• Polymer(Korea)
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• v.33 no.3
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• pp.207-212
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• 2009

The precursor polyimide of the photoreactive polyimides(PI-SP6 and PI-SP12) was prepared from a derivative of 2, 2, 2-trifluoroethane dianhydride and 3,3'-dihydroxy-4,4'-diaminobiphenyl. PI-SP6 and PI-SP12 were then prepared by the polymer reactions of the precursor polyimide with photoreactive 2-styrylpyridine alkylene (hexylene and dodecylene) derivatives, respectively. The photoreactive polymers were soluble in organic solvents. The polymers showed the initial decomposition temperatures around $350^{\circ}C$. The glass transition temperatures of PI-SP6 and PI-SP12 were found to be $130^{\circ}C$ and $85^{\circ}C$, respectively. This result means that the latter polymer is more flexible than the former polymer. Their transmittance in the film state was 90% at $250^{\circ}C$, which indicates that the photosensitive polyimides with thermal stability have high optical transparency even at the high temperature. The respective dichroic ratios of PI-SP6 and PI-SP12 were found to be 0.01 and 0.03 at an exposure energy of $1.5\;J/cm^2$. This result suggests that the latter polymer with larger flexibility compared to the former polymer is more effective for the photoalignment.

• Applied Chemistry for Engineering
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• v.1 no.2
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• pp.116-123
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• 1990

Synthesis and characterization of photosensitive orthonaphthoquinonediazide-sulfonyl derivatives were studied. These photoactive compounds underwent a UV induced transformation to the base-soluble photoproduct. The photoresists were prepared using these photoactive compounds with low molecular weight m-cresol novolacs as matrix resin. And photosensitive characteristics of the photoresists were studied. 3, 4, 5-Trihydroxy-benzophenone with bulky resonance structure increased the sensitivity and the solubility rate of the exposed region. The mixture of PAC and matrix resin having 3:8 weight ratio had the moderate rate of dissolution in the developer. The photoresist using these conditions showed the best snsitivity and contrast under the fixed conditions.

• Journal of the Korean Ceramic Society
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• v.41 no.11
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• pp.826-833
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• 2004

In this study, photosensitivity dynamics in SiO$_2$ glass with the composition similar to that of silica Planar Lightwave Circuit (PLC) devices was investigated as a fundamental study prior to the device fabrication. Silica bulk glasses with similar composition to the core layer of PLC devices were prepared with variable composition of B$_2$O$_3$. The photosensitivity in boron and germanium co-doped SiO$_2$ glass yields refractive index change $\Delta$n as high as 10$\^$-3/. However such index modulation disappeared after annealing. From the result of annealing experiment and W absorption / Raman spectra, we conclude the compaction model is applicable to our glass system.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.14 no.9
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• pp.4467-4471
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• 2013

In this research, developed full-scan photoresist coating system(FPCS) can improve the efficiency of the photoresist coating system essential for spinner equipment in nano semiconductor manufacturing process. The devices developed in this research, which can be swiftly replaced in case abnormal state element changes or wafer manufacturing defect occurs, are anticipated to improve module yield as well as real-time monitoring on the state element in order to prevent the complex process defect due to the photoresist miss coating.

• Korean Journal of Environmental Agriculture
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• v.19 no.2
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• pp.116-121
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• 2000

Photosensitizing activities of some selected photosensitizers (PS) on the artificial diminution of pesticide residues on red pepper were investigated. Red peppers were sprayed 4 times with the three fungicides, dithianon, triflumizole, and triforine, according to the conventional method, followed by the application of photosensitizers once. Recoveries for the analyses of the pesticide residues were high $(90.7{\sim}98.5%)$ except for dithianon $(76.6{\sim}78.3%)$. In case of dithianon, after 1 day of the application of PS-1 (10 ppm), the residual amount was 76% of that of the control. For triflumizole, the residual amount after 3 days of the application of PS-4 (50 ppm) accounted for 48% of that of the control. In case of triforine, the residual amount after 1 day of the application of PS-3 (100 ppm) was 55% of that of the control. The results indicated that the photosensitizing activities of photosensitizers varied with chemicals and the matrices where pesticide residues are remaining.

• Korean Journal of Materials Research
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• v.3 no.5
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• pp.505-513
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• 1993

To make the electrophotographic photoreceptor that srnsirizes for panchromatic matcrial, the dying element of sunfasr yellow which has an absorption ivavclength at near 400nm, and $\alpha,\beta$-copper phthalocyaninc dying elements with 700nm absorption wavelength were adsorbed and then dispersed onto the zine oxide(Zn0). In ordcr to characterize rhe change In sensitivity the various binders and different mole ratio of ZnO to binder were employed in here. It was found rhat the optimum sensitivity was obtained with 5.5 ratio. I;rom the measurements of electrostatic and spectral sensitivity, it was found that the maximum photographic properties were obtained for mixing the sunfast yellow and $\beta$-copper phthalocyaninr. In this case the electrophotographic sensiri\ity was found to he $E{1:2}$= 1440 lux . sec. And also the spectral sensitivity shows that it had a good properties for panchromatic matcrial.

• Korean Journal of Food Science and Technology
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• v.54 no.1
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• pp.1-7
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• 2022

Riboflavin (Rb), in the presence of methionine (Met) under light, generates superoxide radicals that can reduce nitro blue tetrazolium (NBT) to its corresponding formazan. The Rb-Met/NBT system has been used to measure the superoxide dismutase (SOD)-like activities of various antioxidants. However, the reaction mechanisms have not been clearly defined, and the assay conditions are not consistent. In this study, the effects of different photosensitizers and amino acids on NBT reduction in different solvents were investigated. NBT reduction in the Rb-Met/NBT system was more pronounced in phosphate-buffered saline, compared to distilled water or Tris (pH 7.5); histidine (His) instead of Met also led to considerable Rb-induced NBT reduction. Among the photosensitizers, methylene blue with His caused potent NBT reduction in Tris. Rb-induced NBT reduction combined with Met or His was quantitatively inhibited by SOD or gallic acid, but did not affect MB-induced reduction sensitively.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.05a
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• pp.168-172
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• 2005

본 연구에서는 평판 디스플레이 Photo공정 중에서 무회전 도포(Spinless Coating)방식으로 기판(Glass)에 감광제 약액을 도포한 후 용매(Solvent)를 제거시키기 위한 진공건조장치(Vacuum dryer)에서 감광제 도포막의 품질에 영향을 주지 않는 범위 안에서의 용매 제거시간을 단축하기 위한 진공챔버의 용적에 따른 진공포트의 크기 및 배치에 대한 최적화를 구현하였다. 구현된 챔버의 용적과 진공포트의 크기 및 배치를 바탕으로 진공건조장치를 챔버, 챔버 구동부, 기판 구동부, 진공펌프, 그리고 $N_2$ 공급부로 모듈화하여 구성하였으며. 실제 도포 기판을 이용하여 진공건조를 실시한 후 도포막을 검사함으로써 진공포트에 대한 최적화를 검증함과 동시에 진공건조 능력을 확인하였다.

• Korean Journal of Optics and Photonics
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• v.3 no.3
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• pp.148-154
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• 1992

With nonhardening fixer, dichromated bleacher and alcohol drying, the diffraction efficiency of over 71o/c has been achie'{ed for holographic phase gratings in silver halide emulsion. The swollen emulsion of Agfa 8E75 HD film is identified by scanning electron microscope (SEM) after chemical processing. Dichromated bleacher and rapid dehydration using alcohol drying make a strong modulation so that diffraction efficiency is. increased over 20%. The principal characteristic parameters in coupled wave theory are investigated and new modified parameter values are presented by computer simulation. Controlling the emulsion thickness has an important role as a potential source for high diffraction efficiency.ciency.

• Applied Chemistry for Engineering
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• v.21 no.4
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• pp.411-416
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• 2010

In this research, we intended to improve the tolerance of thick film resistor using photosensitive polymer resistor paste which was fabricated with alkali-solution developable photosensitive resin and conductive carbon black. At first, we investigated the effect of the selection of carbon black and photosensitive resin on the resistance range and tolerance level of polymer thick film resistor (PTFR). And then, a difference in resistance tolerance was evaluated according to the coating methods of photosensitive resistor paste on test board. In case that the photosensitive resistor paste was coated on whole surface of test board using screen printing, large positional tolerance was obtained because the formation of the thick film with uniform thickness was difficult. On the other hand, when the paste was coated with roller, the resistive thick film with uniform thickness was formed on the whole board area and the result of resistance evaluation showed low tolerance in ${\pm}10%$ range. The tolerance of PTFR could be improved by combination of the precise patterning using photo-process and the coating process for the resistive thick film with uniform thickness.