Thermodynamic consideration to atomic layer deposition of $Ti_{0.83}Al_{0.17}N$ thin films from $AlCl_3$ and $TiCl_4$ Precursors
($AlCl_3$ 와 $TiCl_4$ 전구체로부터 형성된 $Ti_{0.83}Al_{0.17}N$ 원자층 증착 박막의 열역학적인 고려)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2002.11a
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- pp.76-76
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- 2002