• 제목/요약/키워드: $CF_4$ Decomposition

검색결과 29건 처리시간 0.028초

마이크로파를 이용한 황산세륨으로 개질화 된 SiC/Al2O3 촉매의 CF4 분해 특성 (Decomposition Characteristics of CF4 by SiC/Al2O3 Modified with Cerium Sulfate Using Microwave System)

  • 최성우
    • 대한환경공학회지
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    • 제37권12호
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    • pp.668-673
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    • 2015
  • 마이크로파 열분해 시스템을 이용하여 Ce 담지량이 다른 알루미나 촉매의 $CF_4$ 분해에 대한 연구를 실시하였다. 마이크로파 발열체로는 실리콘카바이드를 사용하였다. 각 촉매의 결정상은 XRD로 관찰하였으며 $CF_4$의 분해율은 GC-TCD를 사용하였다. $500^{\circ}C$ 반응온도에서 10 wt% Ce로 개질화한 알루미나가 개질화하지 않은 알루미나에 비해 $CF_4$ 분해율이 높았다. 반응속도상수 k값은 $Ce(20)/Al_2O_3=Ce(0)/Al_2O_3 순이었다. XRD 패턴은 $Ce(0)/Al_2O_3$에서는 반응 전후의 차이가 나타나지 않았으며 $Al_2O_3$의 결정구조만 관찰되었다. 반면에 Ce를 담지한 촉매에서는 산화알루미늄와 산화세륨의 혼합형으로 나타났다. 본 연구의 결과 Ce를 담지한 $Al_2O_3$촉매는 Ce를 담지하지 않은 촉매에 비해 동일한 분해율을 가지면서 반응온도를 $200^{\circ}C$ 정도를 낮출 수 있음을 보여주었다. 또한 cerium sulfate의 적정비율은 5~10 wt%임을 보여주었다.

DBD 반응기에서 플라즈마 방전형태에 따른 PFCs 가스의 분해 특성 (Decomposition Characteristics of PFCs for Various Plasma Discharge Methods in Dielectric Barrier Discharge)

  • 김관태;김용호;차민석;송영훈;김석준;류정인
    • 한국대기환경학회지
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    • 제20권5호
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    • pp.625-632
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    • 2004
  • Perfluorocompounds ($PFC_s$), such as tetrafluoromethane ($CF_4$) and hexafluoroethane ($C_2F_6$), have been widely used as plasma etching and chemical vapor deposition (CVD) gases for semiconductor manufacturing processes. Since these $PFC_s$ are known to cause a greenhouse effect intensively, there has been a growing interest in reducing $PFC_s$ emissions. Among various $CF_4$ decomposing techniques, a dielectric barrier discharge (DBD) is considered as one of a promising candidate because it has been successfully used for generating ozone ($O_3$) and decomposing nitrogen oxide (NO). Firstly, optimal concentration of oxygen for $CF_4$ decomposition was found to figure out how many primary and secondary reactions are associated with DBD process. Secondary, to find effective discharge method for $CF_4$ decomposition, a streamer and a glow mode in DBD are experimentally compared, which includes (i) coaxialcylinder DBD, (ii) DBD reactor packed with glass beads. and (iii) a glow mode operation with a helium gas. The test results showed that optimal concentration of oxygen was ranged 500 ppm~1% for treating 500 ppm of $CF_4$ and helium glow discharge was the most efficient one to decompose $CF_4$.

Ab Initio Study on the Thermal Decomposition of CH3CF2O Radical

  • Singh, Hari Ji;Mishra, Bhupesh Kumar;Gour, Nand Kishor
    • Bulletin of the Korean Chemical Society
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    • 제30권12호
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    • pp.2973-2978
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    • 2009
  • The decomposition reaction mechanism of $CH_3CF_2O$ radical formed from hydroflurocarbon, $CH_3CHF_2$ (HFC-152a) in the atmosphere has been investigated using ab-initio quantum mechanical methods. The geometries of the reactant, products and transition states involved in the decomposition pathways have been optimized and characterized at DFT-B3LYP and MP2 levels of theories using 6-311++G(d,p) basis set. Calculations have been carried out to observe the effect of basis sets on the optimized geometries of species involved. Single point energy calculations have been performed at QCISD(T) and CCSD(T) level of theories. Out of the two prominent decomposition channels considered viz., C-C bond scission and F-elimination, C-C bond scission is found to be the dominant path involving a barrier height of 12.3 kcal/mol whereas the F-elimination path involves that of a 28.0 kcal/mol. Using transition-state theory, rate constant for the most dominant decomposition pathway viz., C-C bond scission is calculated at 298 K and found to be 1.3 ${\times}$ 10$^4s{-1}$. Transition states are searched on the potential energy surfaces involving both decomposition channels and each of the transition states are characterized. The existence of transition states on the corresponding potential energy surface are ascertained by performing Intrinsic Reaction Coordinate (IRC) calculation.

The atmospheric plasma reactor with water wall to decompose CF4

  • Itatani, Ryohei;Deguchi, Mikio;Toda, Toshihiko;Ban, Heitaro
    • 한국표면공학회지
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    • 제34권5호
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    • pp.391-394
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    • 2001
  • A new type plasma reactor is proposed to decompose CF4 diluted with N2 gas in atmospheric pressure. The arc plasmas is surrounded with a waterwall which acts as a source of water vapor, the solvent of HF, resultant product after decomposition, and conveyer to take away fluorine compound from exhaust gas. Abatement more than 99% is achieved by small size plasmas such as 1 cm in diameter, 25cm in length and 3.4KW of DC discharge power in such gas as the mixture of 100 sccm of CF4 and 15 slm of N2. Reactors of this type are to be expanded to such a system as Nitrogen flow of 50 slm with 200 sccm of CF4 and 7-8 KW discharge power.

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CONSTRUCTIVE WAVELET COEFFICIENTS MEASURING SMOOTHNESS THROUGH BOX SPLINES

  • Kim, Dai-Gyoung
    • 대한수학회지
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    • 제33권4호
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    • pp.955-982
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    • 1996
  • In surface compression applications, one of the main issues is how to efficiently store and calculate the computer representation of certain surfaces. This leads us to consider a nonlinear approximation by box splines with free knots since, for instance, the nonlinear method based on wavelet decomposition gives efficient compression and recovery algorithms for such surfaces (cf. [12]).

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Large Scale Treatment of Perfluorocompounds Using a Thermal Plasma Scrubber

  • Han, Sung-Han;Park, Hyun-Woo;Kim, Tae-Hee;Park, Dong-Wha
    • 청정기술
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    • 제17권3호
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    • pp.250-258
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    • 2011
  • Thermal plasma has been presented for the decomposition of perfluorocompounds (PFCs) which are extensively used in the semiconductor manufacturing and display industry. We developed pilot-scale equipment to investigate the large scale treatment of PFCs and called it a "thermal plasma scrubber". PFCs such as $CF_4$, $C_2F_6$, $SF_6$, and $NF_3$ used in experiments were diluted with $N_2$. There were two different types of experiment setup related to the water spray direction inside the thermal plasma scrubber. The first type was that the water was sprayed directly into the gas outlet located at the exit of the reaction section. The second type was that the water was sprayed on the wall of the quenching section. More effective decomposition took place when the water was sprayed on the quenching section wall. For $C_2F_6$, $SF_6$, and $NF_3$ the maximum destruction and removal efficiency was nearly 100%, and for $CF_4$ was up to 93%.

PFC 배출 저감을 위한 파일롯 규모 촉매 공정 연구 (A Study on Catalytic Process in Pilot Plant for Abatement of PFC Emission)

  • 이영춘;전종기
    • 청정기술
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    • 제18권2호
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    • pp.216-220
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    • 2012
  • 본 연구의 목적은 30 L의 촉매가 장착된 파일롯 규모의 반응 시스템에서 상업용 촉매(Co/$ZrO_2-Al_2O_3$)의 PFC 분해 성능을 검증하는 것이다. 공간 속도(GHSV) 1,800 $h^{-1}$의 조건에서 $SF_6$의 농도를 증가시키면 $T_{95}$가 증가하였는데 $SF_6$의 농도가 1,000~10,000 ppm일 때 $T_{95}$가 580~$610^{\circ}C$ 범위로 나타났으며, 열 소각을 했을 때의 $T_{95}$$1600^{\circ}C$보다 매우 낮은 온도임을 알 수 있다. $650^{\circ}C$의 반응 온도 하에서 72시간 동안에 99% 이상의 $SF_6$의 전환율이 유지되어 촉매의 안정성이 확보되었다. 또한 $SF_6$ 전환율을 99% 이상 유지하기 위해서는 GHSV를 $2,000h^{-1}$ 이하인 조건에서 운전해야 함을 알 수 있었다. $CF_4$의 분해 반응의 경우 $T_{95}$ 온도가 $710^{\circ}C$이었으며, $SF_6$$T_{95}$ 온도보다 높은 온도가 필요함을 알 수 있었다.

PFCs가스 분해처리를 위한 글라이딩 아크 플라즈마 응용 (Gliding arc plasma application for PFCs gas decomposition)

  • 노임준;신백균;박동화;김형권;이상희;박종국;강대하;김진식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2008년도 제39회 하계학술대회
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    • pp.1354-1355
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    • 2008
  • 교류 펄스전압을 이용한 글라이딩 아크 플라즈마를 이용하여 PFCs(Perfluoro compounds) 가스의 일종인 $CF_4$ $SF_6$, $NF_3$를 가스분해하는 연구를 실시하였다. 반응기 양전극 사이에 인가되는 전압은 10kV로 고정하고 각각의 가스의 유량을 조절하여 분해한후 FT-IR을 통해 각각의 가스의 분해율과 분해후 가스내 성분을 스펙트럼을 이용하여 분석하였다. 유량이 낮아질수록 분해율은 좋아졌고 $SF_6$$NF_3$의 경우 99%이상의 높은 분해율에 도달하였을 뿐 아니라 대표적인 난분해 가스로 손꼽히는 $CF_4$의 경우 82%이상의 분해율을 확인하였다.

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