• Title/Summary/Keyword: 감광기술

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Acetylcholinesterase-based Biosensor for Detection of Residual Organophosphates and Carbamates Insecticides (유기인계 및 카바메이트계 농약을 측정할 수 있는 바이오 센서의 개발)

  • Kim, Young-Mee;Kim, Jin-Young;Cho, Moon-Jae;Chang Kong-Man;Hyun, Hae-Nam;Cho, Somi K.
    • Applied Biological Chemistry
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    • v.49 no.4
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    • pp.315-321
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    • 2006
  • Inhibitors of acetylcholinesterase(AchE), such as organophosphates and carbamates, interfere the action of AchE in nerve and may lead to a severe impairment of nerve functions or even death. Therefore, insect AchE is the biological target of predominant insecticides used in agriculture. Biosensors are sensitive and can be used as dispoisable sensors for environmental control. In recent years, the use of AchEs in biosensor technology has gained enormous attention, in particular with respect to insecticide detection. The principle of biosensors using AchE as a biological recognition element is based on the inhibition the catalytic activity by the agents to be detected. We here present a strip-type biosensor based on AchE inhibition. In this study, acetylcholinesterase and PVA-SbQ(polyvinyl alcohol functionalized with methyl pyridinium methyl sulfate) were co-immobilized on immobilone-P membranes. Immobilization of the enzymes showed a stability in 6 months without activity loss in $4^{\circ}C$ storage. Enzymes immobilized on surfaces of membrane responded to organophosphates and carbamate more sensitivitive than enzyme in solution. Organophosphates and carbamates concentrations could be detected by entrapped and surface immobilized enzymes, in 5 min. For chlorpyrifos, carbofuran, cabaryl, and methidathion, the detection limits of AChE-strip were similar to that of HPLC/GC method.

Variation of Flow Rates in Heterogeneous Microchannel Systems (비균일계 마이크로채널에서의 유량 변화 특성)

  • Kim, Jin-Yong;Lee, Hyo-Song;Yu, Jae-Keun;Kim, Ki-Ho;Rhee, Young Woo
    • Applied Chemistry for Engineering
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    • v.17 no.1
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    • pp.28-32
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    • 2006
  • This study investigated the variation of flow rates in microchannels that consisted of polydimethyl siloxane (PDMS) and glass using various external voltages. Three different microchannel widths and two different depths. PDMS and negative photoresist (SU-8) were used to make the microchannels by the soft lithographic method. For each depth of microchannel ($50{\mu}m$ and $100{\mu}m$), three different widths ($100{\mu}m$, $200{\mu}m$ and $300{\mu}m$) were made. In each case, several different external voltages were applied (0.3 kV, 0.35 kV, 0.4 kV and 0.45 kV) to examine the flow rates. Our results indicated that flow rate increased with an increase of the external voltage at the same microchannel width. This was because the electrical field was increased as the external voltage increased. For the same external voltage, the flow rate increased as the microchannel's width increased. These results showed that the resistance in the microchannel decreased as the microchannel's width increased. Also, to investigate the effect of microchannel's depth and width, the cross-sectional area of the microchannel was increased to the double in area. As a result, the effect of the microchannel's depth was higher at a low external voltage, and the effect of the microchannel's width was higher at a high external voltage.

Analysis of the Effect of the Etching Process and Ion Injection Process in the Unit Process for the Development of High Voltage Power Semiconductor Devices (고전압 전력반도체 소자 개발을 위한 단위공정에서 식각공정과 이온주입공정의 영향 분석)

  • Gyu Cheol Choi;KyungBeom Kim;Bonghwan Kim;Jong Min Kim;SangMok Chang
    • Clean Technology
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    • v.29 no.4
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    • pp.255-261
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    • 2023
  • Power semiconductors are semiconductors used for power conversion, transformation, distribution, and control. Recently, the global demand for high-voltage power semiconductors is increasing across various industrial fields, and optimization research on high-voltage IGBT components is urgently needed in these industries. For high-voltage IGBT development, setting the resistance value of the wafer and optimizing key unit processes are major variables in the electrical characteristics of the finished chip. Furthermore, the securing process and optimization of the technology to support high breakdown voltage is also important. Etching is a process of transferring the pattern of the mask circuit in the photolithography process to the wafer and removing unnecessary parts at the bottom of the photoresist film. Ion implantation is a process of injecting impurities along with thermal diffusion technology into the wafer substrate during the semiconductor manufacturing process. This process helps achieve a certain conductivity. In this study, dry etching and wet etching were controlled during field ring etching, which is an important process for forming a ring structure that supports the 3.3 kV breakdown voltage of IGBT, in order to analyze four conditions and form a stable body junction depth to secure the breakdown voltage. The field ring ion implantation process was optimized based on the TEG design by dividing it into four conditions. The wet etching 1-step method was advantageous in terms of process and work efficiency, and the ring pattern ion implantation conditions showed a doping concentration of 9.0E13 and an energy of 120 keV. The p-ion implantation conditions were optimized at a doping concentration of 6.5E13 and an energy of 80 keV, and the p+ ion implantation conditions were optimized at a doping concentration of 3.0E15 and an energy of 160 keV.

The Actual State and the Utilization for Dental Radiography in Korea (국내 치과방사선의 현황 및 이용 실태)

  • Shin, Gwi-Soon;Kim, You-Hyun;Lee, Bo-Ram;Kim, Se-Young;Lee, Gui-Won;Park, Chang-Seo;Park, Hyok;Chang, Kye-Yong
    • Journal of radiological science and technology
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    • v.33 no.2
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    • pp.109-120
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    • 2010
  • The purpose of this study was first to analyze the utilization of dental examination through questionnaire to develop a diagnostic reference level of patient doses for dental radiography in korea. 77 dental institutions were classified into three groups: A group for the dental hospitals of the college of dentistry (11 institutions), B group for dental hospitals (30 institutions) and C group for dental clinics (36 institutions). The results were as follows : The mean numbers of unit chairs and medical staffs were 140.2, 15.3 and 5.8 sets, 112.6, 7.3 and 1.7 dentists, 3.1, 0.5 and no one radiologic technologists, and 19.7, 12.5 and 3.3 dental hygienists in A, B and C groups, respectively. The mean numbers of dental X-ray equipments were 14.64, 3.21 and 2.19 in A, B and C groups, respectively. Intraoral dental X-ray unit was used the most, the following equipments were panoramic, cephalometric, and cone-beam CT units. The most used X-ray imaging system was also digital system (above 50%) in all three groups. Insight dental film (Kodak, USA) having high sensitivity was routinely used for periapical radiography. The automatic processor was not used in many dental institutions, but the film-holding device was used in many dental institutions. The utilization rates of PACS in A, B and C groups were 90.9%, 83.3% and 16.7% respectively, and the PACS software program was used the most PiView STAR (Infinitt, Korea). The annual mean number of radiographic cases in one dental institution in 2008 for A group was 6.8 times and 21.2 times more than those for B and C groups, and periapical and panoramic radiographs were taken mostly. Tube voltage (kVp) and tube current (mA) for periapical radiography were similar in all three groups, but exposure time in C group was 12.0 times and 3.5 times longer than those in B and C groups. The amount of radiation exposure in C group, in which dental hygienists take dental radiographs, was more than those in other groups. The exposure parameters for panoramic radiography were similar in all three groups. In conclusion, the exposure parameters in dental radiography should be determined with reference level, not past experiences. Use of automatic processor and film-holding devices reduces the radiation exposure in film system. The quality assurance of dental equipments are necessary for the reduction of the patient dose and the improvement of X-ray image quality.