Atomic Layer Deposition and Characterization of Tantalum Oxide Films Using Ta(OC2H5)5 and $\textrm{NH}_3$
($\textrm{Ta}(\textrm{OC}_{2}\textrm{H}_{5})_{5}$ 와 $\textrm{NH}_3$ 를 이용한 산화탄탈륨 막의 원자층 증착 및 특성)
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- Korean Journal of Materials Research
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- v.8 no.10
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- pp.945-949
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- 1998