• Title/Summary/Keyword: $YBa_2Cu_3O_{7-{\delta}}$(YBCO) film

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Effects of composition of preannealed Y-Ba-Cu-0 thin films deposited by sputtering on the superconducting properties and microstructure of post-annealed thin films (스퍼터링 증착된 Y-Ba-Cu-O계 박막의 열처리 전 조성이 열처리 후 박막의 초전도특성 및 미세구조에 미치는 영향)

  • Cho, Hae-Seok;Kim, Hyeong-Jun
    • Korean Journal of Materials Research
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    • v.1 no.1
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    • pp.54-61
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    • 1991
  • YBCO films deposited on MgO(100) and Si(100) by rf-magnetron sputtering using stoichiometric single target were annealed under oxygen atmosphere at $880^{\circ}C$ for 1 hr. The microstructure and superconducting properties of YBCO thin films depended on the composition of pre-annealed thin films. Basal planesuperconducting particles grown on MgO(100) substrate had small and rod-like shade due to preferred orientation, while superconducting film grown on the basal plane-superconducting particles showed round-shape particles. If pre-annealed thin film had nonstoichiometric composition, liquid phase was formed during the heat treatment, which made it easy for particles to grow in the preferred orientation and thus to form textured structure. But the thin films with the textured structure did not show good superconducting properties, especially $T_c$, since the liquid phase transformed into second phase in the grain boundary during the cooling. The effect of the second phase on $T_{c, \;zero}$ was greater than that on $T_{c, \;on}$.

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Analysis of the Critical Characteristics in the Superconducting Strip Lines by ICP Etching System (ICP 식각 시스템에 의한 초전도 스트립 라인의 임계 특성 분석)

  • 고석철;강형곤;최효상;양성채;한병성
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.7
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    • pp.782-787
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    • 2004
  • Superconducting flux flow transistor (SFFT) is based on a control of the Abrikosov vortex flowing along a channel. The induced voltage by moving of the Abrikosov vortex in an SFFT is greatly affected by the thickness, the width, and the length of channel. In order to fabricate a reproducible channel in the SFFT, we studied the variation of the critical characteristics of ${YBa}_2{Cu}_3{O}_7-\delta(YBCO)$ thin films with the etching time using ICP (Inductively coupled plasma) system. From the simulation, it was certified that the vortex velocity was increased in a low pinning energy at channel width 0,5 mm. The surfaces of YBCO thin film were etched by ICP etching system. We observed the etched channel surfaces by AFM (Atomic Force Microscope) and measured the critical current density with etching time. As a measured results, the etching thickness of channel should be optimized to fabricated a flux flow transistor with specified characteristics.

Non-invasive Measurements of the Thickness of YBCO Thin Films by Using Microwave Resonators: Roles of the Uncertainty in the Calibration Film Thickness (마이크로파 공진기를 이용한 YBCO 박막 두께의 비파괴적 측정: 캘리브레이션 박막 두께의 불확도의 역할)

  • Kim, Myung-Su;Jung, Ho-Sang;Yang, Woo-Il;Lee, Sang-Young
    • Progress in Superconductivity
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    • v.14 no.1
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    • pp.45-51
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    • 2012
  • Microwave metrology for the thickness of metallic or superconductive films provides a new way to measure the film thickness in a non-invasive way by using microwave resonators, with the measurement accuracy affected by standard uncertainties in the resonator quality factor, temperature-dependent resonant frequency and the dimensions of the resonators. Here we study effects of the standard uncertainty in the thickness, $t_{cal}$, of a calibration $YBa_2Cu_3O_{7-{\delta}}$ (YBCO) film on the measured thicknesses, $t_{RF}$, by using a ~ 40 GHz microwave resonator. For the study, we used five YBCO films having the thicknesses of 70 - 360 nm, for which relative standard uncertainties in $t_{RF}$ due to that in $t_{cal}$ are obtained. The standard uncertainty in $t_{cal}$ was determined with the surface roughness of the film taken into account. It appeared that relative standard uncertainty in $t_{cal}$ significantly affects the $t_{RF}$ values, with the values of 1% (5%) in the former resulting in those of 1-2% (5-9%) for the latter at 10 K. Our results show that, for realizing relative standard uncertainties less than 5% in $t_{RF}$ for all the YBCO films, the surface roughness of the calibration films should be small enough to realize a relative standard uncertainty of less than 2.7% in $t_{cal}$.

Manufacturing of YBCO coated conductor deposited on RABiTS by pulsed laser deposition method (RABiTS 위에 PLD 방법으로 증착된 YBCO 초전도 박막 선재의 제조)

  • Ko Rock-Kil;Shi Dongqi;Chung Jun-Ki;Ha Hong-Soo;Kim Ho-Soup;Song Kyu-Jeong;Park Chan;Moon Seung-Hyun;Yoo Sang Im;Kim Young-Cheol
    • Progress in Superconductivity
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    • v.6 no.1
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    • pp.74-78
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    • 2004
  • YBCO coated conductor is one of the most promising materials as a new generations wire especially for practical power applications. In this work, $YBa_2$$Cu_3$$O_{7}$ -$\delta$/(YBCO) coated conductors (CC) were deposited by pulsed laser deposition (PLD) from buffer layers to superconducting layer on hi-axially textured metal tape. The oxide multilayer buffered substrate of architectures of $CeO_2$/$YSZ/Y_2$$O_3$ was fabricated by PLD at steady status. Then YBCO layer was deposited on RABiTS substrate by stationary and reel-to-reel (R2R) continuous process and we compared with deposition conditions of both processes. The degree of texture of each layer was investigated using X-ray diffraction including $\theta$-2$\theta$ scans, $\omega$-scans and $\Phi$-scans analysis. Their surface morphology was observed by scanning electron microscopy (SEM). The FWHM of the X-ray $\Phi$-scans and $\Phi$-scans indicated that YBCO and buffer layers closely replicate the in-plane and out-of-plane texture of metal tape. Critical current (Ic) at 77 K, self-field of 75.8 A/cm-width, critical temperature (Tc) of 85 K, and critical current density (Ic) of 3.7 MA/$\textrm{cm}^2$ were measured from coated conductor deposited by stationary process. And coated conductor deposited by R2R continuous process had Ic of 57.5 A/cm-width, Tc of 86.5 K and Jc of 2.0 MA/$\textrm{cm}^2$. The film also exhibits a homogeneous and dense surface morphology.

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