• KIEE International Transactions on Electrophysics and Applications
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• v.11C no.3
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• pp.75-80
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• 2001

Holographic polymer dispersed liquid crystals (HPDLCs) have fabricated by irradiating an Ar-ion laser ( ${\lambda}$=514nm) at various intensity on LC/acrylate monomer mixtures which were sandwitched between two ITO coated glass plates. Monomer systems were composed of dipentaerythritol-hydroxy penta acrylate (DPHPA, f=5)/monofunctional acrylate monofunctional monomers. The LC used in this system was E7 (BL001, Merck). Gratings were fabricated by periodic interference of twobeams. Reflection efficiency-irradiation intensity-monomer type relationships were obtained from the UV-visible spectra of the HPDLC films. Peaks were found at a bit smaller wavelength than 514nm, due to the shrinkage of mixture volume upon polymerization. Real time measurements of diffraction efficiency have been obtained according to monomer types and LC contents.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.539-542
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• 2000

ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the emission properties of ZnO thin films, PL measurements with an Ar ion laser as a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited PL bands centered around 390, 510 and 640 nm, labeled near ultra-violet (UV), green and orange bands. Structural properties of ZnO thin films are analized with X-ray diffraction (XRD).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.125-127
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• 2007

MoN 코팅막은 Ar과 $N_2$가 섞인 가스 상태 안에서 몰리브덴(Mo) 타겟을 사용해서 아크 이온 플레이팅법을 사용하여 stainless steel 표면 위에 증착을 시켰다. MoN 코팅막의 미세 결정 구조의 특징은 X-선 회절 분석(X-ray Diffractormeter, Phillips co. X'pert)과 XPS를 사용해서 측정하였다. MoN 코팅막은 순수 Mo 코팅막의 13GPa 보다 높은 25 GPa의 미세경도값을 나타냈으며, 또한 Mo 코팅막에 N의 함량이 증가할수록 마찰계수가 낮아지는 것을 알 수 있었다. 이번 연구에서는 MoN 코팅막에서 질소 함량을 변화 시켜 MoN 코팅막의 미세구조와 그 특성에 대하여 연구하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.331-331
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• 2010

반도체 제조, 디스플레이 산업 등의 진공공정에서 잔류기체의 종류와 양에 대한 관심이 높아지면서 사용이 쉽고 높은 정확도를 가지는 사중극 질량 분석기(QMS)가 널리 쓰이고 있다. 특히 고진공으로 내려가면서 리크디텍션(leak detection)과 미세량의 잔류기체 감지가 더욱더 요구된다. 그중에서도 진공공정에서의 수소 가스를 감지하는 것은 매우 중요하므로 $H_2$/Ar 혼합가스를 이용하여 미세농도의 수소를 측정하였다. 측정하려는 가스를 부피확장 방법으로 가스챔버로 희석하여 이동시키고 핀홀에서 가스유량을 더 줄여서 QMS가 기체를 감지하는 압력범위를 유지하면서 측정하였다. 미세량의 수소기체를 감지하기 위해 이온소스의 emission current, Ion ref. voltage, cathode voltage의 변수를 조절하여 QMS를 최적화 하였으며, 그 결과 수십 ppm 농도까지 측정이 가능하다.

• Korean Journal of Materials Research
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• v.15 no.11
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• pp.730-734
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• 2005

Cr-Al-Si-N coatings were deposited on WC-Co substrates by a hybrid coating system of arc ion plating and DC magnet :on sputtering technique in $N_2/Ar$ mixture. The Cr-tll-Si-N coatings were synthesized with different Si contents. Their microstructure and mechanical properties were systematically investigated. The average size of crystallites largely decreases with the increase of Si content compared with Cr-Al-N. The microhardness of Cr-Al-Si-N coatings largely increases from 24 to 55 GPa. The enhanced hardness is believed to originate from the microstructural change by the fine composite microstructure of Cr-Al-N coatings with Si addition. The average friction coefficient of Cr-Al-Si-N coatings decreases from 0.84 to 0.45 with increasing Si content up to $16\;at.\%$.

• 한국가시화정보학회:학술대회논문집
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• 2002.11a
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• pp.43-44
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• 2002

A pulsed jet was measured with high-definition 3D-PTV technique. The measurement system consists of three CCD cameras, Ar-ion laser, an image grabber and a host computer. Two fitness functions were introduced in a genetic algorithm in order to enhance the correspondences of the particles. One was based on a concept of the continuum theory and the other one was based on a minimum distance error. The head vortex of the jet was visualized by LIF and was reconstructed by the constructed high-resolution 30-PTV system for comparisons.

• Journal of the Korean institute of surface engineering
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• v.34 no.4
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• pp.337-341
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• 2001

TiN coating of high speed end mill is recently generalized. The study of coating layer using ion plating is mainly about the coating method and the why of the longer life of coated tools. In CNC machning process, metal cutting isn't carry out until the tools including the end-mill and so on are fractured. Namely, it is difficult precision processing when the cutting force of the cutting tool is near the limit the fracture cutting force. So, the estimate of the life by wear and fracture is important. Therefore, this study is about the method to estimate the capacity of the coating layer in relation to the tendency of cutting force and the influence of the cutting capacity of coated end-mill by the condition N2, Ar, temperature. The cutting length is in inverse proportion to the cutting force ratio. So, the life of the TiN coated end mill can be predicated by the ratio of the increase of the cutting force.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.103-104
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• 2007

Cr-Mo-Si-N 코팅막은 AISI D2 모재와 Si 모재위에 $Ar/N_2$ 혼합기체를 사용하여 AIP (arc ion plating) 방법과 마그네트론 스퍼터링 (DC magnetron sputtering) 방법을 결합시킨 하이브리드 코팅시스템을 이용하여, 증착하였다. XRD, HRTEM, XPS 등의 분석장비를 이용하여 Cr-Mo-Si-N 코팅의 미세구조를 관찰하였다. Cr-Mo-Si-N 코팅의 경도는 Si함량이 12.1 at.%에서 약 50 GPa의 최고치를 나타냈으며, 평균 마찰계수는 Si 함량이 증가할수록 감소하였다.

• Progress in Superconductivity and Cryogenics
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• v.20 no.4
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• pp.20-25
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• 2018

Niobium nitride (NbN) superconducting thin films with the thickness of 100 and 400 nm have been deposited on the surfaces of silicon oxide/silicon substrates using a sputtering method. Their superconducting properties have been evaluated in terms of the transition temperature, critical magnetic field, and critical current density. In addition, the NbN films were patterned in a line with a width of $10{\mu}m$ by a reactive ion etching (RIE) process for their characterization. This study proves the applicability of the standard complementary metal-oxide-semiconductor (CMOS) process in the fabrication of superconducting thin films without considerable degradation of superconducting properties.

• Journal of Electrochemical Science and Technology
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• v.12 no.2
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• pp.212-216
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• 2021

We investigated the feasibility of hydrogen storage with electrochemically formed VO₂ nanotubes. The VO₂ nanotubes were fabricated through the anodization of vanadium metal in fluoride ion-containing organic electrolyte followed by an annealing process in an Ar-saturated atmosphere at 673 K for 3 h at a heating rate of 3 K /min. During anodization, the current density significantly increased up to 7.93 mA/cm² for approximately 500 s owing to heat generation, which led to a fast-electrochemical etching reaction of the outermost part of the nanotubes. By controlling the anodization temperature, highly ordered VO₂ nanotubes were grown on the metal substrate without using any binders or adhesives. Furthermore, we demonstrated the hydrogen sorption properties of the anodic VO₂ nanotubes.