Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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A Study on the Mo Sputtering and HF Wet Etching for the Fabrication of Polisher

광택기 제조를 목적으로 한 스퍼터링을 이용한 Mo 증착과 불산 습식 식각 특성 연구

  • 김도형 (에스에스디에이티 주식회사) ;
  • 이호덕 (에스에스디에이티 주식회사) ;
  • 권상직 (가천대학교 전자공학과) ;
  • 조의식 (가천대학교 전자공학과)
  • Received : 2017.11.14
  • Accepted : 2017.12.21
  • Published : 2017.12.31
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Abstract

For the economical and environmental-friendly fabrication of polisher, Mo mask layer were sputtered on glass substrate instead of Cr mask material. Mo mask layers were sputtered by pulsed-DC sputtering and Photoresist patterns were formed on Mo mask layer for different develop times and optimized. After Mo mask layer were patterned and exposed glass was wet etched by HF solution for different etching times, the remaining Mo mask was stripped by using Al etchant. Develop time of 30 sec and HF wet etching time of 3 min were selected as optimized process condition and applied to the fabrication of polisher.

Keywords

References

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