Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Effect of Post-deposition Annealing in a Nitrogen Atmosphere on the Properties of SnO2 Thin Films

질소분위기 열처리에 따른 SnO2 박막의 구조적, 전기광학적 특성 변화

  • Song, Young-Hwan (School of Materials Science and Engineering, University of Ulsan) ;
  • Eom, Tae-Young (School of Materials Science and Engineering, University of Ulsan) ;
  • Heo, Sung-Bo (Korea Institute of Industrial Technologies) ;
  • Kim, Jun-Ho (Korea Institute of Industrial Technologies) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 송영환 (울산대학교 첨단소재공학부) ;
  • 엄태영 (울산대학교 첨단소재공학부) ;
  • 허성보 (한국생산기술연구원, 첨단하이브리드생산기술센터) ;
  • 김준호 (한국생산기술연구원, 첨단하이브리드생산기술센터) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2016.12.02
  • Accepted : 2016.12.28
  • Published : 2017.01.30
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Abstract

A 100 nm thick $SnO_2$ thin films were prepared by radio frequency magnetron sputtering on glass substrates and then annealed in nitrogen atmosphere for 30 minutes at 100, 200, and $300^{\circ}C$, respectively. While the visible light transmittance and electrical resistivity of as deposited $SnO_2$ films were 81.8% and $1.5{\times}10^{-2}{\Omega}cm$, respectively, the films annealed at $200^{\circ}C$ show the increased optical transmittance of 82.8% and the electrical resistivity also decreased as low as $4.3{\times}10^{-3}{\Omega}cm$. From the observed results, it is concluded that post-deposition annealing in nitrogen atmosphere at $200^{\circ}C$ is an attractive condition to optimize the optical and electrical properties of $SnO_2$ thin films for the various display device applications.

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References

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