Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication and Characteristics of Ni Doped Carbon Thin Films Prepared by Unbalanced Magnetron Sputtering for the Application of Biomaterials

생체 적합 소재 응용을 위한 비대칭 마그네트론 스퍼터링으로 제작된 Ni 도핑된 탄소 박막의 제조 및 특성

  • Kim, Kwang-Taek (Department of Electronic Engineering, Honam University) ;
  • Park, Yong Seob (Department of Electronics, Chosun College of Science and Technology)
  • 김광택 (호남대학교 전자공학과) ;
  • 박용섭 (조선이공대학교 전자과)
  • Received : 2017.11.12
  • Accepted : 2017.12.12
  • Published : 2018.01.01
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Abstract

Various Ni-doped carbon (C : Ni) thin films were fabricated using different Ni target power densities by unbalanced magnetron sputtering (UBM). The effects of target power density on the structural, physical, surface, and electrical properties of C : Ni films were investigated. The UBM C : Ni thin films exhibited uniformly smooth surfaces. The rms surface roughness and friction coefficient values of the C : Ni films decreased with the increase in target power density. The physical properties of the films such as hardness and elastic moduli increased while their electrical properties such as resistivity decreased with the increase in the target power density. These results show that an increase of the power density leads to an increase in the proportion of Ni and nanocrystallization of the amorphous carbon film; this contributes to the changes observed in the physical and electrical characteristics.

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References

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