• 제목/요약/키워드: $CF_X$

검색결과 210건 처리시간 0.028초

나노임프린트 리소그래피 적용을 위한 CHF3 플라즈마를 이용한 실리콘 몰드 표면 처리 특성 (A Study of the Silicon Mold Surface Treatment Using CHF3 Plasma for Nano Imprint Lithography)

  • 김용근;김재현;유반석;장지수;권광호
    • 한국전기전자재료학회논문지
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    • 제24권10호
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    • pp.790-793
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    • 2011
  • In this study, the surface modification for a silicon(Si) mold using $CHF_3$ inductively coupled plasma(ICP). The conditions under that plasma was treated a input ICP power 600 W, an operating gas pressure of 10 mTorr and plasma exposure time of 30 sec. The Si mold surface became hydrophobic after plasma treatment in order to $CF_x$(X= 1,2,3) polymer. However, as the de-molding process repeated, it was investigated that the contact angle of Si surface was decreased. So, we attempted to investigate the degradation mechanism of the accurate pattern transfer with increasing the count of the de-molding process using scanning electron microscope (SEM), contact angle, and x-ray photoelectron spectroscopy (XPS) analysis of Si mold surface.

GFS-CFXB 내진보강법을 이용한 지진피해를 받은 R/C 건물의 내진성능 평가 및 내진보강 효과 (Seismic Strengthening and Performance Evaluation of Damaged R/C Buildings Strengthened with Glass Fiber Sheet and Carbon Fiber X-Brace System)

  • 이강석
    • 콘크리트학회논문집
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    • 제25권6호
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    • pp.667-674
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    • 2013
  • 기존 강재 브레이싱 내진보강법은 정착부의 안정성 문제와 브레이싱의 국부좌굴이 발생할 문제가 있으며, 이를 방지하기 위한 추가보강으로 인해 불필요한 자중증가 등으로 경제적인 내진보강성능 확보에 어려움이 있다. 이 연구에서는 지진피해를 받은 건물에 지진피해로 인한 기존 기둥의 연성확보를 위해서 유리섬유시트(glass fiber sheet)로 래핑을 함과 동시에 기존 철골 X-브레이싱 내진보강법에 비교해서 경량의 고강도 재료로 보강 후 추가적인 중량증가가 거의 없으며, 브레이싱 압축 좌굴거동에 자유로운 탄소섬유 앵커 X-브레이싱공법(carbon fiber X-brace)을 조합한 경제적이며 효과적인 새로운 내진보강법(GFS-CFXB)을 제안하였다. 이 연구에서 제안한 GFS-CFXB공법의 유용성을 검증할 목적으로 지진피해를 받은 골조를 대상으로 반복가력에 의한 구조실험을 실시하여 내진성능 및 내진보강 효과를 검증하였다.

Concurrent Chemoradiotherapy Versus Radiotherapy Alone for Locoregionally Advanced Nasopharyngeal Carcinoma

  • Yu, Hong-Sheng;Wang, Xin;Song, Ai-Qin;Liu, Ning;Zhang, Wei;Yu, Li
    • Asian Pacific Journal of Cancer Prevention
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    • 제13권8호
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    • pp.3961-3965
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    • 2012
  • Objective: To compare the clinical effects of concurrent radiochemotherapy with those of radiotherapy in treating locally advanced nasopharyngeal carcinoma (Stage III~IVa). Methods: A total of 95 patients suffering from nasopharyngeal carcinoma (Stage III~IVa) were divided into two groups: concurrent radiochemotherapy (Group CCRT, n=49) and radiotherapy (Group RT, n=46). The two groups were both delivered conventional fractionated radiotherapy, while Group CCRT also received three cycles of PF (DDP+5-Fu) or PLF (DDP+5-Fu+CF) chemotherapy. Results: The complete remission rate and total remission rate of Group CCRT were higher than those of Group RT ($X^2$=4.72~7.19, P<0.05). The one-year overall survival (OS) rate calculated by the life table method, was also higher than that of Group RT ($X^2$=4.24, P<0.05) as well as the 3-year OS rate, nasopharyngeal control rate and cervical lymph nodes' control rate ($X^2$=4.28~4.40, P<0.05). In addition, the 5-year OS and metastasis-free rates of Group CCRT were higher than those of Group RT and the differences were of statistical importance ($X^2$=3.96~8.26, P<0.05). However, acute toxicity was also obviously higher, the difference in gastrointestinal reactions being statistically significant ($X^2$=11.70, P<0.05). Conclusion: This study demonstrated that concurrent radiochemotherapy could improve the remission rate, overall survival rate and locally control rate. The toxicity of concurrent radiochemotherapy could be tolerated by the patients.

Characterization of Pathogenesis and Plant Defence-related Genes Against Potato virus X infection empolying Potato X virus expresssin vector

  • Park, Mi-Ri;Kwon, Sun-Jung;Kim, Kook-Hyung
    • 한국식물병리학회:학술대회논문집
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    • 한국식물병리학회 2003년도 정기총회 및 추계학술발표회
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    • pp.74.1-74
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    • 2003
  • Differential display (DD) of mRNA is a technique in which mRNA species expressed by a cell population are reverse transcribed and then amplified by many separate polymerase chain reactions (PCR). Using DD-RT-PCR we obtained many genes that expressed differentially in healthy and PVX-infected Nicotiana benthamima, using total RNAs extracted from healthy and PVX-infected N. benthamiana plants. Three hundred and twenty-five DNA fragments isolated from DD-RT-PCR were cloned and sequenced for further characterization. Several host genes including SKPI-like protein, heat shock transcription factor and Avr9/Cf-9 rapidly elicited protein were selected to obtain full-length open reading frame and to characterize their potential involvement in virus disease development and/or host's defense against virus infection employing PVX-based expression vector. Transcrips from wild-type and clones containing each selected gene were inoculated onto N. benthamiana Levels of virus replication were confirmedby RT-PCR and RNA blot analysis, Expression profiles and potential role(s) of selected genes upon PVX infection will be discussed.

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Microwave Dielectric Properties of Bi2O3-TiO2 Composite Ceramics

  • Axelsson, Anna-karin;Sebastian, Maladil;McN Alford, Neil
    • 한국세라믹학회지
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    • 제40권4호
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    • pp.340-345
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    • 2003
  • B $i_2$ $O_3$-Ti $O_2$ composite dielectric ceramics have been prepared by a conventional solid state ceramic route. The composite ceramics were prepared with starting materials of different origin and the microwave dielectric properties were investigated. The sintered ceramics were characterized by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray microanalysis, Raman and microwave methods. Structural and microstructural analyses identified two separate phases: Ti $O_2$(rutile) and B $i_2$ $Ti_4$0$_{11}$. The separate grains of titania and bismuth titanate were distributed uniformly in the ceramic matrix. The composition 0.88Ti $O_2$-0.12B $i_2$ $Ti_4$ $O_{11}$ was found to have a Q$\times$f of 9300 GHz (measured at a frequency of 3.9 GHz), a temperature coefficient of frequency, $\tau$$_{cf}$ near zero and a high relative permittivity, $\varepsilon$r of 83. The microwave dielectric properties were measured down to 20$^{\circ}$K K. The quality factor increased on cooling the ceramic samples.les.

고선택비 산화막 식각공정시 $C_4$F$_8$ 헬리콘 웨이브 플라즈마에 노출된 실리콘 표면의 잔류막 관찰 (Investigation of the residue formed on the silicon exposed to $C_4$F$_8$ helicon wave plasmas)

  • 김현수;이원정;염근영
    • 한국표면공학회지
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    • 제32권2호
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    • pp.93-99
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    • 1999
  • Surface polymer layer formed on the silicon wafer during the oxide overetching using $C_4F_8$/ helicon wave plasmas and their characteristics were investigated using spectroscopic elipsometry, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry. Overetch percentage and dc-self bias voltage were varied to investigate the effects on the characteristics of the polymers remaining on the overetched silicon surface. The increase of bias voltage from -80 volts to -120 volts increased the C/F ratio and carbon bondings such as C-C, $C-CF_x$/, and C-Si in the polymer while reducing the thickness of the polymer layer. However, the increase of the overetch percentage from 50% to 100% did not change the composition of the polymer layer and the carbon bondings in the polymer layer remained same even though it increased the polymer thickness. The polymer layer formed at the higher dc-self bias voltage was more difficult to be removed by the following various post-etch treatments compared to that formed at the longer overetch percentage.

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Selective Coordination of Silver Ions to Poly(styrene-b-(ethylene-co-butylene)-b-styrene) and its Influence on Morphology and Facilitated Olefin Transport

  • Lee, Dong-Hoon;Kang, Yong-Soo;Kim, Jong-Hak;Kang, Sang-Wook
    • Macromolecular Research
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    • 제16권8호
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    • pp.676-681
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    • 2008
  • The $\pi$-complex membranes of poly(styrene-b-(ethylene-co-butylene)-b-styrene) (SEBS) of two silver salts of $AgBF_4$ and $AgCF_3SO_3$ were prepared and tested for the separation of the propylene/propane mixtures. The Fourier-transform infrared (FT-IR) spectra of these complexes showed that the silver salts were dissolved in SEBS up to a silver mole fraction of 0.14, due to $\pi$-complexation between the aromatic C=C bonds of styrene blocks and silver ions. Above this solubility limit, ion pairs and high-order ionic aggregates began to form, so that silver salts were distributed unselectively in both the EB and PS blocks. The domain size of the PS blocks was enlarged up to this critical concentration with increasing silver concentration without structural transitions, as confirmed by small angle x-ray scattering (SAXS). These structural properties of the SEBS/silver salt complexes may explain the lower separation properties for propylene/propane mixtures compared to poly(styrene-b-butadiene-b-styrene)(SBS)/silver salt complex membranes.

탄성파 지정선에 관한 연구 (a study on the elastic wave delay line)

  • 김종상
    • 대한전자공학회논문지
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    • 제11권6호
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    • pp.1-15
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    • 1974
  • 본 연구는 탄성파 지연선에 이용되는 탄성표면파중에서 SH표면파 모우드에 대하여 이론적 해석을 하였으며 그 결과 전기-기계적 결합계수가 크며 또한 여전 매질내 깊이 방향으로 아주 작은 감쇠률을 갖고 표면을 따라 전파됨을 알았단. 예로서 PZT-4인 경우 에너지의 80%가 감쇠되는 깊이는 190파장이 된다. 또한 탄성표면파 지연선을 하나의 계단자강으로서 취급하여 삽입손실를 구하였으며 특히 SH표면파 모우드와 같이 전기-기계론 결합계수가 큰 경우는 인터디지탈 트랜스듀셔의 전극폭과 윤극간 간격 사이의 비에 따라 중심 주파수가 현저히 달라진다. 그리고 탄성파 지연선의 온도계수를 벌크파인 종파, 횡파에 대하여 구하였으며 LiTaO2 Z축방향 전파의 횡파는 지연시간의 온도계수가 5.4X10-6/℃로 아주 작아짐을 알았다. 또한 LiNbO3의 130°, 64° 로테이트 Y캇트, X전파의 탄성표면파의 온도계수가 이론치와 잘 일치함을 실험적으로 확인하였다.

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표면불소화에 따른 Poly(phenylene oxide)막의 기체투과거동 연구 (Studies on the Gas Permeation Behaviors Using the Surface Fluorinated Poly(phenylene oxide) Membranes)

  • 이보성;김대훈;임지원
    • 멤브레인
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    • 제20권2호
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    • pp.106-112
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    • 2010
  • 본 연구에서는 poly(phenylene oxide) (PPO)의 막 표면에 100 ppm의 농도를 갖는 불소가스를 접촉시켜 표면불소화하였다. 표면 개질된 막의 특성을 알아보기 위하여 표면접촉각, XPS, 기체투과 실험을 수행하였다. 표면특성 분석 결과 불소처리 시간이 증가함에 따라 막 표면에 $-CF_2$, $-CF_3$의 perfluoro group의 결합으로 인해 막의 소수성이 증가함을 알 수 있었다. 기체투과 측정으로부터 불소화시간이 증가함에 따라 기체에 대한 투과도는 감소하였으며, 불소노출이 60분 경과한 막의 경우 질소 33%, 산소 23%, 이산화탄소 3%의 감소율을 나타내었다. 선택도의 경우 질소 대비 산소의 경우 3.92로부터 4.47로, 이산화탄소에 대한 질소의 경우 18.09에서 25.4로 증가함을 얻었다.

MEICP 식각에 의한 SBT 박막의 표면 반응 연구 (The Study on the Surface Reaction of $SrBi_{2}Ta_{2}O_{9}$ Film by Magnetically Enhanced Inductively Coupled Plasma)

  • 김동표;김창일
    • 대한전자공학회논문지SD
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    • 제37권4호
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    • pp.1-6
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    • 2000
  • 최근에 빠른 쓰기/읽기 속도, 적은 소비 전력과 비휘발성을 가지는 메모리 캐패시터의 유전 재료로서 SrBi/sub 2/Ta/sub 2/O/sub 9/(SBT)에 대한 관심이 집중되고 있다. 강유전체 물질을 이용한 고밀도 FeRAM을 생산하기 위하여서는 식각에 의한 패턴이 형성되어야 한다. 강유전체 물질의 성장과 그 전기적 특성에 관한 연구와 발표는 많이 발표 되고 있다. 그러나, 강유전체 물질의 식각의 어려움 때문에 SBT 박막 식각에 관한 연구는 거의 전무하다고 할 수 있다. 그러므로, SBT 박막의 식각의 특성을 알아보기 위하여, SBT 박막은 CF/sub 4/Ar 가스 플라즈마를 이용하여 MEICP로 식각 되어졌다. XPS를 이용하여 식각 된 SBT 박막의 표면에서의 화학 반응을 분석하였고, XPS 분석을 검증하기 위하여 SIMS 분석을 하여 비교하였다.

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