• Journal of Magnetics
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• v.19 no.2
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• pp.126-129
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• 2014

We report the crystallographic and magnetic properties of $Ni_{0.3}Fe_{0.7}Ga_2S_4$ by means of X-ray diffractometer (XRD), a superconducting quantum interference device (SQUID) magnetometer, and a M$\ddot{o}$ssbauer spectroscopy. In particular, $Ni_{0.3}Fe_{0.7}Ga_2S_4$ was studied by M$\ddot{o}$ssbauer analysis for evidence of spin reorientation. The chalcogenide material $Ni_{0.3}Fe_{0.7}Ga_2S_4$ was fabricated by a direct reaction method. XRD analysis confirmed that $Ni_{0.3}Fe_{0.7}Ga_2S_4$ has a 2-dimension (2-D) triangular lattice structure, with space group P-3m1. The M$\ddot{o}$ssbauer spectra of $Ni_{0.3}Fe_{0.7}Ga_2S_4$ at spectra at various temperatures from 4.2 to 300 K showed that the spectrum at 4.2 K has a severely distorted 8-line shape, as spin liquid. Electric quadrupole splitting, $E_Q$ has anomalous two-points of temperature dependence of $E_Q$ curve as freezing temperature, $T_f=11K$, and N$\acute{e}$el temperature, $T_N=26K$. This suggests that there appears to be a slowly-fluctuating "spin gel" state between $T_f$ and $T_N$, caused by non-paramagnetic spin state below $T_N$. This comes from charge re-distribution due to spin-orientation above $T_f$, and $T_N$, due to the changing $E_Q$ at various temperatures. Isomer shift value ($0.7mm/s{\leq}{\delta}{\leq}0.9mm/s$) shows that the charge states are ferrous ($Fe^{2+}$), for all temperature range. The Debye temperature for the octahedral site was found to be ${\Theta}_D=260K$.

• Electrical & Electronic Materials
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• v.8 no.4
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• pp.418-425
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• 1995

The surface of GaAs was treated by using the 0.1M solution of N $a_{2}$S.9 $H_{2}$O. The passivation of the surface in this sample was investigated by the photoreflectance(PR) experiment. The surface electric field( $E_{s}$) and built-in voltage( $V_{bi}$ ) discussed from Franz-Keldysh oscillation of PR signals. The density of surface states and Fermi level of GaAs treated with N $a_{2}$S.9 $H_{2}$O for 40min were determined 1.61*10$^{12}$ c $m^{-2}$ and 0.73eV. These values were about 15 and 10% smaller than those in untreated sample.e.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.441-441
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• 2012

Franz Keldysh Oscillation (FKO)은 p-n 접합 구조의 Photoreflectance (PR) spectra에서 표면 및 계면의 전기장(electric field) 특성을 반영한다. InAs/GaAs 양자점 태양전지(Quantum Dot Solar Cell, QDSC) 구조에서 InAs 양자점 층 전후에 AlGaAs 층을 삽입하여 퍼텐셜 장벽(potential barrier) 두께에 따른 PR spectra 및 GaAs-matrix에서 FKO 주파수 특성을 비교 분석하였다. InAs/GaAs 양자점 태양전지는 p-i-n 구조의 i-GaAs에 2.0 monolayer (ML), 8주기의 InAs 양자점 층을 삽입하여 Molecular Beam Epitaxy (MBE) 방법으로 성장하였다. 각 양자점 층 전후에 두께가 각각 0.0, 1.6, 2.8, 6.0 nm인 AlGaAs 층을 삽입하여 퍼텐셜 장벽 두께에 따른 FKO 주파수 변화를 관측하였다. 또한 태양전지 구조의 전기장 분포를 좀 더 용이하게 관측하기 위해 여기 광의 세기(power intensity)를 충분히 낮추어 Photovoltaic effect에 의한 내부 전기장의 변화를 최소화하여 비교 분석하였다. InAs/GaAs 양자점 태양전지 구조에서 AlGaAs 장벽층이 없는 경우, PR spectra의 Fast Fourier Transform 결과에 반영되는 FKO 주파수 특성은 p-i-n 구조 계면에서 공핍층(depletion region)의 space charge field보다 양자점 층의 내부 전기장에 의한 FKO 주파수가 더 큰 진폭(amplitude)을 보였다. 반면에, AlGaAs 장벽층이 삽입되면 두께가 커짐에 따라 p-i-n 구조 계면의 space charge field에 의해 더 큰 진폭의 FKO 주파수가 관측되었다. 이는 AlGaAs 장벽층이 삽입됨으로써 양자점 층 내 양자 상태 수 및 여기광에 의한 캐리어의 수와 관련이 있음을 확인하였으며, 결과적으로 GaAs-matrix에서 p-i-n 구조 계면의 space charge field에 영향을 미치게 됨을 알 수 있다. 이러한 PR 특성 결과들을 InAs/GaAs 양자점 태양전지의 설계 및 제조에 반영함으로써 양자효율 증대에 기여할 것으로 기대된다.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.10
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• pp.43-50
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• 1995

A laser diode(LD) structure consisting of a single 150$\AA$ $Al_{0.07}$Ga$_{0.93}$As quantum well active region operating at ${\lambda}$=809nm, cladded with an AlGaAs graded-index separate confinement heterostructure, has bes been grown by MOCVD. Temperature coefficient of wavelength is approximately 0.2nm $^{\circ}C$ for the diode. The active aperture consists of five emitters separated from each other by means of SiO$_{2}$ deposition and stripe formation, which creates insulating regions that channel the current to 100-$\mu$m-wide stripes placed on 450-$\mu$m centers. From a typical uncoated LD, the output power of 0.8W has been obtained at a 1$\mu$s, 1kHz pulsed current level of 2.0$\AA$, which results in about 64% external quantum efficiency. The threshold current density is 736A/cm$^{2}$ for the case of 500$\mu$m cavity length LD's. The measure of an internal quantum efficiency was 75.8% and the internal loss 4.83$cm^{-1}$ . Finally, 3.1W output power has been obtained at a 1$\mu$s, 1kHz pulsed current level of 9A from the 500$\mu$m-aperture LD array with 460-$\mu$m- cavity length.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.11
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• pp.1679-1685
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• 1989

In this paper, a new design of GaAs level converter is proposed, and anlyzed wth the variation of the threshold voltage of E/D MESFETs. The threshold voltage ranges analyzed are -0.05V to 0.35V for enhancement type MESFETs and -0.3V to -0.7V for depletion type MESFETs. In this range, the variation of the input characteristics of the conventional level converter designed to convert the level of DCFL using Vss of -0.8V to that of -0.2V, is greather than 600mV, but of the level converter proposed here is less than 100mV.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.08a
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• pp.84-91
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• 2002

The stochiometric composition of $AgGaS_2$/GaAs polycrystal source materials for the $AgGaS_2$/GaAs epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal $AgGaS_2$/GaAs has tetragonal structure of which lattice constant an and Co were 5.756 $\AA$ and 10.305 $\AA$, respectively. $AgGaS_2$/GaAs epilayer was deposited on throughly etched GaAs(100) substrate from mixed crystal $AgGaS_2$/GaAs by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $590^{\circ}C$ and $440^{\circ}C$ respectively. The crystallinity of the grown $AgGaS_2$/GaAs epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for $AgGaS_2$/GaAs epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by $\alpha=8.695{\times}10^{-4}$ eV/K, and $\beta=332K$. From the photocurrent spectra by illumination of polarized light of the $AgGaS_2$/GaAs epilayer, we have found that crystal field splitting ${\Delta}Cr$ was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pairs are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

• Korean Journal of Materials Research
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• v.9 no.10
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• pp.1012-1017
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• 1999

Low resistance ohmic contacts to the Si-doped $\textrm{In}_{0.17}\textrm{Ga}_{0.83}\textrm{N}$(~$\times10^{19}\textrm{cm}^{-3}$) were obtained using the W metallization schemes. Specific contact resistance decreased with increasing annealing temperature. The lowest resistance is obtained after a nitrogen ambient annealing at $950^{\circ}C$ for 90 s, which results in a specific contact resistance of $2.75\times10^{-8}\Omega\textrm{cm}^{-3}$. Interfacial reactions and surface are analyzed using x-ray diffraction and scanning electron microscopy (SEM). The X-ray diffraction results show that the reactions between the W film and the $\textrm{In}_{0.17}\textrm{Ga}_{0.83}\textrm{N}$ produce a $\beta$-$W_2N$ phase at the interface. The SEM result shows that the morphology of the contacts is stable up to a temperature as high as $850^{\circ}C$. Possible mechanisms are proposed to describe the annealing temperature dependence of the specific contact resistance.

• Horticultural Science & Technology
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• v.29 no.6
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• pp.555-560
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• 2011

The objective of this study was carried out to investigate the proper plant growth regulator for increasing the number of flower, fruit set, and to enlarge the size of the berries in Ardisia pusilla. Flower bud formation was used rooted cutting, and fruit set, enlargement, and coloration of fruit were used with two years-old. $GA_3$ concentrations were treated with 0, 100, 200, or $400mg{\cdot}L^{-1}$. Flower bud formation was effective in $400mg{\cdot}L^{-1}$ $GA_3$ and it was 1.8 times greater than control. Plant growth regulators were applied by foliar spray at full bloom stage to increase the fruit set. As a result, $GA_3$ was the most effective for increasing fruit set. Also, auxins of 4-CPA (Tomatotone, Donbu hitech Co., Korea) and dichloprop triethanol amine (Antifall, Bayer Crop Science Co., Ltd., Korea) were effective. When $GA_3$ concentrations of 0.5 and $1.0mg{\cdot}L^{-1}$ were used, fruit set (%) reached to 70% and 77%, respectively. Effectiveness of $GA_3$ was 1.8 times greater than control. Also, auxins, dichloprop triethanol amine increased to about 7-12% during fruit setting, but cytokinin and anti-gibberellin were ineffective. To investigate the fruit enlargement and coloration, $GA_3$ was treated with 0.3, 0.6, and $1.2mg{\cdot}L^{-1}$. Fruit enlargement was achieved to about 15% by $GA_3$ $0.6mg{\cdot}L^{-1}$ when $GA_3$ was treated 3 times at the interval of 1 month per treatment when fruit size was about 2-3mm (after full-blooming two months). But anthocyanin contents for coloration of fruit skin were not significant according to $GA_3$ concentration. The results showed that $GA_3$ enhanced bud formation, fruit set and enlargement of fruit size in Ardisia pusilla.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.13 no.4
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• pp.323-330
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• 2002

In this paper, we have designed and fabricated an BWLL MMIC amplifier using GaAs PHEMT devices. We have optimized power divider/combiner size for small size of MMIC amplifier Using 0.2 ${\mu}$m AIGaAs/lnGaAs/GaAs PHEMT devices, the two stave MMIC amplifier has demonstrated a S$_{21}$ gain of 8.7 ㏈ with input/output return losses of lower than -10 ㏈ at 26.7 GHz. The size of this chip is 4.11 ${\times}$ 2.66 $\textrm{mm}^2$.

• Electrical & Electronic Materials
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• v.10 no.7
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• pp.692-699
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• 1997

The silicon doped $Al_{0.33}$G $a_{0.67}$As were grown by molecular beam epitaxy. The electroreflectance(ER) spectra of Schottky barrier Au/n-Al/suu x/G $a_{1-x}$ As have been measured at various modulation voltage( $V_{ac}$ ) and dc bias voltage( $V_{bias}$). From the observed Franz-Keldysh oscillations(FKO) peak, the band gap energy of the $Al_{x}$G $a_{1-x}$ As is 1.91 eV which corresponds to an Al composition of 33%. The internal electric field( $E_{i}$)of this sample is 2.96$\times$10$^{5}$ V/cm. As the modulation voltage( $V_{ac}$ ) is changed, the line shape of ER signal does not change but its amplitude varies linearly. The amplitude as a function of modulation voltage has saturated at 0.8 V. The internal electric field has decreased from 6.47$\times$10$^{5}$ V/cm to 2.00$\times$10$^{5}$ V/cm as the dc bias voltage( $V_{bias}$) increases from -3.5 V to +0.8 V. The values of built-in voltage( $V_{bi}$ ) and carrier concentration(N) determined from the plot of $V_{bias}$ from the plot of $V_{bias}$ versus $E_{i}$$^{2}$ are 0.855 V and 3.83$\times$10$^{17}$ c $m^{-3}$ , respectively.ively.y.y.y.