• 한국세라믹학회지
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• 제25권6호
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• pp.671-676
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• 1988

Preparation of high purity ultrafine Ba2Ti9O20 powder was investigated by coprecipitation method. Formation of Ba2Ti9O20 powder from precipitate of coprecipitation takes place at 120$0^{\circ}C$, which is 20$0^{\circ}C$ lower than that from mechanical mixtures of BaCO3 and TiO2. This is apparently due to the nature of the compounds formed by the reaction of mixtures of aqueous solutions of BaCl2 and TiCl4 with an ammoniacal solution of ammonium carbonate and ammouium hydroxide. In this method, the Ba2Ti9O20 powders show low callcining and sintering temperature and it has good sintering and dielectric constant at room temperature.

• 한국표면공학회지
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• 제25권5호
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• pp.215-221
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• 1992

This research is aimed at developing(110) preferred TiS2 cathode films and glass typed solid electro-lytes which have high ionic migrations and low electron conductivities for thin secondary solid batteries. To obtain preferred oriented TiS2 thin films on a substrate by CVD method using TiCl4 and H2S gases three factors of heating temperature, inner pressure of furnace and TiCl4/H2S gas mole fraction were ex-amined systematically. To obtain solid films of Li2O-B2O3-SiO2 electrolytes by r.f. sputtering for thin proto-type batteries of Li/Li2O-B2O3-SiO2TiS2, sputtering conditions were examined. TiS2 cathode films showed columnar structure, namely c axis oriented parallely. At low pressure of reaction chamber and low heating temperature, surface of smooth TiS2 films couldd be obtained. Ionic conductivity of Li2O-B2O3-SiO2 films manufactured by r.f. magnetron sputtering were 3$\times$10-7$\Omega$-1cm-1 and electron conductivities were 10-11$\Omega$-1cm-1. Open cell voltage of thin lithium batteries were 2.32V with a designed prototype cell.

• 한국수소및신에너지학회논문집
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• 제13권1호
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• pp.34-41
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• 2002

CdS and $TiO_2$ nanoparticles were made by the precipitation method and sol-gel method, respectively, and they were mixed mechanically and then treated with the hydrothermal processing. CdS-$TiO_2$ composite particulate films were thus prepared by casting CdS-$TiO_2$ mixed sol onto $SnO_2$ conducting glass and a subsequent heat-treatment at $400^{\circ}C$. Again, the physico-chemical and photoelectrochemical properties of these films were controlled by the surface treatment with $TiCl_4$ aqueous solution. The photocurrents and the hydrogen production rates measured under the present experimental conditions varied in the range of $3.5{\sim}4.5mA/cm^2$ and $0.3{\sim}1.8cc/cm^2$-hr, respectively, and showed the maximum values at the $CdS/[CdS+TiO_2]$ mole ratio of 0.2. Also, the surface treatment with $TiCl_4$ aqueous solution caused a considerable improvement in the photocatalytic activity, Probably as a result of close contacts between the primary particles by the etching effect of $TiCl_4$ It was found that the photoelectrochemical performance of these particulate films could be effectively enhanced by this approach.

• 청정기술
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• 제6권2호
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• pp.107-111
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• 2000

$TiO_2$를 광촉매로 사용한 벤젠의 광촉매분해반응에서 근자외선과 가시광 또는 원자외선을 조사하였을 때, 수용액속에 공존하는 음이온들에 의한 영향을 확인해 보았다. 근자외선과 가시광을 조사하였을 때, 광증감제로 작용할 수 있는 $S_2O{_8}^{2-}$ 또는 $NO{_3}^-$가 $TiO_2$와 공존하는 경우에는 $TiO_2$만 사용하였을 때에 비해 벤젠의 분해효율이 약간 증가되었으나 $NO{_2}^-$ 또는 $Cl^-$의 경우에는 이들 이온에 의한 활성화학종의 생성이 억제되어 벤젠의 광분해효율이 크게 감소되었다. 반면에 자외선을 조사하였을 때에는 $S_2O{_8}^{2-}$ 또는 $NO{_3}^-$가 공존하는 경우에는 이들 이온에 의한 활발한 광증감작용으로 벤젠의 광분해효율이 크게 증가되었으며, $NO{_2}^-$과 $Cl^-$이 공존할 때에는 벤젠의 광분해효율이 약간 감소되었는데 근자외선과 가시광을 조사하였을 때와는 달리 그 감소폭이 그다지 커지지 않았다.

• 대한화학회지
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• 제4권1호
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• pp.15-17
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• 1957

1. Preparation of Titanium tetrachloride; The following precesses were strictly followed as the preliminary step to obtain pure $TiOCl_2$, titanyl chloride; First, pure Titanium Oxide mixed with carbon is rolled into pills. After drying up perfectly, these pills are heated at 900∼1000${\circ}C$. And then the pills are subjected to the flow of $Cl_2$ gas in a quartz tube heated to 900-1000${\circ}C$. Thus Titanium tetrachloride is obtained. 2. Preparation of $TiOCl_2$ ; Yellowish trobrown solution is made by pouring 80 g of conc. HCl (sp.gr. 1.19) to 45 gr of Titanium tetrachloride (approx. 2 times of theoretical amount). Then this solution is kept settled for 5-days in a desiccator filled with phosphorous pentoxide at room temperature. As the colorless amorphous solid thus obtained is washed with aceton, 36.5 g of the pure salt are obtained. 3. Determination of composition. The analysis of the sample taken from the deposit desiccated gives the following data; (A) Qualitative analysis; a) $Ti(OH)_4$ is precipitated by adding NaOH in water solution of the salt. b) Adding $AgNO_3$ solution, the water solution of the salt gives white precipitate of AgCl. c) When acid and $H_2O_2$ are added, the solution turns its color to redish brown (This proves that $TiO^{++}$ was converted into $TiO^{++}$ by oxidation of $H_2O_2$. (B) Quantitative analysis; a) $Ti(OH)_4$ precipitated by $10{\%}$ NaOH isalitatsubjected consecutively to the filtration and ignition in porcelain crucible at approx. 1000${\circ}C$. , then $TiO_2$ thus formed is weighed and calculated into Ti content. b) Chlorine involved in water solution of the salt is determined by Vorhardt method. Result: The values obtained from previous analysis, devied by their atomic weight gives the following composition: Ti : Cl = 1 : 2 Therefore $TiOCl_2$ should be given as its molecular formula. 4. Summary. When $TiCl_4$ is additated into conc. HCl, $TiO^{++}$ formed exists as a stable form, and forms $TiOCl_2$. However $TiOCl_2$ is unstable to heating. When the temperature is raised to $65{\circ}C$the decomposition of the solution is accelerated, and gives $TiO_2$ aq. $TiOCl_2$ in addition is highly hygroscopic.

• 한국표면공학회지
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• 제38권2호
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• pp.60-64
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• 2005

The ICP-CVD (inductively coupled plasma chemical vapor deposition) process was applied to the deposition of $TiB_2$ films. For plasma generation, 13.56 MHz r.f. power was supplied to 2-turn Cu coil placed inside chamber. And the gas mixture of $TiCl_4,\;BCl_3,\;H_2$ and Ar was used for $TiB_2$ deposition. $TiB_2$ films with high hardness (<40 GPa) were obtained at extremely low deposition temperature $(250^{\circ}C)$, and the films hardness increased with ICP power and gas flow ratio of $TiCl_4/BCl_3$. The film structure was changed from (100) preferred orientation to random orientation with increasing RF power. It is supposed that the enhanced hardness of films was caused by a strong Ti-B chemical bonding of stoichiometric $TiB_2$ films and film densification induced by high density plasma.

• Bulletin of the Korean Chemical Society
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• 제26권3호
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• pp.461-462
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• 2005

• 공업화학
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• 제31권4호
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• pp.390-397
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• 2020

To synthesize non-corrosive metallic gold colored α-Al₂O₃ nanoplate-TiO₂ core-shell pigments with controlled roughness, we systematically checked the morphological variation of the TiO₂ shell with the mole ratio of TiCl₄ and NaOH from 1 : 1 to 1 : 1.5, 1 : 2, 1 : 2.5, 1 : 3, 1 : 3.5, and 1 : 4. The more increased mole ratio of TiCl₄ and NaOH resulted in the smoother TiO₂ shell due to the promoted formation of anatase TiO₂ than that of the rutile one. By the heat-treatment of pigments at 500 ℃, we could improve the adhesiveness between TiO₂ shell and α-Al₂O₃ nanoplates without changing their topology and roughness. In addition, the α-Al₂O₃ nanoplate with the robust TiO₂ by heat-treatment exhibited comparable photo-stability against photo-catalytic degradation by UV exposure compared with the commercially available α-Al₂O₃/TiO₂ lustering pigment.

• Tribology and Lubricants
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• 제25권1호
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• pp.20-24
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• 2009

TiC-derived carbon coatings have been synthesized at $600^{\circ}C$ temperature treatment with $H_2/Cl_2$ mixture gases. From Raman spectroscopy measurements, the modified layer was covered with carbon and the thick-ness of the layer was increased with increasing reaction time. And $I_D/I_G$ ratio was decreased with increasing reaction time. The superior tribological property was obtained from TiC reacted with $Cl_2$ gas for 2 hrs. And the tribological property measurements indicate that TiC-derived carbon layer has $0.9{\times}10_{-6}mm^3/Nm$ in wear coefficient and 0.13 in friction coefficient.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.182-185
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• 2003

Etching characteristics of (PB,Sr)$TiO_3$(PST) thin films Were investigated using inductively coupled chlorine based plasma system as functions of gas mixing ratio, RF power and DC bias voltage. It was found that increasing of Ar content in gas mixture' lead to sufficient increasing of etch rate and selectivity of PST to Pt. The maximum etch rate of PST film is 562 ${\AA}$/min and the selectivity of PST film to Pt is 0.8 at $Cl_2/(Cl_2+Ar)$ of 20 %. It was proposed that sputter etching is dominant etching mechanism while the contribution of chemical reaction is relatively low due to low volatility of etching products.