• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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• 2002.02a
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• pp.3-4
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• 2002

The stainless steel sheathed MgB$_2$ tapes with Cu addition were fabricated by PIT method without heat treatment. The $J_{c}$ value of 5,600 A/ $cm^{2}$and 16,000 A/$cm^{2}$ at 4.2 K and 5 T were obtained for the $MgB_{2}$ tape and 10 vol % of Cu added $MgB_{2}$ tape respectively. The $J_{c}$-B curve shows enhancement in J$_{c}$ under magnetic field, which suggests enhancement in flux pinning property with Cu addition.n.

• Resources Recycling
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• v.14 no.4 s.66
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• pp.34-40
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• 2005

Reusing of electroless Co-Cu-P waste solution was investigated in the respect of plating time, plating rate, solution composition and deposit. Plating time of cobalt-catalytic surface took longer than that of zincated-catalytic surface. It was possible to reuse the waste solution by mixing $50\%$ fresh solution at batch type. Plating time of initial solution at continuous type took longer 7.5 times over than that of batch type. Plating time of $50\%$ waste solution additive at continuous type took longer 2.5 times over than that of batch type. Component change of cobalt-topper for electroless deposition was greatly affected by deposit inferiority and rapid decrease in plating rate.

• Korean Journal of Materials Research
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• v.25 no.12
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• pp.719-726
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• 2015

For a decade, solution-processed functional materials and various printing technologies have attracted increasingly the significant interest in realizing low-cost flexible electronics. In this study, Cu nanoparticles are synthesized via the chemical reduction of Cu ions under inert atmosphere. To prevent interparticle agglomeration and surface oxidation, oleic acid is incorporated as a surface capping molecule and hydrazine is used as a reducing agent. To endow water-compatibility, the surface of synthesized Cu nanoparticles is modified by a mixture of carboxyl-terminated anionic polyelectrolyte and polyoxylethylene oleylamine ether. For reducing the surface tension and the evaporation rate of aqueous Cu nanoparticle inks, the solvent composition of Cu nanoparticle ink is designed as DI water:2-methoxy ethanol:glycerol:ethylene glycol = 50:20:5:25 wt%. The effects of poly(styrene-co-maleic acid) as an adhesion promoter(AP) on rheology of aqueous Cu nanoparticle inks and adhesion of Cu pattern printed on polyimid films are investigated. The 40 wt% aqueous Cu nanoparticle inks with 0.5 wt% of Poly(styrene-co-maleic acid) show the "Newtonian flow" and has a low viscosity under $10mPa{\cdots}S$, which is applicable to inkjet printing. The Cu patterns with a linewidth of $50{\sim}60{\mu}m$ are successfully fabricated. With the addition of Poly(styrene-co-maleic acid), the adhesion of printed Cu patterns on polyimid films is superior to those of patterns prepared from Poly(styrene-co-maleic acid)-free inks. The resistivities of Cu films are measured to be $10{\sim}15{\mu}{\Omega}{\cdot}cm$ at annealing temperature of $300^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.182-182
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• 1999

The chemisorption effect of CO on the Ni/Cu(001) surface was investigated using LEED(Low Energy Electron Diffraction) and EELS(Electron Energy Loss Spectrscopy0 under the UHV conditions. after mounting the Cu(001) single crystal in the UHV chamber (base pressure 1$\times$10-10Torr), a clean surface was obtained after a few cycles of repeated Ar+ ion sputtering and annealing at about 40$0^{\circ}C$. The epitaxial thin Ni films were formed on the Cu(001) by evaporation from 99.999% Ni block. The pseudomorphic growth and the orderness of the thin Ni films were monitored by c(2$^{\circ}C$2) LEED pattern. CO adlayers on Ni epitaxial thin films were prepared by dosing pure CO has through a leak valve. After CO adsorpton at room temperature, two pairs of peaks were observed by EELS, whose relative intensities are changed as the film thickness is varied and time is elapsed. These two pair of peaks are likely related to different bonding sites (-top and bridge sites) of C-Ni as well as C-O vibration. Experimental results and qualitative interpretation of the spectra wille be discussed. The possibility of using EELS in combination with probe species (CO) to investigate the nature of thin film growth is mentioned. We will report the experimental result of O2 dosage on Ni film and interaction of CO and O2.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.260-260
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• 2012

최근 IT산업의 급속한 발달로 모바일 제품과 반도체 및 IC 패키지 등의 전자제품의 소형화, 경량화 및 고성능화되어 가고 있다. 따라서 반도체 공정에서 단위소자의 고속화를 구현하기 위한 금속배선공정에 사용되는 금속재료가 최근에 최소 선폭을 갖는 디바이스에서는 구리를 배선 재료로 전환하고, 향후에는 모든 디바이스가 구리를 주요 배선재료로 사용할 것으로 예측되고 있다. 반도체 소자 공정 중 시료 표면 위에 형성되는 오염물은 파티클, 유기오염물, 금속 불순물 그리고 자연 산화막으로 나눌 수 있다. 구리 표면에 생성되는 부식생성물의 종류에는 CuO, $Cu_2O$, $Cu(OH)_2$, $CuCO_3{\cdot}Cu(OH)_2$와 같은 생성물들이 있다. 이러한 부식생성물이 구리박막 표면에 형성이 되면 성장된 구리박막의 특성을 저하시키게 된다. 이러한 다양한 오염물들을 제거하기 위해서 여러 가지 전처리 공정에 대한 연구가 보고되고 있다. 본 연구에서, 스퍼터 방식으로 구리를 증착한 웨이퍼 (Cu/Ti/Si) 를 대기 중에 노출시켜 자연 산화막을 성장시키고, 이 산화막과 대기로부터 흡착된 불순물을 제거하기 위해 계면 활성제인 TS-40A와 $NH_4OH$ 수용액을 사용하여 이들 수용액이 구리 표면층에 미치는 영향에 대해 조사 분석하였다. 사용된 TS-40A는 알칼리 탈지제로서 웨이퍼 표면의 유기물을 제거하는 역할을 하며, $NH_4OH$는 구리를 제거하는 부식액으로 산업현장에서 널리 사용되고 있다. 다양한 표면 전처리 조건에 따른 구리박막 표면의 형상 및 미시적 특성변화를 SEM과 AFM을 이용하여 관찰하였고, 표면의 화학구조 및 성분 변화를 관찰하기 위해 XPS를 측정하였으며, 전기적 특성변화를 관찰하기 위해 4-point prove를 사용하여 박막의 면저항을 측정하였다.

• Resources Recycling
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• v.5 no.3
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• pp.31-36
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• 1996

The metallic copper was recovered from sludge of the copper electro-plating plant by pyrometallurgical process. The reducing agent was Pyrolysized from waste tires and the flux was a mixture $Na_2CO_3$, $NaB_4O_7$, and glass. The green sludge contained 87.5% moisture and 12.5% solid with 56.5% Cu and 1.59% Fe. The sludge dried at $100^{\circ}C$ was analyized to be $Cu_4SO_4(OH)_6{\cdot}2H_2O$ and CuO by XRD analysis. The former was 84% and the latter 16%, However, the calcined sludge at $500^{\circ}C$ was 49% $Cu_2O(SO_4)$ and 51% CuO. The sludge could by smelted at $1100^{\circ}C$ for two hours with 6 to 8 moles carbon with respect to copper to produce metallic copper (>90%) with recovery of 9% above.

• Journal of the Korean Society for Heat Treatment
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• v.32 no.2
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• pp.79-85
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• 2019

To investigate the influence of heat treatment on the growth intermetallic compounds (IMCs) at the joint interface of friction-welded Cu-Al, several heat treatments are performed at three different temperature with different times. The experiments reveal three different IMCs layers which are significantly influenced by atomic diffusion of Cu and Al with heat treatment conditions. Since the formation of these IMCs layers can affect mechanical properties of friction-welded Cu-Al interfaces, the relationship between the microstructure of IMCs layers and the tensile strength is analyzed according to heat treatment temperature and times.

• Journal of Environmental Science International
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• v.32 no.5
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• pp.343-353
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• 2023

A zeolite material (ZCH) was synthesized from coal fly ash in an HD thermal power plant using a fusion/hydrothermal method. ZCH with high crystallinity could be synthesized at the NaOH/CFA ratio of 0.9. Ion-exchanged ZCH adsorbents for ammonia removal were prepared by ion-exchanging various cation (Cu²⁺, Co²⁺, Fe³⁺, and Mn²⁺) on the ZCH. They were used to evaluate the ammonia adsorption breakthrough curves and adsorption capacities. The ammonia adsorption capacities of the ZCH and ion-exchanged ZCHs were high in the order of Mn-ZCH > Cu-ZCH ≅ Co-ZCH > Fe-ZCH > ZCH according to NH₃-TPD measurements. Mn-ZCH ion-exchanged with Mn has more Brønsted acid sites than other adsorbents. The ion-exchanged Cu²⁺, Co²⁺, Fe³⁺, or Mn²⁺ ions uniformly distributed on the surface or in the pores of the ZCH, and the number of acidic sites increased on the alumina sites to form the crystal structure of zeolite material. Therefore, when the ion-exchanged ZCH was used, the adsorption capacity for ammonia gas increased.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.24 no.12
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• pp.1120-1127
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• 2013

In this paper, novel chip-on-chip(CoC) flip-chip bump structures using chip-on-wafer(CoW) process technology are proposed, designed and fabricated, and their microwave frequency responses are analyzed. With conventional bumps of Cu pillar/SnAg and Cu pillar/Ni/SnAg and novel Polybenzoxazole(PBO)-passivated bumps of Cu pillar/SnAg, Cu pillar/Ni/SnAg and SnAg with the deposition option of $2^{nd}$ Polyimide(PI2) layer on the wafer, 10 kinds of CoC samples are designed and their frequency responses up to 20 GHz are investigated. The measurement results show that the bumps on the wafers with PI2 layers are better for the batch flip-chip process and have average insertion loss of 0.14 dB at 18 GHz. The developed bump structures for chips with fine-pitch pads show similar or slightly better insertion loss of 0.11~0.14 dB up to 18 GHz, compared with that of 0.13~0.17 dB of conventional bump structures in this study, and we find that they could be utilized in various microwave packages for high integration density.

• Carbon letters
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• v.25
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• pp.33-42
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• 2018

Activated carbon (AC) was modified by ammonium persulphate or nitric acid, respectively. AC and the modified materials were used as catalyst supports. The oxygen groups were introduced in the supports during the modifications. All the supports were characterized by $N_2$-physisorption, Raman, X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), and thermogravimetric analysis. Methanol synthesis catalysts were prepared through wet impregnation of copper nitrate and zinc nitrate on the supports followed by thermal decomposition. These catalysts were measured by the means of $N_2$-physisorption, X-ray diffraction, XPS, temperature programmed reduction and TEM tests. The catalytic performances of the prepared catalysts were compared with a commercial catalyst (CZA) in this work. The results showed that the methanol production rate of AC-CZ ($23mmol-CH_3OH/(g-Cu{\cdot}h)$) was higher, on Cu loading basis, than that of CZA ($9mmol-CH_3OH/(g-Cu{\cdot}h)$). We also found that the modification methods produced strong metal-support interactions leading to poor catalytic performance. AC without any modification can prompt the catalytic performance of the resulted catalyst.