• Journal of the Korean Chemical Society
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• v.50 no.3
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• pp.232-236
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• 2006

The Y1.99-xMxCe0.01SiO5(M=Li, La, Nd, and Gd) phosphors were synthesized by solid-state reaction at 1350oC for 10h under reducing atmosphere in order to improve properties of blue emitting phosphors. Compared with commercial blue phosphors, the Y2SiO5:Ce blue phosphors substituted with various elements showed significant enhancement of the emission intensity. Particularly, 1 mol% Li doped Y2SiO5:Ce phosphors indicated the maximum emission intensity in the photoluminescence spectra. Thanks to SEM analyses revealed that the morphology of Y2SiO5:(Ce,Li) blue phosphors was a pseudo-spherical with particle size of 3m.

• Journal of the Korean Ceramic Society
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• v.37 no.10
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• pp.1014-1020
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• 2000

RF 마크네트론 스퍼터법으로 Ce의 일부를 희토류 원소로 치환한 Ce$_{1-x}$RE$_{x}$O$_{2-y}$(0.1$\leq$x$\leq$0.4, RE=Y, Nd) 박막을 Si(111), $Al_2$O$_3$(1012) 기판 위에 1450~1$600^{\circ}C$로 소결한 target을 이용하여 성장시켰다. Ce$_{1-x}$RE$_{x}$O$_{2-y}$ 박막의 성장시 기판온도 및 증착시간 등을 변화시켜 성장시켰으며, 성장된 박막의 특성분석은 XRD, SEM, TEM으로 행하였다. 증착된 박막의 방향성 및 결정성장 거동은 증착온도 및 시간에 따라 차이를 보였다. Si(111) 기판 위에 증착된 Ce$_{1-x}$Y$_{x}$O$_{2-y}$(x=0.3) 박막의 경우, 80$0^{\circ}C$에 비해 7$50^{\circ}C$에서 증착 시간에 따른 (111) 우선배향성의 정도가 나은 결과를 보였으며, $Al_2$O$_3$(1012) 기판 위에 증착한 Ce$_{1-x}$Nd$_{x}$O$_{2-y}$(x=0.3) 박막 또는 (111) 우선배향성을 나타내었다.을 나타내었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.25 no.2
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• pp.91-95
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• 2012

ZnO thin films were deposited on p-type 4H-SiC substrate by pulsed laser deposition. ZnO nanowires were formed on p-type 4H-SiC substrate by furnace. Ti/Au electrodes were deposited on ZnO thin film/SiC and ZnO nanowire/SiC structures, respectively. Structural and crystallographical properties of the fabricated ZnO thin film/SiC and ZnO nanowire/SiC structures were investigated by field emission scanning electron microscope and X-ray diffraction. In this work, resistance and sensitivity of ZnO thin film/SiC gas sensor and ZnO nanowire/SiC gas sensor were measured at $300^{\circ}C$ with various CO gas concentrations (0%, 90%, 70%, and 50%). Resistance of gas sensor decreases at CO gas atmosphere. Sensitivity of ZnO nanowire/SiC gas sensor is twice as big as sensitivity of ZnO thin film/SiC gas sensor.

• Journal of the Korean Ceramic Society
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• v.41 no.2
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• pp.170-175
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• 2004

The ferroelectric (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ thin films were fabricated by sol-gel method using Y-acetate, Yb-acetate, and Mn-acetate as raw materials. The stable (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ precursor solution (sol) was prepared through the reflux process with acetylaceton as a catalyst and coated on Si(100) substrate by spin coating. The heat treatment temperature and, Rw ($H_2O$/alkoxide moi ratio) dependence on crystallinity of thin films were studied. The lowest temperature for obtaining YbMn $O_3$phase and the optimum heat-treatment conditions were proved as at 7$50^{\circ}C$ and 80$0^{\circ}C$, respectively. The hexagonal YbMn $O_3$with c-axis preferred orientation could be obtained at Rw=1 condition. The remanent polarization for the thin films of x=0 or 1 was about 200 nC/㎤ while, for the specimens ot 0< x< 1, were 50∼100 nC/$\textrm{cm}^2$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.1
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• pp.41-45
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• 2014

We have investigated the passivation property of $SiN_x$ and $SiO_2$ thin films formed using various process conditions for the application of crystalline Si solar cells. An increase in the thickness of $SiN_x$ deposited using plasma enhanced chemical vapor deposition (PECVD) led to the improvement of passivation quality. This could be associated with the passivation of Si dangling bonds by hydrogen atoms which were supplied during PECVD deposition. The $SiO_2$ thin films grown using dry oxidation process exhibited better passivation behavior than those using wet oxidation process, implying the dry oxidation process was more effective in the formation of high quality $SiO_2$ thin films. The relative effective life time gradually decreased with increasing dry oxidation temperature. Such a degradation of passivation behavior could be attributed to the increase in interface trap density caused by thermal damages.

• Electrical & Electronic Materials
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• v.10 no.6
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• pp.541-547
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• 1997

(Pb$_{1-x}$ La$_{x}$)Ti$_{1-x}$ $_4$O$_3$(x=0, 0.02, 0.04, 0.08) ceramic thin films were fabricated by Sol-Gel method. A stock solution of (Pb, La)TiO$_3$ with excess Pb 10 mol% was made and spin-coated on the Pt/Ti/SiO$_2$/Si substrate at 400rpm for 30 seconds. Coated specimens were dried on the hot-plate at 35$0^{\circ}C$ for 10 min and sintered at 500~75$0^{\circ}C$ for 1 hour. The dielectric constant, remanent polarization and coercive field of the PLT(6at.%) thin films sintered at $650^{\circ}C$ were 884, 13.95$\mu$C/$\textrm{cm}^2$ and 8.7kV/cm, respectively. Pyroelectric coefficient, figure of merit of pyroelectric current, voltage responsivity and detectivity of PLT(6at.%) thin films were 3.2$\times$10$^{-8}$ C/$\textrm{cm}^2$K, 1.02$\times$10$^{-8}$ C.cm/J, 2.9 $\times$10$^{-11}$ C.cm/J, 0.29$\times$10$^{-8}$ C.cm/J, respectively.ely.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.205-206
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• 2012

$InSbO_4$ (Indium antimony oxide) 박막을 RF 마그네트론 스퍼터링법을 이용하여 $SiO_2$가 코팅된 Si wafer ($SiO_2/Si$) 기판 또는 $400^{\circ}C$에서 융해된 석영 유리 (silica glass) 기판 위에 증착시켰다. 고결정성과 화학양론의 $InSbO_4$ 막을 증착시키기에 최적화된 조성의 $In_{0.2x}Sb_{0.3x}O_x$ 타겟을 이용하여 Ar과 $O_2$ 혼합 가스 분위기에서 스퍼터링 증착을 수행하였다. $InSbO_4$ 막은 가시광 영역에서 80%이상의 투과도를 보였고, $400^{\circ}C$에서 $1100^{\circ}C$사이의 어닐링 온도에서는 $InSbO_4$ 막의 전기적 성질이 높은 고온 내구성을 가지는 것을 알 수 있었다. 그러나 $1200^{\circ}C$ 이상의 어닐링 온도에서는 새로운 $Sb_2O_4$ 상의 분리로 인해 $InSbO_4$ 막의 비저항이 급격히 증가하였다.

• Korean Chemical Engineering Research
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• v.44 no.3
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• pp.284-288
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• 2006

$(Ca,Sr)_{2-y}MgSi_2O_7:Eu^{2+}{_y}$ (CMS) phosphor particles were prepared by using a spray pyrolysis process. The luminescent property was optimized by changing the content of Eu and the post-treatment temperature. The luminescence characteristics were also monitored with changing the ratio of Ca to Sr. The pure tetragonal $Ca_2MgSi_2O_7$ or $Sr_2MgSi_2O_7$ particles were obtained when the post-treatment temperature was over $1,000^{\circ}C$. The highest emission intensity of CMS particles were achieved when the concentration (y) of Eu and the treatment temperature were 0.05 and $1,250^{\circ}C$,respectively. The emission wavelength $({\lambda}_{max})$ of ${(Ca_{1-x},Sr_x)}_{1.95}MgSi_2O_7:{Eu^{2+}}_{0.05}$ was gradually shifted from 524 nm to 456 nm with increasing the content of Sr due to the reduction of crystal field strength. The emission intensity and its width of $Sr_2MgSi_2O_7:Eu$ was greatly enhanced by substituting Ca of less than 10 mol％ for Sr without any significant peak shift. The morphology of as-prepared particles was spherical, but changed to irregular-shaped one after the post treatment at the temperature range from 900 at $1,300^{\circ}C$.

• Korean Journal of Materials Research
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• v.17 no.8
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• pp.414-419
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• 2007

We report the electrical conductivity of the mixed alkali silicate glasses in the system (60-x)$SiO_2-40Na_2O-xCaO(x=0\sim15wt%)$ in the temperature range from $150^{\circ}C$ to $620^{\circ}C$. In the range from $150^{\circ}C$ to glass transition temperature$(T_g)$, the electrical conductivities of glass samples had a tendency to be proportion with temperature. The glasses of containing over 7.5wt% CaO showed lower conductivities than the glasses of containing 0 and 5wt% CaO because two kinds of alkali ions$(Na^+,\;Ca^{2+})$ were obstructed each other. On the other hand, in the range from $T_g$ to $620^{\circ}C$, the electrical conductivity of glasses($7.5{\leq}x{\leq}12.5$) was unstable and decreased in some region. From XRD results, the $Na_4Ca(SiO_3)_3$ phase were observed in these glasses. This means the alkali ions didn't behave as carrier, it seems that this caused the conductivities decrease. In case of glass of containing 15wt% CaO, any crystal phase were not observed. This means the alkali ions behaved as carrier, it consequently seems the conductivity increased.

• Journal of the Korean Vacuum Society
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• v.10 no.2
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• pp.182-188
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• 2001

Thin films of $SiO_xC_y$ deposited by means of PECVD(plasma enhanced chemical vapor deposition) using HMDSO(hexamethyldisiloxane)/$O_2$ were characterized. The effects of deposition conditions such as RF power, oxygen flow rate and hydrogen flow rate on the chemical bond structure, atomic composition, surface roughness and wear characteristics of the films were investigated by means of FTIR, XPS, AFM and Hazemeter. The deposition rate of $SiO_xC_y$ was greater than 100 nm/min, which is relatively high rate. The XPS results showed that the carbon content in a deposited film was lower than that of previous studies where different organosilicone materials were used. The optimum wear resistance was attained when RF power was 200 Watt and oxygen flow rate was 100 sccm. This study implies that the $HMDSO/O_2$ system is effective in forming a film with a lower carbon content and good abrasion resistance.