• Title/Summary/Keyword: (Ba,Sr)$TiO_3$박막

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The structural properties of the (Ba,Sr)(Nb,Ti)$O_3$[BSNT] thin films with $Ar/O_2$ rates ($Ar/O_2$비에 따른 (Ba, Sr)(Nb, Ti)$O_3$[BSNT] 박막의 구조적 특성)

  • Nam, Sung-Pill;Lee, Sang-Chul;Kim, Ji-Heon;Park, In-Gil;Lee, Young-Hie
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.609-612
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    • 2002
  • In this study, the electrical properties were investigated for the deposited Ba,Sr)(Nb,Ti)$O_3$[BSNT] thin films grown on $Pt/TiO_2/SiO_2/Si$ substrate by RF sputtering method. The structural properties of the BSNT thin films affected by the $Ar/O_2$ rates were investigated. In the case of the BSNT thin films deposited with condition of 60/40$(Ar/O_2)$ ratio, the $BaTiO_3$, $SrTiO_3$ and $BaNbO_3$ phases were showed. The composition ratio of Nb and Ti in the BSNT thin films were nearly equivalent. Also, in the BSNT thin films deposited with condition of 60/40 and 80/20$(Ar/O_2)$ ratios, the composition of Ba, Sr, Nb and Ti were relatively uniform. The Ba, Sr, Nb and Ti in the BSTN thin films were not diffused into the Pt layer.

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The Structural Properties Of the (Ba1Sr)(Nb1Ti)O3[BSNT] Thin Films with Ar/O2Ratios (Ar/O2비에 따른 (Ba1Sr)(Nb1Ti)O3[BSNT] 박막의 구조적 특성)

  • 남성필;이상철;이영희;이성갑
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.4
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    • pp.317-321
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    • 2003
  • In this study, the structural properties were Investigated for the deposited (Ba,Sr)(Nb,Ti)O$_3$[BSNT] thin films grown on Pt/TiO$_2$/SiO$_2$/Si substrate by RF sputtering method. The structural properties of the BSNT thin films affected by the Ar/02 ratios were Investigated. In the case of the BSNT thin films deposited with condition of 60/40(Ar/O$_2$) ratio, the BaTiO$_3$, SrTiO$_3$ and BaNbO$_3$ phases were showed. The composition ratio of Nb and Ti in the BSNT thin films were nearly equivalent. Also, in the BSNT thin films deposited with condition of 60/40 and 80/20(Ar/O$_2$) ratios, the composition of Ba, Sr, Nb and Ti were relatively uniform. The Ba, Sr, Nb and Ti in the BSTN thin films were not diffused into the Pt layer.

$BaTiO_3/SrTiO_3$ Heterolayered Thin/Thick films Dielectric Properties ($BaTiO_3/SrTiO_3$ 이종층 박막/후막의 유전특성)

  • Han, Sang-Wook;Kim, Ji-Heon;Park, In-Gil;Lee, Sung-Gap;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.1850-1852
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    • 2005
  • $SrTiO_3$ and $BaTiO_3$ sol-liquids and powders were prepared by the sol-gel method. $SrTiO_3/BaTiO_3$ heterolayered thin/thick films have been prepared on the $Al_2O_3$ substrates by screen printing and spin-coating method. The thin films were sintered at $750^{\circ}C$ in the air for 1 hour and the thick films sintered at $1325^{\circ}C$ in the air for 2 hours, respectively. The $SrTiO_3/BaTiO_3$ thin/thick films's structural and dielectric properties were investigated. Increasing the spin-coating times, (110), (200), (211) peaks of the $SrTiO_3$ were increased. The X-ray diffraction(XRD) patterns and SEM photographs indicated that the $SrTiO_3$ phase were formed in the surface of $BaTiO_3$ thick films. The average thickness of a $BaTiO_3$ thick films and $SrTiO_3$ thin films were $50{\mu}m$ and 400nm, respectively The dielectric constant and dielectric loss of the $SrTiO_3/BaTiO_3$ thin/thick films with $SrTiO_3$ coated 5 times were 1598 and 0.0436 at 10KHz.

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The improvement in the properties of $(Ba, Sr)TiO_3$films by the application of amorphous layer (비정질 $(Ba, Sr)TiO_3$층의 도입을 통한 $(Ba, Sr)TiO_3$박막의 특성 향상)

  • 백수현;이공수;마재평;박치선
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.2
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    • pp.221-226
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    • 1998
  • Amorphous (Ba, Sr)$TiO_3$[BST] layer(30, 70 nm) was introduced between crystalline BST and $RuO_2$electrode to realize double-layered BST structure in order to improve the properties of BST film. The structure and surface morphology of double-layered BST film were modified by the application of amorphous BST layer; that is, surface became smoother and grain size increased abruptly. Amorphous layer thicker than 30 nm was effective to hinder the influence of $RuO_2$surface on the structure of as-grown BST films by in-situ process. Dielectric constant of double-layered BST film was improved dramatically from 152 to 340 and leakage current was lowered from $1.25{\times}10^{-5}A/{\textrm}{cm}^2);to;6.85{\times}10^{-7}A/{\textrm}{cm}^2$, respectively.

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Establishment of Preparation Conditions for High-Tc Superconducting Y-Ba-Cu-O Thin Film by Chemical Vapor Deposition (화학증착법에 의한 고온 초전도 Y-Ba-Cu-O 박막의 제조 조건 확립에 관한 연구)

  • Park, Joung-Shik;Cho, Ik-Joon;Kim, Chun-Yeong;Lee, Hee-Gyoun;Won, Dong-Yeon;Shin, Hyung-Shik
    • Applied Chemistry for Engineering
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    • v.3 no.3
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    • pp.412-421
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    • 1992
  • The superconducting thin films have shown a growing possibility for practical application in microelectronic fields in recent years. In this study, the high Tc superconducting Y-Ba-Cu-O thin films were prepared on various substrates by chemical vapor deposition method using organic metal chelates of $Y(thd)_3$, $Ba(thd)_2$, and $Cu(thd)_2$ as source materials. The deposition reactions were carried out on single crystalline MgO(100), YSZ(100), $SrTiO_3(100)$, and polycrystalline $SrTiO_3$ substrates. Deposition thickness of thin films was linearly increased with the increase of deposition time. It turned out that the Y-Ba-Cu-O thin films on MgO(100), YSZ(100), and $SrTiO_3(100)$ single crystal substrates showed superconductivities above liquid nitrogen temperature($T_{c,onset}=87{\sim}89K$, $T_{c,zero}=85{\sim}86K$), but the one on polycrystalline $SrTiO_3$ substrate did not.

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The growth and structural analysis of $BaTiO_3$/Sr$TiO_3$ oxide artificial lattice by Laser Molecular Beam Epitaxy system combined Reflection High Energy Electron Diffraction (Laser Molecular Beam Epitaxy system에서 Reflection High Energy Electron Diffraction을 통한 $BaTiO_3$/Sr$TiO_3$ 산화물 인공격자의 성장과 구조적 분석)

  • 이창훈;김이준;전성진;김주호;최택집;이재찬
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.53-53
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    • 2003
  • 최근 높은 유전상수와 잔류 분극, 비선형 등의 다양한 유전적인 특성으로 인해 산화물 박막이 많은 관심을 가지고 연구되어지고 있다. 많은 산화물 박막중에서도 BaTiO3/SiTiO3 (BTO/STO) 인 공격자는 STO나 BTO 또는 (Ba$_{0.5}$ Sr$_{0.5}$)TiO$_3$ (BST)등의 고용체들과 비교했을 때 아주 뛰어난 유전적인 성질을 나타내고 있다. 특히 1000 $\AA$ 이하의 낮은 두께에서도 높은 유전상수와 비선형도를 가진다는 사실이 선행된 실험에서 밝혀졌는데 BTO와 STO를 각각 2 unit cell (8 $\AA$)로 고정 시킨 후 다층 박막으로 제작했을 때 가장 큰 유전 특성을 얻을 수 있었다. 이런 뛰어난 유전적인 성질은 BTO와 STO 각 층의 두께와 주기 변화에 따른 박막 내부의 인위적인 stress와 그에 따른 격자 변형과 아주 밀접한 관계가 있음으로 생각되어진다. 따라서 이런 두 계면에서의 stress와 격자 변형을 더욱 정착하게 분석하기 위해서는 각 층을 원자 단위로 정확하게 두께 제어를 하고 증착되어지는 과정중에서의 growth mode를 확인하는 것이 무엇보다 중요한 일이다.

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Electrical Properties of Ba0.66Sr0.34TiO3 Thin Films Fabricated by a Seed-layer Process (Seed-layer 공정을 이용한 Ba0.66Sr0.34TiO3박막의 제조 및 전기적 특성 연구)

  • 최덕영;박철호;손영국
    • Journal of the Korean Ceramic Society
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    • v.40 no.2
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    • pp.198-205
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    • 2003
  • $Ba_{0.66}Sr_{0.34}TiO_3$ thin films and seed-layers were deposited on $Pt/Ti/SiO_2/Si$substrate by R.F. magnetron sputtering method. Effects of various substrate temperature conditions on electrical properties (such as capacitance and leakage current) of BST thin films were studied. The effect of seed-layer was also studied. When seed-layer was inserted between BST and Pt, the crystallization of the BST thin films was considerably improved and the processing temperature was lowered. Compared to the pure BST thin films, dielectric constant, dielectric loss, and leakage current of BST thin films deposited on the seed-layer were considerably improved. It could be revealed that electrical properties are influenced by the substrate temperatures of BST thin films and are enhanced by the seed-layer.

Electrical Properties of ${Ba_{0.5}}{Sr_{0.5}}{TiO_3}$Thin Film with Various Heat Treatment Conditions (다양한 열처리 조건에 따른 ${Ba_{0.5}}{Sr_{0.5}}{TiO_3}$박막의 전기적 특성)

  • 손영국
    • Journal of the Korean Ceramic Society
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    • v.38 no.5
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    • pp.492-498
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    • 2001
  • Ba$_{0.5}$Sr$_{0.5}$TiO$_3$타겟을 이용 Pt/Ti/SiO/Si 기판 위에 R.F magnetron sputtering 방법으로 BST 박막을 증착하여 다양한 열처리 조건에 따른 BST 박막의 전기적 성질(정전용량, 누설전류)에 대해 박막의 결정성과 미세구조의 연관성에 대하여 연구하였다. BST 박막의 유전상수는 grain size에 영향 받으며, 열처리 온도가 증가할수록 유전상수는 증가함을 보였고 온도에 따른 누설전류는 저전압 영역에서는 Hopping conduction, 고전압 영역에서는 Schottky conduction mechanism을 따르는 것으로 나타났다.

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Microwave dielectric properties and deposition of epitaxial $BaTiO_3$ films by RF magnetron sputtering (RF 마그네트론 스퍼터링으로 증착한 epitaxial BaTiO3 박막 성장과 유전특성)

  • 현태선;조영우;최시경
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.104-104
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    • 2003
  • RF magnetron sputtering 법을 이용하여 LaA1O$_3$, SrTiO$_3$, MgO 단결정 기판 위에 BaTiO$_3$ 박막을 에피텍셜하게 증착하여 박막의 특성과 마이크로 웨이브에서의 유전특성을 평가하였다. 각 기판위에 증착한 박막의 격자상수와 FWHM을 조사하였고, pole figure로 에피텍셜 성장을 관찰하였다. 각 시편에 상부 전극으로 interdigital 타입의 전극을 photolithography 하여 캐패시턴스와 tan $\delta$을 조사하였다. 각 기판의 변화에 따른 격자상수 변화와 유전 특성의 변화를 고찰하였다.

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