• Korean Journal of Metals and Materials
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• v.47 no.4
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• pp.256-260
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• 2009

This study examined the effects of plated temperature on the surface morphology and property of an electrodeposited copper foil. The morphology, crystal structure and electric characteristics of the electrodeposited copper foil were examined by scanning electron microscopy, X-ray diffraction, and a four-point probe, respectively. The surface roughness, crystal growth orientation and resistivity could be controlled using various temperature of electrolyte. Large particles were observed on the surface of the copper layer electroplated onto the $30^{\circ}C$. However, a uniform surface, lower resistivity and high flexibility were obtained when a $50^{\circ}C$ electrolyte was used.

• Korean Journal of Metals and Materials
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• v.47 no.9
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• pp.586-590
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• 2009

The effects of additives on the surface morphology and physical properties of copper electrodeposited on polyimide(PI) film were investigated here. Two kinds of additives, an activator(additive A) and a leveler(additive B),were used in this study. Electrochemical experiments, in conjunction with scanning electron microscopy(SEM), X-ray diffraction(XRD) and a four-point probe, were performed to characterize the morphology and mechanical characteristics of copper electrodeposited in the presence of the additives. The surface roughness, crystal growth orientation and resistivity could be controlled using various quantities of additive B. High resistivity and lower peel strength were observed on the surface of the copper layer electroplated onto the electrolyte with no additive B. However, a uniform surface, lower resistivity and high flexibility were obtained with a combination of 20 ppm of additive A and 100 ppm of additive B.

• Journal of the Korean institute of surface engineering
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• v.56 no.1
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• pp.104-114
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• 2023

Three dimensional (3D) porous structures consisting of Cu@CoO core-shell-type nano-dendrites were synthesized and tested as the anode materials in lithium secondary batteries. For this purpose, first, the 3D porous films comprising Cu@Co core-shell-type nano-dendrites with various thicknesses were fabricated through the electrochemical co-deposition of Cu and Co. Then the Co shells were selectively anodized to form Co hydroxides, which was finally dehydrated to get Cu@CoO nanodendrites. The resulting electrodes exhibited very high reversible specific capacity almost 1.4~2.4 times the theoretical capacity of commercial graphite, and excellent capacity retention (~90%@50^th cycle) as compared with those of the existing transition metal oxides. From the analysis of the cumulative irreversible capacity and morphology change during charge/discharge cycling, it proved that the excellent capacity retention was attributed to the unique structural feature of our core-shell structure where only the thin CoO shell participates in the lithium storage. In addition, our electrodes showed a superb rate performance (70.5%@10.8 C-rate), most likely due to the open porous structure of 3D films, large surface area thanks to the dendritic structure, and fast electron transport through Cu core network.

• Progress in Superconductivity and Cryogenics
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• v.10 no.1
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• pp.10-14
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• 2008

Differently from BSCCO tapes which are fabricated by powder-in-tube method, the coated conductors are made by the evaporation of YBCO on metal substrate. Due to this structural merit, although the coated conductors are generally used for large current transportation, they are expected to be favorable to the purpose of the fault current limitation as well. In this study, using YBCO coated conductor having copper stabilizer formed by plating technique(produced by Superpower Co.), we investigated the over-current characteristics of the coated conductor. The coated conductors had 85 A $I_c$ and 90 K $T_c$. The resistance of the conductor was 0.93 $m{\Omega}/cm$ at 300 K and 0.17 $m{\Omega}/cm$ at the temperature right above $T_c$. To the coated conductors, we applied the voltages of the range from 150 $V_{rms}$ to 230 $V_{rms}$ and measured the V-I curves using four probe method. From the results, we could analyze the electric behavior of the coated conductor in flux flow state. As the current exceed $I_c$, the currents were distributed into the superconductor and metal stabilizer. The amounts of the currents shared through both current paths were calculated under the assumption that the ,Joule heating was perfectly eliminated by $LN_2$ surrounding the conductor. Finally, the condition for the stable current flowing state which does not affect the conductor was established from the analysis on the over-current characteristics.

• Applied Chemistry for Engineering
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• v.35 no.1
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• pp.61-65
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• 2024

The effectiveness of CuSCN as a hole injection layer in large-area organic light-emitting diodes, organic solar cells, and thin-film transistors has been well demonstrated. Therefore, in this study, the surface, optical, and electrical analyses of CuSCN were carried out according to the solution process conditions in order to propose optimized film conditions. Various CuSCN solution concentrations were prepared to determine the film surface characteristics and to determine whether the film surface affects the electrical performance of the device. When the CuSCN solution concentration was low, the CuSCN film was not formed and coated in the form of islands, and when the solution concentration was increased, the CuSCN film was formed uniformly, which contributed to improving the conductivity of the device. In addition, a hole-only device was fabricated to demonstrate the role of CuSCN as a hole transport layer.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.49 no.12
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• pp.654-664
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• 2000

Thin films of ZnO are deposited by using an RF magnetron sputtering with varying the substrate temperature(RT~39$0^{\circ}C$) and RF power(50~250W). Cu-doped ZnO(denoted by ZnO:Cu) films have also been prepared by co-spputtering of a ZnO target on which some Cu-chips are attached. Different substrate materials, such as Si, $SiO_{2}/Si$, sapphire, DLC/Si, and poly-diamond/Si, are employed to compare the c-axial growth features of deposited ZnO films. Texture coefficient(TC) values for the (002)-preferential growth are estimated from the XRD spectra of deposited films. Optimal ranges of RF powers and substrate temperatures for obtaining high TC values are determined. Effects of Cu-doping conditions, such as relative Cu-chip sputtering areas, $O_{2}/(Ar+O_{2})$ mixing ratios, and reactor pressures, on TC values, electrical resistivities, and relative Cu-compositions of deposited ZnO:Cu films have been systematically investigated. XPS study shows that the relative densities of metallic $Cu(Cu^{0})$ atoms and $CuO(Cu^{2+})$-phases within deposited films may play an important role of determining their electrical resistivities. It should be noted from the experimental results that highly resistive(> $10^{10}{\Omega}cm$ ZnO films with high TC values(> 80%) can be achieved by Cu-doping. SAW devices with ZnO(or Zn):Cu)/IDT/$SiO_{2}$/Si configuration are also fabricated to estimate the effective electric-mechanical coupling coefficient($k_{eff}^{2}$) and the insertion loss. It is observed that the devices using the Cu-doped ZnO films have a higher $k_{eff}^{2}$ and a lower insertion loss, compared with those using the undoped films.

• Journal of Korean Society of Environmental Engineers
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• v.35 no.7
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• pp.464-471
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• 2013

In this study, the resource efficiency and future metal resource requirement in photovoltaic (PV) production system were evaluated by using material balance data and life cycle assesment (LCA) method. As a result, in the resource efficiency of ferrous and non-ferrous metal, lead and tin had higher resource efficiency than other materials in all PV systems (SC-Si, MC-Si, CI(G)S, CdTe). In the resource efficiency of rare metals, gallium and rhenium in silicon system and rhenium and rhodium in thin-film system ranked as the first and second high resource efficiency. In case of rare earth metal, gadolinium and samarium took higher resource efficiency. The results of the future metal resource requirement in PV systems showed that 2,545,670 ton of aluminium, 92,069 ton of zinc, 22,044 ton of copper, 1,695 ton of tin and 31 ton of nickel will be needed by 2030 in South Korea, except resource recycling supplement.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.615-615
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• 2013

탄소나노튜브(carbon nanotubes; CNT)는 강철보다 10~100배 견고할 뿐만 아니라 영률과 탄성률 은 각각 1.8 TPa, 1.3 TPa에 달하는 매우 우수한 기계적 강도를 지니고 있으며, 구리보다 좋은 전기 전도도와 다이아몬드의 2배에 이르는 열전도도를 지닌 물질이다. 이러한 탄소나노튜브의 우수한 특성을 이용하여 나노섬유, 고분자-탄소나노튜브의 고기능 복합체, 나노소자, 전계방출원(field emitter), 가스센서 등 다양한 분야로의 활용을 위한 연구가 진행되고 있다. 특히, 수백 ${\mu}m$ 이상의 길이로 수직 성장된 탄소나노튜브(VA-CNTs)의 합성은 길이 대 직경의 비(aspect ratio)가 비약적으로 증가하여 앞서 언급한 분야로의 활용이 더욱 유리하며, 그 중에서도 대량 생산, 나노섬유 및 나노복합체로서의 활용에 극히 유용하다. 최근에는 열 화학기상증착(thermal chemical vapor deposition; TCVD)법을 이용하여 탄소나노튜브의 구조를 제어하는 연구들이 많이 보고되고 있다. 열 화학기상증착을 이용한 수직 정렬된 탄소나노튜브의 합성에서 합성조건의 변화는 탄소나노튜브의 길이, 벽의 수, 직경, 결정성 등 구조에 큰 영향을 미친다. 탄소나노튜브는 이러한 구조에 따 라 물리적 특성이 달라지기 때문에 다양한 분야로의 응용을 위해서는 합성에 대한 근본적인 이해 가 절실히 요구된다. 본 연구에서는 열 화학기상증착법을 이용한 합성에서 성장압력의 변화에 따른 탄소나노튜브의 구조적 특성을 조사하였다. 성장압력의 변화는 탄소나노튜브의 밀도, 길이, 결정성에 큰 영향을 미치는 것을 주사전자현미경과 라만분광법을 이용하여 확인하였다. 이러한 결과 는 탄소나노튜브 박막(CNT forest)의 가장자리(edge)에 비정질 탄소(amorphous carbon)의 흡착으로 인한 나노튜브사이의 간격(intertube distance)이 좁아짐에 따른 가스공급 차단 효과로 설명이 가능 하다. 또한, 마이크로웨이브 플라즈마 화학기상증착법을 이용하여 탄소나노튜브를 합성하였다. 합성과정 중 산소(O2)를 주입 하였을 경우, 그렇지 않은 경우에 비하여 성장 속도가 증가하여 3시간 합성 시 2 mm가 넘는 수직 정렬된 탄소나노튜브를 합성 할 수 있었다. 이러한 결과는 과잉 공급 되어 탄소나노튜브로 합성되지 못하고 촉매금속의 표면과 탄소나노튜브의 벽에 비정질의 형태로 붙어있는 탄소 원자들을 추가 주입해 준 산소에 의하여 CO 또는 CO2 형태로 제거해 줌으로써 활성화된 촉매금속의 반응 시간을 향상 시켜주어 탄소공급이 원활하게 이루어졌기 때문이라 생각된다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.18 no.5
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• pp.475-480
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• 2017

In this paper, the conductivity of the fine pattern is improved in the insulating substrate by laser-induced forward transfer (LIFT) process. The high laser beam energy generated in conventional laser induced deposition processes induces problems such as low deposition density and oxidation of micro-patterns. These problems were improved by using a polymer coating layer for improved deposition accuracy and conductivity. Chromium and copper were used to deposit micro-patterns on silicon wafers. A multi-pulse laser beam was irradiated on a metal thin film to form a seed layer on an insulating substrate(SiO2) and electroless plating was applied on the seed layer to form a micro-pattern and structure. Irradiating the laser beam with multiple scanning method revealed that the energy of the laser beam improved the deposition density and the surface quality of the deposition layer and that the electric conductivity can be used as the microelectrode pattern. Measuring the resistivity after depositing the microelectrode by using the laser direct drawing method and electroless plating indicated that the resistivity of the microelectrode pattern was $6.4{\Omega}$, the resistance after plating was $2.6{\Omega}$, and the surface texture of the microelectrode pattern was uniformly deposited. Because the surface texture was uniform and densely deposited, the electrical conductivity was improved about three fold.

• Journal of the Microelectronics and Packaging Society
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• v.21 no.4
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• pp.69-76
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• 2014

In this study, we developed an ultra-thin flexible printed circuit board(FPCB) using the sputtered flexible copper clad laminate. In order to enhance the adhesion between copper and polyimide substrate, a NiMoNb addition layer was applied. The mechanical durability and flexibility of the ultra-thin FPCB were characterized by stretching, twisting, bending fatigue test, and peel test. The stretching test reveals that the ultra-thin FPCB can be stretched up to 7% without failure. The twisting test shows that the ultra-thin FPCB can withstand an angle of up to $120^{\circ}$. In addition, the bending fatigue test shows that the FPCB can withstand 10,000 bending cycles. Numerical analysis of the stress and strain during stretching indicates the strain and the maximum von Mises stress of the ultra-thin FPCB are comparable to those of the conventional FPCB. Even though the ultra-thin FPCB shows slightly lower durability than the conventional FPCB, the ultra-thin FPCB has enough durability and robustness to apply in industry.