• 제목/요약/키워드: $UV/O_2$

검색결과 2,201건 처리시간 0.036초

EVALUATION OF IN VITRO SKIN PERMEATION OF UV FILTERS

  • Song, Young-Sook;Kim, Hyo-Joong;Lee, Cheon-Koo;Cho, Wan-Goo;Kang, She-Hoon
    • 대한화장품학회지
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    • 제24권3호
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    • pp.38-44
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    • 1998
  • The skin permeation and the skin primary irritation of two UV filters from caprylic capryl triglyceride (oil), oil in water (O/W) and water in oil (W/O) emulsions, were evaluated. We selected octyl moth-oxycinnamate (OMC) broadly used in cosmetics and polymeric sunscreen agent (PSA, average MW: 2,000) synthesized by the coupling reaction of 2-ethylhexyl 4-hydroxycinnamate with poly vinylbenzyl chloride, as model UV filters. For in vitro skin permeation experiments, Franz diffusion cells (effective diffusion area:1.766cm) and the excised skin of female hairless mouse aged 8 weeks were used. Oil or emulsion containing UV filters was applied in the donor compartment. The skin primary irritation was evaluated with fe-male guinea pigs (8-10 weeks,350-400 g). In oil and emulsions, the skin permeability and the skin primary irritation of PSA were lower than those of OMC. The skin permeability of UV filters was lower when they were in oil-in-water emulsion (OIW) than water-in-oil emulsion (W/O). We suggest that O/W system would be more useful when compared with W/O system, and PSA could be a good candidate for a future sunscreen agent for reducing the skin irritation.

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Fabrication of Organic-Inorganic Superlattice Films Toward Potential Use For Gas Diffusion Barrier

  • 윤관혁;;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.394-394
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    • 2012
  • We fabricated organic-inorganic superlattice films using molecular layer deposition (MLD) and atomic layer deposition (ALD). The MLD is a gas phase process in the vacuum like to atomic layer deposition (ALD) and also relies on a self-terminating surface reaction of organic precursor which results in the formation of a monolayer in each sequence. In the MLD process, 'Alucone' is very famous organic thin film fabricated using MLD. Alucone layers were grown by repeated sequential surface reactions of trimethylaluminum and ethylene glycol at substrate temperature of $80^{\circ}C$. In addition, we developed UV-assisted $Al_2O_3$ with gas diffusion barrier property better than typical $Al_2O_3$. The UV light was very effective to obtain defect-free, high quality $Al_2O_3$ thin film which is determined by water vapor transmission rate (WVTR). Ellipsometry analysis showed a self-limiting surface reaction process and linear growth of each organic, inorganic film. Composition of the organic films was confirmed by infrared (IR) spectroscopy. Ultra-violet (UV) spectroscopy was employed to measure transparency of the organic-inorganic superlattice films. WVTR is calculated by Ca test. Organic-inorganic superlattice films using UV-assisted $Al_2O_3$ and alucone have possible use in gas diffusion barrier for OLED.

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p형 반전층을 갖는 ZnO계 자외선 수광소자의 제작과 전기적.광학적 특성 분석 (Analysis on the Electrical.Optical Properties and Fabrication of ZnO Based UV Photodetector with p-type Inversion Layer)

  • 오상현;김덕규;최대섭;박훈배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.367-368
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    • 2007
  • To investigate the 2nO thin films which are interested in the next generation of short wavelength LEDs and Lasers and UV photodetector with p-type inversion layer, the ZnO thin films were deposited by RF sputtering system. Gas ratios and work pressure is Ar : $O_2$ = 4 : 1 and 15 mTorr, respectively, and the purity of ZnO target is 5N. The ZnO thin films were deposited at 300, 450, and $650^{\circ}C$. The current-voltage, responsivity and quantum efficiency of devices were studied and compared with each devices.

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UV/H2O2 고도산화기술을 이용한 수중 잔류의약물질 제거 (Degradation of residual pharmaceuticals in water by UV/H2O2 advanced oxidation process)

  • 박진영;서상원;조익환;전용성;하현섭;황태문
    • 상하수도학회지
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    • 제33권6호
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    • pp.469-480
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    • 2019
  • This study was conducted to evaluate the degradation and mineralization of PPCPs (Pharmaceuticals and Personal Care Products) using a CBD(Collimated Beam Device) of UV/H2O2 advanced oxidation process. The decomposition rate of each substance was regarded as the first reaction rate to the ultraviolet irradiation dose. The decomposition rate constants for PPCPs were determined by the concentration of hydrogen peroxide and ultraviolet irradiation intensity. If the decomposition rate constant is large, the PPCPs concentration decreases rapidly. According to the decomposition rate constant, chlortetracycline and sulfamethoxazole are expected to be sufficiently removed by UV irradiation only without the addition of hydrogen peroxide. In the case of carbamazepine, however, very high UV dose was required in the absence of hydrogen peroxide. Other PPCPs required an appropriate concentration of hydrogen peroxide and ultraviolet irradiation intensity. The UV dose required to remove 90% of each PPCPs using the degradation rate constant can be calculated according to the concentration of hydrogen peroxide in each sample. Using this reaction rate, the optimum UV dose and hydrogen peroxide concentration for achieving the target removal rate can be obtained by the target PPCPs and water properties. It can be a necessary data to establish design and operating conditions such as UV lamp type, quantity and hydrogen peroxide concentration depending on the residence time for the most economical operation.

The Influence of Surface Modification of Gold Nanoparticles Supported on TiO2 in the Catalytic Activity of CO Oxidation

  • Park, Da-Hee;Reddy, A.S.;Eah, Sang-Kee;Park, Jeong-Young
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.213-213
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    • 2011
  • Gold catalysts supported on TiO2 have shown a unique catalytic behavior on CO oxidation, depending on surface effects. Particle size has an influence on the surface activity. To make monodisperse Au nanoparticles, organic capping ligands, such as alkylthiols, were used by a "greener" synthesis method [1,2] and Au nanoparticles were deposited on TiO2. However, organic capping ligands must be removed for high catalytic activities by the Au nanoparticles without changing the Au size [3]. We used UV ozone treatment to decompose thiol ligands. The samples have been characterized by X-ray photoelectron spectroscopy to examine the surface modification by UV ozone treatment. We show the size distribution of the gold nanoparticles by light scattering analysis and transmission electron microscopy. Au/TiO2 have been prepared using the wetness impregnation method. The catalytic performance of CO oxidation over Au supported on TiO2 under oxidizing reaction conditions (40 Torr CO and 100 Torr O2) were tested. The results show that the catalytic activity depends on particle size and the time of UV ozone exposure, which suggests the role of sulfur bonding in determining the catalytic activity of Au/TiO2 catalysts.

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고도산화공정을 이용한 고농도 무전해 니켈도금 폐액 처리방안 연구 (A Study on the Highly Effective Treatment of Spent Electroless Nickel Plating Solution by an Advanced Oxidation Process)

  • 서민혜;조성수;이수영;김진호;강용호;엄성현
    • 공업화학
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    • 제26권3호
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    • pp.270-274
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    • 2015
  • 본 연구에서는 고농도 무전해 니켈도금 폐액을 처리하기 위한 고도산화공정 기술을 개발하였다. 추출, 농축 공정을 이용한 니켈 금속 회수보다는 폐수를 방류수 수준으로 처리할 수 있는 기술 개발을 위하여 차아인산염과 아인산염을 침전이 용이한 인산염으로 효과적으로 전환시킬 수 있는 공정 개발에 초점을 맞추었다. 광화학적 방법인 $UV/H_2O_2$ 방식을 채택하여 COD, $PO_4-P$ 변화 효율 및 과산화수소의 소모량을 분석함으로써 고농도 무전해 니켈도금 폐액의 고도산화처리 특성을 평가하였다. 특히, $UV/H_2O_2/O_3$ 방식으로 오존산화법을 추가함으로써 과산화수소 사용량을 30% 가량 절감하고 처리시간을 약 6 h 단축시킬 수 있었다.

Optically transparent and electrically conductive indium-tin-oxide nanowires for transparent photodetectors

  • Kim, Hyunki;Park, Wanghee;Ban, Dongkyun;Kim, Hong-Sik;Patel, Malkeshkumar;Yadav, Pankaj;Kim, Joondong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.390.2-390.2
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    • 2016
  • Single crystalline indium-tin-oxide (ITO) nanowires (NWs) were grown by sputtering method. A thin Ni film of 5 nm was coated before ITO sputtering. Thermal treatment forms Ni nanoparticles, which act as templates to diffuse Ni into the sputtered ITO layer to grow single crystalline ITO NWs. Highly optical transparent photoelectric devices were realized by using a transparent metal-oxide semiconductor heterojunction by combining of p-type NiO and n-type ZnO. A functional template of ITO nanowires was applied to this transparent heterojunction device to enlarge the light-reactive surface. The ITO NWs/n-ZnO/p-NiO heterojunction device provided a significant high rectification ratio of 275 with a considerably low reverse saturation current of 0.2 nA. The optical transparency was about 80% for visible wavelengths, however showed an excellent blocking UV light. The nanostructured transparent heterojunction devices were applied for UV photodetectors to show ultra fast photoresponses with a rise time of 8.3 mS and a fall time of 20 ms, respectively. We suggest this transparent and super-performing UV responser can practically applied in transparent electronics and smart window applications.

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Photocatalytic Degradation of Methyl tert-Butyl Ether (MTBE): A review

  • Seddigi, Zaki S.;Ahmed, Saleh A.;Ansari, Shahid P.;Yarkandi, Naeema H.;Danish, Ekram;Oteef, Mohammed D.Y.;Cohelan, M.;Ahmed, Shakeel;Abulkibash, Abdallah M.
    • Advances in environmental research
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    • 제3권1호
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    • pp.11-28
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    • 2014
  • Advanced oxidation processes using UV and catalysts like $TiO_2$ and ZnO have been recently applied for the photocatalytic degradation of MTBE in water. Attempts have been made to replace the UV radiation by the solar spectrum. This review intends to shed more light on the work that has been done so far in this area of research. The information provided will help in crystallizing the ideas required to shift the trend from UV photocatalysis to sunlight photocatalysis. The careful optimization of the reaction parameters and the type of the dopant employed are greatly responsible for any enhancement in the degradation process. The advantage of shifting from UV photocatalysts to visible light photocatalysts can be observed when catalysts like $TiO_2$ and ZnO are doped with suitable metals. Therefore, it is expected that in the near future, the visible light photocatalysis will be the main technique applied for the remediation of water contaminated with MTBE.

UV 나노임프린트 리소그래피의 Quartz 기판상의 Resin mold 제거를 위한 Hybrid 세정공정에 관한 연구

  • 조윤식;김민수;강봉균;김재관;이병규;박진구
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.81.1-81.1
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    • 2012
  • 나노임프린트 리소그라피(Nano-Imprint Lithography, NIL) 기술은 기판위의 resin을 나노구조물이 각인된 스탬프로 눌러서 나노구조물을 형성하는 기술로, 경제적이고 효과적으로 나노구조물을 제작할 수 있는 기술이다. 그중에서도 UV 기반의 나노임프린트(UV-NIL) 기술은 resin을 투명한 스탬프로 누른뒤 UV로 경화시켜 나노구조물을 형성하는 기술로써 고온, 고압($140{\sim}180^{\circ}C$, 10~30bar)이 필요한 가열식 나노임프린트 기술에 비해 상온, 상압($20^{\circ}C$, 1bar)에서도 구조물 형성이 가능하여 다층구조 형성에 적합하다. 연속적인 임프린팅 공정에 의해 resin이 quarz 스탬프에 잔류하여 패터닝에 결함을 유발하게 되므로 오염물을 제거하기 위한 세정공정이 필요하다. 하지만 UV에 의해 경화된 resin은 cross-linking을 형성하여 화학적인 내성이 증가하게 되므로 제거하기가 어렵다. 현재는 resin 제거를 위한 세정공정으로 SPM($H_2SO_4/H_2O_2$) 세정이 사용되고 있는데 세정시간이 길고 세정 후에 입자 또는 황 잔유물이 남으며 많은 유해용액 사용의 문제점이 있어 효과적으로 resin을 제거할 세정공정이 필요한 상황이다. 본 연구에서는 친환경적인 UV 세정 및 오존수 세정공정을 적용하여 경화된 resin을 제거하는 연구를 진행하였다. 실험샘플은 약 100nm 두께의 resin을 증착한 $1.5cm{\times}1.5cm$ $SiO_2$ 쿠폰 wafer를 사용하였으며, UV 및 오존수의 처리시간을 달리하여 resin 제거효율을 평가하였다. ATR-FTIR 장비를 사용하여 시간에 따른 resin의 두께를 측정한 결과, UV 세정으로 100nm 높이의 resin중에 80nm의 bulk resin이 단시간에 제거가 되었고 나머지 20nm의 resin thin film은 오존수 세정으로 쉽게 제거되는 것을 확인 하였다. 또한 표면에 남은 resin residue와 particle을 제거하기 위해서 SC-1 세정을 진행하였고 contact angle과 optical microscope 장비를 사용하여 resin이 모두 제거된 것을 확인하였다.

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나노 구조의 패턴을 갖는 n-type GaN 기판을 이용한 380 nm UV-LED의 광 추출 효율 개선 (Improvement in Light Extraction Efficiency of 380 nm UV-LED Using Nano-patterned n-type Gan Substrate)

  • 백광선;조민성;이영곤;;송영호;김승환;김재관;전성란;이준기
    • 한국재료학회지
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    • 제21권5호
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    • pp.273-276
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    • 2011
  • Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.