• Journal of Surface Science and Engineering
• /
• v.31 no.2
• /
• pp.117-126
• /
• 1998

In this study, the residue remaining on the silicon wafer during the oxide overetching using $C_4F_8/H_2$ helicon were plasmas and effects of various cleaning and annealing methods on the removal of the remaining residue were investigated. The addition of 30%$H_2$ to the C4F8 plasma increased the C/F ratio and the thickness of the residue on the etched silicon surface. Most of the residuse on the etched surfaces colud be removed by the oxygen plasmsa cleaning followed by thermal annealing over $450^{\circ}C$. Hydrogen-coataining residue formed on the silicon by 70%$C_4F_8/30%H_2$ helicon plasmas was more easily removed than hydrogen-free residue formed residue formed by $C_4F_8$ helicon wear plasmas. However, damage remaining on the silicon surface overetched using 70%$C_4F_8/30%H_2$ helicon plasmas was intensive and the degree of reocvery duing the post-annealing was lower.

• Korean Journal of Mathematics
• /
• v.22 no.1
• /
• pp.91-121
• /
• 2014

Let X and Y be vector spaces. It is shown that a mapping $f:X{\rightarrow}Y$ satisfies the functional equation ${\ddag}$ $$2df(\frac{x_1+{\sum}_{j=2}^{2d}(-1)^jx_j}{2d})-2df(\frac{x_1+{\sum}_{j=2}^{2d}(-1)^{j+1}x_j}{2d})=2\sum_{j=2}^{2d}(-1)^jf(x_j)$$ if and only if the mapping $f:X{\rightarrow}Y$ is additive, and prove the Cauchy-Rassias stability of the functional equation (${\ddag}$) in Banach modules over a unital $C^*$-algebra, and in Poisson Banach modules over a unital Poisson $C^*$-algebra. Let $\mathcal{A}$ and $\mathcal{B}$ be unital $C^*$-algebras, Poisson $C^*$-algebras, Poisson $JC^*$-algebras or Lie $JC^*$-algebras. As an application, we show that every almost homomorphism $h:\mathcal{A}{\rightarrow}\mathcal{B}$ of $\mathcal{A}$ into $\mathcal{B}$ is a homomorphism when $h(d^nuy)=h(d^nu)h(y)$ or $h(d^nu{\circ}y)=h(d^nu){\circ}h(y)$ for all unitaries $u{\in}\mathcal{A}$, all $y{\in}\mathcal{A}$, and n = 0, 1, 2, ${\cdots}$. Moreover, we prove the Cauchy-Rassias stability of homomorphisms in $C^*$-algebras, Poisson $C^*$-algebras, Poisson $JC^*$-algebras or Lie $JC^*$-algebras, and of Lie $JC^*$-algebra derivations in Lie $JC^*$-algebras.

• Korean Journal of Crystallography
• /
• v.6 no.1
• /
• pp.36-42
• /
• 1995

Two types of single crystals of the title compound [6-(2-pyridyl)-3, 5-hexadiyn-ol, PyHxD] were obtained by solution of n-hexane/CH2C12 and n-hexane/Et2O, and their molecular conformations are proved identical in spite of different of space groups; C22H18N2O2 (I), Mr=343.70, Monoclinic, Pa, a=14.595(2), b=5.413(2), c=12.218(2)Å, β=96.86(1)°, V=958.3Å3, Z=2, Dx=1.19 Mgm-3, λ(MoKα)=0.71069Å, μ=0.072mm-1, F(000)=360.0, T=292K, R=0.104 for 756 unique observed reflections. An asymmetric unit contains a dimer connected by two N-H…O intermolecular hydrogen bonds. C11H9NO (II), Mr=171.85, Monoclinic, P21/a, a=14.611(2), b=5.423(6), c=12.191(2)Å, β=96.89(1)°, V=959.0Å3, Z=4, Dx=1.19 Mgm-3, λ(MoKα)=0.71069Å, μ=0.072mm-1, F(000)=360.0, T=293K, R=0.066 for 824 unique observed reflection. The structural asymmetric unit contains a molecule, but two N-H…O hydrogen bonds related by controsymmetry make the molecules form a dimer. In both structure, the dihedral angle between the planar pyridyl ring and the plane defined by C(10)-C(11)-O connected by linear diyne chain is approximately normal, and the molecules are stacked along b-axis with the unit repeat of b-axis.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.17 no.3
• /
• pp.278-282
• /
• 2004

The Hydrogenated amorphous carbon(a-C:H) thin films are deposited on silicon with a close field unbalanced magnetron(CFUBM) sputtering systems. The experimental data are obtained on the depositon rate and physical properties of a-C:H films using DC bias voltage and Ar/C$_2$H$_2$ pressure. The depostion rate and the surface roughness decrease with DC bias voltage, but the hardness of the thin films increases with DC bias voltage. And the position of G-peak moves to lower wavenumber indicating an increase in diamond-like carbon characteristics with the lower Ar/C$_2$H$_2$ pressure.

• Journal of Integrative Natural Science
• /
• v.8 no.4
• /
• pp.250-257
• /
• 2015

The crystal structure of the potential active 3-(4-ethylphenyl)-3H-chromeno[4,3-c]isoxazole-3a(4H)-carbonitrile ($C_{19}H_{16}N_2O_2$) has been determined from single crystal X-ray diffraction data. In the title compound crystallizes in the monoclinic space group $P2_1/c$ with unit cell dimension a=6.6869 (8) ${\AA}$, b=15.8326 (19) ${\AA}$ and c= 15.237 (2) ${\AA}$ [${\alpha}=90^{\circ}$, ${\beta}=100.663^{\circ}$ and ${\gamma}=90^{\circ}$]. In the structure chromene, isoxazole and carboxylate are almost coplanar each other. All geometrical parameters revelled that chromene ring of pyran ring adopt sofa conformation. The crystal packing is stabilized by intermolecular C-H...N and C-H...O hydrogen bond interaction.

• Food Science of Animal Resources
• /
• v.31 no.4
• /
• pp.551-556
• /
• 2011

The objective of this study was to determine the resistance of Cronobacter sakazakii in acidic environments. The D-values of CAFM2 (ATCC 29544), EB 1, EB 5, and EB 41 at pH 2.5 in TSB were significantly (p<0.05) higher when cells were adapted at pH 4.5 in TSB for 5-h then when cells were not adapted at pH 4.5 in TSB. The D-values of CAFM2, EB1, and EB 41 at pH 2.5 in TSB were significantly (p<0.05) higher when cells were adapted at pH 4.5 in TSB for 10-h then when cells were not adapted at pH 4.5 in TSB. The D-values of CAFM2 and EB1 at pH 2.5 in TSB were significantly (p<0.05) higher when cells were adapted at pH 4.5 in TSB for 24-h then when cells were not adapted at pH 4.5 in TSB. The adaptation of C. sakazakii to mild acidic environments may result in increased resistance to severe acidic environments. The D-values of all test strains at pH 2.5 in TSB were significantly (p<0.05) higher when cells were cultured at pH 4.5 then when they were cultured at pH 7.2 in TSB. These data indicate that cells cultured in mildly acidic environments may result in increased resistance to severe acidic environments. The acid adaptation of C. sakazakii showed an increased resistance to acidic environments. The acid adaptation response of C. sakazakii has important implications for food safety, which should be considered when food preservation measures are developed.

• Proceedings of the Korean Nuclear Society Conference
• /
• 1998.05b
• /
• pp.186-191
• /
• 1998

$UO_2$-5wt%CeO$_2$ 분말에서 소결온도(1600, 1$700^{\circ}C$), 소결분위기(H$_2$, $N_2$-7vol.%H$_2$) 및 Li$_2$O 첨가량(0.05-2wt%)에 따른 소결성의 변화를 관찰하였다. $UO_2$-5wt%CeO$_2$를 attrition mill에서 2 시간까지 분쇄한 후, 1$700^{\circ}C$에서 H$_2$, N2-7vol.%H$_2$ 분위기에서 소결하면 소결밀도가 각각 10.46, 10.36 g/㎤이지만, 각 분위기에서 소결체내의 결경립크기가 일정하지 않고 Ce agg1omerate도 소결체내의 여러 곳에 분포되어 있어 분말처리만으로 소결성을 개선하는데는 한계가 있었다. 반면에, $UO_2$-5wt%CeO$_2$에 0.lwt%Li$_2$O를 첨가하여 1 시간동안 분쇄란 후, 1$600^{\circ}C$에서 H$_2$$N_2$-7vol.%H$_2$ 분위기로 소결하면 밀도는 각각 10.51, 10.48 g/㎤이었고, 결정립크기는 각각 8.9, 42.1 $\mu\textrm{m}$이었다. 즉, Li$_2$O의 첨가에 의해 밀도와 결정립크기가 모두 증가했으며, H$_2$ 분위기보다는 $N_2$-7vol.%H$_2$ 분위기에서 결정립이 더 크게 성장하였고, 1$700^{\circ}C$에서도 유사한 경향을 나타내었다. $UO_2$-5wt%CeO$_2$와 이 조성에 0.lwt%Li$_2$O를 첨가한 분말들을 H$_2$ 및 $N_2$-7vol.%H$_2$ 분위기에서 소결하여 기공크기 및 기공부피의 변화를 관찰한 결과, H2 분위기에서 소결하였을 때는 Li$_2$O의 첨가에 의해 치밀화가 주로 일어났고, 반면에 $N_2$-7vol.%H$_2$ 분위기에서 소결하면 Li$_2$O의 첨가에 의해 작은 기공은 소멸되고 큰 기공이 생성되었다.

• Bulletin of the Korean Chemical Society
• /
• v.24 no.5
• /
• pp.605-609
• /
• 2003

The lower-order lithium organocyanocuprate compound, (THF)₃Li(NC)Cu($C_6$H₃-2,6-Mes₂) (1), and the bulky terphenyl Grignard reagent, Br(THF)₂Mg($C_6$H₃-2,6-Trip₂) (2), have been synthesized and structurally characterized both in the solid state by single crystal x-ray crystallography and in solution by multi-nuclear NMR and IR spectroscopy. The compound (1) was isolated as a monomeric contact ion-pair in which the C (organic ipso)-Cu-CN-Li atoms are coordinated linearly. The lithium has a tetrahedral geometry as a result of solvation by three THF molecules. The compound (1) is the first example of fully characterized monomeric lower order lithium organocyanocuprate. The bulky Grignard reagent (2) was also isolated as a monomer in which the magnesium, solvated by two THF molecules, has a distorted tetrahedral geometry. The crystals of (1) possess triclinic symmetry with the space group $P{\={1}}$, Z = 2, with a = 12.456(3) Å, b = 12.508(3) Å, c = 13.904(3) Å, α = 99.81°, β = 103.72(3)°, and γ = 119.44(3)°. The crystals (2) have a monoclinic symmetry of space group $P2_{1/C}$, Z = 4, with a = 13.071(3) Å, b = 14.967(3) Å, c = 22.070(4) Å, and β = 98.95(3)°.

• Journal of Applied Biological Chemistry
• /
• v.61 no.1
• /
• pp.59-67
• /
• 2018

This study was conducted to isolate the cellulolytic bacteria able to grow on LB- Carboxymethyl cellulose (CMC) agar trypan blue medium from the mixed forest and Larix leptolepis stands. Three bacterial strains with high activity against both CMC and xylan were isolated. Both API kit test and 16S rRNA gene sequence analysis revealed that the three different isolates belong to the gene Bacillus. Therefore, the isolates named as Bacillus sp. EFL1, Bacillus sp. EFL2, and Bacillus sp. EFP3. The optimum growth temperature of Bacillus sp. EFL1, EFL2, and EFP3 were $37^{\circ}C$. The optimum temperature for CMCase and xylanase from Bacillus sp. EFL1 were $50^{\circ}C$. The optimum pH of Bacillus sp. EFL1 xylanase was pH 5.0 but the optimum pH of CMCase from Bacillus sp. EFL1 was pH 6.0. The optimum temperature of CMCase and xylanase from Bacillus sp. EFL2 was $60^{\circ}C$, respectively. The optimum pH of CMCase of Bacillus sp. EFL2 was 5.0, whereas xylanase showed high activity at pH 3.0-9.0. The optimum temperature for CMCase and xylanase of Bacillus sp. EFP3 was $50^{\circ}C$. The optimum pH for CMCase and xylanse was 5.0 and 4.0, respectively. CMCases from Bacillus sp. EFL1, EFL2, and EFP3 were thermally unstable. Although xylanase from Bacillus sp. EFL1 and EFP3 showed to be thermally unstable, xylanase from Bacillus sp. EFL2 showed to be thermally stable. Therefore, Bacillus sp. EFL2 has great potential for animal feed, biofuels, and food industry applications.

• Transactions of the Korean Society of Mechanical Engineers
• /
• v.10 no.1
• /
• pp.131-137
• /
• 1986

Cutting oil cools the chip and a tool as well as lubricates the chip-tool interface, the flank and machined surface. Rehbinder effect has been known as a phenomenon, the reduction of mechanical strength, when the metal is exposed to a polar organic environment or the surface of metal is coated with some polar organic substances. About the cause of Rehbinder effect there have been many different ideas by Rehbinder, Shaw, Barlow, Sakida and etc. In this report, the efect of polar organic substance( $C_{6}$ $H_{5}$C $H_{3}$+ $C_{6}$ $H_{4}$(C $H_{3}$)$_{2}$+ $C_{4}$ $H_{9}$OH+ $C_{6}$ $H_{12}$ $O_{2}$) (magic ink) upon the mechanism of chip formation on the orthogonal cutting of copper and mechanical properties of the work material are experimentally discussed with various rake angles. As expected no lubrication action could be noticed, but the shear angle increased and the cutting force and shear strain on the shear plane decreased, therefore the work material must be embrittled under polar organic substance.substance.