• Title/Summary/Keyword: $Hg_{1-x}Cd_{x}Te$

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A Research of the Characteristics of $Hg_{1-x}Cd_{x}$Te material by using Electro - Chemical Reduction (Electro-Chemical Reduction에 의한 $Hg_{1-x}Cd_{x}$Te재료의 특성 고찰)

  • 이상돈;김봉흡;강형부
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.05a
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    • pp.38-41
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    • 1994
  • The method of passivation for protecting the $Hg_{1-x}Cd_{x}$Te surface is important device fabrication process. Because the surface components are highly reactive leading to its chemical and electrical instability. Especially. the material of detecting for infrared radiation, of which composition is x=0.2 or 0.3, is narrow bandgap semi- conductor. The narrow bandgap semi conductors are largely governed by the properties of the semiconductor surface. The narrow bandgap semi-conductors are largely governed by the properties of the semiconductor surface. The electro-chemical processing of $Hg_{1-x}Cd_{x}$Te allows rigorous control of the surface chemistry and provides an in-suit monitor of surface reaction. So electro-chemical reduction at specific potential can be selectively eliminated the undesirable species on the surface and mainpulated to reproducibly attain the desired stoichiometry. This method shows to assess the quality of chemically treated good $Hg_{1-x}Cd_{x}$Te surface.

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Influence of Growth Conditions on the Structural and Atomic Fractional Properties of $Hg_{1-x}Cd_xTe$ Films Electrodeposited onto Titanium and ITO glass (티타늄과 ITO유리기판에 전착법으로 성장된 $Hg_{1-x}Cd_xTe$ 박막과 성장 조건이 결정구조 및 성분 조성비에 미치는 영향)

  • Choi, C.T.
    • Journal of Sensor Science and Technology
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    • v.10 no.1
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    • pp.80-85
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    • 2001
  • $Hg_{1-x}Cd_xTe$(MCT) thin films were grown onto ITO glass and titanium plate by stationary cathodic electrodeposition in aqueous solution contained $CdSO_4$, $TeO_2$, and $HgCl_2$. During deposition two main fabrication parameters were taken into account deposition potential and growth temperature. MCT films deposited by varying two parameters were studied by X-ray diffraction, electron probe micro analyser(EPMA) and scanning electron microscope measurements. It was shown by XRD and EPMA measurements that the structure of MCT films was zinc blonde and the composition of MCT films can be controlled with the deposition potential.

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Optoelectrical Properties of HgCdTe Epilayers Grown by Hot Wall Epitaxy

  • Yun, Suk-Jin;Hong, Kwang-Joon
    • Journal of Sensor Science and Technology
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    • v.13 no.4
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    • pp.277-281
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    • 2004
  • $Hg_{1-x}Cd_{x}Te$ (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of $590^{\circ}C$ for 15 min. When the thickness of the CdTe buffer layer was $5{\mu}m$ or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111)/GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.

Fabrication of 64x1 linear array infrared detector using Hg1-xCdxTe (Hg1-xCdxTe를 이용한 64x1 선형 적외선 감지 소자 제작)

  • Kim, Jin-Sang;Suh, Sang-Hee
    • Journal of Sensor Science and Technology
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    • v.18 no.2
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    • pp.135-138
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    • 2009
  • $64{\times}1$ forcal plane infrared detector has been fabricated by using HgCdTe epi layer. HgCdTe was grown on GaAs substrate by using metal organic chemical vapor deposition. This paper describes key developments in the epi layer growth and device fabrication process. The performance of IR imaging system is summarized.

Binding energy study from photocurrent signal in HgCdTe layers

  • Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.379-379
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    • 2010
  • $Hg_{1_x}Cd_xTe$ (MCT) was grown by hot wall epitaxy. Prior to the MCT growth, the CdTe (111) buffer layer was grown on the GaAs substrate at the temperature of $590^{\circ}C$ for 15 min. When the thickness of the CdTe buffer layer was $5\;{\mu}m$ or thicker, the full width at half maximum values obtained from the x-ray rocking curves were found to significantly decrease. After a good quality CdTe buffer layer was grown, the MCT epilayers were grown on the CdTe (111) /GaAs substrate at various temperatures in situ. The crystal quality for those epilayers was investigated by means of the x-ray rocking curves and the photocurrent experiment. The photoconductor characterization for the epilayers was also measured. The energy band gap of MCT was determined from the photocurrent measurement and the x composition rates from the temperature dependence of the energy band gap were turned out.

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A Calculation of C-V Characteristics for ${Hg}_{1-x}{Cd}_{x}$Te MIS Device (${Hg}_{1-x}{Cd}_{x}$Te MIS 소자의 C-V 특성 계산)

  • 이상돈;김봉흡;강형부
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.43 no.3
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    • pp.420-431
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    • 1994
  • The HgCdTe material, which is II-VI compound semiconductor, is important materials for the fabrication of the infrared detectros. To suggest the model of accurate MIS C-V calculation for narrow band gap semiconductors such as HgCdTe, non-parabolicity from k.p theory and degeneracy effect are considered. And partially ionized effect and compensation effect which are material's properties are also considerd. Especially, degenerated material C-V characteristics from Fermi-Dirac statistics and exact charge theory are presented to get more accurate analysis of the experimental results. Also the comparison with calculation results between the general MIS theory from Boltzmann appoximation method and this model which is considered the narrow band gap semiconductor properties, show that this model is more useful theory to determination of accurate low and high frequency C-V characteristics.

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$Hg_1_xCd_xTe$를 이용한 적외선 검지소자기술

  • Maeng, Seong-Jae;Lee, Jae-Jin;Kim, Jin-Seop
    • Electronics and Telecommunications Trends
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    • v.3 no.4
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    • pp.45-56
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    • 1988
  • 적외선검출기용 반도체소자($Hg_1_xCd_xTe$)의 특성 및 응용에 대하여 조사하고, 국외의 연구현황과 국내의 문제점 및 향후 전망에 대하여 기술하였다. $Hg_1_xCd_xTe$는 조성에 따라 검지기 파장영역을 조절할 수 있으며, 그 자체에 검지부와 신호처리부를 집적할 수 있는 monolithic기술이 유망하여 앞으로 중요한 반도체중의 하나로 확립될 것이다.

The electron density distribution and the structure of semiconductor HgCdTe (반도체 HgCdTe의 전자 밀도 분포와 결정 구조)

  • Kook-Sang Park;Ky-Am Lee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.4
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    • pp.388-394
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    • 1994
  • A Hg(0.79)Cd(0.21)Te single crystal has been grown by the Traveling Heater Method(THM). Its zinc blend cubic structure is identified from the X-ray diffraction patterns and its lattice constant is determined to be $6.464 {\AA}$ using the least-square method of Cohen. From the values of the lattice constant, the composition x is determined to be 0.21. The electron density is calculated from the relative intensities of the scattered X-ray and compared with the theoretically calculated values. From the electron density distribution, it is shown that the crystal binding of Hg(1-x)Cd(x)Te(MCT) is mainly covalent and has tetrahedron bonds between adjacent atoms.

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Disign of $Hg_{1-x}Cd_xTe$ OMVPE System and ARIIV Reactor Chamber ($Hg_{1-x}Cd_xTe$ OMVPE System 과 ARIIV Reactor Chamber의 설계 및 제작)

  • ;J.D. Parsons
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.410-415
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    • 1993
  • The direct growth OMVPE system, designed specificallyfor direct growth of Hg1-xCdxTe using annular rectant inlet inverted verticla (ARIIV) reactor, was constructed. This paper presents the detailed technical approach on a newly designed ARIIV reactor that increases Hg incorporation, imposes uniformity, and avoids the needs for temperature processing to create alloys by inter diffusion approach.

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