• Title/Summary/Keyword: $SnO_2$film

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Characteristics of Indium Doped SnO2 Thick Film for Gas Sensors (Indium 첨가된 SnO2 후막형 가스센서의 특성)

  • Yu, Il;Lee, Ji-Young
    • Korean Journal of Materials Research
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    • v.20 no.8
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    • pp.408-411
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    • 2010
  • Indium doped $SnO_2$ thick films for gas sensors were fabricated by a screen printing method on alumina substrates. The effects of indium concentration on the structural and morphological properties of the $SnO_2$ were investigated by X-ray diffraction and Scanning Electron Microscope. The structural properties of the $SnO_2$:In by X-ray diffraction showed a (110) dominant $SnO_2$ peak. The size of $SnO_2$ particles ranged from 0.05 to $0.1\;{\mu}m$, and $SnO_2$ particles were found to contain many pores, according to the SEM analysis. The thickness of the indium-doped $SnO_2$ thick films for gas sensors was about $20\;{\mu}m$, as confirmed by cross sectional SEM image. Sensitivity of the $SnO_2$:In gas sensor to 2000 ppm of $CO_2$ gas and 50 ppm of H2S gas was investigated for various indium concentrations. The highest sensitivity to $CO_2$ gas and H2S gas of the indium-doped $SnO_2$ thick films was observed at the 8 wt% and 4 wt% indium concentration, respectively. The good sensing performances of indium-doped $SnO_2$ gas sensors to $CO_2$ gas were attributed to the increase of oxygen vacancies and surface area in the $SnO_2$:In. The $SnO_2$:In gas sensors showed good selectivity to $CO_2$ gas.

A study on characteristics of $SnO_2:F$:F film based on optimum performance Solar cells by APCVD (APCVD법을 이용한 박막 태양전지용 $SnO_2:F$ 투명전극 특성 연구)

  • Ok, Youn-Deok;Kim, Yu-Seung;Yi, Bo-Ram;Kim, Min-Kyoung;Kim, Byung-Kuk;Kim, Hoon;Lee, Jeong-Min;Kim, Hyung-Jun
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.65-68
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    • 2009
  • 본 연구에서는 eagle 2000 glass위에 APCVD(atmospheric CVD)증착법으로 $SnO_2$:F 박막을 제조하였다. 공정 온도, doping 농도, TTC(Tin tetrachloride)와 $H_2O$, $CH_3OH$의 조성비를 공정 변수로 두었으며, 각 변수에 대한 전기적, 광학적 특성 및 결정성을 확인하였다. hall measurement를 이용 제작된 박막의 전기적 특성을 확인 하였고, uv-VIS spectroscopy, hazemeer를 이용 박막의 광학적 특성을 확인 하였다. 또한 XRD, FESEM, AFM을 이용 박막의 결정성 및 표면 특성을 확인 하였다. 박막의 결정성을 결정짓는 증착 온도의 경우 $590^{\circ}C$에서 완벽한 Tetragonal rutile 형태의 결정성을 보였으며 $SnO_2$:F film $1{\mu}m$ thickness에서 $10({\Omega}/{\square})$ 내외의 우수한 면저항값과 $30(cm^2/Vs)$ 이상의 mobility값을 확인 하였으며, 가시광영역대 에서 높은 투과율과 우수한 haze값을 얻었다.

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Fabrication and characterization of a small-sized gas identification instrument for detecting LPG/LNG and CO gases

  • Lee Kyu-Chung;Hur Chang-Wu
    • Journal of information and communication convergence engineering
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    • v.4 no.1
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    • pp.18-22
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    • 2006
  • A small-sized gas identification system has been fabricated and characterized using an integrated gas sensor array and artificial neural-network. The sensor array consists of four thick-film oxide semiconductor gas sensors whose sensing layers are $In_{2}O_{3}-Sb_{2}O_{5}-Pd-doped\;SnO_2$ + Pd-coated layer, $La_{2}O_{5}-PdCl_{2}-doped\;SnO_2,\;WO_{3}-doped\;SnO_{2}$ + Pt-coated layer and $ThO_{2}-V_{2}O_{5}-PdCl_{2}\;doped\;SnO_{2}$. The small-sized gas identification instrument is composed of a GMS 81504 containing an internal ROM (4k bytes), a RAM (128 bytes) and four-channel AD converter as MPU, LEDs for displaying alarm conditions for three gases (liquefied petroleum gas: LPG, liquefied natural gas: LNG and carbon monoxide: CO) and interface circuits for them. The instrument has been used to identify alarm conditions for three gases among the real circumstances and the identification has been successfully demonstrated.

Study on Electrical Properties and Structures of SnO2 Thin Films Depending on the Annealing Temperature (SnO2 박막의 열처리온도에 따른 결정성과 전기적인 특성 연구)

  • Yeon, Su Ji;Lee, Sung Hee;Oh, Teresa
    • Industry Promotion Research
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    • v.1 no.2
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    • pp.7-11
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    • 2016
  • $SnO_2$ films were annealed in a vacuum atmosphere conditions to research the temperature dependency of current-voltage characteristics, crystal structure and chemical properties. The $SnO_2$ film annealed in a vacuum became an amorphous structure, but the degree of amorphous structure changed in accordance with the content of oxygen vacancy, which increased at film annealed at $100^{\circ}C$ and then decreased over the sample at annealed at $150^{\circ}C$. Because the crystallinity was affected the content of oxygen vacancy. The oxygen vacancy as carriers disappeared with increasing the annealing temperatures, and the depletion layer increased. Therefore the content of exiton as optical properties increased with becoming the amorphous structure. So the intensity of PL spectra increased with increasing the annealing temperature.

Effect of Annealing Temperatures on the Properties of Zn2SnO4 Thin Film (열처리 온도에 따른 Zn2SnO4 박막의 특성)

  • Shin, Johngeon;Cho, Shinho
    • Journal of the Korean Society for Heat Treatment
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    • v.32 no.2
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    • pp.74-78
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    • 2019
  • $Zn_2SnO_4$ thin films were deposited on quartzs substrates by using radio-frequency magnetron sputtering system. Thermal treatments at various temperatures were performed to evaluate the effect of annealing temperatures on the properties of $Zn_2SnO_4$ thin films. Surface morphologies were examined by using field emission-scanning electron microscopy and showed that sizes of grains were slightly increased and grain boundaries were clear with increasing annealing temperatures. The deposited $Zn_2SnO_4$ thin films on quartzs substrates were amorphous structures and no distinguishable crystallographic changes were observed with variations of annealing temperatures. The optical transmittance was improved with increasing annealing temperatures and was over 90% in the wavelength region between 350 and 1100 nm at the annealing temperature of $600^{\circ}C$. The optical energy bandgaps, which derived from the absorbance of $Zn_2SnO_4$ thin films, were increased from 3.34 eV to 3.43 eV at the annealing temperatures of $450^{\circ}C$ and $600^{\circ}C$, respectively. As the annealing temperature was increased, the electron concentrations were decreased. The electron mobility was decreased and resistivity was increased with increasing annealing temperatures with exception of $450^{\circ}C$. These results indicate that heat treatments at higher annealing temperatures improve the optical and electrical properties of rf-sputtered $Zn_2SnO_4$ thin films.

Influence of Ni Interlayer on the Electrical and Optical Properties of SnO2 thin films (Ni 층간박막에 따른 SnO2 박막의 전기적, 광학적 물성 변화)

  • Song, Young-Hwan;Eom, Tae-Young;Kim, Daeil
    • Journal of the Korean Society for Heat Treatment
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    • v.29 no.5
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    • pp.216-219
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    • 2016
  • $SnO_2$ single layer films (100 nm thick) and 2 nm thick Ni intermediated $SnO_2$ films were deposited on glass substrate by RF and DC magnetron sputtering without intentional substrate heating and then the influence of the Ni interlayer on the electrical and optical properties of the films were investigated. As deposited $SnO_2$ single layer films show the optical transmittance of 82.6% in the visible wavelength region and a resistivity of $6.6{ \times}10^{-3}{\Omega}cm$, while $SnO_2/Ni/SnO_2$ trilayer films show a lower resistivity of $2.7{ \times}10^{-3}{\Omega}cm$ and an optical transmittance of 76.3% in this study. Based on the figure of merit, it can be concluded that the intermediate Ni thin film effectively enhances the opto-electrical performance of $SnO_2$ films for use as transparent conducting oxides in flexible display applications.