to increase ink transfer ratio. The ink which has higher affinity with substrate can be transferred more from the roll to the substrate due to the good wettability between ink and substrate. However, it is difficult to evaluate the affinity between the substrate and the ink which is viscoelastic in nature. In this study, we suggest a practical method to evaluate the interfacial interaction between the ink and various substrates.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.72-73
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• 2012

Metal line을 형성하는 방법에는 그라비아 인쇄, 잉크젯 인쇄, photo 공정 후 박막 증착 공정 등을 많이 사용한다. 본 연구에서는 Micro-imprinting 공정과 DFR photo lithography 공정을 통해 음각의 미세한 pattern을 형성한 후 sputtering과 printing을 이용하여 pattern의 filling을 통해 metal line을 구현하는 것을 목표로 하였다. Pattern을 형성한 후 RIE 공정을 통해 기판 표면의 친수성 처리를 하고, SAM 공정을 통해 코팅 막의 소수성 처리를 하였다. Sputtering과 전면 프린팅 및 건조 후 strip 공정을 통해 metal line을 형성하고, 이에 대한 표면 특성과 전기적 특성을 분석하였다.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.10
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• pp.1123-1130
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• 2011

The pattern shape engraved on the gravure printing roll is one of the most important factors influencing ink transfer. This study focuses on the relations between dot geometry engraved on gravure printing roll and the ink transfer during the gravure printing process. The influence of dot width on printed patterns will be demonstrated. Results reveal that as the width of a dot on the printing roll increases, the ink transfer rate also increases. But over a certain size of width, surface uniformity began to recede. Therefore, proper dot geometry on the printing roll should be decided to guarantee good printing quality according to printing conditions and expected performance of the electronic devices.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.10
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• pp.1146-1152
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• 2011

Ink transfer process is very important to determine quality of printed pattern, therefore its mechanism should be understood to control printing quality. Although there have been many attempts to understand ink transfer mechanism by numerical simulation and experimental studies, their model was too much simple to model realistic printing process and our understanding is not enough yet. In this paper we designed ink transfer visualization system to present flow visualization of ink transfer process for gravure offset printing. We considered rotational effect of blanket roll which is related with printing speed and used non-Newtonian fluid as working fluid such as Ag paste. For printing unit, cantilever-type blanket roll is used for convenient visualization of ink transfer. Serial images were captured continuously by using high-speed CMOS camera and long range microscope. We investigated the effects of various design parameters such as printing speed and pattern angle on the ink transfer process. We found more stretched ink filament for non-Newtonian fluid than Newtonian fluid. As increasing printing speed, length of stretched ink filament and height of break-up point are also increased. We also compared ink transfer process between CD and MD pattern and its relationship with ink transfer mechanism.

• Journal of the Korean Society for Precision Engineering
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• v.17 no.11
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• pp.191-198
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• 2000

Laser direct patterning of the coated photoresist (PMER-NSG31B) layer was studied to make halftone dots on gravure printing roll. The selective laser hardening of photoresist by Ar-ion laser(wavelength: 333.6~363.8nm) was controlled by the A/O modulator. The coating thickness in the range of 5~11$\mu m$ could be obtained by using the up-down directional moving device along the vertically located roll. The width, thickness and hardness of the hardened lines formed under the laser power of 200~260㎽ and irradiation time of 4.4~6.6 $\mu$sec/point were investigated after developing. The hardened width increased as the coating thickness increased. Though the hardened thickness was changed due to the effect of the developing solution, the hardened layer showed good resistance to the scratching of 2H pencil. Also, the hardened minimum line widths of 10$\mu m$ could be obtained. The change of line width was also found after etching, and the minimum line widths of 6$\mu m$ could be obtained. The hardened lines showed the good resistance to the etching solution. Finally, the experimental data could be applied to make gravure halftone dots using the developed imaging process, successfully.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2001.10a
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• pp.186-189
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• 2001

The main method in micro-etching process, used in manufacturing semiconductors, electronic components, circuits, is Photo Masking method that exposes and develops on the photo-sensitivity solutions or films. This method enables one to process highly precisely, $\pm$0.03 mm in end line location area. But this has limits in a high speed / wide width process, difficulties in endless masking, and the problem of high price. We have developed the direct masking method to make use of Gravure printing, widely used in grocery packing sheet printing. We made cylinder tools to influence the masking quality by laser stream process. We have confirmed that the end line location accuracy in the line width of the product is improved from 0.12 mm to $\pm$0.07 mm level, after etching process.

• Journal of Institute of Control, Robotics and Systems
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• v.9 no.12
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• pp.984-993
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• 2003

In Gravure printing process, there are a lot of printing errors caused by expansion and contraction of printing materials and difficulty of printing of small letters, accordingly we cannot detect those errors with eyes. In this paper, we describe the algorithm which can detect small errors automatically in Gravure printing process and a real-time detection system adopting the algorithm. We present the Perimetric Mask algorithm that can eliminate tiny errors occurring near the contour of printing objects to achieve accurate inspection, and also construct an algorithm utilizing symmetry transform which can emphasize tiny errors to make a robust inspection system. We have made a system running in real-time and verified the efficiency of the algorithm.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.31 no.12
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• pp.1017-1023
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• 2007

This study is intended to analyze the effect of thin ink-film thickness around rotating printing roll on the printing quality in the gravure printing process which is used for making electronics circuit like a RFID tag with a conductive ink. The present work numerically estimates the film thickness around rotating roller partially immersed in ink for which the volume of fluid (VOF) method was adopted to figure out the film formation process around rotating roller. Parameter studies were performed to compare the effect of ink properties (viscosity, surface tension), operating condition (roller rotating speed, initial immersed angle) on the film thickness. The result indicates that the film thickness has a strong dependency on the rotating speed, while the surface tension has negligible effect.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.6
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• pp.462-467
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• 2013

In this paper, we analyzed the effects of doctoring process on the patterns of Ag ink in gravure off-set printing. The parameters of doctoring process were the angle and the pressure, which was represented by the depth of blade movement to the gravure roll, of doctor blade to the surface of gravure roll, and the angle of patterns engraved on the gravure roll to the doctor blade moving direction. The proper parameters were extracted for the fine patterns and they were 15 mm for the pressure, $60^{\circ}$ for the blade angle. And the angle of patterns with respect to the blade movement should be less than $40^{\circ}$ for the best results. The gravure off-set printing with the above parameters was carried out to print gate electrodes and scan bus lines of OTFT-backplane for e-paper. The line width of $50{\mu}m$ was successfully obtained. The thickness of electrodes was $2.5{\mu}m$ and the surface roughness was $0.65{\mu}m$ and the sheet resistance was $15.8{\Omega}/{\Box}$.