Journal of Electrochemical Science and Technology

The Korean Electrochemical Society (한국전기화학회)
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Growing High-Quality Ir-Sb Nanostructures by Controlled Electrochemical Deposition

  • Received : 2019.04.04
  • Accepted : 2019.12.26
  • Published : 2020.05.31
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Abstract

The electrochemical preparation and spectroscopic characterisation of iridium-antimony (Ir-Sb) species is important owing to their potential applications as nanostructure materials. Nanostructures, i.e. nanoflower and nanodisk, of Ir-Sb were electrodeposited on conductive substrates using a practical electrochemical method based on the simultaneous underpotential deposition (UPD) of Ir and Sb from the IrCl3 and Sb2O3 at a constant potential. Electrochemical UPD mechanism of Ir-Sb was studied using cyclic voltammetry and potential-controlled electrochemical deposition techniques. Herein, X-ray diffraction, scanning electron microscopy, energy dispersive spectroscopy, X-ray photoelectron and Raman spectroscopy were used to determine the morphological and structural properties of the electrochemically-synthesised Ir-Sb nanostructures.

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References

  1. M. H. Elsheikh, D. A. Shnawah , F. M. Sabri, S. B. M. Said, M. H. Hassan, M. B. A. Bashir, M. Mohama, Renewable and Sustainable Energy Reviews, 2014, 30, 337-355. https://doi.org/10.1016/j.rser.2013.10.027
  2. D. J. Singh, Semicond. Semimetals, 2001, 125-177.
  3. K. Takegahara, H. Harima, Physica B, 2003, 328(1-2), 74-76. https://doi.org/10.1016/S0921-4526(02)01813-6
  4. T. S. Snider, J. V. Badding, S. B. Schujman, G. A. Slack, Chem. Mater., 2000, 12(3), 697-700. https://doi.org/10.1021/cm990446i
  5. T. M. Tritt, G. S. Nolas, G. A. Slack, A. C. Ehrlich, D. J. Gillespie, J. L. Cohn, J. Appl. Phys, 1996, 79(11), 8412-8418. https://doi.org/10.1063/1.362515
  6. A. P. Alivisatos, Science, 1996, 271(5251), 933-937. https://doi.org/10.1126/science.271.5251.933
  7. R. Venkatasubramanian, E. Siivola, T. Colpitts, B. Quinn, Nature, 2001, 413(6856), 597-602. https://doi.org/10.1038/35098012
  8. Y. Miyazaki, T. Kajitani, Journal of Crystal Growth, 2001, 229(1-4), 542-546. https://doi.org/10.1016/S0022-0248(01)01225-8
  9. A. Purkayastha, F. Lupo, S. Kim, T. Borca-Tasciuc, G. Ramanath, Adv. Mater., 2006, 18(4), 496-500. https://doi.org/10.1002/adma.200501339
  10. A. L. Prieto, M. S. Sander, M. S. Martin-Gonzalez, R. Gronsky, T. Sands, A.M. Stacy, J. Am. Chem. Soc., 2001, 123(29), 7160-7161. https://doi.org/10.1021/ja015989j
  11. C. Murphy, J. Anal. Chem., 2002, 74(19), 520-526. https://doi.org/10.1021/ac022124v
  12. L.A. Swafford, L.A. Weigand, M.J. Bowers, J.R. McBride, J.L. Rapaport, T.L., Watt, S.K. Dixit, L.C. Feldman, S.J. Rosenthal, J. Am. Chem. Soc., 2006, 128(37), 12299-12306. https://doi.org/10.1021/ja063939e
  13. F. Bayrakceken Nisanci, U. Demir, Langmuir, 2012, 28(22), 8571-8578. https://doi.org/10.1021/la301377r
  14. C. Woll, S. Chiang, R. J. H. Wilson, Physical Review B, 1989, 39(11), 7988-7991. https://doi.org/10.1103/PhysRevB.39.7988
  15. D. M. Kolb, H. Gerischer, C. W. Tobias, Advances in electrochemistry and electrochemical engineering, Eds.; Wiley-Interscience, New York, 1978, 11, 125-271.
  16. U. Demir, C. Shannon, Langmuir, 1994, 10(8), 2794-2799. https://doi.org/10.1021/la00020a048
  17. J. Clavilier, R. Faure, G. Guinet, R. Durand, J. Electroanal. Chem., 1980, 107(1), 205-209. https://doi.org/10.1016/S0022-0728(79)80022-4
  18. B. W. Gregory and J. L. X. Stickney, J.Electroanal. Chem., 1991, 300(1-2), 543-561. https://doi.org/10.1016/0022-0728(91)85415-L
  19. L.E. Brus, J. Phys. Chem., 1986, 90(12), 2555-2560. https://doi.org/10.1021/j100403a003
  20. T. Pauporte, D. J. Lincot, Electrochem. Soc., 2001, 148(4), C310-C314. https://doi.org/10.1149/1.1357175
  21. M. Alanyalioglu, F. Bayrakceken, U. Demir, Electrochim. Acta., 2009, 54(26), 6554-6559. https://doi.org/10.1016/j.electacta.2009.06.056
  22. F. Bayrakceken Nisanci, T. Oznuluer, U. Demir, Electrochimica Acta, 2013, 108, 281-287. https://doi.org/10.1016/j.electacta.2013.06.135
  23. C. Gu, H. Xu, M. Park, C. Shannon, Langmuir, 2009, 25(1), 410-414. https://doi.org/10.1021/la8026607
  24. W. Zhu, X. Liu, H. Liu, D. Tong, J. Yang, J. Peng, J. Am. Chem. Soc., 2010, 132(36), 12619-12626 https://doi.org/10.1021/ja1025112