• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.11
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• pp.977-982
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• 2007

The realization of the photoresist(PR) removal method with vaporized water and ozone gas mixture has been studied for the LCD TFT array manufacturing. The developed PR stripper uses the water boundary layer control method based on the high concentration ozone production technology. We develop the prototype of PR stripper and experiment to find the optimal process parameter condition like as the ozone gas flow/concentration, process reaction time and thin boundary layer formation. As a results, we realize the LCD PR strip rate over the 0.4 ${\mu}m/min$ and this PR removal rate is more than 5 times higher than the conventional immersion type ozonized water process.

• Journal of the Korean Applied Science and Technology
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• v.13 no.3
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• pp.145-153
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• 1996

Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.

• Journal of the Korean Society of Urban Environment
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• v.18 no.4
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• pp.547-555
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• 2018

In addition to North America and Europe, Korea is also responding to the toxic damage caused by the production and distribution of chemicals. Methods for assessing bio-toxicity of harmful substances have been widely introduced, but it is required of quantitative and speedy information for modeling. For 6 heavy metals, as zinc, copper, chrome, cadmium, mercury and lead, bio-toxicity assessment and kinetics model were constructed using Vibrio fischeri which is widely used luminous bacteria. The degree of luminescence activity and the toxicity of heavy metals were relative limunescence unit, RLU measured as by using a photomultiplier embedded device. The toxicity was assessed by the concentration levels giving under 20% lethality and lethal concentration, $EC_{50}$. In the results, the toxicity order were followed from mercury, lead, copper, chrome, zinc and cadmium. $EC_{{50},{\infty}}$ obtained by trends of $EC_{50}$ by time follows had highly linear agreement with main parameters of bio-toxicity modelling. The average error rates of the reproduced lethality obtained from DAM and TDM model on the basis of body residue, were 10.2% for mercury, lead, copper, chrome and 20.0 for the all 6 methals.

• Korean Journal of Optics and Photonics
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• v.30 no.4
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• pp.146-153
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• 2019

The exposure system is a device that transfers a circuit pattern to a desired location. To display patterns on a substrate without deforming the optical characteristics, the characteristics of the optical exposure system are very important. Therefore, to form a microcircuit pattern, a small divergence angle should impinge on the irradiation area. Also, since the light from the source must react uniformly with the photosensitizer, it must have high luminance efficiency and uniformity of illumination. In this paper a parabolic reflector and an aspherical lens were designed to solve the problem of narrow-angle implementation, and it was confirmed by simulation analysis after their arrangement that the beam angle, uniformity, and maximum illuminance satisfied the target performance.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.42-47
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• 1998

We have fabricated electron-optical lens for micro E-beam system that can overcome the limitation of current E-beam lithography. Our electron-optical lens consists of multiple silicon electrodes which were fabricated by micromachining technology and assembled by anodic bonding. The assembled system was installed in UHV chamber to observe the emission characteristics of focused electrons by the electro-optical lens. We used STM(Scanning Tunneling Microscope) tip for electron source. By performing lithography with the focused electrons with PMMA(poly-methylmethacrylate) as E-beam resist. We could draw 0.13${\mu}{\textrm}{m}$ nano-scale lines.

• Journal of the Korean Society of Propulsion Engineers
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• v.10 no.4
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• pp.77-84
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• 2006

With the development of micro/nano spacecraft, concepts of micro propulsion are introduced for orbit transfer and drag compensation as well as attitude control. Micro solid propellant thruster has been attention as one of possible solution for micro thruster. In this paper, micro solid propellant thruster is introduced and research on basic components of a micro solid propellant thruster is reported. Micro Pt igniter was fabricated through negative patterning and quantitative effect of geometry was estimated. The characteristic of HTPB/AP solid propellant was investigated to measure the homing velocity. A combustion chamber was fabricated by means of anisotropic etching of photosensitive glass. Finally, micro solid propellant thrusters having various geometries were fabricated and tested.

• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1899-1901
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• 2001

본 논문에서는 3차원 feed horn 안테나를 볼로미터에 결합함으로써 감지도(Detectivity)를 향상시킨 비가시광 영상 감지 소자를 제안하였다. Feed horn 안테나의 우수한 지향성(Directivity)를 통해서 주위의 잡음 성분을 제거함으로써 감지도의 향상을 확인할 수 있었다. 안테나와 볼로미터와의 결합 손실을 줄이기 위해서 볼로미터의 흡수층의 모양을 원형의 형태로 하였으며 크기도 안테나 폭과 일치를 시켰다. 또한 열적 고립 구조를 만들기 위한 지지 다리의 모양도 원형의 형태로 하여서 전체 길이를 증가 시켰으며 이로 인해 열전도도(Thermal conductance)를 $4.65{\times}10^{-8}$[W/K]까지 낮출 수 있었 다. 설계된 소자의 감지도는 $2.37{\times}10^{9}$[$cm\sqrt{Hz}/W$]을 나타내었으며 안테나 결합을 통한 감지도의 향상을 확인 할 수 있었다. 볼로미터의 제작은 MEMS 기술을 이용한 표면미세가공(Surface micromachining)법으로 열적 고립 구조체를 제작할 수 있으며 3차원 feed horn안테나는 SU-8이라는 음성 감광제를 경사회전노광시켜서 제작할 수 있다.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2007.04a
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• pp.91-94
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• 2007

The fabrication and firing test of the ignition system for a micro solid propellant thruster are described in the present paper. Pt igniter coil was patterned on the glass membrane that was fabricated by the wet etching process. The thickness of Pt layer was $2000{\AA}$ and the width of igniter pattern was $40{\mu}m$. The thickness and diameter of glass membrane were $15{\mu}m$ and 1 mm, respectively. Ignition test was performed. Successful ignition of HTPB/AP propellant was obtained with an ignition delay of 1.6 s at an input voltage of 12 V. The ignition energy was estimated to be 1.4 J.

• 연구논문집
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• s.33
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• pp.99-109
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• 2003

Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.

• ETRI Journal
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• v.13 no.4
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• pp.10-24
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• 1991

본 연구에서는 기상 성장법 (VPE : vapor phase epitaxy) 으로 성장된 $n^+(Si:2X10^18cm^-3)$/$n(Si:1x10^17cm^-3)$구조의 시편 위에 SiN 과 감광막 등 식각 선택비가 서로 다른 두 물질로 보호된 소스와 드레인 사이의 게이트 형성 영역을 건식식각과 습식식각방법으로 리세스 에칭을 하여 형성한 후, 게이트를 자기정렬하여 형성시킬 수 있는 이중 리세스공정 기술을 개발하였고, 이를 통하여 전력용 MESFET 소자를 제작하였다.게이트 형성부분의 wide recess 폭은 건식식각으로 SiN을 측면식각(lateral etch) 함으로써 조절하였는데, 이 방법을 사용하여 MESFET 소자의 임계전압을 조절할 수 있고, 동시에 소스-드레인 항복전압을 30V 까지 향상시킬 수 있었다. 소스-드레인 항복전압은 wide recess 폭이 증가함에 따라, 그리고 게이트 길이가 길어짐에 따라 증가하는 경향을 보여주었다. 이 방법으로 제작한 여러종류의 MESFET 중에서 게이트 길이가 $2\mum$이고 소스-게이트 간격이 $3 \mum$인 MESFET의 전기적 특성은 최대 트랜스컨덕턴스가 120 mS/mm, 게이트 전압이 0.8V 일 때 포화드레인전류가 170~190mA/mm로 나타났다. 제작된 MESFET이 ($NH_4$)$_2$$S_x$ 용액에 담금처리될때 , 공기중에 노출된 게이트-드레인 사이의 n-GaAs층의 표면이 유황으로 보호되어 공기노출에 의한 표면 재산화막의 형성이 억제되었기 때문으로 사료된다.