• Journal of the Korean Chemical Society
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• v.31 no.6
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• pp.491-497
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• 1987

$ThO_2-Tm_2O_3$ (TDT) solid solutions containing 1,3,5,8,10, and 15 mol% $Tm_2O_3$ were synthesized from spectroscopically pure $ThO_2$ and $Tm_2O_3$ polycrystalline powders. The TDT solid solutions were indentified to the fluorite structure by the X-ray powder technique. The values of the lattice parameter were decreased with increasing amount of $Tm_2O_3$ incorporated. But, there was no linearity for the samples containing 8, 10, and 15 mol% $Tm_2O_3$. It was concluded that these samples became incomplete solid solutions. From the intensity analyses of X-ray diffraction patterns, the residual factor was found below 0.13 even for the 15 mol% TDT system. lt was confirmed from the DTA and TGA analyses that any phase transitions did not occur under the experimental condition executed. Comparing the pycnometric density with the lattice parameter obtained from XRD, it was suggested that the predominant defect model be an oxygen vacancy.

• Korean Chemical Engineering Research
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• v.61 no.3
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• pp.394-400
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• 2023

In this study, the tuning phenomena, gas storage capacity, and thermal expansion behaviors of binary (cyclopentylamine + CH₄) and (cyclopropylamine + CH₄) clathrate hydrates were investigated for the potential applications of clathrate hydrates to gas storage. To understand the tuning behaviors of binary (cyclopentylamine + CH₄) and (cyclopropylamine + CH₄) clathrate hydrates, ¹³C solid-state NMR spectroscopy was used, and the results confirmed that maximum tuning factors for the binary (cyclopentylamine + CH₄) and (cyclopropylamine + CH₄) clathrate hydrates were achieved at 0.5 mol% and 1.0 mol% of guest concentration, respectively. The gas storage capacity of binary (cyclopentylamine + CH₄) and (cyclopropylamine + CH₄) clathrate hydrates were also checked, and the results showed the CH₄ capacity of our hydrate systems was superior to that of binary (tetrahydrofuran + CH₄) and (cyclopentane + CH₄) clathrate hydrates. The synchrotron diffraction patterns of these hydrates collected at 100, 150, 200, and 250 K confirmed the formation of a cubic Fd-3m hydrate. In addition, the lattice constant of clathrate hydrates with cyclopentylamine and methane were larger than that with cyclopropylamine and methane due to the effects of molecular size and shape.

• Korean Chemical Engineering Research
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• v.45 no.2
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• pp.155-159
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• 2007

A series of new dimesogenic compounds having two identical, terminal Schiff base type mesogens and a central tetramethylene spacer were synthesized. Their thermotropic and mesomorphic properties of the compounds were investigated by differential scanning calorimetry and polarizing microscopy. The compounds with X= -F, -Cl, -Br, -CN and $-OCH_3$ were enantiotropically nematic liquid crystal. In contrast, the compounds with X= -I and $-CF_3$ were non-liquid crystal. The nematic forming efficiency of the groups was in the order of -CN > $-OCH_3$ > -Br > -Cl > -F.

• Fire Science and Engineering
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• v.22 no.3
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• pp.181-187
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• 2008

Numerical simulation of natural convection along a vertical wall was carried out to evaluate the computational fluid dynamics simulator, which is to be utilized for study of vertical wall fires. The computed velocity and temperature profiles were compared with measurements over the turbulent boundary layer formed along the wall of 4m high and constant temperature. It fumed out that the simulator with default parameters failed to predict the turbulent natural convection showing the boundary layer flow laminar. The grid size $\Delta$x=5mm, ${\Delta}y={\Delta}z=10mm$ and Smagorinsky constant of the large eddy simulation $C_s$=0.1 were chosen through parametric investigations. Though turbulent mixing was not enough, the velocity distribution near wall, peak velocity, and temperature profile in the turbulent boundary layer agreed well with the measurements.

• Journal of the Computational Structural Engineering Institute of Korea
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• v.28 no.1
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• pp.79-83
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• 2015

This paper presents a numerical study on the alignment of ridge-like surface structures evolving on silicon-germanium thin films under localized modulation of surface diffusivity. A situation is considered in which the surface diffusion of film material is selectively promoted such that its morphology is perturbed to periodic patterns. To simulate the growth behavior, a governing equation is formulated taking the surface chemical potential into account, and its solution is numerically sought using a finite-difference method. Results show that an initially planar surface coalesces upon the diffusivity modulation, and the surface structures can be aligned by changing the frequency of modulation condition. This research suggests a bottom-up fabrication technique that can manage the regularity of surface structures for thin film devices.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.8 no.3
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• pp.383-387
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• 1998

The vacuum-Bridgman equipment for large size diameter (4 inch more over) crystal growth was organized simply and the $CaF_2$ single crystal which was grown in the conditions of growth rate of 2mm/hr, freezing temperature gradient of $12^{\circ}C$/cm, have analyzed to keep excellent properties. Using Mo thermal reflector of umbrella shape, it could be eliminated the formation of polycrystalline. The preferential growth direction was (111) and the calculated lattice parameter was $5.460 \AA$ by XRD peaks. The secondary phases, also, was not formed by means of powder-XRD analysis. The value of EPD is $1.4{\times}10^4 \textrm{cm}^{-2}$ and the optical quality, which is the transmittance is 91% up in UV region, is suitable for optical components of UV applications.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.2
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• pp.141-148
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• 1999

High quality pure and Nb-doped $PbWO_{4}$ Single Crystal were grown from a 50 %~50 % mixture of Lead oxide (PbO) and Tungsten oxide $(WO_{3})$ by Czochralski method in Iridium crucible. The stoichiometric deviation correspond to the selective loss of the crystal constituents is found to be responsible for the yellowish coloration of $PbWO_{4}$. Through the X-ray powder diffraction experiment, we have investigated the lattice constant variations of each $PbWO_{4}$ crystals. We also present information on their photoluminescence (PL), optical absoption properties and Raman spectra. The temperature dependence of PL intensity and FWHM (Full Width Half Maximum) were measured in the temperature range 10 K~300 K. One observes a slight temperature dependence in the low temperature region and PL intensity decreases over 200 K by thermal quenching. The activation energy, Huang-Rhys coupling constant and inhomogenious brodenning acquired from their temperature dependence.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.193.1-193.1
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• 2015

실리콘 (Si) 기판 위에 고품질의 갈륨질화물 (GaN) 박막을 성장시키기 위한 노력이 계속되고 있다. 실리콘 기판은 사파이어 기판 보다 경제적인 측면에서 유리하고, 실리콘 직접화 공정에 GaN 소자를 쉽게 접목 가능하다는 장점이 있다. GaN 박막은 2차원 전자 가스형성을 통한 고속소자, 직접 천이형 밴드갭을 이용한 발광소자 및 고전압 소자로써 활용 가능한 물질이다. 종래에는 Si(100) 및 Si(111) 기판 위에 GaN 박막 성장에 대한 연구가 주로 진행되었다. 하지만 대칭성과 격자 불일치도 등 결정학적 특성을 고려할 때 Si(100) 기판 위에 고품질의 GaN 박막을 성장시키는 것은 쉽지 않다. Si(111) 기판은 실리콘 소자 직접화 공정에 적합하지 못한 단점을 가지고 있다. 반면, 최근 Si(110) 기판 위에서 비등방적 변형 제어를 통한 고품질 GaN 박막 성장이 보고 되어 실리콘 집적 소자와 결합한 고전압 소자 및 고속소자 구현에 관한 연구가 진행되고 있다. 본 연구에서는 투과전자현미경 연구를 바탕으로 Si(110) 기판 위에 성장된 GaN의 미세구조에 관한 연구를 소개한다. 열팽창계수의 차이에 의한 GaN 박막 내 결함 생성을 줄이기 위하여 AlN 완충층이 사용되었다. GaN 박막을 암모니아 ($NH_3$) 유량이 다른 조건에서 성장시킴으로써 GaN 박막 미세구조의 암모니아 유량 의존성에 관한 연구를 진행하였다. GaN 박막에서 투과전자현미경 연구와 X-ray 회절 연구를 통하여 결함 거동 및 결정성을 확인하였다. $NH_3$ 유랑이 증가함에 따라 GaN의 성장 거동이 3차원에서 2차원으로 변화됨을 관찰하였다. 또한, 전위밀도의 증가도 확인되었다. $NH_3$ 유량이 낮은 경우 GaN 전위는 AlN와 GaN 경계에 주로 위치하고 GaN 표면 근처에는 전위밀도가 감소하였으나, $NH_3$ 유량이 높을 경우 GaN 박막 표면까지 전위가 관통됨을 확인하였다.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.8
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• pp.387-391
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• 2006

The Ag photodoping effect in amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ chalcogenide thin films for holographic recording has been investigated using a He-Ne laser (${\lambda}$=632.8 nm). The chalcogenide films thickness prepared in the present work were thinner in comparison with the penetration depth of recording light ($d_p=1.66{\mu}m$). It exhibits a tendency of the variation of the diffraction efficiency (${\eta}$) in amorphous chalcogende films, independently of the Ag photodoping. That is, ${\eta}$ increases rapidly at the beginning of the recording process and reaches the maximum (${\eta}_{max}$) and slowly decreases slowly with the exposed time. In addition, the value of ${\eta}_{max}$ depends strongly on chalcogenide film thickness(d) and its maximum peak among the films with d = 40, 80, 150, 300, and 633 nm is observed 0.083% at d = 150 nm (approximately 1/2 ${\Delta}n$), where ${\Delta}$n is the refractive index of chalcogenide thin film (${\Delta}n=2.0$). The ${\eta}$ is largely enhanced by Ag photodoping into the chakogenides. In particular, the value of ${\eta}_{max}$ in a bilayer of 10-nm-thick Ag/150-nm-thick $As_{40}Ge_{10}Se_{15}S_{35}$ film is about 1.6%, which corresponds to ${\sim}20$ times larger than that of the single-layer $As_{40}Ge_{10}Se_{15}S_{35}$ thin film (without Ag). And we obtained the diffraction pattern according to the formation of (P:P) polarization holographic grating using Mask pattern and SLM.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.1
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• pp.59-69
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• 1997

The growth and microstructural characterization of epitaxial yttrium silicide ($YSi_2$) on the (100)Si substrate are investigated. The $YSi_2$ film grow epitaxilly through the solid phase reaction during vacuum annealing above $400^{\circ}C$. The epitaxial relationships between the hexagonal $YSi_2$ film and the (100)Si substrate are [0001]$YSi_2$//[011]Si and [0001]$YSi_2$//[011]Si in the (1100)$YSi_2$//(100)Si plane relation. The YSi$_2$ film consists of the two types of domains which have two different azimuthal orientations making an angle of $90^{\circ}$ to each other. The two types of domains in the $YSi_2$film are equivalent in volume fraction and crystalline quality, which has been proved from the equivalent integrated intensities of (2201) asymmetric reflection of X-ray diffraction. The formation of a double -domain structure is discussed on the basis of geometrical matching at interface between the (1100)$YSi_2$ film and the (100)Si substrate, and growth model is proposed.