• Journal of Integrative Natural Science
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• v.3 no.2
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• pp.89-95
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• 2010

It is still controversial where the improved stability of n-octadecyltriethoxysilane self-assembled monolayer (OTE SAM) on plasma-pretreated mica surface exactly originates from. To date, it has been well known that the extensive cross-polymerization between silane head-groups is a crucial factor for the outstanding mechanical strength of the monolayer. However, this study clearly showed that the stability comes not only from the cross-links but also, far more importantly, from the direct chemical bonds between silane headgroups and mica surface. To examine this phenomenon, n-octadecyltrichlorosilane monolayers were self-assembled on both untreated and plasma treated mica surfaces, and their adhesion properties at various physical conditions (relative humidity, high stress, and contact repetition) were investigated and compared through the use of the surface forces apparatus technique. It revealed that, in highly humid conditions (>90%RH), there is a substantial difference of stability between untreated and plasma treated cases and the plasma treated surface is mechanically much more stable. It obviously proves that the extensive chemical bonds indeed exist between silane head-groups and plasma treated mica surface and dramatically improve the mechanical stability of the OTE monolayer-coated mica substrate.

• Korean Journal of Materials Research
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• v.12 no.6
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• pp.427-430
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• 2002

Plasma nitrocarburizing treatment was performed for SCM 435 steel by using a plasma ion nitriding system. The effects of the variation of nitrogen and methan contents upon the hardened layer was investigated. Both the thickness of the compound layer and the amount of $\varepsilon$ phase in the compound layer increased with increasing nitrogen content. However, the thickness of the compound layer decreased due to unstable plasma for an atmosphere containing 90% $N_2$ gas content in the gas mixture. The amount of $\varepsilon$phase in the compound layer increased with increasing $CH_4$ gas content. For $CH_4$ gas content more than 2% in the gas mixture, the thickness of the compound layer decreased due to the formation of $\theta$ phase.

• Membrane Journal
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• v.11 no.1
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• pp.38-49
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• 2001

The surface of polyimide membrane was modified by plasma treatment using Ar and NH~. and the permeability and selectivity for the mixture gas $(CO_2/N_2=20/80 vol%)$ were measured. The per¬meation experiments were performed by a variable volume method at $30^{\circ}$C and total pressure of 5 atm, The effect of the plasma conditions such as treatment time, power input, gas flow rate and pressure in the reactor on the transport Dwperties of modified membranes was investigated. The surface of the plasma treated membrane was analyzed by means of FTlR - ATH, ESCA and AFM. The dependences of the wettability and the etching on plasma treatment time were investigated by use of the contact angle and the weight loss measurement. Measurements of gas pcnneability characteristic were performed using both dry and wet membranes. The effects of experimental conditions such as temperature on the membrane performance were studied.

• Korean Journal of Materials Research
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• v.8 no.4
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• pp.317-322
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• 1998

The stabilization of low dielectric constant SiOF films prepared by conventional PECVD using TEOS and $C_2F_6$ was evaluated by the $N_2O$-plasma post-deposition annealing. Properties of SiOF film became unstable when it was air-exposed or heat-treated. Water absorption of SiOF films was increased as F content was increased due to the for¬mation of F -Si- F bonds. Also F content of SiOF films decreased after heat treatment. $N_2O$-plasma post-deposition annealing was proved to be effective on stabilizing SiOF films. which was mainly due to the formation of thin SiON layer near the top surface of films. However. the value of dielectric constant was greatly increased again when $N_2O$-plasma post-deposition annealing was done for a long time. To stabilize the SiOF films without an increase of dielec¬tric constant by $N_2O$- plasma post-deposition annealing. the annealing time should be kept the minimum value. to which stabilizing effects against air environment and heat treatment were preserved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.356-357
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• 2008

The effects of $O_2$ plasma ashing process for surface treatment of nano-wire Bio-FET were investigated. In order to evaluate the plasma damage introduced by $O_2$ plasma ashing, a back-gate biasing method was developed and the electrical characteristics as a function of $O_2$ plasma power were measured. Serious degradations of electrical characteristics of nano-wire Bio-FET were observed when the plasma power is higher than 50 W. For curing the plasma damages, a forming gas anneal (2 %, $H_2/N_2$) was carried out at $400^{\circ}C$. As a result, the electrical characteristics of nano-wire Bio-FET were considerably recovered.

• Journal of Environmental Science International
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• v.22 no.7
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• pp.863-871
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• 2013

Dielectric discharges are an emerging technique in environmental pollutant degradation, which that are characterized by the production of hydroxyl radicals as the primary degradation species. For practical application of the plasma reactor, reactor that can handle large amounts of water are needed. Plasma research to date has focused on small-scale water treatment. This study was carried out basic study for scale-up of a single DBD (dielectric barrier discharge) plasma reactor. The degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical) was used as a performance indicator of multi-plasma reactor. The experiments is divided into two parts: design parameters [effect of distance of single plasma module (1~14 cm), arrangement of ground electrode (single and multi), rector number (1~5) and power number (1~5)]; operation parameter [effect of applied voltage (60~220 V), air flow rate (1~5 L/min), electric conductivity of solution ($1.4{\mu}S/cm$, deionized water)~18.8 mS/cm (addition of NaCl 10 g/L) and pH (5~9)]. Considering the electric stability of the plasma reactor, optimum spacing between the single plasma module was 2 cm. Multi discharge electrodes - single ground electrode array was selected. Combination of power 3-plasma module 5 was the optimal combination for maximum RNO degradation. The optimum 1st voltage and air flow rate for RNO degradation were 180 V and 4 L/min, respectively. The pH and conductivity of the solution was not influencing the RNO degradation.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.60 no.10
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• pp.1895-1902
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• 2011

This work was carried out for the measurement of vibration and rotation temperature using the optical emission spectroscopy of nitrogen second positive system in the small plasma torch. Among emissions $N_2$ SP systems, the emission of $N_2$ SP(0-0) was so strong. Emission peaks of SP system increased until the position of 12.5[mm] from the end of plasma torch, after that it decreased. However, vibration temperature decreased from 1540[K] to 1000[K] at the position of 12.5[mm]. In addition, rotational temperature was about 400[K] at the position of 10[mm] and it increased a little as much of 420[K] at 12.5[mm]. Consequently, the plasma torch discussed in this work is possible to apply in the surface treatment process under the low temperature.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.337-337
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• 2012

Dye sensitized solar cell (DSSC) having high efficiency with low cost was first reported by Gr$\ddot{a}$tzel et al. Many DSSC research groups attempt to enhance energy conversion efficiency by modifying the dye, electrolyte, Pt-coated electrode, and $TiO_2$ films. However, there are still some problems against realization of high-sensitivity DSSC such as the recombination of injected electrons in conduction band and the limited adsorption of dye on $TiO_2$ surface. The surface of $TiO_2$ is very important for improving hydrophilic property and dye adsorption on its surface. In this paper, we report a very efficient method to improve the efficiency and stability of DSSC with nano-structured $TiO_2$. Atmospheric plasma system was utilized for nitrogen plasma treatment on nano-structured $TiO_2$ film. We confirmed that the efficiency of DSSC was significantly dependent on plasma power. Relative in the $TiO_2$ surface change and characteristics after plasma was investigated by various analysis methods. The structure of $TiO_2$ films was examined by X-ray diffraction (XRD). The morphology of $TiO_2$ films was observed using a field emission scanning electron microscope (FE-SEM). The surface elemental composition was determined using X-ray photoelectron spectroscopy (XPS). Each of plasma power differently affected conversion efficiency of DSSC with plasma-treated $TiO_2$ compared to untreated DSSC under AM 1.5 G spectral illumination of $100mWcm^{-2}$.

• Journal of Microbiology and Biotechnology
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• v.29 no.9
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• pp.1401-1411
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• 2019

Mycobacterial cell walls comprise thick and diverse lipids and glycolipids that act as a permeability barrier to antibiotics or other chemical agents. The use of OH radicals from a non-thermal plasma jet (NTPJ) for the inactivation of mycobacteria in aqueous solution was adopted as a novel approach. Addition of water vapor in a nitrogen plasma jet generated OH radicals, which converted to hydrogen peroxide ($H_2O_2$) that inactivated non-pathogenic Mycobacterium smegmatis and pathogenic Mycobacterium tuberculosis H37Rv. A stable plasma plume was obtained from a nitrogen plasma jet with 1.91 W of power, killing Escherichia coli and mycobacteria effectively, whereas addition of catalase decreased the effects of the former. Mycobacteria were more resistant than E. coli to NTPJ treatment. Plasma treatment enhanced intracellular ROS production and upregulation of genes related to ROS stress responses (thiolrelated oxidoreductases, such as SseA and DoxX, and ferric uptake regulator furA). Morphological changes of M. smegmatis and M. tuberculosis H37Rv were observed after 5 min treatment with $N_2+H_2O$ plasma, but not of pre-incubated sample with catalase. This finding indicates that the bactericidal efficacy of NTPJ is related to the toxicity of OH and $H_2O_2$ radicals in cells. Therefore, our study suggests that NTPJ treatment may effectively control pulmonary infections caused by M. tuberculosis and nontuberculous mycobacteria (NTM) such as M. avium or M. abscessus in water.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1878-1880
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• 2005

In this research, We investigated the effect of $O_2/O_3$ Plasma treatment of indium-tin oxide (ITO) surface on the performance of organic light emitting devices (OLEDs). The OLED had a structure of ITO/N,N'-diphenyl-N,N' -(3-methylphenyl)-1, 1'-biphenyl-4-4'-diamine (TPD)/Tris (8-hydroxyquinolinato) Aluminum $(Alq_3)/Al$. The ITO surface was treated by $O_2/O_3$ plasma with different RF power chamber pressure and exposure time. As a result, the emission efficiency of the OLEDs could be improved obviously.