• Title/Summary/Keyword: $SiO_2$ coating

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Optical properties and applications of $TiO_2$ films prepared by ion beam sputtering (이온빔 스퍼터링으로 증착한 $TiO_2$박막의 광학적 특성 및 응용)

  • 이정환;조준식;김동환;고석근
    • Journal of the Korean Vacuum Society
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    • v.11 no.3
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    • pp.176-182
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    • 2002
  • Amorphous $TiO_2$ thin films were deposited on glass substrates by ion beam sputtering in which the ratio of $O_2$/Ar gas used as discharged gas was varied from 0 to 2. After optical and microstructure properties and chemical composition of thin films was analyzed, antireflection coating layers were fabricated with $SiO_2$/$TiO_2$ multi-layers. Thin films deposition was performed at room temperature and ion beam voltage and ion current density for sputtering of target were fixed at 1.2 kV and 200 $\mu\textrm{A}/\textrm{cm}^2$, respectively. Refractive indexs of the deposited $TiO_2$films were 2.40-2.45 at a wavelength of 633 nm. $TiO_2$films had high transmission and stoichiometry when ratio of $O_2$/Ar was 1. Rms roughness of deposited $TiO_2$ film was below 7 $\AA$. In excessive $O_2$ environments, however Rms roughness increased over 50 $\AA$. Transmittance decreased by scattering of rough surface. Reflectance of $SiO_2$/$TiO_2$multi-layers was below 1% in visible light.

Study of Treatment Methods on Solution-Processed ZnSnO Thin-Film Transistors for Resolving Aging Dynamics

  • Jo, Gwang-Won;Baek, Il-Jin;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.348-348
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    • 2014
  • 차세대 디스플레이 구동 회로 소자를 위한 재료로서, Amorphous Oxide Semiconductor (AOS)가 주목받고 있다. AOS는 기존의 Amorphous Silicon과 비교하여 뛰어난 이동도를 가지고 있으며, 넓은 밴드 갭에 의한 투명한 광학적 특성을 가지고 있다. 이러한 장점을 이용하여, AOS 박막은 thin film transistor (TFT)의 active channel로 이용 되고 있다. 하지만, AOS를 이용한 TFT의 경우, 시간이 경과함에 따라 $O_2$$H_2O$ 흡착에 의해 전기적 특성이 변하는 현상이 있다. 이러한 현상은 소자의 신뢰성에 있어 중요한 문제가 된다. 이러한 문제를 연구하기 위해 본 논문에서는, AOS 박막을 이용하여 bottom 게이트형 TFT를 제작하였다. 이를 위해 먼저, p-type Si 위에 건식산화방식으로 $SiO_2$(100 nm)를 성장시켜 게이트 산화막으로 이용하였다. 그리고 Zn과 Sn이 1: 2의 조성비를 가진 ZnSnO (ZTO) 용액을 제조한 후, 게이트 산화막 위에 spin coating 하였다. Splin coating된 용액에 남아 있는 솔벤트를 제거하기 위해 10분 동안 $230^{\circ}C$로 열처리를 한 후, 포토리소그래피와 에칭 공정을 이용하여 ZTO active channel을 형성하였다. 그 후, 박막 내에 남아 있는 불순물을 제거하고 ZTO TFT의 전기적인 특성을 향상시키기 위하여, $600^{\circ}C$의 열처리를 30분 동안 진행 하여 junctionless형 TFT 제작을 완료 하였다. 제작된 소자의 시간 경과에 따른 열화를 확인하기 위하여, 대기 중에서 2시간마다 HP-4156B 장비를 이용하여 전기적인 특성을 확인 하였으며, 이러한 열화는 후처리 공정을 통하여 회복시킬 수 있었다. 열화의 회복을 위한 후처리 공정으로, 퍼니스를 이용한 고온에서의 열처리와 microwave를 이용하여 저온 처리를 이용하였다. 결과적으로, TFT는 소자가 제작된 이후, 시간에 경과함에 따라서 on/off ratio가 감소하여 열화되는 경향을 보여 주었다. 이러한 현상은, TFT 소자의 ZTO back-channel에 대기 중에 있는 $O_2$$H_2O$의 분자의 물리적인 흡착으로 인한 것으로 보인다. 그리고 추가적인 후처리 공정들에 통해서, 다시 on/off ratio가 회복 되는 현상을 확인 하였다. 이러한 추가적인 후처리 공정은, 열화된 소자에 퍼니스에 의한 고온에서의 장시간 열처리, microwave를 이용한 저온에서 장시간 열처리, 그리고 microwave를 이용한 저온에서의 단 시간 처리를 수행 하였으며, 모든 소자에서 성공적으로 열화 되었던 전기적 특성이 회복됨을 확인 할 수 있었다. 이러한 결과는, 저온임에도 불구하고, microwave를 이용함으로 인하여, 물리적으로 흡착된 $O_2$$H_2O$가 짧은 시간 안에 ZTO TFT의 back-channel로부터 탈착이 가능함과 동시에 소자의 특성을 회복 가능 함 의미한다.

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Fabrication and Evaluation of Si3N4-coated Organic/inorganic Hybrid Separators for Lithium-ion Batteries (Si3N4-코팅 유/무기 복합 분리막을 통한 리튬이온전지용 분리막의 제조 및 평가)

  • Yeo, Seung-Hun;Son, Hwa-Young;Seo, Myeong-Su;Roh, Tae-Wook;Kim, Gyu-Chul;Kim, Hyun-Il;Lee, Ho-Chun
    • Journal of the Korean Electrochemical Society
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    • v.15 no.1
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    • pp.48-53
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    • 2012
  • Polyethylene (PE) separator is the most popular separator for lithium-ion batteries. However, it suffers from thermal contraction and mechanical rupture. In order to improve the thermal/mechanical dimensional stabilities, this study investigated the effects of $Si_3N_4$ coating. SCS (Silicon-nitride Coated Separator) has been fabricated by applying 10 ${\mu}m$-thick $Si_3N_4$/PVdF coating on one side of PE separator. SCS exhibits enhanced thermal stability over $100{\sim}150^{\circ}C$: its thermal shrinkage is reduced by 10~20% compared with pristine PE separator. In addition, SCS shows higher tensile strength than PE separator. Employing SCS hardly affects the C-rate performance of $LiCoO_2$/Li coin-cell, even though its ionic conductivity is somewhat lower than that of PE separator.

Preparation of silica-coated gadolinium compound particle colloid solution and its application in imaging

  • Kobayashi, Yoshio;Morimoto, Hikaru;Nakagawa, Tomohiko;Gonda, Kohsuke;Ohuchi, Noriaki
    • Advances in nano research
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    • v.1 no.3
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    • pp.159-169
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    • 2013
  • A preparation method for gadolinium compound (GdC) nanoparticles coated with silica ($GdC/SiO_2$) is proposed. GdC nanoparticles were prepared with a homogeneous precipitation method at $80^{\circ}C$ using $1.0{\times}10^{-3}$ M $Gd(NO_3)_3$, 0.5 M urea and $0-3.0{\times}10^{-4}$ M ethylenediarinnetetraacetic acid disodium salt dihydrate (ETDA) in water. As a result of preparation at various EDTA concentrations, GdC nanoparticles with a size as small as $40.5{\pm}6.2$ nm, which were colloidally stable, were prepared at an EDTA concentration of $2.0{\times}10^{-4}$ M. Silica-coating of the GdC nanoparticles was performed by a St$\ddot{o}$ber method at $35^{\circ}C$ using $1.0-10.0{\times}10^{-3}$ M tetraethylorthosilicate (TEOS), 11 M $H_2O$ and $1.5{\times}10^{-3}$ M NaOH in ethanol in the presence of $1.0{\times}10^{-3}$ M GdC nanoparticles. Performance of preparation at various TEOS concentrations resulted in production of $GdC/SiO_2$ particles with an average size of $106.1{\pm}11.2$ nm at a TEOS concentration of $5.0{\times}10^{-3}$ M. The gadolinium (Gd) concentration of $1.0{\times}10^{-3}$ M in the as-prepared $GdC/SiO_2$ particle colloid solution was increased up to a Gd concentration of 0.2 M by concentrating with centrifugation. The core-shell structure of $GdC/SiO_2$ particles was undamaged, and the colloid solution was still colloidally stable, even after the concentrating process. The concentrated $GdC/SiO_2$ colloid solution showed images of X-ray and magnetic resonance with contrast as high as commercial Gd complex contrast agents.

Phase Formation and Rheological Characteristics of LAS Derived from the Monophasic Sol-Gel Route (Sol-Gel 반응으로 유도된 LAS의 상 생성과 점성 특성)

  • 장현명;김광수;정창주
    • Journal of the Korean Ceramic Society
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    • v.28 no.5
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    • pp.365-372
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    • 1991
  • LAS (lithium aluminosilicate) sol was synthesized using the hydrolysis-condensation reaction of TEOS, chelated Al(OBus)3 and Li-salt with H2O in alcohol (EtOH+2-Propanol) medium. Effects of important reaction parameters on the properties of sol and gel-derived LAS were examined. The crystallization of the sol-gel derived LAS with ${\beta}$-spodumene composition began at ∼600$^{\circ}C$, and a series of polymorphic transformations occurred as temperature was increased to 1100$^{\circ}C$: amorphous LAS\longrightarrowhexagonal LiAl(SiO3)2\longrightarrow${\beta}$-spodumene. Lowering Li content in the gel enhanced densification and retarded the crystallization significantly. Optimum reaction conditions of LAS sol formation for thin coating applications were derived from rheological measurements, and these can be summarized as: H2O/total alkoxides molar ratio=4, pH=∼2.5, and aging time of ∼250h.

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Conformal coating of Al-doped ZnO thin film on micro-column patterned substrate for TCO (TCO 응용을 위한 패턴된 기판위에 증착된 AZO 박막의 특성 연구)

  • Choi, M.K.;Ahn, C.H.;Kong, B.H.;Cho, H.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.28-28
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    • 2009
  • Fabrications of antireflection structures on solar cell were investigated to trap the light and to improve quantum efficiency. Introductions of patterned substrate or textured layer for Si solar cell were performed to prevent reflectance and to increase the path length of incoming light. However, it is difficult to deposit conformally flat electrode on perpendicular plane. ZnO is II-VI compound semiconductor and well-known wide band-gap material. It has similar electrical and optical properties as ITO, but it is nontoxic and stable. In this study, Al-doped ZnO thin films are deposited as transparent electrode by atomic layer deposition method to coat on Si substrate with micro-scale structures. The deposited AZO layer is flatted on horizontal plane as well as perpendicular one with conformal 200 nm thickness. The carrier concentration, mobility and resistivity of deposited AZO thin film on glass substrate were measured $1.4\times10^{20}cm^{-3}$, $93.3cm^2/Vs$, $4.732\times10^{-4}{\Omega}cm$ with high transmittance over 80%. The AZO films were coated with polyimide and performed selective polyimide stripping on head of column by reactive ion etching to measure resistance along columns surface. Current between the micro-columns flows onto the perpendicular plane of deposited AZO film with low resistance.

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표면변형에 따른 실리콘 태양전지의 전력변환효율 변화

  • Lee, Se-Won;O, Si-Deok;Sin, Hyeon-Uk;Jeong, Je-Myeong;Kim, Tae-Hwan;Sin, Jae-Cheol;Kim, Hyo-Jin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.387-387
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    • 2012
  • 결정 Si 및 비정질 Si 태양전지는 환경친화적이며 안정적인 물질로 전력변환 및 에너지 저장 장치에 중요하기 때문에 연구가 활발하게 진행되고 있다. 고효율 Si 태양전지를 제작하여 상용화하기에는 여러 가지 문제점이 있다. 공기와 비교하여 높은 굴절률을 갖고 있기 때문에 발생하는 반사를 줄이기 위해서 필요한 무반사 코팅층(Anti-reflective coating; ARC)은 주로 SiO2 와 SiNx 와 같은 유전체를 이용하여 사용하지만 이들 ARC 증착은 PECVD와 같은 진공장비를 사용하므로 제작 비용이 높아지는 단점이 있다. 나노선 또는 나노 팁과 같은 sub-wavelength 구조를 표면에 만들어 반사율을 줄이는 작업을 통해 ARC 공정비용을 감소하고 효율을 증진하는 연구가 활발히 진행되고 있다. CdS 양자점을 태양전지 표면에 형성함으로 ARC로 해결할 수 없는 단파장영역에 해당하는 부분을 줄이는 연구가 진행되었으며, 비정질의 경우 원기둥 형태의 태양전지 형태와 더불어 지름 방향으로의 PN 접합 나노로드 배열을 만들어 흡수면을 증가하여 효율을 증가한 연구도 진행되었다. 태양전지 표면의 형태를 V-groove 형태로 형성하여 입사하는 태양전지의 광밀도를 증가하는 이론적 결과도 발표되었다. 본 연구에서는 Si 태양전지의 표면변형에 따른 태양전지의 전력변환효율의 변화를 관찰하기 위하여 태양전지 표면의 texture 지름을 $3{\sim}15{\mu}m$, 간격을 $5{\sim}20{\mu}m$로 변화하고, 태양전지 표면의 나노 패턴을 2~10 nm 로 변화하여 반사율과 전력변환효율을 비교하였다. 나노와 마이크로 패턴은 각각 polystyrene nanosphere 와 photo mask를 이용하여 제작하였으며 PN junction Si 태양전지는 spin on dopant 방식으로 제작하여 성능을 조사하였다.

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Study on Design of ZnO-Based Thin-Film Transistors With Optimal Mechanical Stability (ZnO 기반 박막트랜지스터의 기계적 안정성 확보에 관한 연구)

  • Lee, Deok-Kyu;Park, Kyung-Yea;Ahn, Jong-Hyun;Lee, Nae-Eung;Kim, Youn-Jea
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.35 no.1
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    • pp.17-22
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    • 2011
  • ZnO-based thin-film transistors (TFTs) have been fabricated and the mechanical characteristics of electric circuits, such as stress, strain, and deformation are analyzed by the finite element method (FEM). In this study, a mechanical-stability design guide for such systems is proposed; this design takes into account the stress and deformation of the bridge to estimate the stress distribution in an $SiO_2$ film with 0 to 5% stretched on 0.5-${\mu}m$-thick. The predicted buckle amplitude of $SiO_2$ bridges agrees well with experimental results within 0.5% error. The stress and strain at the contact point between bridges and a pad were measured in a previous structural analysis. These structural analysis suggest that the numerical measurement of deformation, SU-8 coating thickness for Neutral Mechanical Plane (NMP) and ITO electrode size on a dielectric layer was useful in enhancing the structural and electrical stabilities.

Laser Damage Threshold Increase of A/R Coating Films for 200MHz AOM (A/R 코팅 변화에 따른 200MHz AOM의 laser damage threshold 증가)

  • Kim, Yong-Hun;Lee, Hang-Hun;Lee, Jin-Ho;Park, Yeong-Jun;Park, Jeong-Ho
    • Korean Journal of Materials Research
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    • v.7 no.3
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    • pp.213-217
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    • 1997
  • AOhf(Hcousto-r)l)tic niodulator) with :!OOlIiz freclucncl- and Sfi(;(Seconrl harmonic generation) green lasel-Lvith 53% nm wavelength were used for Il\'IIII~Dii.it,ii v~ilco disk recorder) FOI rhe appli~aptin of high densit]. optical recording, a high po\ver I ~ c r is r c ~ ~ l i ~ i l - u l ic I !tic. s\-sti,m a n d optic.,~I io;iting l,t)c>rs of each optical device must have a high laser damage threshoid hie rn;itie ant] retlwtive coatings on a $TeO_{2}$ singlc crystal. which is used as an acoustooptic material, by E-beam evaporation method. Laser damage threshold \vas nicdsureci hy Ar laser with the input power oi 0.55LV 1,aser damage threiholti 01 $ZrO_{2}$ and $SiO_{2}$. filn-is were higher than $AI_{2}O_{3}$ f i l m U'e also investigated a long--tern1 stability of the output po\ver of St{(; green laser

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The Surface and Electrical Properties of BST Thin Films Prepared by Sol-Gel Method (Sol-Gel 방법에 의한 BST 박막의 표면 및 전기적 특성)

  • 홍경진;조재철
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.6
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    • pp.504-510
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    • 2002
  • Recently, thin film capacitors of high dielectric constant and low leakage current are applied to integrated devices. In this study, (Ba, Sr)$TiO_3$ (BST) thin films for low cost were prepared by Sol-Gel method. BST solution was spin-coated on Pt/$SiO_2$/Si substrate at 4,000 rpm for 10 seconds. Coating process was repeated 3 times and then sintered at $700^{\circ}C$ for 30 minutes. Structural and electrical characteristics of each specimen were analyzed by TG-DTA, SEM, fractal phenomenon, voltage-current and dielectric factor. Thickness of BST ceramics thin films are about 2,600~2,800 ${\AA}$ at depositing 3 times. Dielectric constant of thin films was decreased in 1 kHz~1 MHz. Dielectric constant and loss to frequency were 250 and 0.02 in $(Ba_{0.7}Sr_{0.3})TiO_3$ (BST3). Leakage current of BST3 was $10^{-9}\sim10^{-11}$/ A under 3 V.