• 제목/요약/키워드: $Nano-TiN_x$

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Hard coating 응용을 위한 DC 마그네트론 스퍼터링 방법을 이용하여 증착한 TiN 박막의 특성에 대한 연구 (Characteristic properties of TiN thin films prepared by DC magnetron sputtering method for hard coatings)

  • 김영렬;박용섭;최원석;홍병유
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.354-354
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    • 2007
  • Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness. In this paper, we wanted see how the films properties are changed according to DC power. TiN thin films were deposited by direct current (DC) magnetron sputtering method using TiN compound target on silicon substrates. The films structural properties are examined by X-ray Diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester, nano-stress tester. Especially in DC power of 150 W, the maximum hardness and the minimum residual stress of TiN film exhibited about 25 GPa and 1 GPa, respectively. And also, the critical load of TiN film prepared by magnetron sputtering method were measured over 30 N.

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Synthesis and characterization of nanocrystalline Al0.5Ag0.5TiO3 powder

  • Kumar, Sandeep;Sahay, L.K.;Jha, Anal K.;Prasad, K.
    • Advances in nano research
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    • 제1권4호
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    • pp.211-218
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    • 2013
  • A low-cost, green and reproducible citric acid assisted synthesis of nanocrystalline $Al_{0.5}Ag_{0.5}TiO_3$ (n-AAT) powder is reported. X-ray, FTIR, energy dispersive X-ray, transmission electron microscopy and scanning electron microscopy analyses are performed to ascertain the formation of n-AAT. X-ray diffraction data analysis indicated the formation of monoclinic structure. Spherical shaped particles having the sizes of 3-15 nm are found. The mechanism of nano-transformation for the soft-chemical synthesis of n-AAT has been explained using simple organic chemistry rules and nucleation and growth theory. Dielectric study revealed that AAT ceramic might be a suitable candidate for capacitor applications.

마그네트론 스퍼터링 증착법을 사용하여 순수한 질소 플라즈마에 의해 성막된 고경도 TiNX 박막의 역학적 특성 (Mechanical Properties of High-Hardness TiNX Thin Films Deposited by Pure Nitrogen Plasma Using Magnetron Sputtering Deposition)

  • 이창현;이병로;배강;박창환;김화민
    • 한국전기전자재료학회논문지
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    • 제30권8호
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    • pp.514-519
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    • 2017
  • TiN (titanium nitride) films were prepared using the RF magnetron sputtering technique. The films were deposited by pure $N_2$ plasma sputtering. Their mechanical properties, such as nano-indentation hardness, friction coefficient, and surface wettability, have been investigated. X-ray diffraction (XRD) studies revealed that the orientation of $TiN_X$ films changed towards the (111) orientation with decreasing working pressure due to a strong compressive stress during deposition. The strongest TiN (111) orientation was found when the film was deposited at a working pressure of 1 Pa. This film showed the largest hardness (16 GPa) and smallest friction coefficient (0.17) among the studied samples. Moreover, this film was found to be accompanied by a water-repellent surface with water contact angle more than $100^{\circ}$.

The Syntheses, Characterizations, and Photocatalytic Activities of Silver, Platinum, and Gold Doped TiO2 Nanoparticles

  • Loganathan, Kumaresan;Bommusamy, Palanisamy;Muthaiahpillai, Palanichamy;Velayutham, Murugesan
    • Environmental Engineering Research
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    • 제16권2호
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    • pp.81-90
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    • 2011
  • Different weight percentages of Ag, Pt, and Au doped nano $TiO_2$ were synthesized using the acetic acid hydrolyzed sol-gel method. The crystallite phase, surface morphology combined with elemental composition and light absorption properties of the doped nano $TiO_2$ were comprehensively examined using X-ray diffraction (XRD), $N_2$ sorption analysis, transmission electron microscopic (TEM), energy dispersive X-ray, and DRS UV-vis analysis. The doping of noble metals stabilized the anatase phase, without conversion to rutile phase. The formation of gold nano particles in Au doped nano $TiO_2$ was confirmed from the XRD patterns for gold. The specific surface area was found to be in the range 50 to 85 $m^2$/g. TEM images confirmed the formation a hexagonal plate like morphology of nano $TiO_2$. The photocatalytic activity of doped nano $TiO_2$ was evaluated using 4-chlorophenol as the model pollutant. Au doped (0.5 wt %) nano $TiO_2$ was found to exhibit higher photocatalytic activity than the other noble metal doped nano $TiO_2$, pure nano $TiO_2$ and commercial $TiO_2$ (Degussa P-25). This enhanced photocatalytic activity was due to the cathodic influence of gold in suppressing the electron-hole recombination during the reaction.

비납계 (Bi0.5Na0.5)(1-x)BaxTiO3 압전 세라믹 재료의 최적 조성 (Optimum Compositions for Piezoelectric Properties of Pb-free (Bi0.5Na0.5)(1-x)BaxTiO3 Ceramics)

  • 성연수;여홍구;조종호;송태권;정순종;송재성;김명호
    • 한국재료학회지
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    • 제17권2호
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    • pp.68-72
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    • 2007
  • Optimum compositions for piezoelectric properties of $(Bi_{0.5}Na_{0.5})_{(1-x)}Ba_xTiO_3$ ceramics were investigated in the range of $x=0{\sim}0.1$ covering rhombohedral to tetragonal phase regions. No impurity phases other than a perovskite phase were found and the grain size decreased with increasing x. A two-phase coexisting morphotropic phase area rather than boundary dividing rhombohedral and tetragonal phase regions appeared to exist at $x=0.05{\sim}0.08$. As for piezoelectric properties within morphotropic phase compositions, the piezoelectric constant ($d_{33}$) and the electromechanical coupling factor ($K_p$) showed peak values at x=0.065, 192 pC/N and 34%, respectively, indicating x=0.065 as an optimum composition for piezoelectric $(Bi_{0.5}Na_{0.5})_{(1-x)}Ba_xTiO_3$ ceramics.

Ti0.5Al0.5N/CrN 나노 다층 박막의 기계적 성질과 열적 안정성 (Mechanical Properties and Thermal Stability of Ti0.5Al0.5N/CrN Nano-multilayered Coatings)

  • 안승수;박종극;오경식;정태주
    • 한국분말재료학회지
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    • 제27권5호
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    • pp.406-413
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    • 2020
  • Ti0.5Al0.5N/CrN nano-multilayers, which are known to exhibit excellent wear resistances, were prepared using the unbalanced magnetron sputter for various periods of 2-7 nm. Ti0.5Al0.5N and CrN comprised a cubic structure in a single layer with different lattice parameters; however, Ti0.5Al0.5N/CrN exhibited a cubic structure with the same lattice parameters that formed the superlattice in the nano-multilayers. The Ti0.5Al0.5/CrN multilayer with a period of 5.0 nm exceeded the hardness of the Ti0.5Al0.5N/CrN single layer, attaining a value of 36 GPa. According to the low-angle X-ray diffraction, the Ti0.5Al0.5N/CrN multilayer maintained its as-coated structure up to 700℃ and exhibited a hardness of 32 GPa. The thickness of the oxidation layer of the Ti0.5Al0.5N/CrN multilayered coating was less than 25% of that of the single layers. Thus, the Ti0.5Al0.5N/CrN multilayered coating was superior in terms of hardness and oxidation resistance as compared to its constituent single layers.

열플라즈마에 의한 TiO2-xNx의 합성 및 광촉매 특성 비교 (Synthesis of TiO2-xNx Using Thermal Plasma and Comparison of Photocatalytic Characteristics)

  • 김민희;박동화
    • 공업화학
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    • 제19권3호
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    • pp.270-276
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    • 2008
  • $TiO_2$의 가장 큰 특징은 광촉매적 특성을 들 수 있으나 순수한 $TiO_2$는 자외선 영역에서만 활성을 보이는 단점이 있다. 단점을 보완하고자 본 연구에서는 초고온, 고활성을 이용한 열플라즈마 공정으로 질소가 도핑된 $TiO_2$를 합성하여 $TiO_2$의 광촉매적 특성을 높이고자 하였다. 직류 플라즈마 제트를 이용하여 비금속이온인 질소와 반응 가스인 산소를 $TiCl_4$와 함께 플라즈마 반응기 안에서 반응시켜 질소가 도핑된 $TiO_2$ 나노 분말을 합성하였다. 합성 조건으로 질소의 유량을 변화하였다. 합성 변수에 따른 입자의 상조성, 크기를 분석하였고 아세트알데히드와 곰팡이를 광분해하는 실험을 통해 광촉매 활성을 살펴보았다. 한편 $TiO_2$의 분말 상태와 코팅된 상태의 광촉매 특성을 비교하고자 합성한 분말의 스핀 코팅과 PLD (Pulsed Laser Deposition)을 통해 $TiO_2$를 코팅하였다. 아세트알데히드 분해 실험의 결과 질소가 도핑된 $TiO_2$ 분말의 경우가 순수한 $TiO_2$ 분말에 비해 가시영역에서의 광촉매 활성이 두 배 이상 뛰어난 것을 확인하였으며, 곰팡이 분해 실험 결과 역시 질소가 도핑된 $TiO_2$ 분말에 곰팡이가 분해되는 것을 확인하였다. 분말과 필름을 제조하여 메틸렌블루 광분해 실험한 결과 분말의 경우 100% $TiO_2$입자가 메틸렌블루 분해에 이용되며, 반면 스핀 코팅의 경우 바인더의 함량 때문에 20~30%의 $TiO_2$만이 분해에 이용되기 때문에, 분말의 경우 초기 30 mL 메틸렌블루를 한번에 분해할 수 있었다.

Hard Coating 응용을 위한 DC 마그네트론 스퍼터링 방법을 이용하여 증착한 TiN 박막의 특성에 대한 연구 (Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings)

  • 김영렬;박용섭;최원석;홍병유
    • 한국전기전자재료학회논문지
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    • 제21권7호
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    • pp.660-664
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    • 2008
  • Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.

교정용 와이어의 표면특성에 미치는 TiN 및 ZrN 코팅영향 (Effects of TiN and ZrN Coating on Surface Characteristics of Orthodontic Wire)

  • 김원기;김도영;최한철
    • 한국표면공학회지
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    • 제41권4호
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    • pp.147-155
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    • 2008
  • The dental orthodontic wire provides a good combination of strength, corrosion resistance and moderate cost. The purpose of this study was to investigate the effects of TiN and ZrN coating on corrosion resistance and physical property of orthodontic wire using various instruments. Wires(round type and rectangular type) were used, respectively, for experiment. Ion plating was carried out for wire using Ti and Zr coating materials with nitrogen gas. Ion plated surface of each specimen was observed with field emission scanning electron microscopy(FE-SEM), energy dispersive X-ray spectroscopy(EDS), atomic force microscopy(AFM), vickers hardness tester, and electrochemical tester. The surface of TiN and ZrN coated wire was more smooth than that of other kinds of non-coated wire. TiN and ZrN coated surface showed higher hardness than that of non-coated surface. The corrosion potential of the TiN coated wire was comparatively high. The current density of TiN coated wire was smaller than that of non-coated wire in 0.9% NaCl solution. Pit nucleated at scratch of wire. The pitting corrosion resistance $|E_{pit}-E_{rep}|$ increased in the order of ZrN coated(300 mV), TiN coated(120 mV) and non-coated wire(0 mV).

ZrN 및 TiN 코팅된 치과교정 용 미니나사의 표면특성과 전기화학적 거동 (Surface Characteristics and Electrochemical Behaviors of TiN and ZrN Coated Orthodontic Mini-screw)

  • 김신영;문영필;박근형;조호형;김원기;손미경;최한철
    • 한국표면공학회지
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    • 제41권5호
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    • pp.232-239
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    • 2008
  • The dental orthodontic mini-screw requires good mechanical properties and high corrosion resistance for implantation in the bone. The purpose of this study was to investigate the electrochemical characteristics of TiN and ZrN coated orthodontic mini-screws, mini-screws were used for experiment. Ion plating was carried out for mini-screw using Ti and Zr coating materials with nitrogen gas. Ion plated surface of each specimen w as o bserved with f ield emission scanning e lectron microscopy ( FE-SEM), e nergy dispersive x-ray spectroscopy (EDX), and electrochemical tester. The surface of TiN and ZrN coated mini-screw were more smooth than that of other kinds of non-coated mini-screw due to dercrease of machined defects. The corrosion current density of the TiN and ZrN coated mini-screw decreased compared to non-coated sample. The corrosion potential of TiN and ZrN coated mini-screw were higher than that of non-coated mini-screw in 0.9% NaCl solution. The pitting corrosion resistance increased in the order of ZrN coated, TiN coated and non-coated wire. Pitting potential of ZrN coated mini-screw was the highest in the other specimens.