• Title/Summary/Keyword: $PtO_x$

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Electrical Properties of 50% Pb-excess PZT Thin Films Deposited on the Glass Substrates (유리기판위에 증착한 50% Pb-excess PZT박막의 전기적특성)

  • Jeong, Kyu-Won;Park, Young;Ju, Pil-Yeon;Park, Ki-Yup;Song, Joon-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.5
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    • pp.370-375
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    • 2001
  • PZT thin films (3500${\AA}$) ahve been prepared onto Pt/Ti/corning glass (1737) substrates with a RF magnetron sputtering system using Pb$\sub$1.50/(Zr$\sub$0.52/,Ti$\sub$0.48)O$_3$ ceramic target. We used two-step annealing techniques, PZT thin films were grown at a 300$^{\circ}C$ substrate temperature and then subjected to an RTA treatment. In case of 500$^{\circ}C$ RTA temperature show pyrochlore phase. The formation of Perovskite phase started above 600$^{\circ}C$ and PZT thin films generated (101) preferred orientation. As the RTA time and temperature increased, crystallization of PZT films were enhanced. The PZT capacitors fabricated at 650$^{\circ}C$ for 10 minutes RTA treatment showed remanent polarization 30 ${\mu}$C/$\textrm{cm}^2$, saturation polarization 42${\mu}$C/$\textrm{cm}^2$, coercive field 110kV/cm, leakage current density 2.83x10$\^$-7/A/$\textrm{cm}^2$, remanent polarization were decreased by 30% after 10$\^$9/ cycles.

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Fabrication and characterization of Biological mass detecing system using PZT microcantilever (PZT 마이크로 켄틸레버를 이용한 생체 물질 무게 감지 소자의 제작 및 분석)

  • Lee, Jeong-Hoon;Hwang, Kyo-Seon;Kang, Ji-Yoon;Kim, Sang-Ho;Ahn, Se-Young;Kim, Tae-Song
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.2006-2007
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    • 2002
  • MEMS 공정을 이용하여 $SiN_x$를 지지층으로 한 $SiO_2$/Ta/PZT/Pt 의 박막 구조를 가지는 마이크로 켄틸레버를 제작하였다. 켄틸레버의 전기기계적 특성을 LDV (레이저 미소 변위 측정기)를 이용하여 측정하였으며, 이를 통해 전기기계적 거동을 분석하였다. 또한 무게 감지소자로서의 응용을 위해 Au의 증착을 통한 감도를 측정하였으며, streptavidin의 무게를 감지하기 위해 immobilization 공정을 거쳐 thiol 그룹 및 biotin을 표면에 고정화 시킨후 biotin-streptavidin 결합에 의한 전기기계적 신호 분석을 통해 생체 물질의 무게 감지 소자로의 응용을 평가하였다.

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A study on the Improvement of Ferroeletric Characteristics of PZT thin film for FRAM Device (FRAM 소자용 PZT박막의 강유전특성에 관한 연구)

  • Lee, B.S;Chung, M.Y.;Shin, P.K.;Lee, D.C.;Lee, S.H.;Kim, J.S.
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.1881-1883
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    • 2005
  • In this study, PZT thin films were fabricated using sol-gel Processing onto $Si/SiO_2/Ti/Pt$ substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}\;A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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A study on the PZT thin films for Non-volatile Memory (비휘발성 메모리용 강유전체 박막에 관한 연구)

  • Lee, B.S.;Park, J.K.;Kim, Y.W.;Park, K.S.;Kim, S.H.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1562-1564
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    • 2003
  • In this study, PZT thin films were fabricated using sol-gel processing onto Si/$SiO_2$/Ti/Pt substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C,\;650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

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Improvement of Fatigue Properties in Ferroelectric Dy-Doped Bismuth Titanate(BDT) Thin Films Deposited by Liquid Delivery MOCVD System (Liquid Delivery MOCVD로 증착된 강유전체 BDT 박막의 피로 특성 향상)

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.171-171
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    • 2007
  • Dysprosium-doped bismuth titanate (BDT) thin films were successfully deposited on Pt(111)/Ti/$SiO_2$/Si(100) substrates by liquid delivery MOCVD process and their structural and ferroelectric properties were characterized. Fabricated BDT thin films were found to be random orientations, which were confirmed by X-ray diffraction experiment and scanning electron microscope analysis. The crystallinity of the BDT films was improved and the average grain size increased as the crystallization temperature increased from 600 to $720^{\circ}C$ at an interval of $40^{\circ}C$. The BDT thin film annealed at $720^{\circ}C$ showed a large remanent polarization (2Pr) of $52.27\;{\mu}C/cm^2$ at an applied voltage of 5V. The BDT thin film exhibits a good fatigue resistance up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz with applied pulse of ${\pm}5\;V$. These results indicate that the randomly oriented BDT thin film is a promising candidate among ferroelectric materials useti비 in lead-free nonvolatile ferroelectric random access memory applications.

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MEMS-Based Micro Sensor Detecting the Nitrogen Oxide Gases (산화질소 검출용 마이크로 가스센서 제조공정)

  • Kim, Jung-Sik;Yoon, Jin-Ho;Kim, Bum-Joon
    • Korean Journal of Materials Research
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    • v.23 no.6
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    • pp.299-303
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    • 2013
  • In this study, a micro gas sensor for $NO_x$ was fabricated using a microelectromechanical system (MEMS) technology and sol-gel process. The membrane and micro heater of the sensor platform were fabricated by a standard MEMS and CMOS technology with minor changes. The sensing electrode and micro heater were designed to have a co-planar structure with a Pt thin film layer. The size of the gas sensor device was about $2mm{\times}2mm$. Indium oxide as a sensing material for the $NO_x$ gas was synthesized by a sol-gel process. The particle size of synthesized $In_2O_3$ was identified as about 50 nm by field emission scanning electron microscopy (FE-SEM). The maximum gas sensitivity of indium oxide, as measured in terms of the relative resistance ($R_s=R_{gas}/R_{air}$), occurred at $300^{\circ}C$ with a value of 8.0 at 1 ppm $NO_2$ gas. The response and recovery times were within 60 seconds and 2 min, respectively. The sensing properties of the $NO_2$ gas showed good linear behavior with an increase of gas concentration. This study confirms that a MEMS-based gas sensor is a potential candidate as an automobile gas sensor with many advantages: small dimension, high sensitivity, short response time and low power consumption.

Potential Characteristics of Supercapacitor Based on Ruthenium Oxide-Aqueous Electrolyte (루테늄 산화물-수계 전해액 수퍼캐패시터의 전위 특성)

  • Doh, Chil-Hoon;Choi, Sang-Jin;Moon, Seong-In;Yun, Mun-Su;Yug, Gyeong-Chang;Kim, Sang-Gil;Lee, Ju-won
    • Journal of the Korean Electrochemical Society
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    • v.6 no.2
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    • pp.93-97
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    • 2003
  • The electrode for a supercapacitor was prepared using an amorphous ruthenium oxide, which was synthesized from ruthenium trichloride hydrate$(RuO_2{\cdot}nH_2O)$. A supercapacitor was assembled with an electrode of ruthenium oxide material on a current collector of tantalum, and an electrolyte of 4.8 M sulfuric acid. The result of the AC impedance analyses on $Ta/H_2SO_4(4.8 M)/Pt$ cell showed that tantalum was stable at the potential range of $0.0\~1.1V(vs. SCE)$. Therefore, Ta film could be used the supercapacitor as a current collector. The irreversible hydrolysis in the supercapacitor occurred over ca. 1.0V(vs.SCE) when the supercapacitor was protonated to 0.5V(vs. SCE). The supercapacitor protonated to 0.5V(vs.SCE) showed good electrochemical properties when it was tested at the potential range of 1.0V in the charge-discharge test. The potential range of the electrodes including the positive and the negative electrode was varied between -0.004 and 0.995V(vs. SCE). The potential ranges of the positive and the negative electrode were $-0.004\~0.515V(vs.\;SCE)\;and\; 0.515\~0.995V(vs.\;SCE)$, respectively.

A Study on the Electrochemical Deposition and p-Type Doping of ZnTe Films as a Back Contact Material for CdTe Photovoltaic Solar Cells (CdTe계 태양전지에 응용되는 ZnTe 박막의 전기화학적 제조 및 Cu 도핑 연구)

  • Kim, Dong-Hwan;Jeon, Yong-Seok;Kim, Gang-Jin
    • Korean Journal of Materials Research
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    • v.7 no.10
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    • pp.856-862
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    • 1997
  • 박막형 CdTe/CdS 태양전지의 배면전극(back contacts)물질로서 Cu도핑된 ZnTe 박막(ZnTe:Cu)을 전착법(electroplating)으로 제조하는 연구를 수행하였다. Sulfate계의 전해질 수용액에서 CdTe 기판과 투명전극으로 코팅된 유리(In$_{2}$O$_{3}$: Sn, ITO)기판 위에 ZnTe 박막을 코팅하는 방법으로써 potentiostat와 기판(cathode), Pt counter electrode, Ag/AgCI 표준전극으로 구성된 장치를 사용하여 pH=2.5-4, T=70-8$0^{\circ}C$, 0.02M $Zn^{2+}$ 1x$10^{-4}$M TeO$_{2}$, 0.2M $K_{2}$SO$_{4}$조건에서 -0.800 Vs~-0.975 V 범위의 전압(V$_{a}$ )에 걸쳐 실험하였다. ITO박막을 기판으로 사용하여 cyclic voltammogram을 작성한 결과 약 -0.50 V 에서 Te환원 peak이 나타났다. Auger electron spectroscopy (AES)로 조성분석한 결과 표면에서 Zn signal이 강하게 나왔고 시편의 두께에 따라 Zn의 signal감소하는 반면 Cd signal은 증가하는 것이 확인되었다. SEM 사진으로부터 ZnTe의 표면이 작은 입자 (0.2$\mu\textrm{m}$ 이하)로 구성되어 있으며 낮은 V$_{a}$ 에서는 입자가 작아지면서 조직이 치밀해짐이 관찰되었다. Optical transmission방법에 의하여 ITO기판위에 입혀진 박막의 밴드갭은 2.5 eV으로 측정되었다. 수용액중의 Cu$_{2+}$와 triethanolamine(TEA)은 산성용액에서 착물형성이 이루어지지 않았으며 1,10-phenanthroline과는 pH=2에서도 착물이 형성되었다.

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Etching characteristic of SBT thin film by using Ar/$CHF_3$ Plasma (Ar/$CHF_3$ 플라즈마를 이용한 SBT 박막에 대한 식각특성 연구)

  • 서정우;이원재;유병곤;장의구;김창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.41-43
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    • 1999
  • Among the feffoelectric thin films that have been widely investigated for ferroelectric random access memory (FRAM) applications, SrBi$_2$Ta$_2$$O_{9}$ thin film is appropriate to memory capacitor materials for its excellent fatigue endurance. However, very few studies on etch properties of SBT thin film have been reported although dry etching is an area that demands a great deal of attention in the very large scale integrations. In this study, the a SrBi$_2$Ta$_2$$O_{9}$ thin films were etched by using magnetically enhanced inductively coupled Ar/CHF$_3$ plasma. Etch properties, such as etch rate, selectivity, and etched profile, were measured according to gas mixing ratio of CHF$_3$(Ar$_{7}$+CHF$_3$) and the other process conditions were fixed at RF power of 600 W, dc bias voltage of 150 V, chamber pressure of 10 mTorr. Maximum etch rate of SBT thin films was 1750 A77in, under CHF$_3$(Ar+CHF$_3$) of 0.1. The selectivities of SBT to Pt and PR were 1.35 and 0.94 respectively. The chemical reaction of etched surface were investigated by X-ray photoelectron spectroscopy (XPS) analysis. The Sr and Ta atoms of SBT film react with fluorine and then Sr-F and Ta-F were removed by the physical sputtering of Ar ion. The surface of etched SBT film with CHF$_3$(Ar+CHF$_3$) of 0.1 was analyzed by secondary ion mass spectrometer (SIMS). Scanning electron microscopy (SEM) was used for examination of etched profile of SBT film under CHF$_3$(Ar+CHF$_3$) of 0.1 was about 85˚.85˚.˚.

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On-line Image Guided Radiation Therapy using Cone-Beam CT (CBCT) (콘빔CT (CBCT)를 이용한 온라인 영상유도방사선치료 (On-line Image Guided Radiation Therapy))

  • Bak, Jin-O;Jeong, Kyoung-Keun;Keum, Ki-Chang;Park, Suk-Won
    • Radiation Oncology Journal
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    • v.24 no.4
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    • pp.294-299
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    • 2006
  • $\underline{Purpose}$: Using cone beam CT, we can compare the position of the patients at the simulation and the treatment. In on-line image guided radiation therapy, one can utilize this compared data and correct the patient position before treatments. Using cone beam CT, we investigated the errors induced by setting up the patients when use only the markings on the patients' skin. $\underline{Materials\;and\;Methods}$: We obtained the data of three patients that received radiation therapy at the Department of Radiation Oncology in Chung-Ang University during August 2006 and October 2006. Just as normal radiation therapy, patients were aligned on the treatment couch after the simulation and treatment planning. Patients were aligned with lasers according to the marking on the skin that were marked at the simulation time and then cone beam CTs were obtained. Cone beam CTs were fused and compared with simulation CTs and the displacement vectors were calculated. Treatment couches were adjusted according to the displacement vector before treatments. After the treatment, positions were verified with kV X-ray (OBI system). $\underline{Results}$: In the case of head and neck patients, the average sizes of the setup error vectors, given by the cone beam CT, were 0.19 cm for the patient A and 0.18 cm for the patient B. The standard deviations were 0.15 cm and 0.21 cm, each. On the other hand, in the case of the pelvis patient, the average and the standard deviation were 0.37 cm and 0.1 cm. $\underline{Conclusion}$: Through the on-line IGRT using cone beam CT, we could correct the setup errors that could occur in the conventional radiotherapy. The importance of the on-line IGRT should be emphasized in the case of 3D conformal therapy and intensity-modulated radiotherapy, which have complex target shapes and steep dose gradients.