• 제목/요약/키워드: $SiO_2/SiON$

검색결과 6,045건 처리시간 0.031초

차세대 공정에 적용 가능한 Cu(B)/Ti/SiO2/Si 구조 연구 (A Study on Cu(B)/Ti/SiO2/Si Structure for Application to Advanced Manufacturing Process)

  • 이섭;이재갑
    • 한국재료학회지
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    • 제14권4호
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    • pp.246-250
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    • 2004
  • We have investigated the effects of boron added to Cu film on the Cu-Ti reaction and microstructural evolution of Cu(B) alloy film during annealing of Cu(B)/Ti/$SiO_2$/Si structure. The result were compared with those of Cu(B)/$SiO_2$ structure to identify the effects of Ti glue layers on the Boron behavior and the result grain growth of Cu(B) alloy. The vacuum annealing of Cu(B)/Ti/$SiO_2$ multilayer structure allowed the diffusion of B to the Ti surface and forming $TiB_2$ compounds at the interface. The formed $TiB_2$ can act as a excellent diffusion barrier against Cu-Ti interdiffusion up to $800^{\circ}C$. Also, the resistivity was decreased to $2.3\mu$$\Omega$-cm after annealing at $800^{\circ}C$. In addition, the presence of Ti underlayer promoted the growth Cu(l11)-oriented grains and allowed for normal growth of Cu(B) film. This is in contrast with abnormal growth of randomly oriented Cu grains occurring in Cu(B)/$SiO_2$ upon annealing. The Cu(B)/Ti/$SiO_2$ structure can be implemented as an advanced metallization because it exhibits the low resistivity, high thermal stability and excellent diffusion barrier property.

Simple Synthesis of SiOx by High-Energy Ball Milling as a Promising Anode Material for Li-Ion Batteries

  • Sung Joo, Hong;Seunghoon, Nam
    • Corrosion Science and Technology
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    • 제21권6호
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    • pp.445-453
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    • 2022
  • SiOx was prepared from a mixture of Si and SiO2 via high-energy ball milling as a negative electrode material for Li-ion batteries. The molar ratio of Si to SiO2 as precursors and the milling time were varied to identify the synthetic condition that could exhibit desirable anode performances. With an appropriate milling time, the material showed a unique microstructure in which amorphous Si nanoparticles were intimately embedded within the SiO2 matrix. The interface between the Si and SiO2 was composed of silicon suboxides with Si oxidation states from 0 to +4 as proven by X-ray photoelectron spectroscopy and electrochemical analysis. With the addition of a conductive carbon (Super P carbon black) as a coating material, the SiOx/C manifested superior specific capacity to a commercial SiOx/C composite without compromising its cycle-life performance. The simple mechanochemical method described in this study will shed light on cost-effective synthesis of high-capacity silicon oxides as promising anode materials.

수식 졸-겔법에 의한 TiO2-SiO2분체합성 및 광촉매활성 (Preparation of TiO2-SiO2 Powder by Modified Sol-Gel Method and their Photocatalytic Activities)

  • 김병관;미즈노 노리타카;야수이 이타루
    • 공업화학
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    • 제7권6호
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    • pp.1034-1042
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    • 1996
  • DCCA로 1-도데카놀을 이용한 수식 졸-겔법에 의한 $TiO_2-SiO_2$계분체를 합성하였으며, 이들 합성분체에 대한 characterization과 광활성촉매에 대해 검토하였다. $500^{\circ}C$까지의 감량변화는 TiO2단독분체가 33.0wt%, $TiO_2/SiO_2$의 몰비가 75/25, 50/50 및 25/75인 분체는 각각 67.0wt%, 70.0wt% 및 73.0wt%, 그리고 $SiO_2$단독분체는 42.5wt%이였다. 이들 탈리는 거의 대부분이 유기물질이였다. 합성직후의 분체는 $TiO_2$단독분체를 제외하고는 무정형화합물이였고, 아나타아제의 루틸로의 상전이는 $SiO_2$에 의해 억제되었다. 합성직후의 분체는 입자의 형태가 관찰되지 않았으나, $600^{\circ}C$, 1시간 가열에 의한 $TiO_2$단독분체, $TiO_2/SiO_2$의 몰비가 75/25 및 50/50인 분체는 모두 서브미크론의 입자를 보였으며, 몰비가 25/75의 분체 및 $SiO_2$단독분체는 여전히 벌크상태였다. 비표면적 역시 $SiO_2$의 증가와 함께 증가하였으며, 세공크기 역시 $SiO_2$성분에 의존하였다. 그리고 이들 가열물의 광촉매활성은, $TiO_2/SiO_2$의 몰비가 75/25인 분체의 경우, 수소발생량으로 $0.240{\mu}mol/h.g-cat.$을 나타내었으며, $TiO_2$단독분체의 그것보다는 약 2.6배, 표준광촉매물질인 P-25(Degussa P-25)보다는 약 2.0배 가량 큰 값을 나타냈다.

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$CaO-Al_2O_3$계 유리의 물성에 미치는 $SiO_2$의 영향 (Effect of $SiO_2$ on the Properties of $CaO-Al_2O_3$ Glasses)

  • 원종원;박용완
    • 한국세라믹학회지
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    • 제31권4호
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    • pp.389-398
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    • 1994
  • Calcium aluminate glasses transmit light at relatively long wavelengths up to 6 ㎛ and exhibit also low Rayleigh scattering values. However they have a tendency to get devitrified easily, which limits their use as routine optical materials. Here, the ternary system CaO-Al2O3-SiO2 glasses with low-silica (<30 mol%) were prepared to prevent the devitrification of CaO-Al2O3 glasses and the properties were investigated as functions of composition. The addition of SiO2 to calcium aluminate glasses promoted their stability, which was due to the decrease of non-bridging oxygens and the reconnection of network. As SiO2 was added, density, refractive index, molar volume of oxygens and thermal expansion coefficient decreased continuously. But the glass transition temperatures with increasing SiO2 contents were raised and then lowered. It was postulated that the anomaly was related to the changes of the middle range order as well as the short range order. As the amount of SiO2 in the glass was increased, the IR cut-off values moved to shorter wavelength owing to 'Si-O' antisymetric stretching vibration. The IR cut-off wavelength of the glasses with 5 and 30 mol% SiO2 was 4.90, 4.55 ㎛, respectively.

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고선택비 인산공정에서의 식각율 향상과 SiO2 재성장에 관한 연구 (Study on Improvement of Etch Rate and SiO2 Regrowth in High Selectivity Phosphoric Acid Process)

  • 이승훈;모성원;이양호;배정현
    • 한국재료학회지
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    • 제28권12호
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    • pp.709-713
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    • 2018
  • To improve the etch rate of $Si_3N_4$ thin film, $H_2SiF_6$ is added to increase etching rate by more than two times. $SiO_3H_2$ is gradually added to obtain a selectivity of 170: 1 at 600 ppm. Moreover, when $SiO_3H_2$ is added, the etching rate of the $SiO_2$ thin film increases in proportion to the radius of the wafer. In $Si_3N_4$ thin film, there is no difference in the etching rate according to the position. However, in the $SiO_2$ thin film, the etching rate increases in proportion to the radius. At the center of the wafer, the re-growth phenomenon is confirmed at a specific concentration or above. The difference in etch rates of $SiO_2$ thin films and the reason for regrowth at these positions are interpreted as the result of the flow rate of the chemical solution replaced with fresh solution.

완전 탄소 프리폼으로부터 Si 용융 침투에 의해 제조한 반응 소결 탄화규소의 치밀화에 미치는 Y2O3 첨가량의 영향 (Effect of Y2O3 Additive Amount on Densification of Reaction Bonded Silicon Carbides Prepared by Si Melt Infiltration into All Carbon Preform)

  • 조경식;장민호
    • 한국재료학회지
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    • 제31권5호
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    • pp.301-311
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    • 2021
  • The conversion of all carbon preforms to dense SiC by liquid infiltration can become a low-cost and reliable method to form SiC-Si composites of complex shape and high density. Reactive sintered silicon carbide (RBSC) is prepared by covering Si powder on top of 0.5-5.0 wt% Y2O3-added carbon preforms at 1,450 and 1,500℃ for 2 hours; samples are analyzed to determine densification. Reactive sintering from the Y2O3-free carbon preform causes Si to be pushed to one side and cracking defects occur. However, when prepared from the Y2O3-added carbon preform, an SiC-Si composite in which Si is homogeneously distributed in the SiC matrix without cracking can be produced. Using the Si + C = SiC reaction, 3C and 6H of SiC, crystalline Si, and Y2O3 phases are detected by XRD analysis without the appearance of graphite. As the content of Y2O3 in the carbon preform increases, the prepared RBSC accelerates the SiC conversion reaction, increasing the density and decreasing the pores, resulting in densification. The dense RBSC obtained by reaction sintering at 1,500 ℃ for 2 hours from a carbon preform with 2.0 wt% Y2O3 added has 0.20 % apparent porosity and 96.9 % relative density.

SiO2 첨가가 AIN 세라믹스의 고온 비저항에 미치는 영향 (Effects of SiO2 on the High Temperature Resistivities of AIN Ceramics)

  • 이원진;김형태;이성민
    • 한국세라믹학회지
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    • 제45권1호
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    • pp.69-74
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    • 2008
  • The effects of $SiO_2$ impurity on the high temperature resistivities of AIN ceramics have been investigated. When $SiO_2$ was added into 1 wt% $Y_2O_3$-doped AIN, DC resistivities have decreased and electrode polarizations disappeared. Impedance spectroscopy showed two semi-circles at $600^{\circ}C$, which were attributed to grain and grain boundary, respectively. $SiO_2$ doping had more significant effects on the grain resistivity than grain boundary resistivity, implying that doped Si acted as a donor in AIN lattice. In addition, voltage dependency of DC resistivity was observed, which might be related to dependency of size of grain boundary semi-circle on the bias voltage in impedance spectroscopy.

SiC와 $ZrO_2$를 함유하는 ${Al_2}{O_3}$ 입자복합체의 균열저항거동 : I. 실험 (R-Curve Behavior of Particulate Composites of ${Al_2}{O_3}$ Containing SiC and $ZrO_2$: I. Experiment)

  • 박관수;이승환;이재형
    • 한국세라믹학회지
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    • 제37권4호
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    • pp.359-367
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    • 2000
  • Particulate composites of Al2O3/SiC, Al2O3/ZrO2 and Al2O3/ZrO2/SiC have been fabricated to investigate their R-curve behaviors and toughening mechanisms. Al2O3 containing 30 vol% SiC particles of 3${\mu}{\textrm}{m}$ showed rising R-curve behavior owing to the strong crack bridging by SiC particles. The fracture toughness reached 9.1 MPa {{{{ SQRT {m} }} at the crack length of 1000${\mu}{\textrm}{m}$. On the other hand, ZrO2-toughened Al2O3 had a high flat R-curve since it rose steeply in the short crack region due to the well known transformation toughening. For Al2O3/ZrO2/SiC composites, the R-curve behavior was similar to that of Al2O3/SiC but with slightly higher toughness. The SiC particles in this composite decreased the amount of transformable tetragonal phase to reduce the effect of transformation toughening by 50%. It was also found that the fracture toughness of this composite with two different toughening mechanisms was markedly lower than that estimated by the simple addition of two contributions.

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Ga2O3와 4H-SiC Vertical DMOSFET 성능 비교 (Performance Comparison of Vertical DMOSFETs in Ga2O3 and 4H-SiC)

  • 정의석;김영재;구상모
    • 전기전자학회논문지
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    • 제22권1호
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    • pp.180-184
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    • 2018
  • 산화갈륨 ($Ga_2O_3$)과 탄화규소 (SiC)는 넓은 밴드 갭 ($Ga_2O_3-4.8{\sim}4.9eV$, SiC-3.3 eV)과 높은 임계전압을 갖는 물질로서 높은 항복 전압을 허용한다. 수직 DMOSFET 수평구조에 비해 높은 항복전압 특성을 갖기 때문에 고전압 전력소자에 많이 적용되는 구조이다. 본 연구에서는 2차원 소자 시뮬레이션 (2D-Simulation)을 사용하여 $Ga_2O_3$와 4H-SiC 수직 DMOSFET의 구조를 설계하였으며, 항복전압과 저항이 갖는 trade-off에 관한 파라미터를 분석하여 최적화 설계하였다. 그 결과, 제안된 4H-SiC와 $Ga_2O_3$ 수직 DMOSFET구조는 각각 ~1380 V 및 ~1420 V의 항복 전압을 가지며, 낮은 게이트 전압에서의 $Ga_2O_3-DMOSFET$이 보다 낮은 온-저항을 갖고 있지만, 게이트 전압이 높으면 4H-SiC-DMOSFET가 보다 낮은 온-저항을 갖을 수 있음을 확인하였다. 따라서 적절한 구조와 gate 전압 rating에 따라 소자 구조 및 gate dielectric등에 대한 심화 연구가 요구될 것으로 판단된다.

MOS 소자에서 WSi$_2$ 게이트 전극이 Thin Oxide 성질에 미치는 영향 (Effect of WSi$_2$ Gate Electrode on Thin Oxide Properties in MOS Device)

  • 박진성;이현우;김갑식;문종하;이은구
    • 한국세라믹학회지
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    • 제35권3호
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    • pp.259-263
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    • 1998
  • WSi2/CVD-Si/SiO2/Si-substrate의 폴리사이드 구조에서 실리콘 증착 POCl3 확산 그리고 WSi2 증착 유무에 따른 Thin oxide 특성을 연구했다 WSi2 막을 증착하지 않은 CVD-Si/SiO2/Si-substrate 구조에서 CVD-Si을 po-lycrystalline-Si으로 증착한 시편이 amorphous-Si을 증착한 시편보다 산화막 불량이 적다 WSi2 를 증착시킨 WSi2/CVD-Si/SiO2./Si-substrate의 구조에서 CVD-Si의 polycrystalline-Si 혹든 amorphous-Si 의 막 증착에 따른 thin oxide의 불량율 차이는 미미하다 산화막 불량은 CVD-Si에 확산시킨 인(P) 증가 즉 면저항(sheet resistance) 감소로 증가한다. Thin oxide의 절연특성은 WSi2 증착으로 저하된다 WSi2 증착으로 산화막 두께는 증가하나 막 특성은 열등해져 산화막 절연성이 떨어진다.

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