• Title/Summary/Keyword: $Ag/Al_2O_3$

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플라즈마/촉매 공정을 이용한 n-헵테인과 일산화탄소 동시제거 (Combined Removal of n-heptane and CO using Plasma-catalytic Process)

  • 이상백;조진오;목영선
    • 한국가스학회지
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    • 제20권2호
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    • pp.1-9
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    • 2016
  • 본 연구는 플라즈마/촉매 공정을 이용하여 n-헵테인과 일산화탄소의 동시제거에 대해 조사하였다. n-헵테인과 일산화탄소의 분해특성을 파악하기 위해 플라즈마/촉매 공정과 촉매공정의 분해효율을 비교하였고, 촉매의 종류, 온도, 전력 등을 변화시켜 실험을 진행하였다. n-헵테인의 분해효율은 반응기 내부의 온도보다는 에너지밀도에 더 영향을 많이 받는 것으로 확인되었으며, 일산화탄소는 에너지밀도와 반응기 내부 온도 모두의 영향을 받는 것으로 나타났다. 촉매의 종류를 달리하며 n-헵테인의 분해효율을 조사한 결과 $Pd/{\gamma}-Al_2O_3$ > $Ru/{\gamma}-Al_2O_3{\approx}Ag/{\gamma}-Al_2O_3$순으로 나타났다. 특히, $Pd/{\gamma}-Al_2O_3$를 사용한 경우 n-헵테인 분해 과정에서 일산화탄소가 거의 발생하지 않았으며, $CO_2$ 선택도가 100%에 가까웠다. 일산화탄소 분해효율은 $Pd/{\gamma}-Al_2O_3$ > $Ru/{\gamma}-Al_2O_3$ > $Ag/{\gamma}-Al_2O_3$ 순으로 나타났으며, $180^{\circ}C$이하의 온도에서는 플라즈마/촉매 공정의 효율이 높고, $180^{\circ}C$이상에서는 촉매 공정의 분해효율이 높았다.

초고집적 Submicron 박막금속화를 위한 Dielectric Overlayer의 Passivation 효과 (The Effects of Dielectric Passivation Overlayers for Submicron Thin Film Metallizations of ULSI Semiconductor Devices)

  • 김대일;김진영
    • 한국진공학회지
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    • 제3권1호
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    • pp.59-64
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    • 1994
  • 극소전자 디바이스의 고집적화와 더불어 박막배선의 선폭은 0.5$\mu$m이하까지 축소되며 초고집적 submicron 박막금속화가 진행되고 있다. 미세회로에 적용되어지는 배선재료는 인가되는 고전류밀도로 인하여 electromigration 에 의한 결함이 쉽게 발생한다는 단점이있다. 금속박막 전도체위의 dielectric overlayer는 electromigration 에 대한 passivation 효과를 보여 극소전자 디바이스의 평균수명을 향상시 킨다.본 연구에서는 박막금속화에서 dielectric overlayer의 passivation 효과를 알아보기 위하여 약 3000 $\AA$ 두께의 Al,Al-1%Si, Ag 그리고 Cu 박막배선위에 증착하여 SiO2절연보호막의 유무에 따른 박막배선 의 수명변화 및 신뢰도를 측정하였다. 박막배선에 인가된 전류밀도는 1x106 A/cm2와 1x107 A/cm2 이었다. SiO2 dielectric overlayer는 Al,Al-1%Si Ag. Cu 박막배선에서는 electromigration에 대한 보호막 혀과를 보이며 평균수명을 모두 향상시킨다. SiO2 passivation 효과는 Al, Ag, Cu 박막중 Cu 박막배선에서 가 장 크게 나타났다. SiO2 dielectric overlayer가 형성되지 않은 경우 Al 박막배선의 수명이 가장 긴 것으 로 나타났으나 SiO2 가 형성된 경우는 Cu 박막배선의 수명이 가장 길게 나타났다.

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플라즈마 충진 촉매 시스템을 이용한 에틸렌 저감 연구 (Decomposition of Ethylene using a Hybrid Catalyst-packed Bed Plasma Reactor System)

  • 이상백;조진오;장동룡;목영선
    • 한국대기환경학회지
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    • 제30권6호
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    • pp.577-585
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    • 2014
  • A series of experiments using atmospheric-pressure non-thermal plasma coupled with transition metal catalysts were performed to remove ethylene from agricultural storage facilities. The non-thermal plasma was created by dielectric barrier discharge, which was in direct contact with the catalyst pellets. The transition metals such as Ag and $V_2O_5$ were supported on ${\gamma}-Al_2O_3$. The effect of catalyst type, specific input energy (SIE) and oxygen content on the removal of ethylene was examined to understand the behavior of the hybrid plasma-catalytic reactor system. With the other parameters kept constant, the plasma-catalytic activity for the removal of ethylene was in order of $V_2O_5/{\gamma}-Al_2O_3$ > $Ag/{\gamma}-Al_2O_3$ > ${\gamma}-Al_2O_3$ from high to low. Interestingly, the rate of plasma-catalytic ozone generation was in order of $V_2O_5/{\gamma}-Al_2O_3$ > ${\gamma}-Al_2O_3$ > $Ag/{\gamma}-Al_2O_3$, implying that the catalyst activation mechanisms by plasma are different for different catalysts. The results obtained by varying the oxygen content indicated that nitrogen-derived reactive species dominated the removal of ethylene under oxygen-lean condition, while ozone and oxygen atoms were mainly involved in the removal under oxygen-rich condition. When the plasma was coupled with $V_2O_5/{\gamma}-Al_2O_3$, nearly complete removal of ethylene was achieved at oxygen contents higher than 5% by volume (inlet ethylene: 250 ppm; gas flow rate: $1.0Lmin^{-1}$; SIE: ${\sim}355JL^{-1}$).

저온 소성용 SiO$_2$-TiO$_2$-Bi$_2$O$_3$-RO계(RO :BaO-CaO-SrO) Glass/ceramic 유전체 재료의 B$_2$O$_3$첨가에 따른 Ag 후막과의 동시 소결시 정합성 밀 유전 특성에 관한 연구 (A Study on the Co-firing Compatibility with Ag-thick film and Dielectric Characteristics of Low Temperature Sinterable SiO$_2$-TiO$_2$-Bi$_2$O$_3$-RO system (RO :BaO-CaO-SrO) Glass/Ceramic Dielectric Material with the Addition of B$_2$O$_3$)

  • 윤장석;이인규;유찬세;이우성;강남기
    • 마이크로전자및패키징학회지
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    • 제6권3호
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    • pp.37-43
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    • 1999
  • 고주파에서 사용하기 위한 $SiO_2-TiO_2-Bi_2O_3$-RO계(RO:BaO-CaO-SrO)를 주성분으로 하는 결정화 유리와 세라믹 충진재로서 $Al_2O_3$를 혼합하여 제조한 저온 소성용 Glass/Ceramic 유전체 모재와 Ag-thick film의 동시 소결시 발생할 수 있는 소결 부정합과 그 해소 방안을 연구하였다. 적층된 Glass/Ceramic 유전체 sheet와 Ag-thick film의 동시 소결시에 소결체는 sheet와 film의 densification rate 차 등에 의해 큰 camber 현상과 그로 인해 Ag-film에 crack이 발생하였다. 이를 교정하기 위해 유리 성분과 $Al_2O_3$성분이 혼합된 유전체 분말에 $B_2O_3$를 6, 8, 10, 12, 14 vol% 첨가한 결과를 보면 $B_2O_3$첨가량이 증가함에 따라 소결체의 camber 현상은 점점 크게 줄어들었으며 14 vol% 첨가된 경우에는 거의 관찰되지 않았다. 또한 $BaO_3$첨가량이 증가함에 따라 유전율($varepsilon_{r}$)은 점점 감소하였고 Q$\times$f 값은 크게 증가하는 경향을 나타내었으며 $\tau_{f}$ 값은 양(+)의 값으로 점점 크게 변하였다.

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입내 분산형 Al2O3/Ag 나노복합체의 제조와 특성 (Preparation and Properties of the Intra-type Al2O3Ag Nanocomposites)

  • 천승호;한인섭;히데오 아와지
    • 한국세라믹학회지
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    • 제44권4호
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    • pp.208-213
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    • 2007
  • Alumina/silver ($Al_2O_3/Ag$) nanocomposites with Ag content up to 9 vol% were prepared from nanopowder by soaking method using ${\gamma}-Al_2O_3$ of needle type and spark plasma sintering (SPS). The mechanical properties of specimens were investigated three-point flexural strength and toughness as a function of the Ag contents. The maximum flexural strength of the alumina/silver nanocomposite was 850 MPa for the 1 vol% composite, and also higher than monolith alumina as about 800 MPa at 3, 5, and 7 vol% Ag contents. Fracture toughness by single edged V-notch beam (SEVNB) was $4.05MPa{\cdot}m^{1/2}$ for the 3 vol% composite and maintained about $4.00MPa{\cdot}m^{1/2}$ at 5, and 7 vol% Ag content. Microstructure of fracture surface for each fracture specimens was observed. Due to the inhibition effect of alumina grain growth, the average grain size of nanocomposites depends on the content of Ag nano particles. The fracture morphology of nanocomposite with dislocation (sub-grain boundary) by silver nano-particles of second phases in the alumina matrix also showed transgranular fracture-mode compare with intergranular of monolith alumina. Thermal conductivity of specimens at room temperature was about 40 W/mK for the 1 vol% Ag content.

용융금속에 의한 Ceramic Oxides에서의 Wetting에 관한 연구 (A Stydy on the Wetting of Ceramic Oxides by Molten Metal)

  • 이석권;임응극;김환
    • 한국세라믹학회지
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    • 제20권4호
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    • pp.289-296
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    • 1983
  • The Wetting of fusion cast $Al_2O_3$ brick and $Al_2O_3 -ZrO_2$ brick by liquid Ag was studied by the sessile drop technique in Ar atmosphere. In this experiment the specimens were photographed per 2$0^{\circ}C$with increasing temperature from 96$0^{\circ}C$ melting point of Ag. And the method of photographing was carried out by shadow technique. The cosine of the contact angle increased linearly with increasing temperature in both systems. And the relation between the cosine of the contact angle and the temperature was Cos$\theta$=1.132+$0.75{\times}10^{-3}T$ for $Al_2O_3$ brick and Cos$\theta$=-1.706+$1.125{\times}10^{-3}T$ for $Al_2O_3 -ZrO_2$ brick In both systems the contact angle decreased as the surface of substrate became smoother. The work of adhesion which was 503.5ergs/$cm^2$ for $Al_2O_3$brick and 393.6 ergs/cm2 for $Al_2O_3 -ZrO_2$ brick at 96$0^{\circ}C$ increased parabolically with increasing temperature in both system.

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알루미나 기판에 스크린 프린팅된 Ag(Ta,Nb)O3 후막의 유전특성 및 초고주파 특성에 대한 연구 (An Investigation on the Dielectric and Microwave Properties of Ag(Ta,Nb)O3 Thick Films on the Alumina Substrates)

  • 이규탁;고중혁
    • 한국전기전자재료학회논문지
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    • 제24권11호
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    • pp.925-928
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    • 2011
  • Perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. This article was investigated ferroelectric materials $Ag(Ta,Nb)O_3$ thick film. In this study, we have fabricated the $Ag(Ta,Nb)O_3$ thick film on the $Al_2O_3$ substrates by screen printing method. The $Ag(Ta,Nb)O_3$ thick film were fabricated by the mixed oxide method. The sintering temperature and time were 1,150$^{\circ}C$, 2 hr. The electrical properties of $Ag(Ta,Nb)O_3$ thick film were investigated at 30~100$^{\circ}C$.

알루미나/Ag-Cu-Zr-Sn 브레이징 합금계면의 미세조직 (Evolution of Interfacial Microstructure in Alumina and Ag-Cu-Zr-Sn Brazing Alloy)

  • 김종헌;유연철
    • 소성∙가공
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    • 제7권5호
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    • pp.481-488
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    • 1998
  • The active metal brazing was applied to bond Alumina and Ni-Cr steel by Ag-Cu-Zr-Sn alloy and the interfacial microstructure and reaction mechanism were investigated. Polycrystalline monoclinic $ZrO_2$ with a very fine grain of 100-150 nm formed at the alumina grain boundary contacted with Zr segregation layer at the interface. The $ZrO_2$ layer containing the inclusions and cracks were developed at the boundary of inclusion/$ZrO_2$ due to the difference in specific volume. The development of $ZrO_2$ at the interface was successfully explained by the preferential penetration of $ZrO_2$ at the interface was successfully explained by the preferential penetration of Zr atoms a higher concentration of oxygen and a high diffusion rate of Al ions into molten brazing alloy.

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Ag계 도체 및 RuO2계 저항체 페이스트의 특성에 미치는 무연계 글라스 프릿트 조성의 영향 (Effect of Lead Free Glass Frit Compositions on Properties of Ag System Conductor and RuO2 Based Resistor Pastes)

  • 구본급
    • 한국전기전자재료학회논문지
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    • 제24권3호
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    • pp.200-207
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    • 2011
  • Abstract: The effect of lead free glass frit compositions on the properties of thick film conductor and resistor pastes were investigated. Two types lead free frits, HBF-A(without $Bi_2O_3$) and HBF-B(with $Bi_2O_3$) were made from $SiO_2$, $B_2O_3$, $Al_2O_3$, CaO, MgO, $Na_2O$, $K_2O$, ZnO, MnO, $ZrO_2$, $Bi_2O_3$. And Ag based conductor pastes and $RuO_2$ based resistor paste were prepared by mixed with these frits and functional phase(Ag and $RuO_2$), and organic vehicle. The properties of thick film conductor and resistor sintered at $850^{\circ}C$ were studied after printing on $Al_2O_3$ substrate. The morphology of the sintered films surface were SEM and EDS were carried out to analysis the chemical composition on resistor surface and state of Ru atom in frit matrix.

Protective Metal Oxide Coatings on Zinc-sulfide-based Phosphors and their Cathodoluminescence Properties

  • Oh, Sung-Il;Lee, Hyo-Sung;Kim, Kwang-Bok;Kang, Jun-Gill
    • Bulletin of the Korean Chemical Society
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    • 제31권12호
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    • pp.3723-3729
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    • 2010
  • We investigated the high-excitation voltage cathodoluminescence (CL) performance of blue light-emitting (ZnS:Ag,Al,Cl) and green light-emitting (ZnS:Cu,Al) phosphors coated with metal oxides ($SiO_2$, $Al_2O_3$, and MgO). Hydrolysis of the metal oxide precursors tetraethoxysilane, aluminum isopropoxide, and magnesium nitrate, with subsequent heat annealing at $400^{\circ}C$, produced $SiO_2$ nanoparticles, an $Al_2O_3$ thin film, and MgO scale-type film, respectively, on the surface of the phosphors. Effects of the phosphor surface coatings on CL intensities and aging behavior of the phosphors were assessed using an accelerating voltage of 12 kV. The MgO thick film coverage exhibited less reduction in initial CL intensity and was most effective in improving aging degradation. Phosphors treated with a low concentration of magnesium nitrate maintained their initial CL intensities without aging degradation for 2000 s. In contrast, the $SiO_2$ and the $Al_2O_3$ coverages were ineffective in improving aging degradation.