• Journal of the Korean Ceramic Society
• /
• v.29 no.6
• /
• pp.459-462
• /
• 1992

It has been reported that the size and characteristics of ferroelectric domains which have an essential role on the ferroelectric properties depend on the grain size of ferrolectric ceramics. Therefore understanding the change of domain characteristics with grain size is so important to know the dependence of dielectric constant, dielectric loss and aging on the grain size. In this research, the equilibrim domain with is calculated as d={{{{ SQRT { { 64 pi sigma a} over {3C11Ss2 } } }}. This calculated value is nearly same to the measured value of BaTiO3 and Pb(Zr0.4Ti0.6)O3 ceramics 90$^{\circ}$domain wall width. The calculated 90$^{\circ}$domain wall enerygy in Pb(Zr0.4Ti0.6)O3 which is obtained through the model is approximately 2$\times$10-2J/$m^2$.

• The Korean Journal of Ceramics
• /
• v.6 no.3
• /
• pp.262-266
• /
• 2000

We investigated the effect of the grain size on the photovoltaic current in (Pb$_{1-x}$La$_x$)TiO$_3$ceramics, and the photoinduced domain switching in (Pb$_{0.85}$La$_{0.15}$)TiO$_3$and BaTiO$_3$ceramics. These behaviors in ferroelectric ceramics were attributed to the grain boundary at which photoexcited electrons were trapped. As the charged grain boundary acted as an electro-potential barrier which impeded the movement of electrons, the photovoltaic current showed a peak at a critical grain size. The space charge field built by the electrons trapped at the grain bound-aries was accounted for the photoinduced domain switching, and AE experimental results support well this account.

• Journal of the Korean Vacuum Society
• /
• v.9 no.3
• /
• pp.242-248
• /
• 2000

BST thin films were prepared with various deposition conditions by rf-magnetron sputtering. As substrate temperature increases and Ar/$O_2$ratio decreases, the electrical properties of the BST films improve. The conventional Schottky model and modified-Schottky model were introduced in order to investigate the leakage-current-conduction mechanisms of the deposited films. It was found that the modified-Schottky model better describes the current-conduction mechanism in the BST films than the conventional Schottky model. From the modified-Schottky model, optical dielectric constant ($\varepsilon$), electronic drift mobility ($\mu$), and barrier height $({\phi}_b)are calculated as $\varepsilon$=4.9, $\mu$=0.019 $\textrm{cm}^2$/V-s, and ${\phi}_b=0.79 eV.

• Journal of the Korean Ceramic Society
• /
• v.42 no.2 s.273
• /
• pp.132-139
• /
• 2005

Sintering behavior of $BaO-Nd_{2}O_3-TiO_2$ with a Pb-based glassceramics frit were investigated in order to understand an effect of glassceramics as a low temperature sintering agent on dielectric ceramics. A green sheet form was fabricated through tape casting method with the glassceramic fut added $BaO-Nd_{2}O_3-TiO_2$. The dispersion properties, rheological properties and final density of dielectric composit slurry as a function of amount and composition of organic additives was examined. The dispersants' addition was effective in controlling dispersion of the ceramics in solution. The addition of excessive dispersant showed adverse effect on dispersion. The prepared slurries, containing ceramic : powders, glass-ceramics and various kinds of organic viechles, exhibited typical shear thinning behavior. The best properties of tape casting appeared powder to solvent ratio 65 : 35 and amount of the binder 6 wt$\%$ and plasticizer 3 wt$\%$. The viscosity of the slurry was 677 cps and green/sintered density in the tape was $3.3 g/cm^3,\;5.56 g/cm^3$ respectively.

• Proceedings of the International Microelectronics And Packaging Society Conference
• /
• 2003.11a
• /
• pp.165-168
• /
• 2003

본 연구에서는 마이크로파응용을 위한 이동통신기기용 안테나 모듈용 유전체재료 개발을 위해 $20\~80$의 중유전율을 가지는 글래스-세라믹스 복합체를 제조하고자 하였다. $BaO-Nd_2O_3-TiO_2$계 세라믹스를 기본조성으로 하고, $Na_2O-BaO-B_2O_3-P_2O_5$계 글래스 프릿의 첨가를 통해 제조된 글래스-세라믹스 복합체의 소결특성 및 유전특성을 조사하였다. 글래스 프릿을 5, 10, $15wt\%$ 첨가하였으며, $800\~950^{\circ}C$에서 각각 1시간동안 소결을 진행하였다. 그 결과로서 글래스 프릿의 한량이 증가하고, 소결온도가 높을수록 유전율$(\epsilon_r)$은 증가하였으며, 복합체의 결정특성은 감소함을 나타내었다.

• Journal of the Korean Institute of Telematics and Electronics D
• /
• v.36D no.6
• /
• pp.44-51
• /
• 1999

The electrical conduction mechanism of high dielectric $(Ba,Sr)TiO_3$ (BST) thin film capacitor, which is the promising cell capacitor for high density DRAM, was investigated in low field region (<0.2MV/cm). It is known that the current in the low field region consists of dielectric relaxation current and leakage current. The current-time (I-t) measurement technique under the constant voltage was used for extracting successfully each current component. The conduction mechanism of the BST capacitor was deduced from the dependency of the current on the measurement temperature, strength of electric field, the polarity of applied electric field and post annealing process. From these results, it was suggested that the dielectric relaxation current and the leakage current are originated from the redistribution of internally trapped electron by hopping process and Pool-Frenkel conduction mechanism, respectively. It was also concluded that traps causing these two current components are due to oxygen vacancies within the BST film.

• Journal of the Korean Ceramic Society
• /
• v.34 no.8
• /
• pp.803-810
• /
• 1997

Ba0.5Sr0.5TiO3 thin films were deposited by RF magnetron sputliring method in order to clarify the anneal condition and doping effect on loakage current Nb and Al were selected as electron donor and acceptor dopants respectively, in the BST films because they have been known to have nearly same ionic radii as Ti and thought to substitute Ti sites to influence the charge carrier and the acceptor state adjacent to the gram boundary. BST thin films prepared in-situ at elevated temperature showed selatively high leakage current density and low breakdown voltage. In order to achieve smooth surface and to improve electrical properties, BST thin films were deposited at room temperature and annealed at elevated temperature. Post-annealed BST thin films showed smoother surface morphology and lower leakage current density than in-situ prepared thin films. The leakage current density of Al doped thin films was measured to be around 10-8A/cm2, which is much lower than those of undoped and Nb doped BST films. The result clearly demonstrates that higher Schottky barrier and lower mobile charge carrier concentration achieved by annealing in the oxygen atmosphere and by Al doping are desirable for reducing leakage current density in BST thin films.

• Proceedings of the Korean Magnestics Society Conference
• /
• 2007.05a
• /
• pp.74.2-74.2
• /
• 2007

• Proceedings of the Korean Vacuum Society Conference
• /
• 2003.02a
• /
• pp.145-145
• /
• 2003

• Proceedings of the Korean Vacuum Society Conference
• /
• 2002.06a
• /
• pp.77-77
• /
• 2002