Abstract
This study was conducted to evaluate the effects of scattering radiation, which was not considered in the cultural Heritage radiography, by evaluating the relationship between the tube voltage (unit: kVp), film-floor-distance(FFD), and lead screen layout. The density (unit: D) of the test specimens and the scattered radiation increased with the tube voltage. The density of the test specimens showed an average deviation of 1.4 D; it was 0.17 D at 60 kVp, 1.54 D at 160 kVp, and 2.97 D at 220 kVp. The mean density of the scattered radiation was 0.10 D at 60 kVp, 0.40 D at 160 kVp, and 0.46 D at 220 kVp. The density tended to increase when the tube voltage ranged between 60 kVp and 160 kVp, as the FFD distance increased. However, a change in the permeation density was not observed for high voltages(160 kVp-220 kVp). Scattered radiation was observed when FFD was 50 mm, 100 mm, and 200 mm and no lead screen was used and the bottom surface was replaced with the lead screen. No scattered radiation was observed when FFD was 0 mm. The identification rate ranged from 2.08% to 2.67%, according to the FFD, for a 160 kVp tube voltage, and from 2.67% to 3.33% for a 220 kVp tube voltage.
본 연구는 문화재 방사선 조사에서 고려하지 않았던 산란 방사선의 영향을 확인하기 위해 관전압 (kVp)과 필름-바닥 거리(film-floor-distance: FFD) 납스크린 배치를 달리하여 평가하였다. 연구결과, 실험시편의 투과농도와 산란 방사선의 투과 농도는 관전압에 따라 증가되었다. 실험시편의 투과농도는 평균 1.4 D의 편차를 보이며, 60 kVp에서 0.17 D, 160 kVp에서 1.54 D, 220 kVp에서 2.97 D로 확인되었다. 산란 방사선의 평균 투과농도는 60 kVp에서 0.10 D, 160 kVp에서 0.40 D, 220 kVp에서 0.46 D로 확인되었다. FFD 거리가 바닥면과 멀어질수록 관전압(60 kVp-160 kVp)구간의 경우 투과농도 (D)가 커지는 경향을 보였으나, 고전압(160 kVp-220 kVp)구간은 FFD 거리 증가에 따른 투과농도 변화가 확인되지 않았다. 납스크린 없는 조건과 바닥면(floor)을 납스크린으로 대체한 경우는 FFD 50 mm, 100 mm, 200 mm 거리에서 산란 방사선이 확인되었고, FFD 0 mm 거리는 확인되지 않았다. 식별률은 관전압 160 kVp에서 FFD에 따라 2.08~2.67% 범위이며, 관전압 220 kVp에서는 2.67~3.33% 범위로 측정되었다.