• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.2
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• pp.292-300
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• 1997

PSZT powders having the particle size of 0.5~5 $\mu\textrm{m}$ with cubic shapes, were prepared by a hydrothermal reaction in the temperature range of 150~$^{\190circ}C$ for a 2 h reaction. Experimental results showed that as the reaction temperature increased, the nucleation and crystal growth were accelerated and the the particle size became larger. However, the particle size became smaller with its narrow distribution as the concentration of a mineralizer (KOH) increased. It was possible to reduce the reaction temperature by increasing mineralizer concentrations. With increase in Zr/Ti ratio, the major crystal phase of synthetic PSZT powders was seen to change from tetragonal phase to rhombohedral phase.

• Journal of the Microelectronics and Packaging Society
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• v.25 no.3
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• pp.61-66
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• 2018

This research scrutinizes the self-annealing characteristics of copper used to metal interconnection for application of DRAM fabrication process. As the time goes after the copper deposited, the grain of copper is growing. It is called self-annealing. We use the electroplating method for copper deposition and estimate two kinds of electroplating chemicals having different organic additives. As the time of self-annealing is elapsed, sheet resistance decreases with logarithmic dependence of time and is finally saturated. The improvement of sheet resistance is approximately 20%. The saturation time of experimental sample is shorter than that of reference sample. We can find that self-annealing is highly efficient in grain growth of copper through the measurement of TEM analysis. The structure of copper grain is similar to the bamboo type useful for current flow. The results of thermal excursion characteristics show that the reliability of self-annealed sample is better than that of sample annealed at higher temperature. The self-annealed sample is not contained in hillock. The self-annealed samples grow until $2{\mu}m$ and develop in [100] direction more favorable for reliability.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.5 no.3
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• pp.278-283
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• 1995

The potassium titanate fibres were synthesized with wet process by the addition of KOH solution to the TiOz gel produced by the reaction between element titanium particles and $H_2O_2$ solution at $50^{\circ}C$. And then they were characterized by XRD, SEM and FT - IR. It was found that potassium titanate fibres were mainly affected by KOH/TiOz mole ratio, synthesis time and aging time in this wet process employed. For $KOH/TiO_2 = 1/1$, synthesizing time 24 hrs, aging time 24 hrs and calcination temperature of TEX>$900^{\circ}C$ for 1 hr, their products were mainly found to be potassium tetratitanate which had thin and long fibres in the range of 10 ~ 20 mm. As the synthesizing time increased and the amount of KOH decreased, potassium tetratitanate was converted into potassium hexatitanate. Also, the length of their fibres became short.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.3
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• pp.211-218
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• 2000

$PbZrO_3$precursor was prepared for the spin coating on the Pt/Ti/$SiO_2$/Si substrate. Two different heat treatment methods were used and the differencies were studied. One of the method is that the films were inserted into the furnace for 30 minutes and the other is that the films were annealed by rapid thermal annealing (RTA) for 1 minute at the same temperatures. We also examined the tendency of crystallization by annealing at the fixed temperature, $700^{\circ}C$ as a function of time, namely during 1, 10, 20, and 30 minitues, respectively. The optimum conditions for the crystallization of these films were at $550^{\circ}C$ during 30 min. and at $700^{\circ}C$ during 10 min. in muffle furnace and at $650^{\circ}C$ during 1 min in RTA furnace. The best condition for making good quality grains needs 30 min. at $700^{\circ}C$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.6
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• pp.262-266
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• 2004

Rutile single crystals were grown by the skull melting method. Ti metal ring was used for initial RF induction heating. The grown crystals were cut into wafer of 5.5 mm diameter and 1mm thickness. The wafers were annealed in air at $1300^{\circ}C$ up to 15 hours and their transmittance spectra $(\lambda= 200~25000 nm)$ were obtained.

• Korean Journal of Materials Research
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• v.7 no.4
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• pp.322-329
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• 1997

ECR 마이크로 플라즈마 CVD법에 의하여 단결정 Si기판위에서 대면적에 걸쳐 방향성을 가진 다이아몬드박막을 성공적으로 성장시키고, 막 증착공정을 바이어스처리 단계와 성막단계의 2단계로 나누어 실시할 때 바이어스처리 단계에서 여러 공정 매개변수들이 다리아몬드 핵생성밀도에 미치는 효과에 관하여 조사하였다. 기판온도$600^{\circ}C$, 압력 10Pa, 마이크로파 전력 3kW, 기판바이어스 +30V의 조건으로 바아어스 처리할 때, 핵생성에 대한 잠복기간은 5-6분이며, 핵생성이 완료되기 까지의 시간은 약 10분이다. 10분 이후에는 다이아몬드 결정이 아닌 비정질 탄소막이 일단 형성된다. 그러나 성장단계에서 이러한 비정질 탄소막은 에칭되어 제거되고 남아있는 다이다몬드 핵들이 다시 성장하게 된다. 또한 기판온도의 증가는 다이아몬드 막의 결정성을 높이고 핵생성 밀도를 증가시키는 데에 별로 효과가 없다. ECR플라즈마 CVD법에서 바이어스처리 테크닉을 사용하면, 더욱 효과적임을 확인하였다. 총유량 100 sccm의 CH$_{3}$OH(15%)/He(85%)계를 사용하여 가스압력 10Pa, 바이어스전압 +30V마이크로파 전력 3kW, 온도 $600^{\circ}C$의 조건하에서 40분간 바이어스처리한 다음 다이아몬드막을 성장시켰을 때 일시적으로나마 제한된 지역에서 완벽한 다이아몬드의 에피성장이 이루어졌음을 SEM으로 확인하였다. 이것은 Si기판상에서의 다이아몬드의 에피성장이 가능함을 시사하는 것이다. 그밖에 라만분광분석과 catodoluminescence 분석에 의한 다이아몬드의 결정질 조사결과와 산소방전 및 수소방전에 의한 챔버벽의 탄소오염효과 등에 관하여 토의하였다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.5 no.3
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• pp.209-214
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• 1995

Abstract 0.2 wt % $Fe_2O_3$ doped $SrTiO_3$ single crystals were grown by floating zone method in air and Nz atmosphere, respectively. The growth rate was fixed at 5 mm/hr and rotation speed was maintained at 30 rpm. As - grown crystals were cut perpendicular to its growth direction and then, annealed at 900, 1000 and $1100^{\circ}C$ for 2 hours in Nz atmosphere. Resistivities of each samples were measured and then converted into conductivities. By using these conductivity values, the activation energies were calculated and by means of the calculated activation energies, mechanism which contribute to increasing the electrical conductivity were investigated.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.13 no.5
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• pp.235-240
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• 2003

The development of large area GaN substrates is one of important issues in expanding of GaN-based applications. In order to investigate the possibility, GaN thick films were grown by a sublimation technique, using MOCVD-GaN films grown on a sapphire as a seed-crystal substrate and a commercial GaN powder as a source material. The pressure in chamber under the fixed flow rate of $N_2$ gas and $NH_3$ gas was kept at 1 atmosphere and the effects of the various processing parameters such as the distance between source material and seed crystal, the temperature of top- and bottom heater and the growth time during the growth of GaN thick film were investigated. The growth feature and microstructure of the GaN thick films were observed by SEM and XRD. The optical bandgap properties and the defects were evaluated by the PL measurement. By these results, the growth conditions such as the distance between the GaN source and the seed substrate, the growth temperature and the growth time were determined for the satisfied growth of GaN thick films.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.16 no.5
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• pp.181-188
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• 2006

Rutile single crystals grown by skull melting method were cut parallel and perpendicular to growth axis, and both sides of the cut wafers (${\phi}5.5mmx1.0mm$) were then polished to be mirror surfaces. The black wafers were changed into pale yellow color by annealing in air at 1200 and $1300^{\circ}C$ for $3{\sim}15\;and\;10{\sim}50$ hours, respectively. After annealing, structural and optical properties were examined by specific gravity (S.G), SEM-electron backscattered pattern (SEM-EBSP), X-ray diffraction (XRD), FT-IR transmittance spectra, laser Raman spectroscopy (LRS), photoluminescence (PL) and X-ray photoelectron spectroscopy (XPS). These results are analyzed increase of weight in air, decrease of weight in water and specific gravity, shown secondary phase of needle shape, diffusion of oxygen ion and increase of $Ti^{3+}$. From the above results, we suggest that the skull melting method grown rutile single crystals contain defect centers such as $O_v,\;Ti^{3+},\;O_v-Ti^{3+}$ interstitials and $F^+-H^+$.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.289.2-289.2
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• 2014

본 연구에서는 전기증착법 정전류 방법으로 ITO 유리기판 위에 ZnO 나노막대를 성장하였다. 성장 매개 변수로 용액 농도, 전착 전류, 용액 온도 및 성장 시간으로 하였고, 성장된 ZnO 나노막대는 field-emission scanning electron microscopy, X-ray diffractometer, photoluminescence를 이용하여 구조적, 광학적 특성을 분석하였다. 모든 시료에서 ZnO 나노막대는 wurtzite 형태의 결정 구조를 가지고, c-축 배향성을 나타내는 강한 ZnO(002) 회절피크가 나타났다. 용액 농도와 전착 전류가 감소함에 따라 ZnO 나노막대의 밀도 및 직경이 감소하였다. 또한, ZnO 나노막대는 성장 온도가 증가함에 따라 직경이 줄어들었고, 성장 시간이 증가함에 따라 ZnO 나노막대의 길이는 늘어났다. 모든 ZnO 나노막대 시료는 자유 엑시톤 재결합에 의해서 3.18 eV, 산소공공에 의한 결함에 의해서 2.32~1.86 eV의 피크가 관찰되었다. ZnO 나노막대의 직경이 작아질수록 NBEE 피크의 세기가 감소하고, 용액의 농도가 증가함에 따라 NBEE 피크는 청색편이 하였다.