• Journal of Radiation Protection and Research
• /
• v.23 no.1
• /
• pp.59-63
• /
• 1998

The light sensitivity and angular dependence of the $Mg_2SiO_4$:Tb(MSO-5) TLD which affect the accuracy of the radiation dose measurement are investigated. Light-induced thermoluminescence of MSO-S TLD under the 200 lux fluorescent and the incandescent lamp for 8 hours are corresponding to 11 and 3 mR exposure, respectively. TL intensity ratio of the incident angle of ${\pm}80^{\circ}$ to normal incidence for MSO-S and badge type MSO-L are about 0.8 and 0.15, respectively.

• Proceedings of the Korean Society of Soil and Groundwater Environment Conference
• /
• 2005.10a
• /
• pp.158-159
• /
• 2005

This study showed that the highest temperature point of the Dongrae thermal spring in Pusan was moved to the north direction of the Dongrae fault as times goes by. The Br concentration(1.5mg/L) in Dongrae thermal waters indicated the influence of 2% seawater mixing. If the simple mixing without hydrochemical reaction occurs between seawater and thermal water, the concentration of Mg will be about 20mg/L. But the low concentration(0.1 mg/L) of Mg, contrary to high concentration(10 mg/L) of surrounding groundwater not affected by thermal water, suggested the thermal water, seawater and rock interactions. The calculation of saturation index(SI) by using the geochemical code of EQ3NR showed that the Mg in thermal groundwater, which was introduced by seawater, was removed by the precipitation of Antigorite (SI: log Q/K =71.753, $Mg_{48}Si_{24}O_{85}(OH)_{62}$) and Tremolite (SI: 8.463, $Ca_2Mg_5Si_8O_{22}(OH)_2$), Talc (SI: 6.409, $Mg_3Si_4O_{10}(OH)_2$), Dolomite (SI: 2.014, $CaMg(CO_3)_2$), Chrysotile (SI: 3.698, $Mg_3Si_2O_5(OH)_4$) in the crack of fault zone. The highest temperature point in the study area will move to north direction and stop in the Jangjun area without the input of seawater.

• Proceedings of the Korean Ceranic Society Conference
• /
• 2000.10a
• /
• pp.144.2-144
• /
• 2000

• Korean Journal of Materials Research
• /
• v.18 no.2
• /
• pp.92-97
• /
• 2008

In spray pyrolysis, the effects of the preparation temperature, flow rate of the carrier gas and concentration of the spray solution on characteristics such as the morphology, size, and emission intensity of $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders under long-wavelength ultraviolet light were investigated. The phosphor powders obtained post-treatment had a range of micron sizes with regular morphologies. However, the composition, crystal structure and photoluminescence intensity of the phosphor powders were affected by the preparation conditions of the precursor powders. The $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders prepared at temperatures that were lower and higher than $700^{\circ}C$ had low photoluminescence intensities due to deficiencies related to the of Cl component. The phosphor powders with the deficient Cl component had impurity peaks of $Ca_2SiO_4$. The optimum flow rates of the carrier gas in the preparation of the $Ca_8Mg(SiO_4)_4Cl_2:Eu^{2+}$ phosphor powders with high photoluminescence intensities and regular morphologies were between 40 and 60 l/minute. Phosphor powders prepared from a spray solution above 0.5 M had regular morphologies and high photoluminescence intensities.

• Korean Journal of Materials Research
• /
• v.14 no.1
• /
• pp.46-51
• /
• 2004

The annealing of a Cu(4.5at.% Mg)/$SiO_2$/Si structure in ambient $O_2$, at 10 mTorr, and $300-500^{\circ}C$, allows for the outdiffusion of the Mg to the Cu surface, forming a thin MgO (15 nm) layer on the surface. The surface MgO layer was patterned, and successfully served as a hard mask, for the subsequent dry etching of the underlying Mg-depleted Cu films using an $O_2$ plasma and hexafluoroacetylacetone [H(hfac)] chemistry. The resultant MgO/Cu structure, with a taper slope of about $30^{\circ}C$ shows the feasibility of the dry etching of Cu(Mg) alloy films using a surface MgO mask scheme. A dry-etched Cu(4.5at.% Mg) gate a-Si:H TFT has a field effect mobility of 0.86 $\textrm{cm}^2$/Vs, a subthreshold swing of 1.08 V/dec, and a threshold voltage of 5.7 V. A novel process for the dry etching of Cu(Mg) alloy films, which eliminates the use of a hard mask, such as Ti, and results in a reduction in the process steps is reported for the first time in this work.

• Journal of the Korean Ceramic Society
• /
• v.36 no.4
• /
• pp.425-431
• /
• 1999

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.310-310
• /
• 2007

Mg-Si-O계 세라믹스에 glass frit 조성을 첨가하여 저온에서의 소결 특성 및 마이크로파 유전 특성을 연구하였다. 기존의 Mg-Si-O계 세라믹스는 우수한 유전특성을 가지고 있으나 높은 소결온도로 인하여 LTCC용 기판 소재로 적용이 어려웠다. 본 연구에서는 MgO, $SiO_2$를 이용하여 $Mg_2SiO_4$을 합성한 후, $B_2O_3-ZnO-Na_2O-SiO_2-Al_2O_3$계 glass 조성을 20~40wt%로 첨가하여 소결온도를 감소시켜 LTCC 기판 소재로서의 적용성을 고찰하였다. glass frit 함량이 증가함에 따라 밀도($g/cm^3$) 및 유전율(${\varepsilon}_r$)은 증가하였고 품질계수($Qxf_0$)값은 감소하였다. glass frit 함량이 40wt%일때 $900^{\circ}C$에서 1시간 소결한 소결체의 유전톡성은 유전율 (${\varepsilon}_4$) = 6.5. 품질계수 ($Qxf_0$) = 4,000(GHz), 온도계수 $(\tau_t)\;=\;{\pm}\;10ppm/^{\circ}C$로 우수한 특성을 확인하였다.

• Journal of environmental and Sanitary engineering
• /
• v.24 no.3
• /
• pp.55-61
• /
• 2009

Fe-V is used as raw material of vanadium in the steel making process. The purpose of this study, Fe-V is to replace the $VO_{4}$. So the distribution behavior of vanadium in $VO_{4}$ of the steel investigated. The distribution ratio of the vanadium where potential of the free oxygen ion will increase in slag decreased. When CaO and MgO content which is a basic oxide from CaO-$SiO_2$-FetO-MgOsatd. slag increases, S distribution ratio increases. CaO-$SiO_2$-FetO-MgOsatd. slag better than CaO-$SiO_2$-$Al_2O_3$-MgO slag is the recovery of vanadum and desulfurization.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.11 no.3
• /
• pp.127-131
• /
• 2001

The effect of grain shape on the grain growth behavior of oxide system was investigated as afunction of liquid content during liquid phase sintering. As a model system, the solid grains of $Al_{2}O_{3}$ and MgO were selected during liquid phase sintering, i.e. faceted shape of $Al_{2}O_{3}$ in $CaAl_{2}Si_{2}O_{8}$ liquid phase and spherical shape of MgO in $CaMgSiO_{4}$ liquid phase. The average grain size of MgO with spherical shape was decreased with increasing the liquid phase content, whereas that of $Al_{2}O_{3}$ with faceted shape was independent of liquid phase content. In the case of $Al_{2}O_{3}$ grains with faceted shape, which interfaces are expected to be atomically flat, are likely to grow by the interfacial reaction controled process. Whereas, in the case of MgO grains with spherical shape, which interface are expected to be atomically rough, are likely to grow by the diffusion controlled process.

• Journal of Ceramic Processing Research
• /
• v.22 no.5
• /
• pp.568-575
• /
• 2021

Glass-ceramic glazes were prepared using a CaO-MgO-Al2O3-SiO2 system and were used to fabricate low-temperature firing,high-hardness glazes in ceramic tiles. Additives (B2O3) and a nucleating agent (TiO2) were added to the glaze, and crystallineglazes were obtained by sintering at 1000 ~ 1100 oC for 30 or 60 min. X-ray diffraction analysis of the glazes suggested thatcordierite (Mg2Al4Si5O18) and anorthite (CaAl2Si2O8) crystal phases were present, and the peak intensity of the cordieritecrystal phase increased with increasing sintering temperature. All samples showed high crystallinities of 70% or more,irrespective of sintering temperature or time. The glaze density increased with increasing sintering temperature and decreasedat 1100 oC. The Vickers hardness test results of the glazes indicated high hardness values of 6.79 and 6.77 GPa after 30 minheat treatment at 1000 oC and 60 min at 1050 oC, respectively. Glass-ceramic glaze with high hardness at low temperature wasfabricated through crystallization of glaze for tiles.