• Journal of the Korean Ceramic Society
• /
• v.38 no.11
• /
• pp.1037-1041
• /
• 2001

Silicon diosixde thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) method, at a low temperature (32$0^{\circ}C$) and from (SiH$_4$+$N_2$O) gas mixtures. The effects of deposition parameters on properties of SiO$_2$thick films were investigated by variation of $N_2$O/SiH$_4$flow ratio and RF power. As the $N_2$O/SiH$_4$flow ratio decreased, deposition rate increased from 2.9${\mu}{\textrm}{m}$/h to maximum 10.1${\mu}{\textrm}{m}$/h. As the RF power increased from 60 W to 120 W, deposition rate increased (5.2~6.7 ${\mu}{\textrm}{m}$/h) and refractive index approached at thermally grown silicon dioxide (n=1.46).

• Journal of Korean Society of Water and Wastewater
• /
• v.23 no.5
• /
• pp.669-678
• /
• 2009

The reduction of excess activated sludge from petrochemical plant was investigated by the electro fenton (E-Fenton) process using electrogenerated hydroxyl radicals which lead to mineralization of activated sludge to $CO_2$, water and inorganic ions. Factors affecting the disintegration efficiency of excess activated sludge in E-Fenton process were examined in terms of five criteria: pH, $H_2O_2/Fe^{2+}$ molar ratio, current density, initial MLSS (mixed liquid suspended solids) concentration, $H_2O_2$ feeding mode. TSS total suspended solid and $TCOD_{cr}$ reduction rate increased with the increasing $H_2O_2/Fe^{2+}$ molar ratio and current density until 42 and $6.7 mA/cm^2$, respectively but further increase of $H_2O_2/Fe^{2+}$ molar ratio and current density would reduce the reduction rate. On the other hand, as expected, increasing pH and initial MLSS concentration of activated sludge decreas TSS and $TCOD_{cr}$ reduction rate. The E-Fenton process was gradually increased during first 30 minutes and then linearly proceed till 120 minutes. The optimal E-Fenton condition showed TSS reduction rate of 62~63% and $TCOD_{cr}$ (total chemical oxygen demand) reduction rate of 55~56%. Molar ratio $H_2O_2/Fe^{2+} = 42$ was determined as optimal E-Fenton condition with initial $Fe^{2+}$ dose of 5.4 mM and current density of $6.7{\sim}13.3 mA/cm^2$, initial MLSS of 7,600 mg/L and pH 2 were chosen as the most efficient E-Fenton condition.

• Journal of Ceramic Processing Research
• /
• v.13 no.spc2
• /
• pp.407-410
• /
• 2012

The properties of Al-doped ZnO (AZO) films were investigated as a function of H2/(Ar + H2) gas ratio using an AZO (2 wt% Al2O3) ceramic target in a radio frequency (RF) magnetron sputtering system. The deposition process was done at 200 ℃ and in 2 × 10-2Torr working pressure and with various ratios of H2/(Ar + H2) gas. During the AZO film deposition process, partial H2 gas affected the AZO film characteristics. The electron resistivity (~ 9.21 × 10-4 Ωcm) was lowest and mobility (~17.8 ㎠/Vs) was highest in AZO films when the H2/(Ar + H2) gas ratio was 2.5%. When the H2/(Ar + H2) gas ratio was increased above 2.5%, the electron resistivity increased and mobility decreased with increasing H2/(Ar + H2) gas ratio in AZO films. The carrier concentration increased with increasing H2/(Ar + H2) gas ratio from 0% to 7.5%. This phenomenon was explained by reaction of hydrogen and oxygen and additional formation of oxygen vacancy. The average optical transmission in the visible light wavelength region over 90% and an orientation of the deposition was [002] orientation for AZO films grown with all H2/(Ar + H2) gas ratios.

• Resources Recycling
• /
• v.11 no.2
• /
• pp.3-13
• /
• 2002

The characteristics of cyanide decomposition in aqueous phase by hydrogen peroxide have been explored in an effort to develop a process to recycle waste water. The self-decomposition of $H_2O$$_2$at pH 10 or below was minimal even in 90 min., with keeping about 90% of $H_2O$$_2$undissociated. On the contrary, at pH 12 only 9% of it remained during the same time. In the presence of copper catalyst at 5 g Cu/L, complete decomposition of $H_2$O$_2$was accomplished at pH 12 even in a shorter time of 40 min. The volatility of free cyanide was decisively dependent on the solution pH: the majority of free cyanide was volatilized at pH 8 or below, however, only 10% of it was volatilized at pH 10 or above. In non-catalytic cyanide decomposition, the free cyanide removal was incomplete in 300 min. even in an excessive addition of $H_2$$O_2$at a $H_2$$O_2$/CN molar ratio of 4, with leaving behind about 8% of free cyanide. On the other hand, in the presence of copper catalyst at a Cu/CN molar ratio of 0.2, the free cyanide was mostly decomposed in only 16 min. at a reducedH202/CN molar ratio of 2. Ihe efnciency of HBO2 in cyanide decomposition decreased with increasing addition of H2O2 since the seu-decomposition rate of $H_2$$O_2$increased. At the optimum $H_2$$O_2$/mo1ar ratio 0.2 of and Cu/CN molar ratio of 0.05, the free cyanide could be completely decomposed in 70 min., having a self-decomposition rate of 22 mM/min and a H$_2$$O_2$ efficiency of 57%.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.27 no.7
• /
• pp.893-900
• /
• 2003

Numerical simulations of freely propagating flames burning stoichiometric C $H_4$/CHC1$_3$/ $O_2$/$N_2$ mixtures are performed at atmospheric pressure in order to understand the effect of the $O_2$ enrichment level and the CHC1$_3$/C $H_4$ molar ratio. A chemical kinetic mechanism is developed, which involves 69 gas-phase species and 379 forward and 364 backward reactions. The calculated flame speeds are compared with the experiments for the flames established at several CHC1$_3$/C $H_4$ molar ratio (R<1), the results of which is in excellent agreement. As a results of the increased $O_2$ enrichment level from 0.21 to 1, the flame speed and the temperature in the burned gas are increased. At high CHC1$_3$/C $H_4$ molar ratio two peak values appear on the $O_2$ consumption rate, which are affected by CC1$_2$＋ $O_2$$_{-}$>C1O+CC1O and H＋ $O_2$$_{-}$>O＋OH.＋OH.

• Bulletin of the Korean Chemical Society
• /
• v.34 no.10
• /
• pp.3065-3072
• /
• 2013

Direct synthesis of $H_2O_2$ and in situ oxidative desulfurization of model fuel over Au/Ti-HMS and Au/TS-1 catalysts has been comparatively investigated in water or methanol. Maximum amount (82%) of active $Au^0$ species for $H_2O_2$ synthesis was obtained. Au/Ti-HMS and Au/TS-1 exhibited the contrary performances in $H_2O_2$ synthesis as $CH_3OH/H_2O$ ratio of solvent changed. $H_2O_2$ decomposition and hydrogenation in water was inhibited by the introduction of methanol. Effect of $O_2/H_2$ ratio on $H_2O_2$ concentration, $H_2$ conversion and $H_2O_2$ selectivity revealed a relationship between $H_2O_2$ generation and $H_2$ consumption. The highest dibenzothiophene removal rate (83.2%) was obtained over Au/Ti-HMS in methanol at 1.5 of $O_2/H_2$ ratio and $60^{\circ}C$. But removal of thiophene over Au/TS-1 should be performed in water without heating to obtain a high removal rate (61.3%). Meanwhile, $H_2$ conversion and oxidative desulfurization selectivity of $H_2$ were presented.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1996.11a
• /
• pp.369-372
• /
• 1996

We prepared LiMn$_2$O$_4$ by reacting stoichiometric mixture of LiOH.$H_2O$ and MnO$_2$ (mole ratio 1 : 1) and heating at 80$0^{\circ}C$ for 24h, 36h, 48h, 60h and 70h. We obtained through X-ray diffraction that lattice parameter varied as function of heat treatment time. heated cathode active materials at 80$0^{\circ}C$ for 36h, (111)/(311) peak ratio was 0.37. It expected good charge/discharge characteristics. When (111)/(311) peak ratio was 0.37, it will be that crystal structure is farmed very well. In the result of charge/discharge test When heated at 80$0^{\circ}C$ for 36h, charge/discharge characteristic of LiMn$_2$O$_4$is the most property. It agree with our expectation.

• 한국연소학회:학술대회논문집
• /
• 2001.11a
• /
• pp.90-96
• /
• 2001

Catalytic ignition of $H_2/O_2/CO_2$ mixtures over platinum catalyst is experimentally investigated by using microcalorimetry. For comparison, $N_2$ and Ar is also used as diluent gas. The gas mixture flows toward platinum foil heated by electric current at atmosphere pressure and ambient temperature. The ignition temperature range 350-445K according to the fuel ratio, dilution ratio and diluent gas. It increases as the fuel ratio and dilution ratio increase. $H_2/O_2$ mixture with $CO_2$ ignites at higher temperature than with other diluents by 30-50K. Several experimental evidences show the inhibition effects of $CO_2$ in $H_2-O_2$ heterogeneous reaction is considerable

• Journal of Korean Society of Environmental Engineers
• /
• v.28 no.1
• /
• pp.48-53
• /
• 2006

The purpose of this paper is to investigate the optimal condition of the SynGas production by reforming of propane using plasmatron. Plasma was generated by air and arc discharge. The effects of applied steam, $CO_2$ or Ni-catalyst on propane conversion, yield of hydrogen and $H_2/CO$ ratio as well as correlation of syngas were studied. When the variations of $O_2/C_3H_8$ flow ratio, $H_2O/C_3H_8$ flow ratio and $CO_2/C_3H_8$ flow ratio were $0.94{\sim}1.48,\;4.3{\sim}10\;and\;0.8{\sim}3.05$ respectively, Under the condition mentioned above, result of $H_2O/C_3H_8$ flow ratio was maximum $H_2$ concentration, or $28.2{\sim}31.6%$, and result of $H_2O/C_3H_8$ flow ratio with catalyst was minimum CO concentration or $6.6{\sim}7.1%$ and the ratio of hydrogen to carbon monoxide($H_2/CO$) were $3.89{\sim}4.86$.

• Journal of the Korean Ceramic Society
• /
• v.38 no.12
• /
• pp.1150-1154
• /
• 2001

Silicon oxynitride (SiON) thick films using the core layer of silica optical waveguide have been deposited on Si wafer by PECVD at low temperature (32$0^{\circ}C$) were obtained by decomposition of appropriate mixture of (SiH$_4$+$N_2$O+$N_2$) gaseous mixtures under RF power and SiH$_4$/($N_2$O+$N_2$) ratio deposition condition. Prism coupler measurements show that the refractive indices of SiON layers range from 1.4663 to 1.5496. A high SiH$_4$/($N_2$O+$N_2$) of 0.33 and deposition power of 150 W leads to deposition rates of up to 8.67 ${\mu}{\textrm}{m}$/h. With decreasing SiH$_4$/($N_2$O+$N_2$) ratio, the SiON layer become smooth from 41$\AA$ to 6$\AA$.