• 제목/요약/키워드: $O_2$ partial pressure

검색결과 489건 처리시간 0.032초

MOCVD 공정을 이용한 $Yb_2O_3$ 박막 제조 (Preparation of $Yb_2O_3$ Film by MOCVD Method)

  • 정우영;전병혁;박해웅;홍계원;김찬중
    • Progress in Superconductivity
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    • 제8권1호
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    • pp.75-80
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    • 2006
  • [ $Yb_2O_3$ ] films were successfully deposited on a cube-textured Ni and(100) $SrTiO_3$(STO) single crystal substrates by metal organic chemical vapor deposition(MOCVD) method using $H_2O$ vapor as an oxidant. $H_2O$ vapor was used in order to avoid the oxidation of Ni substrate. The working pressure and Ar flow rate were 10 Ton and 600 sccm, respectively. $Yb_2O_3$ films on STO were formed at high temperatures above $900^{\circ}C$. While XRD peaks from $Yb_2O_3$ were hardly detected at $900^{\circ}C$, the $Yb_2O_3$(400) texture was developed fur the films grown at deposition temperatures above $950^{\circ}C$. The AEM surface roughness of $Yb_2O_3$ film, grown on STO, was in the range of $6{\sim}10nm$ for the film deposited at $950^{\circ}C$ with a $H_2O$ vapor partial pressure of 5.5 Ton and deposition times of 3 and 5 mins. For cube-textured Ni substrate, both $Yb_2O_3$(222) and $Yb_2O_3$ (400) textures were developed textures at deposition temperatures above $850^{\circ}C$.

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반응성 dc 미그네트론 스퍼링법으로 제조된 IPO박막에 미치는 산소분압의 영향 (Effects of Oxygen Partial Pressure on ITO Thin Films PrePared by Reactive dc Magenetron Sputtering)

  • 신성호;신재혁;박광자;김현우
    • 한국표면공학회지
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    • 제31권3호
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    • pp.171-176
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    • 1998
  • Transparent conducting ITO (Indium Tin Oxide) thin films were prepared on soda lime glass by reactive dc magnetron sputtering mothod. The maaterial properties were measured by the X-ray diffraction meter (XRD) and atomic force microscopy (AFM) scanning. As a resuIts, the (400) park for $O_2 gas rate 2% grows uniquely as the preferred orientaon. However, the (400) peak exists at $O_2 gas rate 5% as well as the (222) peak appears abruptly as the main orietation. Both <100> and <111> grain alignments are consisted simultaneously in the XRE pattern of ITO thin films. The electrical charcteristics were esimated by the electrical resistivity, optical transmission, and Hall mobillty, ect. The resistivity of ITO thin film deposited at 4cm from the substrate center is increased from $2\times10^-4$ to $8\times10^-4\Omega$cm as a function of $O_2$ gas pressure (0~5%). The optical transmission curves with a rising of $O_2$ gas rate become shifted into longer wavelength range.

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$CaF_{2}$를 이용한 고체전해질 산소센서의 제조및 그 특성 (Fabrication of Solid Electrolyte Oxygen Sensors Using $CaF_{2}$ and their Characteristics)

  • 이재현;이덕동
    • 센서학회지
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    • 제3권2호
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    • pp.40-49
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    • 1994
  • $CaF_{2}$ 불화물 고체전해질을 모물질로하는 저온동작용($300^{\circ}C{\sim}$500^{\circ}C) 산소센서를 제조하였다. $CaF_{2}$ 산소센서는 수축률과 SEM사진의 결과를 토대로 $850^{\circ}C$-3hr 동안 열처리 하였다. 디스크형 산소 센서는 기준전극으로 Air($O_{2}:21%$)|Pt를, 전해질로는 $CaF_{2}$, 감지전극으로 Pt를 사용하였으며, 기준전극 내장형 산소센서는 기준전극으로 NiO/Ni (30:70)을 사용하였다. 디스크형 산소센서의 경우 측정온도 $400^{\circ}C$에서 산소농도($0.1 %{\sim}10%$)로 변화시 45mV 정도의 기전력 변화를 보였으며, 기준전극 내장형의 경우는 40mV의 변화를 보였다.

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ZnO-SnO2 투명박막트랜지스터의 특성에 미치는 산소분압 및 후속열처리의 영향 (The Effects of Oxygen Partial Pressure and Post-annealing on the Properties of ZnO-SnO2 Thin Film Transistors)

  • 마대영
    • 한국전기전자재료학회논문지
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    • 제25권4호
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    • pp.304-308
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    • 2012
  • Transparent thin film transistors (TTFT) were fabricated using the rf magnetron sputtered ZnO-$SnO_2$ films as active layers. A ceramic target whose Zn atomic ratio to Sn is 2:1 was employed for the deposition of ZnO-$SnO_2$ films. To study the post-annealing effects on the properties of TTFT, ZnO-$SnO_2$ films were annealed at $200^{\circ}C$ or $400^{\circ}C$ for 5 min before In deposition for source and drain electrodes. Oxygen was added into chamber during sputtering to raise the resistivity of ZnO-$SnO_2$ films. The effects of oxygen addition on the properties of TTFT were also investigated. 100 nm $Si_3N_4$ film grown on 100 nm $SiO_2$ film was used as gate dielectrics. The mobility, $I_{on}/I_{off}$, interface state density etc. were obtained from the transfer characteristics of ZnO-$SnO_2$ TTFTs.

Anatase TiO$_2$박막의 미세조직이 광촉매 효과에 미치는 영향 (Photocatalytic Efficiency of Anatase TiO$_2$Thin Film by Reactive Sputtering)

  • 최용락;김선화
    • 한국재료학회지
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    • 제11권7호
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    • pp.537-544
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    • 2001
  • $TiO_2$광촉매릉 반응성 스퍼터링법을 이웅하여 박막으로 제조하고 유기물 및 살균실험을 통하여 미세조직이 광촉매 효율에 미치는 영향을 조사하고자 하였다. 광촉매 효율측정을 위하여 페놀분해실험 및 E.coli 078을 이용한 살균실험을 행하였다. $TiO_2$박막에 의한 페놀분해실험 시, 전자수용체인 산소의 공급에 의하여 분해효율이 2배까지 증가하였다. E.coli 078분해실험의 경우, 광촉매 $TiO_2$박막을 사웅하여 살균하였을때 UV만 조사하여 살균하였을 경우 보다 분해효율이 최고 70% 이상 증가하였다. 페놀분해실험과 E.coli 078 살균실험 결과 저결정성 박막의 경우 분해능이 매우 미약하였으며, 표면조도가 높고 결정성이 우수한 박막의 경우에 높은 광촉매 효율을 나타내어$TiO_2$박막의 광촉매 효과는 표면형상과 결정성이 매우 중요한 인자로 작용하였다.

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Effects of the Impurity Gases on the Characteristics of ac PDP

  • Shin, Joong-Hong;Park, Chung-Hoo
    • 한국전기전자재료학회논문지
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    • 제15권10호
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    • pp.909-913
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    • 2002
  • The luminance and discharge characteristics of ac PDP may be significantly affected by a small amount of impurity gas in working gas. These impurity gases such as O$_2$, O, C and H$_2$ can be mixed in the manufacturing and /or discharge process. In this paper a small amount of impurity gas in acPDP are introduced quantitatively and the relationship between the amount of impurity gas and the luminance/discharge characteristics are investigated. The luminous efficiency decreased seriously with increase in the partial pressure of impurity gases, especially in H$_2$, O$_2$ and CO$_2$. Under the condition of the impurity gas ratio of 2${\times}$10$\^$-3/ for Ar, N2, H$_2$, CO$_2$ and O$_2$, the luminous efficiency decreased about 8%, 8%, 32%, 36% and 50%, respectively.

Synthesis of Titanium Diboride and Composites by Carbothermic Reduction of Titanium Oxide and Boric Oxide

  • Yoon, Su-Jong;Jha, Animesh
    • The Korean Journal of Ceramics
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    • 제4권4호
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    • pp.387-393
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    • 1998
  • The formation of titanium diboride ($TiB_2$ ) via the reduction of $TiO_2$ with boric oxide and carbon was studied in a partially reducing atmosphere of argon mixed with 4 vol.%H2. The effect of reaction time, temperature, partial pressure of nitrogen and $TiO_2/B_2_O3$ stoichiometric ratio on the reducibility of oxides has been studied. The phases formed were analysed by using X-ray rowder diffraction and scanning sosctron microscopic techniques. In this paper, we also investigated the presence of $CaC_2$ as a reducing agent on the reducibility of oxide mixtures and on the Ti-B-C-Ca-O phase equilibria. The morphology of $TiB_2$ formed in the presence of $CaC_2$ is compared with the microstructure of $TiB_2$ formed as a consequence of carbothermic reduction. The observed variation in $TiB_2$ crystals formed is also explained.

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Electrical Conductivity of the System ThO$_2-Ho_2O_3$

  • 조승구;박성호;김규홍;최재시
    • Bulletin of the Korean Chemical Society
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    • 제9권1호
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    • pp.21-24
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    • 1988
  • The electrical conductivitv of the system $ThO_2-Ho_2O_3$ was measured in the temperature range 600-$1100^{\circ}C$ and $Po_2$range $10^{-5}-2{\times}10^{-1}$ atm. The mean value of activation energy was 1.45 eV. The observed conductivity dependence on $Po_2$ was ${Po_2}^{1/4}$ at $Po_2$'s above $10^{-3}$ atm and was independent on oxygen partial pressure at $Po_2$'s below $10^{-3}$ atm. It is suggested that these dependences are due to a mixed ionic plus electron hole conduction by Vo defect.

질산염 무기금속 화합물의 분무열분해법에 의한 High-$J_c$ YBCO 박막 제조 (Preparation of High $J_c$ YBCO Films on LAO by Spray Pyrolysis Process Using Nitrate Precursors)

  • 홍석관;김재근;김호진;조한우;유석구;안지현;주진호;이희균;홍계원
    • Progress in Superconductivity
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    • 제8권1호
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    • pp.71-74
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    • 2006
  • High $J_c$ over 1 $MA/cm^2$ YBCO film has been successfully prepared using nitrate precursors by spray pyrolysis method. Aerosol drolpets generated using a concentric spray nozzle were directly sprayed on a $LaAlO_3$(100) single crystal substrate. The cation ratio of precursor solution was Y:Ba:Cu=1:2.65:1.35. The distance between nozzle and substrate was 15 cm. Deposition temperature was ranging from $750^{\circ}C\;to\;800^{\circ}C$. Deposition pressure was 100 Torr, and oxygen partial pressure was varied from 10 Torr to 50 Torr. The microstructure, phase formation, texture development and superconducting properties of deposited films were largely changed with oxygen partial pressure. Deposited films showed a texture with(001) planes parallel to substrate plane. High quality film was obtained when film was deposited at $760^{\circ}C$ with an oxygen partial pressure of 30 Torr. The critical current density($J_c$) of the YBCO film was 1.75 $MA/cm^2$ at 77 K and self-field.

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비정질 투휘석($CaMgSi_2O_6$)에 대한 상변이 연구 (A Phase Transformation Study on Amorphous Diopside ($CaMgSi_2O_6$))

  • 김영호
    • 한국광물학회지
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    • 제16권2호
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    • pp.161-169
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    • 2003
  • 한성 비정질 투휘석$(Ca,Mg)SiO_3$에 대한 상변이 연구를 압력은 다이아몬드앤빌기기를 이용하여 ∼30 GPa까지, 온도는 약(YAG) 레이저 가열기기를 이용하여 ∼$1000^{\circ}C$에서 조사(scanning)하여 시행하였다. 비정질 투휘석은 고온-고압 하에서 곧바로 등축정계에 속하는 단상의 $(Ca,Mg)SiO_3$페롭스카이트 결정구조로 상변이 하였다. 이러한 결과는 고온-고압 하에서 사방정계에 속하는 $MgSiO_3$페롭스카이트 상과 등축정계에 속하는 $CaSiO_3$페롭스카이트 상으로 분리되는 상변이를 하는 결정질 투휘석의 상변이 계통과는 큰 차이를 보이고 있다. 이러한 차이는 출발시료의 차이점이나 특히 온도가 상변이에 큰 영향인자로 작용하여 기인한 것으로 판단된다. 이러한 강변이 관계는 맨틀의 온도, 압력 및 산소분압 차이 등에 의해 맨틀전이대나 하부맨틀을 구성하는 광물상의 조합에 영향을 줄 수 있다.