• 대한금속재료학회지
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• 제47권6호
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• pp.378-382
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• 2009

We investigated the effects of deposition conditions on the fabrication of $Fe_{3}O_{4}$ thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated $Fe_{3}O_{4}$ film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the $Fe_{3}O_{4}$ film were298 emu/cc, $4.0{\times}10^{-2}{\Omega}cm$, and 125 K, respectively.

• 한국자기학회지
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• 제7권5호
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• pp.243-248
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• 1997

Ar+ $O_{2}$ 혼합가스 중에서 반응성 스퍼터링을 통해 직접 Fe-Hf-O계 초미세결정 연자성 박막을 제조하였으며, 이때 산소분압비의 변화가 Fe-Hf-O 박막의 미세구조 및 자기적 특성에 미치는 영향을 조사하였다. 산소분압이 증가함에 따라 박막의 포화자속밀도는 점차적으로 감소하며 연자기특성이 10%까지는 향상되다가 다시 열화되는 경향을 나타내었다. 최적조건인 10%의 산소분압에서 증착한 F $e_{82}$H $f_{3.4}$ $O_{14.6}$ 초미세결정 박막은 열처리 없이 증착한 상태에서 우수한 연자기 특성을 나타내었으며, 이때의 자기적 특성은 각각 포화자속밀도 17.7 kG, 보자력 0.7 Oe 및 실효투자율 2,500(100 MHz)의 값을 나타내었다. 산소분압이 증가함에 따라 결정립 크기가 감소하며 15% 이상의 산소분압에서는 F $e_{3}$ $O_{4}$가 생성되었다. 따라서 10%에서 가장 우수한 연자기 특성을 나타내는 것은 결정립 크기와 산화물 생성에 의해 설명될 수 있다. Fe-Hf-O계 초미세결정 박막의 전기비저항은 산소분압이 증가함에 따라 증가하는 경향을 나타내었다. 우수한 연자기 특성을 나타내는 F $e_{82}$H $f_{3.4}$ $O_{14.6}$ 박막의 경우, 약 150 .mu. .ohm.cm로 산소를 첨가하지 않은 경우의 30 .mu. .ohm. cm에 비하여 약 5배 증가된 값을 나타내었다. 따라서 F $e_{82}$H $f_{3.4}$ $O_{14.6}$초미세결정 박막이 고주파에서 우수한 연자기 특성을 나타내는 원인은 주로 높은 전기비저항과 미세하게 형성된 결정립에 기이한 것으로 생각된다.

• 한국진공학회지
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• 제11권4호
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• pp.240-248
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• 2002

결정성이 좋을 것으로 기대되는 Fe이 도핑된 $Fe_{x}Ti_{l-x}O_2$박막 (x=0.07과 0.16)을 rutile $TiO_2$(110) 기판위에 산소 플라즈마 적층 성장 방법으로 성장시켰다. 도핑되는 Fe의 함량에 따른 표면 특성을 규명하기 위하여 박막 성장은 같은 조건에서 이루어졌다. 여러 가지의 표면분석법을 이용하여 성장된 박막의 표면 특성을 규명하였다. $Fe_{x}Ti_{l-x}O_2$박막에 존재하는 Ti의 산화상태는 +4 이었고 Fe의 경우는 +2와 +3의 산화상태가 섞여있었으며 Fe의 함량이 높은 $Fe_{0.16}Ti_{0.84}O_2$박막에서 $Fe^{3+}$ 이온의 함량이 더 높은 것으로 나타났다. $Fe_{0.07}Ti_{0.93}O_2$박막은 기판과 유사한 평탄한 표면에 막대형과 원통형의 높은 island 형태로 성장되었다. $Fe_{0.16}Ti_{0.84}O_2$박막은 $Fe_{0.07}Ti_{0.93}O_2$ 박막보다는 평탄하지만 적은 island들이 뭉쳐있는 다소 거칠은 표면을 한 다결정성 형태로 성장되어 Fe의 함량에 따라 morphology가 다르게 나타났다.

• 대한전자공학회논문지
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• 제27권9호
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• pp.1393-1401
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• 1990

The physical properties of \ulcorner-Fe2O3 raw materials were investigated. \ulcorner-Fe2O3/Pd thick film gas sensors were fabricated with screen-printing method and their electrical and sensitivity characteristics were analyzed. The irreversible phase transition from \ulcorner-Fe2O3 to \ulcorner-Fe2O3 occured at 500\ulcorner. At this time, the cation of tetrahedral sites moved into the octahedral sites. \ulcorner-Fe2O3 raw materials contained only trivalent and no divalent iron. Thecontents of divalent iron (Fe+\ulcorner were increased as detecting gases were adsorbed. The addition of Pd (1w/o) to \ulcorner-Fe2O3 enhanced the sensitivity to gases. The sentivity of \ulcorner-Fe2O3/Pd(1w/o) thick film to 5000ppm C4H10 was 97% at the operating temperature of 300\ulcorner.

• 한국세라믹학회지
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• 제36권5호
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• pp.465-470
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• 1999

Sensing properties of $\alpha$-Fe2O3 thin film to reducing gases such as CHx and CO were systematically examined after deposition on Al2O3 substrate by PECVD(Plasma Enhanced Chemical Vapor Deposition)technique. Microstructure of deposited $\alpha$-Fe2O3 thin film showed the porous island structure. This specimen was annealed at 450, 550, $650^{\circ}C$ to enhance the gas sensing properties and investigated in terms of CO and C4H10 concentration from 500ppm to 3,000 ppm at operating temperature of 35$0^{\circ}C$ The gas sensitivity(%) to C4H10 measured at the operating temperature of 35$0^{\circ}C$ was 98.24 (highest sensitivity) 69.51 to CO and 2% to CH4 respectviely.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1997년도 Proceedings of the 12th KACG Technical Meeting and the 4th Korea-Japan EMGS (Electronic Materials Growth Symposium)
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• pp.79-85
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• 1997

Fe$_2$O$_3$ thin films were prepared on $Al_2$O$_3$ substrate by PECVD(Plasma-Enhanced Chemical Vapor Deposition) process. The phase transformation of iron oxide film was determined as the substrate temperature and reduction-oxidation process. $\alpha$-Fe$_2$O$_3$ was stable in deposition temperature ranges of 80~15$0^{\circ}C$. Fe$_3$O$_4$ phase was obtained by the reduction process of $\alpha$-Fe$_2$O$_3$ phase in H$_2$ ambient. Fe$_3$O$_4$ phase was transformed into a ${\gamma}$-Fe$_2$O$_3$ thin film under controlled oxidation conditions at 280~30$0^{\circ}C$.

• 한국자기학회지
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• 제6권3호
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• pp.145-150
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• 1996

Ferrite plating 방법은 진공이 불필요하고, 저온(< $100^{\circ}C$)에서 페라이트 박막을 제작할 수 있다. 이 방법으로 유리 기판위에 $80^{\circ}C$에서 $Fe_{3-x}Mn_{x}O_4(x=0.0~0.023)$의 페라이트 박막을 제작하였다. 박막은 60분간 성장시켰으며, 막의두께는 약 $9000\AA$이었고, 거울면과 같은 광택을 지녔다. X-선 회절 실험으로 스피넬 구조의 단일상을 확인하였다. $Fe_{3-x}Mn_{x}O_4$ 박막의 구성비 x는 반응용액에서의 구성비 x'에 비해 매우낮다(x/x'=0.04). $Fe_{3}O_{4}$ ferrite 박막의 포화자화($M_{s}$)는 480 emu/cc로써 bulk 시료와 비슷한 값을 가졌다.

• 한국세라믹학회지
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• 제45권12호
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• pp.796-801
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• 2008

$LaGaO_3$ thin film was prepared on Ni-Fe metal porous substrate by Pulsed Laser Deposition method. By the thermal reduction, the dense $NiO-{Fe_3}{O_4}$ substrate is changed to a porous Ni-Fe metal substrate. The volumetric shrinkage and porosity of the substrate are controlled by the reduction temperature. It was found that a thermal expansion property of the Ni-Fe porous metal substrate is almost the same with that of $LaGaO_3$ based oxide. $LaGaO_3$ based electrolyte films are prepared by the pulsed laser deposition (PLD) method. The film composition is sensitively affected by the deposition temperature. The obtained film is amorphous state after deposition. After post annealing at 1073K in air, the single phase of $LaGaO_3$ perovskite was obtained. Since the thermal expansion coefficient of the film is almost the same with that of LSGM film, the obtained metal support LSGM film cell shows the high tolerance against a thermal shock and after 6 min startup from room temperature, the cell shows the almost theoretical open circuit potential.

• 한국전기전자재료학회논문지
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• 제13권8호
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• pp.658-666
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• 2000

Sb and Sb-Fe doped SnO$_2$film resistors were prepared by spray pyrolysis technique. The effects of Sb and Sb-Fe addition on TCR and electrical properties of SnO$_2$film resistors were studied. Also the dependence of electrical properties on the substrate temperature and substrate-nozzle distance was investigated. The Sn-Sb system with 7.9 mol% SbCl$_3$(STO-406) and Sn-Sb-Fe systems with 7.3 mol% SbCl$_3$+7.3 mol% FeCl$_3$(STO-407) and with 3.4 mol% SbCl$_3$+7.7mol% FeCl$_3$(STO-408) were prepared. Both of the systems Sn-Sb and Sn-Sb-Fe represented nonlinearity of TCR with temperature. As the amount of Fe increased TCR was shifted to positive direction. Decreasing Sb or increasing Fe caused resistivity to increase. Also increasing Fe caused the crystallization degree of rutile structure in SnO$_2$film to decrease. The electrical resistivity decreased with increasing substrate temperature The resistivity decreased with increasing substrate-nozzle distance in the ranges from 15 to 25 cm and increased rapidly at the distance over 25cm.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.60-60
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• 2011

Giant magnetoresistance (GMR), tunneling magnetoresistance (TMR), and magnetic random-access memory (MRAM) are currently active research areas in spintronics. The high magnetoresistance and the high spin polarization (P) of electrons in the ferromagnetic electrodes of tunnel junction or intermediate layers are required. Magnetite, Fe3O4, is predicted to possess as half-metallic nature, P ~ 100% spin polarization, and has a high Curie temperature (TC~850 K). Experiments demonstrated that the P~($80{\pm}5$)%, ~($60{\pm}5$)%, and ~40-55% for epitaxial (111), (110) and (001)-oriented Fe3O4 thin films, respectively. Epitaxial Fe3O4 films may enable us to investigate the effects of half metals on the spin transport without grain-boundary scattering.In addition, it has been reported that the Verwey transition (TV, a first order metal-insulator transition) of 120 K in bulk Fe3O4 is strongly affected by many parameters such as stoichiometry and stress, etc. Here we report that the growth modes, magnetism and transport properties of Fe3O4 thin films were strongly dependent on the oxygen pressure during film growth. The average roughness decreases from 1.021 to 0.263 nm for the oxygen pressure increase from $2.3{\times}10-7$ to $8.2{\times}10^{-6}$ Torr, respectively. The 120 K Verwey transition in Fe3O4 was disappeared for the sample grown under high oxygen pressure.