• Journal of Sensor Science and Technology
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• v.2 no.1
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• pp.35-40
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• 1993

A FET(field effect transistor) type lipid sensor was fabricated uy immobilizing lipase enzyme on the gate of pH-ISFET($SiO_{2}/Si_{3}N_{4}$). A water soluble polymer, polyvinyl alcohol(PVA) was modified with 1-methyl-4-(formyl-styryl) pyridinium methosulfate(SbQ) to give a photosensitive membrane(PVA-SbQ) in which lipase was immobilized. The optimum photolithographic conditions were ; spin coating speed $5,000{\sim}6,000$ rpm. UV exposure time $20{\sim}30$ seconds, developing time in water $30{\sim}40$ seconds, and vacuum drying time 45 min. at room temperature with the suspension containing PVA-SbQ aqueous solution(SbQ 1mol%, 10 wt %) $200{\mu}L$, bovine serum albumin (BSA) 7.5 mg, and lipase 10 mg. The lipid sensor showed good linear calibration curve in the range of $10{\sim}100$ mM triacetin as a lipid sample.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.100-101
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• 2012

The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

• Korean Journal of Materials Research
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• v.21 no.4
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• pp.236-241
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• 2011

Polysilazane and silazane-based precursor films were deposited on stacked TiN/Ti/TEOS/Si-substrate by spin-coating, then annealed at $150{\sim}400^{\circ}C$, integrated further to form the top electrode and pad, and finally characterized. The precursor solutions were composed of 20% perhydro-polysilazane ($SiH_2NH$)n, and 20% hydropolymethyl silazane ($SiHCH_3NH$)n in dibutyl ether. Annealing of the precursor films led to the compositional change of the two chemicals into silicon (di)oxides, which was confirmed by Fourier transform infrared spectroscopy (FTIR) spectra. It is thought that the different results that were obtained originated from the fact that the two precursors, despite having the same synthetic route and annealing conditions, had different chemical properties. Electrical measurement indicated that under 0.6MV/cm, a larger capacitance of $2.776{\times}10^{-11}$ F and a lower leakage current of 0.4 pA were obtained from the polysilazane-based dielectric films, as compared to $9.457{\times}10^{-12}$ F and 2.4 pA from the silazane-based film, thus producing a higher dielectric constant of 5.48 compared to 3.96. FTIR indicated that these superior electrical properties are directly correlated to the amount of Si-O bonds and the improved chemical bonding structures of the spin-on dielectric films, which were derived from a precursor without C. The chemical properties of the precursor films affected both the formation and the electrical properties of the spin-on dielectric film.

• Applied Biological Chemistry
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• v.11
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• pp.77-82
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• 1969

In order to determine an optimum pressure condition of the storage chamber of apples, several reduced pressure were examined for the Jonathan. The results obtained checking various storage conditions are as follows. 1. The optimum pressure of chamber atmosphere for apple storage was 10 cmHg. 2. Under the pressure of 10 cmHg, the normal (room) temperature storage was better than the cold storage. 3. Under reduced pressure, poly-ethylene film wrapping of apple showed a good result in a short-term (less than one and half month) experiment. 4. No noticeable effect was observed by O.E.D (Oxy-ethylene doxanole) or sodium dehydro acetate treatment. 5. Change of the components (total sugar, reduced sugar, acid and vitamin C) of apples according to the storage methods showed similar results to our previous report, Studies on The Reduced Pressure Storage of Fruits (I)

• Membrane and Water Treatment
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• v.3 no.3
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• pp.169-179
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• 2012

One of the major limitations in the use of commercial aromatic polyamide thin film composite (TFC) reverse osmosis (RO) membranes is to maintain high performance over a long period of operation, due to the sensitivity of polyamide (PA) skin layer to oxidizing agents, such as chlorine, even at very low concentrations in feed water. This article reports surface modification of a commercial TFC RO membrane (BW30-Dow Filmtec) by covering it with a thin film of poly(vinyl alcohol) (PVA) crosslinked with glutaraldehyde (GA) to improve its resistance to chlorine. Crosslinking reaction was carried out at 25 and $40^{\circ}C$ by using PVA 1.0 wt.% solutions at different GA/PVA mass ratio, namely 0.0022, 0.0043 and 0.013. Water swelling measurements indicated a maximum crosslinking density for PVA films prepared at $40^{\circ}C$ and GA/PVA 0.0043. ATR-FTIR and TGA analysis confirmed the reaction between GA and PVA. SEM images of the original and modified membranes were used to evaluate the surface coating. Chlorine resistance of original and modified membranes was evaluated by exposing it to an oxidant solution (NaClO 300 mg/L, NaCl 2,000 mg/L, pH 9.5) and measuring water permeability and salt rejection during more than 100 h period. The surface modification effectively was demonstrated by increasing the chlorine resistance of PA commercial membrane from 1,000 ppm.h to more than 15.000 ppm.h.

• The Journal of the Korea Contents Association
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• v.14 no.4
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• pp.389-396
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• 2014

This study was conducted as the basic research for the replacement of Blast Furnace Slag, Red Mud, Silica Fume, etc., with cement as a solution to the problems arising from the global warming caused by the generation of $CO_2$, and conducted the experimental review to examine the feasibility of matrix having properties identical to those of cement by using the Blast Furnace slag, Red mud, Silica fume, and alkali-activator. For this, by using the the inorganic binder, such as Blast Furnace Slag, Red Mud, Silica Fume, etc., and NaOH, $Na_2SiO_3$ and others as the cement substitute material, the strength characteristic according to the mixture time variation was performed in the tentative experiment. Based on the preceding experiment, this study performed the experiment to analyze the strength properties of hardener through the curing by air-dry temperature, curing by temperature in water, coating curing, and Korean paper curing. For the water curing at $80^{\circ}C$, the compressive strength and flexural strength were found to be the most excellent at the age of the 28th day, and furthermore, it was found that the non-cement hardener could be made, which is considered to affect the production of eco-friendly concrete.

• Journal of the Korean Electrochemical Society
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• v.13 no.4
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• pp.256-263
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• 2010

A Crofer 22 APU mesh coated with a conductive ceramic material was developed as an alternative cathode current collector to Ag-based materials for solid oxide fuel cells. $(La_{0.80}Sr_{0.20})_{0.98}MnO_3$ (LSM) layer was deposited onto the Crofer mesh using a spray-coating technique, in an attempt to mitigate the degradation of electrical properties due to surface oxidation at high temperatures. The oxidation experiments at $800^{\circ}C$ in air indicated that the areaspecific resistance (ASR) of the LSM-coated Crofer mesh was strongly dependent on the wire diameter and the contact morphology between mesh and cell. In addition, the post-heat-treatment in $H_2/N_2$ resulted in a reduced thickness of Cr-containing oxide scales at the interface between Crofer mesh and LSM layer, leading to a decreased ASR.

• Journal of Welding and Joining
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• v.28 no.3
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• pp.92-98
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• 2010

Ferritic stainless steels, which have relatively small thermal expansion coefficient and excellent corrosion resistance, are increasingly being used in vehicle manufacturing, in order to increase the lifetime of exhaust manifold parts. But, there are limits on use because of the problem related to cosmetic resistance, corrosions of condensation and high temperature salt etc. So, Aluminum-coated stainless steel instead of ferritic stainless steel are utilized in these parts due to the improved properties. In this investigation, Al-8wt% Si alloy coated 409L ferritic stainless steel was used as the base metal during Gas Tungsten Arc(GTA) welding. The effects of coated layer on the microstructure and hardness were investigated. Full penetration was obtained, when the welding current was higher than 90A and the welding speed was lower than 0.52m/min. Grain size was the largest in fusion zone and decreased from near HAZ to base metal. As welding speed increased, grain size of fusion zone decreased, and there was no big change in HAZ. Hardness had a peak value in the fusion zone and decreased from the bond line to the base metal. The highest hardness in the fusion zone resulted from the fine re-precipitation of the coarse TiN and Ti(C, N) existed in the base metal during melting and solidification process and the presence of fine $Al_2O_3$ and $SiO_2$ formed by the migration of the elements, Al and Si, from the melted coating layer into the fusion zone.

• Journal of the Korean Vacuum Society
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• v.22 no.5
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• pp.270-275
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• 2013

Single-layer graphene layers have been synthesized by using chemical vapor deposition, subsequently transferred on 300 nm $SiO_2/Si$ and quartz substrates, and doped with $AuCl_3$ by spin coating for various doping concentrations ($n_D$) from 1 to 10 mM. Based on the $n_D$-dependent variations of Raman frequencies/peak-intensity ratios, sheet resistance, work function, and Dirac point, measured by structural, optical, and electrical analysis techniques, the p-type nature of graphene is shown to be strengthened with increasing $n_D$. Especially, as estimated from the drain current-gate voltage curves of graphene field effect transistors, the hole mobility is very little varied with increasing $n_D$, in strong contrast with the $n_D$-dependent large variation of electron mobility. These results suggest that $AuCl_3$ is one of the best p-type dopants for graphene and is promising for device applications of the doped graphene.

• Applied Chemistry for Engineering
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• v.26 no.3
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• pp.362-365
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• 2015

Silica encapsulated ZnSe quantum dots (QDs) were prepared by employing two microemulsion systems: AOT/water/cyclohexane microemulsions containing ZnSe quantum dots with NP5/water/cyclohexane microemulsions containing tetraethylorthosilicate (TEOS). Using this method, cubic zinc blende nanoparticles (3 nm in diameter) were synthesized and encapsulated by silica nanoparticles (20 nm in diameter). The temperature dependence of photoluminescence (PL) for silica-encapsulated ZnSe QDs was investigated to evaluate this material as a temperature sensor media. The fluorescence emission intensity of silica-encapsulated ZnSe nanoparticles (NPs) was decreased with an increase of ambient temperature over the range from $30^{\circ}C$ to $60^{\circ}C$ and a linear relationship between the temperature and the emission intensity was observed. In addition, the temperature dependence of PL intensity for silica-encapsulated ZnSe NPs showed a reversible pattern on ambient temperature. A reversible temperature dependence of the luminescence combined with its insensitivity toward quenching by oxygen due to silica coating established this material as an attractive media for temperature sensor applications.