• Title/Summary/Keyword: $O_2$-plasma treatment

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Characteristic Analysis of ITO by Variation of Plasma Condition to Fabricate OLED of High Efficiency (고효율 OLED 제작을 위한 플라즈마 조건 변화에 따른 ITO 특성 분석)

  • Kim, Jung-Yeoun;Kang, Myung-Koo
    • 전자공학회논문지 IE
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    • v.44 no.2
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    • pp.8-13
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    • 2007
  • This paper aims to analyze the characteristics of ITO which are caused by variation of plasma condition to fabricate the OLED of high efficiency. We treated $N_2$ gas and $O_2$ gas plasma on the surface of the ITO by changing their RF plasma power into 100 W, 200 W, 400 W and by changing their 9as pressure into 12 mTorr, 120 mTorr. The work function of ITO that plasma treatment was done by using $N_2$ gas had value of $4.88{\sim}5.07\;eV$, and that by using $O_2$ gas, $4.85{\sim}4.97 eV$. The characteristics of the ITO were most efficient in the $N_2$ gas plasma with the RF power of 200W and gas pressure of 120 mTorr. The rms roughness of ITO surface is the value from AFM image. In this case, ITO obtained $25.2\;{\AA}$ and $30.5\;{\AA}$ in the $N_2$ and $O_2$ gas plasma respectively when it had the RF power of 200 W. But ITO that didn't have plasma treatment was $44.5{\AA}$. The variation of ITO transmittance was almost not discovered by the change of $N_2$ gas and $O_2$ gas pressure.

Influence of Hydrogen and Oxygen Plasma Treatment on the Structural Properties of Carbon Nanotubes (MPECVD를 이용한 탄소나노튜브의 $H_2$$O_2$ 플라즈마 처리에 따른 특성 변화)

  • Lee, Dong-Jin;Lee, Jae-Hyeong;Park, Dae-Hee;Nah, Chang-Woon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.164-165
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    • 2007
  • The effect of hydrogen and oxygen plasma treatments on the structural properties of carbon nanotubes (CNTs) has been systematically investigated. The plasma treatment resulted in the removal of the amorphous carbon particles. As the plasma treatment time was longer, the CNT diameter was reduced, regardless of gas types. Especially, for the sample treated in hydrogen plasma, the catalyst metal on the tip of CNTs was eliminated.

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Improvement of Printing Properties of PET Micro Filament Fabrics Using Low Temperature Plasma Technology(I) (저온 plasma 기술에 의한 PET 극세사직물의 날염성 개선(I))

  • 조규민;이종훈
    • Textile Coloration and Finishing
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    • v.7 no.1
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    • pp.1-9
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    • 1995
  • In order to improve dyeability of poly(ethylene terephthalate)(PET) micro filament fabrics, the effect of the prior oxygen low temperature plasma on the subsequent dyeing(deep dyeing, printing) was examined in various conditions. The apparent concentration of dyed PET micro filament fabrics was increased by $O_{2}$plasma treatment. Higher discharge power levels and higher reactor pressure values created more significant effect. The wettability was significantly increased by $O_{2}$ plasma treatment. Therefore, it is predicted that introducing hydrophilic group on the surface of material can improve the apparent concentration of PET micro filament fabrics.

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Analysis of Chemical and Morphological Changes of Phenol Formaldehyde-based Photoresist Surface caused by O2 Plasma

  • Shutov, D.A.;Kang, Seung-Youl;Baek, Kyu-Ha;Suh, Kyung-Soo;Min, Nam-Ki;Kwon, Kwang-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.5
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    • pp.211-214
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    • 2007
  • Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

High Performance InGaZnO Thin Film Transistor by Atmospheric Pressure Ar Plasma Treatment (대기압 아르곤 플라즈마 처리를 통한 IGZO TFT의 전기적 특성 향상 연구)

  • Jeong, Byung-Jun;Jeong, Jun-Kyo;Park, Jung-Hyun;Kim, Yu-Jung;Lee, Hi-Deok;Choi, Ho-Suk;Lee, Ga-Won
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.4
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    • pp.59-62
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    • 2017
  • In this paper, atmospheric pressure plasma treatment was proposed for high performance indium gallium zinc oxide thin film transistor (IGZO TFT). RF Ar plasma treatment is performed at room temperature under atmospheric pressure as a simple and cost effective channel surface treatment method. The experimental results show that field effect mobility can be enhanced by $2.51cm^2/V{\cdot}s$ from $1.69cm^2/V{\cdot}s$ to $4.20cm^2/V{\cdot}s$ compared with a conventional device without plasma treatment. From X-ray photoelectron spectroscopy (XPS) analysis, the increase of oxygen vacancies and decrease of metal-oxide bonding are observed, which suggests that the suggested atmospheric Ar plasma treatment is a cost-effective useful process method to control the IGZO TFT performance.

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Crystalline Phases and Superconductor Characteristics of the Plasma Sprayed YBa2Cu$\chi$O7-y High Tc Superconductor Thick Film (플라즈마 용사법에 의해 제조된 YBa2Cu$\chi$O7-y(X=3, 3.5, 4) 고온초전도체 후막층의 결정상 및 초전도 특성)

  • 한명섭;서동수
    • Journal of the Korean Ceramic Society
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    • v.29 no.2
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    • pp.152-160
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    • 1992
  • High-Tc superconductor thick films of YBa2Cu$\chi$O7-y (X=3, 3.5, 4) of which thickness varies from 100 $\mu\textrm{m}$ to 200 $\mu\textrm{m}$ were successfully prepared by plasma spraying method, and the characteristics of thick film depending on copper content and heat treatment conditions were investigated. Regardless of heat-treated temperature, the specimens with X=3 were composed of YBa2Cu$\chi$O7-y, Y2BaCuO5 and BaCuO3 phases. The specimens with X=4, however, were composed of YBa2Cu$\chi$O7-y phase at all heat treatment conditions. The specimens with X=4 composition showed the best superconducting characteristics after heat treatment at 925$^{\circ}C$, and the superconducting transition temperature with zero resistivity (Tc,zero) was 87K. The thick film lost superconductivity when the specimens were heat-treated at 950$^{\circ}C$ because of interdiffusion between superconductor elements and bond coating elements and Y2BaCuO5 phase was found was found to be main phase at the interface.

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The Effect of Plasma Treatment on the OLED Characteristics (플라즈마 처리가 유기발광다이오드의 특성에 미치는 영향)

  • Shin, Se-Jin;Ahn, Jong-Myung;Kim, Min-Young;Jang, Ji-Geun
    • Journal of the Semiconductor & Display Technology
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    • v.6 no.1 s.18
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    • pp.23-26
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    • 2007
  • The effects of plasma treatment on the ITO/glass substrate before deposition of organic materials were investigated in the fabrication of green light emitting organic devices with $Alq_3-C545T$ fluorescent system. In our experiments, the optimum plasma treatment was obtained at the power and time of 150W and 2 minutes under the $Ar(50%)/O_2$ ambient of 1 mTorr. The green OLED with plasma treatment at 150W for 2 minutes showed the luminance and efficiency of $4700\;cd/m^2$ and 8 lm/W at 10V, respectively. On the contrary, the same structured device without plasma treatment showed much lower performance with the luminance of $2600\;cd/m^2$ and the efficiency of 3.6 lm/W at 10 V.

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The Characteristics of the Oxide Layer Produced on the Plasma Nitrocarburized Compound Layer of SCM435 Steel by Plasma Oxidation (플라즈마 산질화처리된 SCM435강의 표면경화층의 미세조직과 특성)

  • Jeon Eun-Kab;Park Ik-Min;Lee Insup
    • Korean Journal of Materials Research
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    • v.14 no.4
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    • pp.265-269
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    • 2004
  • Plasma nitrocarburising and post oxidation were performed on SCM435 steel by a pulsed plasma ion nitriding system. Plasma oxidation resulted in the formation of a very thin ferritic oxide layer 1-2 $\mu\textrm{m}$ thick on top of a 15~25 $\mu\textrm{m}$ $\varepsilon$-F $e_{2-3}$(N,C) nitrocarburized compound layer. The growth rate of oxide layer increased with the treatment temperature and time. However, the oxide layer was easily spalled from the compound layer either for both oxidation temperatures above $450^{\circ}C$, or for oxidation time more than 2 hrs at oxidation temperature $400^{\circ}C$. It was confirmed that the relative amount of $Fe_2$$O_3$, compared with $e_3$$O_4$, increased rapidly with the oxidation temperature. The amounts of ${\gamma}$'-$Fe_4$(N,C) and $\theta$-$Fe_3$C, generated from dissociation from $\varepsilon$-$Fe_{2-3}$ /(N,C) phase during $O_2$ plasma sputtering, were also increased with the oxidation temperature.e.

A Study on Bathochromic Finish of Poly(ethylene Terephthalate) Fabrics by Low Temperature Plasma$(O_2)$ Treatment (산소 저온 Plasma 처리에 의한 Poly(ethylene Terephthalate) 직물의 심색화에 관한 연구)

  • Cho, Hwan;Chang, Byong-Ryul;Chang, Du-Sang;Huh, Man-Woo;Cho, In-Suol;Lee, Kwang-Woo
    • Textile Coloration and Finishing
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    • v.4 no.1
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    • pp.1-9
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    • 1992
  • In order to study on the surface modification of the poly(ethylene Terephthalate)(PET) fabrics, low temperature plasma$(O_2)$ has been irradiated on the PET fabrics in various conditions. Experiments were carried out at pressure ranging from 0.5 tort to 3 tort. The properties of PET fabrics treated with low temperature plasma($(O_2)$, such as bathochromic, wettability, antistatic property were measured. Etching ratio was increased as the pressure and the output of discharge increased. When its were put on the cathode, the most efficient effect of etching according to the position of sample between anode and cathode was obtained. The bathochromic effect has more or less improved as pressure was getting higth in case of dyed fabrics treated with only low temperature plasma$(O_2)$ . And when it was treated with the low refractive index resin, the bathochromic of dyed fabrics treated with low temperature plasma$(O_2)$ was better than that of the dyed fabrics untreated.

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A Study on the Surface Modification Mechanism of Copper Foil Using O2 / Ar Plasma (O2 / Ar 플라즈마를 이용한 구리호일 표면 개질에 관한 연구)

  • Lee, Jongchan;Son, Jinyoung;Kim, Moonkeun;Kwon, Kwang-Ho;Lee, Hyunwoo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.11
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    • pp.836-840
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    • 2013
  • In this study, the surface modification of copper foil using an inductively coupled $O_2$ / Ar plasma as $O_2$ gas fraction (0~100%) was investigated in order to improve the surface characteristics. After plasma treatment, the measurement of the surface roughness, surface contact angle and surface energy were performed for the surface analysis of copper foil. As a result, the surface roughness and the surface energy were increased. And plasma diagnostics was performed by a double Langmuir probe (DLP) and optical emission spectroscopy (OES). Using these results, the plasma surface modification mechanism was investigated.