• Electrical & Electronic Materials
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• v.10 no.1
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• pp.8-14
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• 1997

The UV/O$_{3}$ dry cleaning has been well known in removing organic molecules. The UV/O$_{3}$ dry cleaning method was performed to clean the Si wafer surfaces and contact holes contaminated by organic molecules such as residual PR. During the cleaning process, the Si surfaces were analyzed with X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and ellipsometer. When the UV/O$_{3}$ dry cleaning at 200'C was performed for 3 minutes, the residual photoresist was almost removed on Si wafer surfaces, but Si surfaces were oxidized. For UV/O$_{3}$ application of contact hole cleaning, the contact string were formed using the equipment of ISRC (Inter-university Semiconductor Research Center). Before Al deposition, UV/O$_{3}$ (at 200.deg. C) dry cleaning was performed for 3 minutes. After metal annealing, the specific contact resistivity was measured. Because UV/O$_{3}$ dry cleaning removed organic contaminants in contact holes, the specific contact resistivity decreased. Each contact hole size was different, but the specific contact resistivities were all much the same. Thus, it is expected that the UV/O$_{3}$ dry cleaning method will be useful method of removal of the organic contaminants at smaller contact hole cleaning.

• Journal of Korean Society on Water Environment
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• v.32 no.1
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• pp.23-29
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• 2016

Ozonation was investigated for its ability to remove pyruvic acid in a laboratory-scale batch reactor under various experimental conditions, including UV irradiation, TiO₂ addition, and variations in temperature. An ozone flow rate of 1.0 L min^-1 and a concentration of 75±5 mg L^-1 were maintained throughout the experiment, and pH, COD, and TOC were measured at 10 min intervals during a 60 min reaction. Our results confirmed that the combination of UV irradiation and photocatalytic TiO₂ in the ozonation reaction improved the removal efficiency of both COD and TOC in aqueous solution at 20℃. Pseudo first-order rate constants and activation energies were quantified based on the COD and TOC measurements. We observed that the O₃/UV, O₃/UV/TiO₂ system increased mineralization and reduced the activation energy (E_a) necessary for pyruvic acid decomposition.

• Journal of the Korean Ceramic Society
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• v.39 no.8
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• pp.750-757
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• 2002

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$ thin films have been prepared by spin coating method using photosensitive sol solution. Strontium ethoxide, tertramethylheptanedionato bismuth and tantalum ethoxide were used as starting materials. As UV exposure time to the SBT thin film increased, the UV absorption peak intensity of metal ${\beta}$-diketonate decreased due to reduced solubility by M-O-M bond formation. Solubility difference by UV irradiation on SBT thin film allows to obtain a fine patterning of thin film. Also, The ferroelectric properties of the UV irradiated SBT thin films were superior to those of the no-UV irradiated films.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.240-240
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• 2010

In this paper, in these case of photoelectrode using UV treatment after oxygen solar conversion efficiency is increased. According to oxygen injection UV treatment will removal residual organics and increase the TiO2 surface area but also UV treatment can affect the same chemical action of ozone treatment. More porous networks and larger porosities were obtained in the TiO2 films prepared UV treatment after oxygen injection.

• Journal of Industrial Technology
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• v.27 no.A
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• pp.15-18
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• 2007

This study investigated disinfection effect by general water purifier and water purifier with UV light disinfection. The results are as follows : (i) The general bacteria existed plentifully in a storage tank before treatment (ii) Water treated in water purifier did not meet the water treatment regulation standard since the presence of bacteria, whereas with UV light application the regulation standard is totally satisfied. (iii) Photocatalytic disinfection process with UV light in the presence of $TiO_2$ more effectively killed general bacteria than UV light only.

• Journal of IKEEE
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• v.22 no.1
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• pp.1-5
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• 2018

In this research, sol-gel processed CuO p-type thin film transistors were fabricated with copper (II) acetate monohydrate precursors. After $500^{\circ}C$ annealing process, the deposited thin films were fully converted into CuO. We investigated $UV/O_3$ process time effect on electrical characteristics of sol-gel processed CuO thin film transistors. After 600 sec $UV/O_3$ process, the fabricated CuO thin film transistor delivered field effect mobility in saturation regime of $5{\times}10^{-3}\;cm^2/V{\cdot}s$ and on/off current ratio of ${\sim}10^2$.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.24 no.10
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• pp.1306-1311
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• 2020

In this study, we proposed an anti-reflective nano-structure to improve the photoresponsivity of AlGaN UV photodiode that can be used as a receiver in a solar blind UV optical communication system. The anti-reflective nano-structure was fabricated by forming Ni nano-clusters on SiO2 film followed by etching the underneath SiO2 film. A sample with the anti-reflective nano-structure exhibited lower surface reflection along with less dependency on the wavelength in comparison with a sample without the nano-structure. Finally, a UV photodiode was fabricated by applying an anti-reflective structure produced by heat-treating a 2 nm-thick Ni layer. The photodiode fabricated with the proposed nano-structure exhibited noticeable improvement in the photoresponsivity at the wavelength range from 240 nm to 270 nm in comparison with the same photodiode with a SiO2 film without the nano-structure.

• Journal of Korean Society of Water and Wastewater
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• v.18 no.3
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• pp.377-384
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• 2004

In the present study, a feasibility of an advanced oxidation process using UV/Hydrogen peroxide($H_2O_2$) system equipped with a medium pressure lamp for secondary effluent reclamation was investigated. Initial concentration of $H_2O_2$ and pH were changed to determine the optimum operation condition for the system. The removal efficiency of color was than 80% with 14.3mg/L of initial $H_2O_2$ and 5 minute of contact time in the UV/$H_2O_2$ system. The color removal was analyzed using first-order reaction equation. The dependence of rate constant (k) on initial $H_2O_2$ represented the rational relationship with maximum value. Residual $H_2O_2$ caused increase of effluent COD, since analyzing agent, dichromate, reacted with $H_2O_2$ in the sample. Therefore, excess initial concentration of $H_2O_2$ would significantly affect effluent COD measurement. At pH variation experiment, both residual $H_2O_2$ and color showed peak in the neutral pH range with the same pattern. Effect of $H_2O_2$ dose also enhanced color removal but raised residual $H_2O_2$ problem in the continuous operation UV system. In conclusion, these results indicated that medium pressure UV/$H_2O_2$ system could be used to control color in the secondary effluent for reclamation and reuse.

• Analytical Science and Technology
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• v.16 no.4
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• pp.292-298
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• 2003

In this study, the photooxidation and ozonation of humic acid (HA) in aqueous solution were conducted and the treated HA samples at different reaction time were analyzed using ultrafiltration techniques to evaluate the change of their molecular size distributions with its DOC removal. Molecular size distribution of untreated HA showed 41.5% in higher molecular size fractions (>30,000 daltons) and 15.2% in much smaller molecular size fraction (<500 daltons). As UV irradiation time was increased, it was observed that the degradation of the large molecules of the fraction of >30,000 daltons into much smaller molecules was increased. In UV system, the HA molecules of the fraction of <500 daltons became significantly more and its percentage was increased from 35.3% (UV only irradiation) to 58.9% ($UV/TiO_2$) and 87.8% ($UV/H_2O_2$) in the presence of the photocatalysis. Otherwise, ozonation of HA produced mainly the fraction of medium molecular size ranging from 3,000 to 30,000 daltons with much lower portion (<~7%) in the fraction of <500 daltons. In ozone only system, the fraction of 30,000~10,000 daltons occupied in 41.5% at 60 min of ozonation time. In $O_3/H_2O_2$ system, the fraction of 30,000~10,000 daltons and 10,000~3,000 daltons occupied in 38.9% and 36.2% respectively. Based on these results, we suggested applicable treatment process which could be combined with $UV/H_2O_2$, $UV/TiO_2$ and $O_3$, $O_3/H_2O_2$ system for more effective removal of humic acid in water treatment.

• Journal of the Korean GEO-environmental Society
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• v.7 no.3
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• pp.21-29
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• 2006

The treatment performance of ozonation and three types of advanced oxidation processes (AOPs) such as $O_3/H_2O_2$, $O_3/UV$, $O_3/H_2O_2/UV$ was experimentally investigated for the treatment of refractory synthetic dye wastewater. The removal efficiency of $COD_{cr}$, color and biodegradability ($BOD_5/COD_{cr}$) were relatively evaluated in each treatment unit with simulated dye wastewater. Optimal operational conditions of pH, temperature, dosage and circulation flow rate were also investigated. All suggested processes revealed an effectiveness for the removal of color within a short operational time, moreover, $O_3/H_2O_2/UV$ process showed the highest $COD_{cr}$ removal and biodegradability enhancement among proposed oxidation process.