• Journal of the Korean Ceramic Society
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• v.31 no.1
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• pp.17-24
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• 1994

Al2O3-ZrO2(ZTA) composites were fabricated by a surface-induced coating of the precursor for the ZrO2 phase on the kinetically stable colloid particles of Al2O3. The fabricated composites were characterized by a uniform spatial distribution of the dispersed ZrO2 phase and by the absence of large ZrO2 grains throughout the Al2O3 matrix. The fracture toughness (KIC) and the bending strength of ZTA composites sintered at 1$600^{\circ}C$, respectively, were 5.6 MPa.m1/2 (for 20 wt% ZrO2) and 600 MPa (for 15wt% ZrO2). The fraction of tetragonal ZrO2 phase decreases as the total content of ZrO2, suggesting that both the stress-induced tlongrightarrowm transformation and the microcrack nucleation contribute to the toughening of the ZTA composites fabricated by the surface-induced coating.

• Bulletin of the Korean Chemical Society
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• v.28 no.8
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• pp.1265-1272
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• 2007

A solid acid catalyst, NiSO4/CeO2-ZrO2 was prepared simply by promoting ZrO2 with CeO2 and supporting nickel sulfate on CeO2-ZrO2. The support of NiSO4 on ZrO2 shifted the phase transition of ZrO2 from amorphous to tetragonal to higher temperatures because of the interaction between NiSO4 and ZrO2. The surface area of 10-NiSO4/1-CeO2-ZrO2 promoted with CeO2 and calcined at 600 oC was very high (83 m2/g) compared to that of unpromoted 10-NiSO4/ZrO2 (45 m2/g). This high surface area of 10-NiSO4/1-CeO2-ZrO2 was due to the promoting effect of CeO2 which makes zirconia a stable tetragonal phase as confirmed by XRD. The role of CeO2 was to form a thermally stable solid solution with zirconia and consequently to give high surface area and acidity of the sample, and high thermal stability of the surface sulfate species. 10-NiSO4/1- CeO2-ZrO2 containing 1 mol% CeO2 and 10 wt% NiSO4, and calcined at 600 oC exhibited maximum catalytic activities for both reactions, 2-propanol dehydration and cumene dealkylation.

• Bulletin of the Korean Chemical Society
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• v.34 no.4
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• pp.1221-1224
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• 2013

The atomic layer deposition (ALD) of $ZrO_2$ was conducted in ultrahigh vacuum (UHV) conditions. The surface was exposed to $ZrCl_4$ and $H_2O$ in sequence and the surface species produced after each step were identified in situ with X-ray photoelectron spectroscopy (XPS). $ZrCl_4$ is molecularly adsorbed at 140 K on the $SiO_2$/Si(111) surface covered with OH groups. When the surface is heated to 300 K, $ZrCl_4$ loses two Cl atoms to produce $ZrCl_2$ species. Remaining Cl atoms of $ZrCl_2$ species can be completely removed by exposing the surface to $H_2O$ at 300 K followed by heating to 600 K. The layer-by-layer deposition of $ZrO_2$ was successfully accomplished by repeated cycles of $ZrCl_4$ dosing and $H_2O$ treatment.

• Journal of the Korean Ceramic Society
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• v.26 no.2
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• pp.210-220
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• 1989

The properties of the powder of Al2O3-15v/o ZrO2(＋3m/o Y2O3) system prepared by co-precipitation method at the pH values of 7, 9, 10 and 11 were investigated. Al2(SO4)3.18H2O, ZrOCl2.8H2O and YCl3.6H2O were used as starting materials and NH4OH as a precipitation agent. Zirconium hydroxide decreased the specific surface area of aluminum hydroxide of AlOOH type, while increased the specific surface area of aluminum hydroxide of Al(OH)3 type, and formed co-network structure of Al-O-Zr type with the aluminum hydroxides. The rate of transition to $\alpha$-Al2O3 from co-precipitated materials occurred in the order of 7≒10, 9 and 11 of pH values. Al2O3 and ZrO2 interacted to bring about coupled grain growth, and the growth of ZrO2 crystallite size rapidly occurred within $\theta$-Al2O3 matrix. Segregation did not occur in the system Al2O3-15v/o ZrO2(＋3m/o Y2O3) and Y2O3 acted as a stabilizer to ZrO2. The lattice strain of tetragonal ZrO2 was increased by the constraint effect of Al2O3 matrix.

• Bulletin of the Korean Chemical Society
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• v.32 no.5
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• pp.1483-1490
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• 2011

The protection effect of a $ZrO_2$ coating layer on a $LiCoO_2$ thin film was characterized. A wide and smooth $LiCoO_2$ thin film offers sufficient opportunity for careful observation of the reaction at the interface between cathode (coated and uncoated) and electrolyte. The formation of a $ZrO_2$ coating on a $LiCoO_2$ thin film was confirmed by secondary ion mass spectrometry. Scanning electron and atomic force microscopy were used to characterize the surface morphologies of coated and uncoated films before and after cycling. A $ZrO_2$-coated $LiCoO_2$ film showed a higher discharge capacity and rate capability than an uncoated film. This may be associated with a surface protection effect of the coating. The surface of a pristine film was damaged during cycling, whereas the coated film maintained a relatively clear surface under the same measurement conditions. This result clearly demonstrates the protection effect of a $ZrO_2$ coating on a $LiCoO_2$ thin film.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.33-35
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• 2011

Films of CrAlN and CrZrN were deposited on a steel substrate by closed field unbalanced magnetron sputtering, and their oxidation behaviors were investigated. CrAlN films consisted of dense, polycrystalline CrN and AlN fine columns. The formed oxides consisted primarily of crystalline $Cr_2O_3$ incorporated with $Al_2O_3$. The oxide layers were thin and compact so as to make CrAlN films more protective than CrN films. In case of CrZrN films, Zr atoms were dissolved in the CrN phase. Zr atoms advantageously refined the columnar structure, reduced the surface roughness, and increased the micro-hardness. However, the addition of Zr did not increased oxidation resistance, mainly because Zr was not a protective element. All the deposited films displayed relatively good oxidation resistance, owing to the formation of the highly protective $Cr_2O_3$ on their surface. The $Cr_{40}Zr_9N$ and $Cr_{31}Zr_{16}N$ films oxidized to $Cr_2O_3$ as the major phase and ${\alpha}-ZrO_2$ as the minor one, whereas the CrN film oxidized to $Cr_2O_3$.

• Applied Science and Convergence Technology
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• v.23 no.2
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• pp.90-96
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• 2014

Flexible $ZrO_2$ films as dielectric materials for high-energy-density capacitors were deposited on polyethylene terephthalate (PET) substrates by RF magnetron sputtering. The growth behavior, microstructure and electrical properties of the flexible $ZrO_2$ films were dependent on the sputtering pressure and gas ratio. Although $ZrO_2$ films were deposited at room temperature, all films showed a tetragonal crystalline structure regardless of the sputtering variables. The surface of the film became a surface with large white particles upon an increase in the $O_2/Ar$ gas ratio. The RMS roughness and crystallite size of the $ZrO_2$ films increased with an increase in the sputtering pressure. The electrical properties of the $ZrO_2$ films were affected by the microstructure and roughness. The $ZrO_2$ films exhibited a dielectric constant of 21~38 at 1 kHz and a leakage current density of $10^{-6}{\sim}10^{-5}A/cm^2$ at 300 kV/cm.

• Journal of Technologic Dentistry
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• v.27 no.1
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• pp.57-63
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• 2005

Experimental Ti-13%Zr and Ti-13%Zr-5%Cu alloys were made in an argon-arc melting furnace. The grade 2 CP Ti was used to control. To investigate the surface reaction layers produced by the reaction with mold materials and the influence of the reaction layers on the hardness of castings, A phosphate bonded $SiO_2$ base investment was used as mold material, and microstructure observation and hardness test were performed. The surface reaction layers of Ti-13%Zr and Ti-13%Zr-5%Cu alloys were thinner than that of CP Ti had a clearly multiple structure. A difference of the hardness between surface and inner of the Ti-13%Zr and Ti-13%Zr-5%Cu alloys became less than that of CP Ti. From the results, it was found that the Ti-Zr-(Cu) based alloys were possible to cast with $SiO_2$ base investment without the great changes of mechanical properties of the castings.

• Bulletin of the Korean Chemical Society
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• v.28 no.9
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• pp.1463-1466
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• 2007

Single phases of multi-component oxides films, ZrTiO4 and Ta2Zr6O17, could be synthesized by using the combinatorial approach through surface sol-gel route, coating the appropriate mole ratio of 100 mM zirconium butoxide, tantalum butoxide and titanium butoxide precursors on Pt/Ti/SiO2/Si (100) substrate, following pyrolysis at 450 oC, and annealing them at 770 oC. Both the films and bulks of ZrTiO4 and Ta2Zr6O17 showed very stable dielectric properties in temperature range, ?140 to 60 oC, and frequency range, 100 Hz to 1 MHz, promising their applications in wide range of temperatures and frequencies. The dielectric constants of the films were lower and a little more dependent on frequency than those of the bulks. The reduction of dielectric property in the film was mainly due to the interfacial effects that worked as series and parallel-connected capacitances toward the substantial film capacitance.

• Korean Journal of Materials Research
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• v.12 no.3
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• pp.220-224
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• 2002

The oxide scales formed on $Ni_3Al$-7.8%Cr-1.3%Zr-0.8%Mo-0.025%B after oxidation at 900, 1000 and 110$0^{\circ}C$ in air were studied using XRD, SEM, EPMA and TEM. The oxide scales consisted primarily of $NiO,\; NiAl_2O_4,\;{\alpha}-Al_2O_3,\; monoclinic-ZrO_2,\; and \;tetragonal-ZrO_2$. The outer layer of the oxide scale was rich in Ni-oxides, whereas the internal oxide stringers were rich in Al-oxides and $ZrO_2$. Within the above oxide scales, Cr and Mo tended to exist as dissolved ions.